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Höflich K, Maćkosz K, Jureddy CS, Tsarapkin A, Utke I. Direct electron beam writing of silver using a β-diketonate precursor: first insights. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2024; 15:1117-1124. [PMID: 39224534 PMCID: PMC11368048 DOI: 10.3762/bjnano.15.90] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/01/2024] [Accepted: 07/24/2024] [Indexed: 09/04/2024]
Abstract
Direct electron beam writing is a powerful tool for fabricating complex nanostructures in a single step. The electron beam locally cleaves the molecules of an adsorbed gaseous precursor to form a deposit, similar to 3D printing but without the need for a resist or development step. Here, we employ for the first time a silver β-diketonate precursor for focused electron beam-induced deposition (FEBID). The used compound (hfac)AgPMe3 operates at an evaporation temperature of 70-80 °C and is compatible with commercially available gas injection systems used in any standard scanning electron microscope. Growth of smooth 3D geometries could be demonstrated for tightly focused electron beams, albeit with low silver content in the deposit volume. The electron beam-induced deposition proved sensitive to the irradiation conditions, leading to varying compositions of the deposit and internal inhomogeneities such as the formation of a layered structure consisting of a pure silver layer at the interface to the substrate covered by a deposit layer with low silver content. Imaging after the deposition process revealed morphological changes such as the growth of silver particles on the surface. While these effects complicate the application for 3D printing, the unique deposit structure with a thin, compact silver film beneath the deposit body is interesting from a fundamental point of view and may offer additional opportunities for applications.
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Affiliation(s)
- Katja Höflich
- Ferdinand-Braun-Institut (FBH), Gustav-Kirchhoff-Str. 4, 12489 Berlin, Germany
- Laboratory of Mechanics for Materials and Nanostructures, Empa – Swiss Federal Laboratories for Material Science and Technology, Feuerwerkerstrasse 39, CH 3602 Thun, Switzerland
| | - Krzysztof Maćkosz
- Laboratory of Mechanics for Materials and Nanostructures, Empa – Swiss Federal Laboratories for Material Science and Technology, Feuerwerkerstrasse 39, CH 3602 Thun, Switzerland
| | - Chinmai S Jureddy
- Laboratory of Mechanics for Materials and Nanostructures, Empa – Swiss Federal Laboratories for Material Science and Technology, Feuerwerkerstrasse 39, CH 3602 Thun, Switzerland
| | - Aleksei Tsarapkin
- Ferdinand-Braun-Institut (FBH), Gustav-Kirchhoff-Str. 4, 12489 Berlin, Germany
| | - Ivo Utke
- Laboratory of Mechanics for Materials and Nanostructures, Empa – Swiss Federal Laboratories for Material Science and Technology, Feuerwerkerstrasse 39, CH 3602 Thun, Switzerland
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Butrymowicz-Kubiak A, Muzioł TM, Kaczmarek-Kędziera A, Jureddy CS, Maćkosz K, Utke I, Szymańska IB. New palladium(II) β-ketoesterates for focused electron beam induced deposition: synthesis, structures, and characterization. Dalton Trans 2024. [PMID: 39087858 DOI: 10.1039/d4dt01287a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 08/02/2024]
Abstract
We report the synthesis and characterization of new palladium(II) β-ketoesterate complexes [Pd(CH3COCHCO2R)2] with alkyl substituents R = tBu, iPr, Et. These compounds can have potential use in focused electron beam induced deposition (FEBID), which is a direct write method for the growth of structures at the nanoscale. However, it is still a major challenge to obtain deposits with a high metal content, and new precursor molecules are needed to overcome this. Single crystal X-ray diffraction, infrared spectroscopy, nuclear magnetic resonance spectroscopy, and density-functional theory calculations were used to confirm the compounds' composition and structure. Using thermal analysis and sublimation experiments, we investigate their thermal stability and volatility. These studies show that the palladium complexes sublimate over the range 348-353 K under 10-2 mbar pressure. The electron-induced decomposition of the complex molecules in the gas phase and their thin layers on silicon substrates were analysed using electron impact mass spectrometry (EI MS) and microscopy studies (SEM/EDX). They confirm that the precursor electron-induced fragmentation depends on the molecular structure. The obtained results reveal that [Pd(CH3COCHCO2tBu)2] with cis-positioned tert-butyl groups may be a promising FEBID precursor, and we carried out preliminary deposition experiments using this compound.
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Affiliation(s)
- A Butrymowicz-Kubiak
- Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland.
| | - T M Muzioł
- Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland.
| | - A Kaczmarek-Kędziera
- Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland.
| | - C S Jureddy
- Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, CH - 3602 Thun, Switzerland
| | - K Maćkosz
- Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, CH - 3602 Thun, Switzerland
| | - I Utke
- Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, CH - 3602 Thun, Switzerland
| | - I B Szymańska
- Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland.
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Tsarapkin A, Maćkosz K, Jureddy CS, Utke I, Höflich K. Area-Selective Chemical Vapor Deposition of Gold by Electron Beam Seeding. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024:e2313571. [PMID: 38546415 DOI: 10.1002/adma.202313571] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/12/2023] [Revised: 03/06/2024] [Indexed: 04/19/2024]
Abstract
Chemical vapor deposition (CVD) is an established method for producing high-purity thin films, but it typically necessitates the pre- and post-processing using a mask to produce structures. This study presents a novel maskless patterning technique that enables area-selective CVD of gold. A focused electron beam is used to decompose the metal-organic precursor Au(acac)Me2 locally, thereby creating an autocatalytically active seed layer for subsequent CVD with the same precursor. The procedure can be included in the same CVD process without the need for clean room lithographic processing. Moreover, it operates at low temperatures of 80 °C, over 200 K lower than standard CVD temperatures for this precursor, reducing thermal load on the specimen. Given that electron beam seeding operates on any even moderately conductive surface, the process does not constrain device design. This is demonstrated by the example of vertical nanostructures with high aspect ratios of ≈40:1 and more. Written using a focused electron beam and the same precursor, these nanopillars exhibit catalytically active nuclei on their surface. Furthermore, by using the onset of the autocatalytic CVD growth, for the first time the local temperature increase caused by the writing of nanostructures with an electron beam can be precisely determined.
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Affiliation(s)
- Aleksei Tsarapkin
- Ferdinand-Braun-Institut (FBH), Leibniz-Institut für Höchstfrequenztechnik, Gustav-Kirchhoff-Str. 4, D-12489, Berlin, Germany
| | - Krzysztof Maćkosz
- Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, Thun, CH-3602, Switzerland
| | - Chinmai Sai Jureddy
- Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, Thun, CH-3602, Switzerland
| | - Ivo Utke
- Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, Thun, CH-3602, Switzerland
| | - Katja Höflich
- Ferdinand-Braun-Institut (FBH), Leibniz-Institut für Höchstfrequenztechnik, Gustav-Kirchhoff-Str. 4, D-12489, Berlin, Germany
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Jurczyk J, Höflich K, Madajska K, Berger L, Brockhuis L, Edwards TEJ, Kapusta C, Szymańska IB, Utke I. Ligand Size and Carbon-Chain Length Study of Silver Carboxylates in Focused Electron-Beam-Induced Deposition. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:nano13091516. [PMID: 37177061 PMCID: PMC10180361 DOI: 10.3390/nano13091516] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/19/2023] [Revised: 04/21/2023] [Accepted: 04/25/2023] [Indexed: 05/15/2023]
Abstract
Gas-assisted focused electron-beam-induced deposition is a versatile tool for the direct writing of complex-shaped nanostructures with unprecedented shape fidelity and resolution. While the technique is well-established for various materials, the direct electron beam writing of silver is still in its infancy. Here, we examine and compare five different silver carboxylates, three perfluorinated: [Ag2(µ-O2CCF3)2], [Ag2(µ-O2CC2F5)2], and [Ag2(µ-O2CC3F7)2], and two containing branched substituents: [Ag2(µ-O2CCMe2Et)2] and [Ag2(µ-O2CtBu)2], as potential precursors for focused electron-beam-induced deposition. All of the compounds show high sensitivity to electron dissociation and efficient dissociation of Ag-O bonds. The as-deposited materials have silver contents from 42 at.% to above 70 at.% and are composed of silver nano-crystals with impurities of carbon and fluorine between them. Precursors with the shortest carbon-fluorine chain ligands yield the highest silver contents. In addition, the deposited silver content depends on the balance of electron-induced ligand co-deposition and ligand desorption. For all of the tested compounds, low electron flux was related to high silver content. Our findings demonstrate that silver carboxylates constitute a promising group of precursors for gas-assisted focused electron beam writing of high silver content materials.
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Affiliation(s)
- Jakub Jurczyk
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, 3602 Thun, Switzerland
- Faculty of Physics and Applied Computer Science, AGH University of Krakow Al. Mickiewicza 30, 30-059 Kraków, Poland
| | - Katja Höflich
- Helmholtz-Zentrum Berlin Für Materialien und Energie, Nanoscale Structures and Microscopic Analysis, Hahn-Meitner-Platz 1, 14109 Berlin, Germany
- Ferdinand-Braun Institut, Leibniz-Institut für Höchstfrequenztechnik, Gustav-Kirchhoff-Str. 4, 12489 Berlin, Germany
| | - Katarzyna Madajska
- Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland
| | - Luisa Berger
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, 3602 Thun, Switzerland
| | - Leo Brockhuis
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, 3602 Thun, Switzerland
- Faculty of Physics and Applied Computer Science, AGH University of Krakow Al. Mickiewicza 30, 30-059 Kraków, Poland
| | - Thomas Edward James Edwards
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, 3602 Thun, Switzerland
| | - Czesław Kapusta
- Faculty of Physics and Applied Computer Science, AGH University of Krakow Al. Mickiewicza 30, 30-059 Kraków, Poland
| | - Iwona B Szymańska
- Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland
| | - Ivo Utke
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, 3602 Thun, Switzerland
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Boysen N, Devi A. Liquid injection field desorption/ionization as a powerful tool to characterize volatile, labile, and reactive metal-organic complexes. EUROPEAN JOURNAL OF MASS SPECTROMETRY (CHICHESTER, ENGLAND) 2023; 29:12-20. [PMID: 36579795 DOI: 10.1177/14690667221146687] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/17/2023]
Abstract
Electron ionization mass spectrometry (EI-MS) is often used to characterize volatile and thermally stable organometallic complexes relevant for chemical vapor deposition (CVD) processes. However, this method has limitations for thermally unstable and labile organometallic complexes. In this context, EI-MS is not the preferred method of choice for characterizing such compounds. With three different representative organometallic complexes based on the transition metals yttrium, iridium, and silver, relevant as precursors for CVD of different materials, the significance of liquid injection field desorption/ionization mass spectrometry (LIFDI-MS) as an important precursor characterization tool is exemplified. The precursors are not only reactive toward ambient air, but also thermally labile especially in the case of iridium and silver complexes. As a promising alternative, LIFDI-MS is used to overcome the limitations of EI-MS. For the first time, these complexes were successfully analyzed using LIFDI-MS. The comparison between EI-MS and LIFDI-MS highlights that LIFDI-MS is superior for the mass spectrometric analysis of sensitive and labile complexes. In terms of precursor characterization, LIFDI-MS can be fully exploited to gain valuable insights into the decomposition mechanisms and identifying the nuclearity of organometallic precursors used for CVD applications.
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Affiliation(s)
- Nils Boysen
- Inorganic Materials Chemistry (IMC), 9142Ruhr University Bochum, Bochum, Germany
| | - Anjana Devi
- Inorganic Materials Chemistry (IMC), 9142Ruhr University Bochum, Bochum, Germany
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Jurczyk J, Pillatsch L, Berger L, Priebe A, Madajska K, Kapusta C, Szymańska IB, Michler J, Utke I. In Situ Time-of-Flight Mass Spectrometry of Ionic Fragments Induced by Focused Electron Beam Irradiation: Investigation of Electron Driven Surface Chemistry inside an SEM under High Vacuum. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:2710. [PMID: 35957140 PMCID: PMC9370286 DOI: 10.3390/nano12152710] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/15/2022] [Revised: 07/22/2022] [Accepted: 07/29/2022] [Indexed: 06/15/2023]
Abstract
Recent developments in nanoprinting using focused electron beams have created a need to develop analysis methods for the products of electron-induced fragmentation of different metalorganic compounds. The original approach used here is termed focused-electron-beam-induced mass spectrometry (FEBiMS). FEBiMS enables the investigation of the fragmentation of electron-sensitive materials during irradiation within the typical primary electron beam energy range of a scanning electron microscope (0.5 to 30 keV) and high vacuum range. The method combines a typical scanning electron microscope with an ion-extractor-coupled mass spectrometer setup collecting the charged fragments generated by the focused electron beam when impinging on the substrate material. The FEBiMS of fragments obtained during 10 keV electron irradiation of grains of silver and copper carboxylates and shows that the carboxylate ligand dissociates into many smaller volatile fragments. Furthermore, in situ FEBiMS was performed on carbonyls of ruthenium (solid) and during electron-beam-induced deposition, using tungsten carbonyl (inserted via a gas injection system). Loss of carbonyl ligands was identified as the main channel of dissociation for electron irradiation of these carbonyl compounds. The presented results clearly indicate that FEBiMS analysis can be expanded to organic, inorganic, and metal organic materials used in resist lithography, ice (cryo-)lithography, and focused-electron-beam-induced deposition and becomes, thus, a valuable versatile analysis tool to study both fundamental and process parameters in these nanotechnology fields.
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Affiliation(s)
- Jakub Jurczyk
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
- Faculty of Physics and Applied Computer Science, AGH University of Science and Technology Krakow, Al. Mickiewicza 30, 30-059 Kraków, Poland
| | - Lex Pillatsch
- TOFWERK AG, Schorenstrasse 39, CH-3645 Thun, Switzerland
| | - Luisa Berger
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
| | - Agnieszka Priebe
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
| | - Katarzyna Madajska
- Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland
| | - Czesław Kapusta
- Faculty of Physics and Applied Computer Science, AGH University of Science and Technology Krakow, Al. Mickiewicza 30, 30-059 Kraków, Poland
| | - Iwona B. Szymańska
- Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland
| | - Johann Michler
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
| | - Ivo Utke
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
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