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Lo Nigro R, Fiorenza P, Pécz B, Eriksson J. Nanotechnology for Electronic Materials and Devices. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:3319. [PMID: 36234447 PMCID: PMC9565597 DOI: 10.3390/nano12193319] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/07/2022] [Accepted: 09/13/2022] [Indexed: 06/16/2023]
Abstract
The historical scaling down of electronics devices is no longer the main goal of the International Roadmap for Devices and Systems [...].
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Affiliation(s)
- Raffaella Lo Nigro
- Consiglio Nazionale della Ricerche (CNR), Istituto per la Microelettronica e Microsistemi (IMM), Strada VIII, 5, 95121 Catania, Italy
| | - Patrick Fiorenza
- Consiglio Nazionale della Ricerche (CNR), Istituto per la Microelettronica e Microsistemi (IMM), Strada VIII, 5, 95121 Catania, Italy
| | - Béla Pécz
- Centre for Energy Research, Institute for Technical Physics and Materials Science Research, Konkoly-Thege, 29-33, 1121 Budapest, Hungary
| | - Jens Eriksson
- Department of Physics, Chemistry and Biology (IFM), University of Linkoping, Campus Valla, Fysikhuset, SE-581 83 Linkoping, Sweden
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Gao Q, Lu J, Chen S, Chen L, Xu Z, Lin D, Xu S, Liu P, Zhang X, Cai W, Zhang C. Chemical Vapor Deposition of Uniform and Large-Domain Molybdenum Disulfide Crystals on Glass/Al 2O 3 Substrates. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:2719. [PMID: 35957148 PMCID: PMC9370393 DOI: 10.3390/nano12152719] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 07/22/2022] [Revised: 08/01/2022] [Accepted: 08/03/2022] [Indexed: 06/15/2023]
Abstract
Two-dimensional molybdenum disulfide (MoS2) has attracted significant attention for next-generation electronics, flexible devices, and optical applications. Chemical vapor deposition is the most promising route for the production of large-scale, high-quality MoS2 films. Recently, the chemical vapor deposition of MoS2 films on soda-lime glass has attracted great attention due to its low cost, fast growth, and large domain size. Typically, a piece of Mo foil or graphite needs to be used as a buffer layer between the glass substrates and the CVD system to prevent the glass substrates from being fragmented. In this study, a novel method was developed for synthesizing MoS2 on glass substrates. Inert Al2O3 was used as the buffer layer and high-quality, uniform, triangular monolayer MoS2 crystals with domain sizes larger than 400 μm were obtained. To demonstrate the advantages of glass/Al2O3 substrates, a direct comparison of CVD MoS2 on glass/Mo and glass/Al2O3 substrates was performed. When Mo foil was used as the buffer layer, serried small bilayer islands and bright core centers could be observed on the MoS2 domains at the center and edges of glass substrates. As a control, uniform MoS2 crystals were obtained when Al2O3 was used as the buffer layer, both at the center and the edge of glass substrates. Raman and PL spectra were further characterized to show the merit of glass/Al2O3 substrates. In addition, the thickness of MoS2 domains was confirmed by an atomic force microscope and the uniformity of MoS2 domains was verified by Raman mapping. This work provides a novel method for CVD MoS2 growth on soda-lime glass and is helpful in realizing commercial applications of MoS2.
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Affiliation(s)
- Qingguo Gao
- School of Electronic Information, University of Electronic Science and Technology of China Zhongshan Institute, Zhongshan 528402, China
| | - Jie Lu
- College of Physical Science and Technology, Xiamen University, Xiamen 361005, China
| | - Simin Chen
- School of Electronic Information, University of Electronic Science and Technology of China Zhongshan Institute, Zhongshan 528402, China
| | - Lvcheng Chen
- School of Electronic Information, University of Electronic Science and Technology of China Zhongshan Institute, Zhongshan 528402, China
| | - Zhequan Xu
- School of Electronic Information, University of Electronic Science and Technology of China Zhongshan Institute, Zhongshan 528402, China
| | - Dexi Lin
- School of Electronic Information, University of Electronic Science and Technology of China Zhongshan Institute, Zhongshan 528402, China
| | - Songyi Xu
- School of Electronic Information, University of Electronic Science and Technology of China Zhongshan Institute, Zhongshan 528402, China
| | - Ping Liu
- School of Electronic Information, University of Electronic Science and Technology of China Zhongshan Institute, Zhongshan 528402, China
| | - Xueao Zhang
- College of Physical Science and Technology, Xiamen University, Xiamen 361005, China
| | - Weiwei Cai
- College of Physical Science and Technology, Xiamen University, Xiamen 361005, China
| | - Chongfu Zhang
- School of Electronic Information, University of Electronic Science and Technology of China Zhongshan Institute, Zhongshan 528402, China
- School of Information and Communication Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
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