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For: Coulon PM, Feng P, Wang T, Shields PA. Impact of Inductively Coupled Plasma Etching Conditions on the Formation of Semi-Polar ( 11 2 ¯ 2 ) and Non-Polar ( 11 2 ¯ 0 ) GaN Nanorods. Nanomaterials (Basel) 2020;10:E2562. [PMID: 33419314 PMCID: PMC7766584 DOI: 10.3390/nano10122562] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/23/2020] [Revised: 12/15/2020] [Accepted: 12/16/2020] [Indexed: 11/22/2022]
Number Cited by Other Article(s)
1
Mrad M, Baril K, Charles M, Perez JZ, Labau S, Panabiere M, Petit-Etienne C, Alloing B, Lefevre G, Dupré L, Feuillet G, Gourgon C. Controlled SOI nanopatterning for GaN pendeo-epitaxy. MICRO AND NANO ENGINEERING 2022. [DOI: 10.1016/j.mne.2022.100110] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/27/2022]
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