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Cao Y, Sun H, Chen Y, Ma L, Li L, Jin S, Wu W. A self-aligned assembling terahertz metasurface microfluidic sensor for liquid detection. NANOSCALE 2024. [PMID: 38639046 DOI: 10.1039/d4nr00466c] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/20/2024]
Abstract
This paper reports a new terahertz metasurface microfluidic sensor, which is actually a kind of reflective terahertz metasurface absorber with a microfluidic-channel structure located in the strong field energy region of the absorber. The metasurface structure is made on an ultra-thin quartz substrate as the cap layer, while a two-step structure is made on a silicon substrate as the pedestal layer. In order to precisely control the thickness of the microfluidic channel, the cap layer is self-aligned assembled with the pedestal layer to form the terahertz metasurface microfluidic sensor. The obtained sensor could enhance the light-matter interaction, resulting in high sensing performance. The measured results show that the sensor has a perfect absorption peak at 2.60 THz and a high Q-factor of 62.59, which are basically consistent with the simulated results. The sensitivity and FOM calculated based on the measured results of different liquids with different refractive indices is 0.733 THz per RIU and 16.4, respectively. Compared with some recently related work, the sensitivity is increased by about 40%, the Q-factor is increased by 3-5 times, and the FOM is increased by 5 times, which make the sensor have great application potential for solution detection in the terahertz frequency band.
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Affiliation(s)
- Yunhao Cao
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing 100871, P. R. China.
| | - Hongshun Sun
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing 100871, P. R. China.
| | - Yusa Chen
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing 100871, P. R. China.
| | - Lijun Ma
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing 100871, P. R. China.
| | - Liye Li
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing 100871, P. R. China.
| | - Shengxiao Jin
- National Key Laboratory of Science and Technology on Space Microwave, CAST Xi'an, P. R. China
| | - Wengang Wu
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing 100871, P. R. China.
- Beijing Advanced Innovation Center for Integrated Circuits, P. R. China
- Frontiers Science Center for Nano-optoelectronics, Peking University, P. R. China
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Wang X, Sang T, Li G, Mi Q, Pei Y, Wang Y. Ultrabroadband and ultrathin absorber based on an encapsulated T-shaped metasurface. OPTICS EXPRESS 2021; 29:31311-31323. [PMID: 34615226 DOI: 10.1364/oe.435371] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/29/2021] [Accepted: 09/03/2021] [Indexed: 06/13/2023]
Abstract
Ultrabroadband absorbers are vital for applications such as solar energy harvesting and integrated optoelectronic devices. Herein, we design, fabricate and characterize a novel ultrabroadband and ultrathin absorber based on the encapsulated T-shaped metasurface (ETM). The ETM consists of a 20 nm Cr film and a Cr substrate sandwiched by the T-shaped polymethyl methacrylate (PMMA) arrays. The Cr film provides a robust absorptive surface with improved impedance matching, and ultrabroadband absorption can be achieved via the excitation of the localized surface plasmon (LSP) of this ultrathin film. The average absorption of simulated and experimental results of the ETM in the visible range of 400-800 nm for the TM (TE) polarization are 96.4% (96.3%) and 90.6% (89.4%), respectively. Three-dimensional (3D) power dissipation density distributions of the proposed structure have been investigated, which indicates that the synergistic absorption effect of different parts of the T-shaped ultrathin Cr film contributes to the major absorption enhancement. The absorption of the ETM is very robust to the changes of geometrical parameters and the symmetry of the structure, and it can be maintained almost the same even if T-shaped profiles are changed to L-shaped profiles. Moreover, the absorption performance of the ETM exhibits polarization-insensitive and wide-angle features, which has advantages for many potential applications.
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Yao Y, Zhou J, Liu Z, Liu X, Fu G, Liu G. Refractory materials and plasmonics based perfect absorbers. NANOTECHNOLOGY 2021; 32:132002. [PMID: 33302265 DOI: 10.1088/1361-6528/abd275] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/16/2020] [Accepted: 12/10/2020] [Indexed: 06/12/2023]
Abstract
In the past decades, metamaterial light absorbers have attracted tremendous attention due to their impressive absorption efficiency and significant potential for multiple kinds of applications. However, the conventional noble metals based metamaterial and nanomaterial absorbers always suffer from the structural damage by the local high temperature resulting from the strong plasmonic photo-thermal effects. To address this challenge, intensive research has been conducted to develop the absorbers which can realize efficient light absorption and simultaneously keep the structural stability under high temperatures. In this review, we present detail discussion on the refractory materials which can provide robust thermal stability and high performance for light absorption. Moreover, promising theoretical designs and experimental demonstrations that possess excellent features are also reviewed, including broadband strong light absorption, high temperature durability, and even the easy-to-fabricate configuration. Some applications challenges and prospects of refractory materials based plasmonic perfect absorbers are also introduced and discussed.
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Affiliation(s)
- Yu Yao
- Jiangxi Key Laboratory of Nanomaterials and Sensors, Jiangxi Key Laboratory of Photoelectronics and Telecommunication, College of Physics and Communication Electronics, Jiangxi Normal University, Nanchang 330022, Jiangxi, People's Republic of China
| | - Jin Zhou
- Jiangxi Key Laboratory of Nanomaterials and Sensors, Jiangxi Key Laboratory of Photoelectronics and Telecommunication, College of Physics and Communication Electronics, Jiangxi Normal University, Nanchang 330022, Jiangxi, People's Republic of China
| | - Zhengqi Liu
- Jiangxi Key Laboratory of Nanomaterials and Sensors, Jiangxi Key Laboratory of Photoelectronics and Telecommunication, College of Physics and Communication Electronics, Jiangxi Normal University, Nanchang 330022, Jiangxi, People's Republic of China
| | - Xiaoshan Liu
- Jiangxi Key Laboratory of Nanomaterials and Sensors, Jiangxi Key Laboratory of Photoelectronics and Telecommunication, College of Physics and Communication Electronics, Jiangxi Normal University, Nanchang 330022, Jiangxi, People's Republic of China
| | - Guolan Fu
- Jiangxi Key Laboratory of Nanomaterials and Sensors, Jiangxi Key Laboratory of Photoelectronics and Telecommunication, College of Physics and Communication Electronics, Jiangxi Normal University, Nanchang 330022, Jiangxi, People's Republic of China
| | - Guiqiang Liu
- Jiangxi Key Laboratory of Nanomaterials and Sensors, Jiangxi Key Laboratory of Photoelectronics and Telecommunication, College of Physics and Communication Electronics, Jiangxi Normal University, Nanchang 330022, Jiangxi, People's Republic of China
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Cai H, Sun Y, Wang X, Zhan S. Design of an ultra-broadband near-perfect bilayer grating metamaterial absorber based on genetic algorithm. OPTICS EXPRESS 2020; 28:15347-15359. [PMID: 32403564 DOI: 10.1364/oe.393423] [Citation(s) in RCA: 10] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/23/2020] [Accepted: 04/28/2020] [Indexed: 06/11/2023]
Abstract
An ultra-broadband metamaterial absorber, consisting of 2D SiO2-Ti square bilayer grating on SiO2 film and Ti substrate, is proposed and designed by rigorous coupled wave analysis (RCWA) and genetic algorithm (GA) methods. The optimized structure shows an average absorption of 98.3% in the wavelength range of 300 nm to 2100 nm. Moreover, the metamaterial absorber is polarization-independent and also insensitive to incidence angle for both TM- and TE-polarized waves. The physical mechanisms responsible for nearly perfect broadband absorption, including the Wood's anomaly (WA), cavity resonance (CR), surface plasmon polaritons (SPPs) and the resonance of magnetic polaritons (MPs), have been analyzed clearly by finite-difference time-domain (FDTD) method and the inductor-capacitor (LC) circuit model. Overall, the proposed metamaterial absorber is a promising candidate in solar applications.
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Numerical Study of Multilayer Planar Film Structures for Ideal Absorption in the Entire Solar Spectrum. APPLIED SCIENCES-BASEL 2020. [DOI: 10.3390/app10093276] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/26/2023]
Abstract
Here, we have theoretically proposed an ideal structure of selective solar absorber with multilayer planar films, which can absorb the incident light throughout the entire solar spectrum (300–2500 nm) and over a wide angular range, whatever the polarization angle of 0°~90°. The efficiency of the proposed absorber is proven by the Finite-Difference Time Domain (FDTD) simulation. The average absorption rate over the solar spectrum is up to 96.6%. The planar design is extremely easy to fabricate and modify, and this structure does not require lithographic processes to finish the absorbers. Improvements of the solar absorber on the basis of planar multilayer-film structures is attributed to multiple asymmetric highly lossy Fabry–Perot resonators. Because of having many virtues, such as using different refractory and non-noble metals, having angle and polarization independence, and having ideal absorption for entire solar spectrum, our proposed absorbers are promising candidates for practical industrial production of the solar-energy harvesting.
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