Recent Advances in Sequential Infiltration Synthesis (SIS) of Block Copolymers (BCPs)

Combined Swelling and Metal Infiltration: Advancing Block Copolymer Pattern Control for Nanopatterning Applications

Block copolymer (BCP) patterning is a well-established self-assembly technique for developing surfaces with regular and controllable nanosized features. This method relies on the microphase separation of a BCP film and subsequent infiltration with inorganic species. The BCP film serves as a template, leaving behind inorganic replicas when removed. BCP patterning offers a promising, cost-effective alternative to standard nanopatterning techniques, featuring fewer processing steps and reduced energy use. However, BCP patterning can be complex and challenging to control. Varying the structural characteristics of the polymeric template (feature sizes) requires careful and often challenging synthesis of bespoke BCPs with controllable molecular weights (M w). To develop BCP patterning as a standard nanofabrication approach, a vapor-phase patterning (VPP) technology has been developed. VPP allows for the simultaneous, single-step, selective swelling of BCP nanodomains to precise feature sizes and morphologies while forming inorganic features by metallic precursor infiltration. Infiltration preserves the swollen arrangement, thus allowing for feature size selection without synthesizing BCPs with different M w, simplifying the process. VPP has the potential to revolutionize nanopatterning techniques in industries such as optical materials, materials for energy storage, sensors, and semiconductors by providing a pathway to efficient, precise, and cost-effective BCP template patterning.

Artificial fingerprints engraved through block-copolymers as nanoscale physical unclonable functions for authentication and identification

Besides causing financial losses and damage to the brand's reputation, counterfeiting can threaten the health system and global security. In this context, physical unclonable functions (PUFs) have been proposed to overcome limitations of current anti-counterfeiting technologies. Here, we report on artificial fingerprints that can be directly engraved on a wide range of substrates through self-assembled block-copolymer templating as nanoscale PUFs for secure authentication and identification. Results show that morphological features can be exploited to encode fingerprint-like nanopatterns in binary code matrices representing a unique bit stream of information characterized by high uniqueness and entropy. A strategy based on computer vision concepts for authentication/identification in real-world scenarios is reported. Long-term reliable operation and robust authentication/identification against thermal treatment at cryogenic and high temperatures of the PUF have been demonstrated. These results pave the way for the realization of PUFs embracing the inherent stochasticity of self-assembled materials at the nanoscale.

The Development and Atomic Structure of Zinc Oxide Crystals Grown within Polymers from Vapor Phase Precursors

Sequential infiltration synthesis (SIS), also known as vapor phase infiltration (VPI), is a quickly expanding technique that allows growth of inorganic materials within polymers from vapor phase precursors. With an increasing materials library, which encompasses numerous organometallic precursors and polymer chemistries, and an expanding application space, the importance of understanding the mechanisms that govern SIS growth is ever increasing. In this work, we studied the growth of polycrystalline ZnO clusters and particles in three representative polymers: poly(methyl methacrylate), SU-8, and polymethacrolein using vapor phase diethyl zinc and water. Utilizing two atomic resolution methods, high-resolution scanning transmission electron microscopy and synchrotron X-ray absorption spectroscopy, we probed the evolution of ZnO nanocrystals size and crystallinity level inside the polymers with advancing cycles─from early nucleation and growth after a single cycle, through the formation of nanometric particles within the films, and to the coalescence of the particles upon polymer removal and thermal treatment. Through in situ Fourier transform infrared spectroscopy and microgravimetry, we highlight the important role of water molecules throughout the process and the polymers' hygroscopic level that leads to the observed differences in growth patterns between the polymers, in terms of particle size, dispersity, and the evolution of crystalline order. These insights expand our understanding of crystalline materials growth within polymers and enable rational design of hybrid materials and polymer-templated inorganic nanostructures.

Sequential Infiltration Synthesis of Silicon Dioxide in Polymers with Ester Groups-Insight from In Situ Infrared Spectroscopy

New strategies to synthesize nanometer-scale silicon dioxide (SiO2) patterns have drawn much attention in applications such as microelectronic and optoelectronic devices, membranes, and sensors, as we are approaching device dimensions shrinking below 10 nm. In this regard, sequential infiltration synthesis (SIS), a two-step gas-phase molecular assembly process that enables localized inorganic material growth in the targeted reactive domains of polymers, is an attractive process. In this work, we performed in situ Fourier transform infrared spectroscopy (FTIR) measurements during SiO2 SIS to investigate the reaction mechanism of trimethylaluminum (TMA) and tri(tert-pentoxy) silanol (TPS) precursors with polymers having ester functional groups (poly(methyl methacrylate) (PMMA), poly(ethyl methacrylate) (PEMA), polycaprolactone (PCL), and poly(t-butyl methacrylate) (PBMA)), for the purpose of growing patterned nanomaterials. The FTIR results show that for PMMA and PEMA, a lower percentage of functional groups participated in the reactions and formed weak and unstable complexes. In contrast, almost all functional groups in PCL and PBMA participated in the reactions and showed stable and irreversible interactions with TMA. We discovered that the amount of SiO2 formed is not directly correlated with the number of interacting functional groups. These insights into the SiO2 SIS mechanism will enable nanopatterning of SiO2 for low-dimensional applications.

Hybrid Metrology for Nanostructured Optical Metasurfaces

Metasurfaces have garnered increasing research interest in recent years due to their remarkable advantages, such as efficient miniaturization and novel functionalities compared to traditional optical elements such as lenses and filters. These advantages have facilitated their rapid commercial deployment. Recent advancements in nanofabrication have enabled the reduction of optical metasurface dimensions to the nanometer scale, expanding their capabilities to cover visible wavelengths. However, the pursuit of large-scale manufacturing of metasurfaces with customizable functions presents challenges in controlling the dimensions and composition of the constituent dielectric materials. To address these challenges, the combination of block copolymer (BCP) self-assembly and sequential infiltration synthesis (SIS), offers an alternative for fabrication of high-resolution dielectric nanostructures with tailored composition and optical functionalities. However, the absence of metrological techniques capable of providing precise and reliable characterization of the refractive index of dielectric nanostructures persists. This study introduces a hybrid metrology strategy that integrates complementary synchrotron-based traceable X-ray techniques to achieve comprehensive material characterization for the determination of the refractive index on the nanoscale. To establish correlations between material functionality and their underlying chemical, compositional and dimensional properties, TiO2 nanostructures model systems were fabricated by SIS of BCPs. The results from synchrotron-based analyses were integrated into physical models, serving as a validation scheme for laboratory-scale measurements to determine effective refractive indices of the nanoscale dielectric materials.

Block Copolymer-Templated, Single-Step Synthesis of Transition Metal Oxide Nanostructures for Sensing Applications

The synthesis of transition metal oxide nanostructures, thanks to their high surface-to-volume ratio and the resulting large fraction of surface atoms with high catalytic activity, is of prime importance for the development of new sensors and catalytic materials. Here, we report an economical, time-efficient, and easily scalable method of fabricating nanowires composed of vanadium, chromium, manganese, iron, and cobalt oxides by employing simultaneous block copolymer (BCP) self-assembly and selective sequestration of metal-organic acetylacetonate complexes within one of the BCP blocks. We discuss the mechanism and the primary factors that are responsible for the sequestration and conformal replication of the BCP template by the inorganic material that is obtained after the polymer template is removed. X-ray photoelectron spectroscopy (XPS) and powder X-ray diffraction (PXRD) studies indicate that the metal oxidation state in the nanowires produced by plasma ashing the BCP template closely matches that of the precursor complex and that their structure is amorphous, thus requiring high-temperature annealing in order to sinter them into a crystalline form. Finally, we demonstrate how the developed nanowire array fabrication scheme can be used to rapidly pattern a multilayered iron oxide nanomesh, which we then used to construct a prototype volatile organic compound sensor.

Developing Quantitative Nondestructive Characterization of Nanomaterials: A Case Study on Sequential Infiltration Synthesis of Block Copolymers

The sequential infiltration synthesis (SIS) of inorganic materials in nanostructured block copolymer templates has rapidly progressed in the last few years to develop functional nanomaterials with controllable properties. To assist this rapid evolution, expanding the capabilities of nondestructive methods for quantitative characterization of the materials properties is required. In this paper, we characterize the SIS process on three model polymers with different infiltration profiles through ex situ quantification by reference-free grazing incidence X-ray fluorescence. More qualitative depth distribution results were validated by means of X-ray photoelectron spectroscopy and scanning transmission electron microscopy combined with energy-dispersive X-ray spectroscopy.

Conductive Polyaniline-Indium Oxide Composite Films Prepared by Sequential Infiltration Synthesis for Electrochemical Energy Storage

Composites of conductive polymers (CP) and metal oxides (MO) have attracted continued interest in the past decade for diverse application fields because the synergistic effects of CP and MO enable the realization of unusual electronic, electrochemical, catalytic, and mechanical properties of the composites. Herein, we present a novel method for the sequential infiltration synthesis of composite films of polyaniline (PANI) and indium oxide (InO _x ) with high electrical conductivities (4-9 S/cm). The synthesized composite films were composed of two phases of graded concentration: InO _x with oxygen vacancies and PANI with partially protonated molecular units. The PANI-InO _x composite films displayed enhanced electrochemical activity with a pair of well-defined redox peaks. The open interfacial regions between the InO _x and PANI phases may provide efficient pathways for ion diffusion and active sites for improved charge transfer.

Liquid Phase Infiltration of Block Copolymers

Novel materials with defined composition and structures at the nanoscale are increasingly desired in several research fields spanning a wide range of applications. The development of new approaches of synthesis that provide such control is therefore required in order to relate the material properties to its functionalities. Self-assembling materials such as block copolymers (BCPs), in combination with liquid phase infiltration (LPI) processes, represent an ideal strategy for the synthesis of inorganic materials into even more complex and functional features. This review provides an overview of the mechanism involved in the LPI, outlining the role of the different polymer infiltration parameters on the resulting material properties. We report newly developed methodologies that extend the LPI to the realisation of multicomponent and 3D inorganic nanostructures. Finally, the recently reported implementation of LPI into different applications such as photonics, plasmonics and electronics are highlighted.

Understanding Physicochemical Mechanisms of Sequential Infiltration Synthesis toward Rational Process Design for Uniform Incorporation of Metal Oxides

Sequential infiltration synthesis (SIS) is a novel technique for fabricating organic-inorganic hybrid materials and porous inorganic materials by leveraging the diffusion of gas-phase precursors into a polymer matrix and chemical reactions between the precursors to synthesize inorganic materials therein. This study aims to obtain a fundamental understanding of the physicochemical mechanisms behind SIS, from which the SIS processing conditions are rationally designed to obtain precise control over the distribution of metal oxides. Herein, in situ FTIR spectroscopy was correlated with various ex situ characterization techniques to study a model system involving the growth of aluminum oxides in poly(methyl methacrylate) using trimethyl aluminum (TMA) and water as the metal precursor and co-reactant, respectively. We identified the prominent chemical states of the sorbed TMA precursors: (1) freely diffusing precursors, (2) weakly bound precursors, and (3) precursors strongly bonded to pre-existing oxide clusters and studied how their relative contributions to oxide formation vary in relation to the changes in the rate-limiting step under different growth conditions. Finally, we demonstrate that uniform incorporation of metal oxide is realized by a rational design of processing conditions, by which the major chemical species contributing to oxide formation is modulated.

Sub-5 nm Anisotropic Pattern Transfer via Colloidal Lithography of a Self-Assembled GdF3 Nanocrystal Monolayer

Patterning materials with nanoscale features opens many research opportunities ranging from fundamental science to technological applications. However, current nanofabrication methods are ill-suited for sub-5 nm patterning and pattern transfer. We demonstrate the use of colloidal lithography to transfer an anisotropic pattern of discrete features into substrates with a critical dimension below 5 nm. The assembly of monodisperse, anisotropic nanocrystals (NCs) with a rhombic-plate morphology spaced by dendrimer ligands results in a well-ordered monolayer that serves as a 2D anisotropic hard mask pattern. This pattern is transferred into the underlying substrate using dry etching followed by removal of the NC mask. We exemplify this approach by fabricating an array of pillars with a rhombic cross-section and edge-to-edge spacing of 4.4 ± 1.1 nm. The fabrication approach enables broader access to patterning materials at the deep nanoscale by implementing innovative processes into well-established fabrication methods while minimizing process complexity.

Sequential Infiltration Synthesis into Maltoheptaose and Poly(styrene): Implications for Sub-10 nm Pattern Transfer

Vapor phase infiltration into a self-assembled block copolymer (BCP) to create a hybrid material in one of the constituent blocks can enhance the etch selectivity for pattern transfer. Multiple pulse infiltration into carbohydrate-based high-χ BCP has previously been shown to enable sub-10 nm feature pattern transfer. By optimizing the amount of infiltrated material, the etch selectivity should be further improved. Here, an investigation of semi-static sequential infiltration synthesis of trimethyl aluminum (TMA) and water into maltoheptaose (MH) films, and into hydroxyl-terminated poly(styrene) (PS-OH) films, was performed, by varying the process parameters temperature, precursor pulse duration, and precursor exposure length. It was found that, by decreasing the exposure time from 100 to 20 s, the volumetric percentage on included pure Al2O3 in MH could be increased from 2 to 40 vol% at the expense of a decreased infiltration depth. Furthermore, the degree of infiltration was minimally affected by temperature between 64 and 100 °C. Shorter precursor pulse durations of 10 ms TMA and 5 ms water, as well as longer precursor pulses of 75 ms TMA and 45 ms water, were both shown to promote a higher degree, 40 vol%, of infiltrated alumina in MH. As proof of concept, 12 nm pitch pattern transfer into silicon was demonstrated using the method and can be concluded to be one of few studies showing pattern transfer at such small pitch. These results are expected to be of use for further understanding of the mechanisms involved in sequential infiltration synthesis of TMA/water into MH, and for further optimization of carbohydrate-based etch masks for sub-10 nm pattern transfer. Enabling techniques for high aspect ratio pattern transfer at the single nanometer scale could be of high interest, e.g., in the high-end transistor industry.

Sub-25 nm Inorganic and Dielectric Nanopattern Arrays on Substrates: A Block Copolymer-Assisted Lithography

A range of well-ordered inorganic (antimony, tin, and tungsten oxide) and dielectric (silica, alumina, and hafnia) nanoparticles and nanowire array patterns are created on substrates by a low-cost block copolymer (BCP) approach. A cylindrical-phase PS-b-PEO BCP is used as a template with hexagonally ordered perpendicular or parallel orientation of PEO cylinders. The solvent annealing parameters such as solvents, temperature, time, and so forth are optimized to achieve the desired patterns. An established BCP in situ inclusion protocol is utilized to achieve the material nanopatterns by spin coating the respective precursor ethanolic solution on the template followed by UV/ozone treatment for oxide conversion and polymer removal. Furthermore, the precursor solution concentrations and stirring times are calibrated to achieve isolated, well-ordered, and uniform-diameter and -thickness nanoparticles and nanowires. All of the material nanopatterns are mimicking the parent BCP nanopatterns. The phases of all of the nanopatterns are determined by X-ray photoelectron spectroscopy. The inorganic and dielectric nanopattern arrays are patterned on a graphoepitaxial substrate for device application.

Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications

Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.