The Physics behind the Modulation of Thermionic Current in Photodetectors Based on Graphene Embedded between Amorphous and Crystalline Silicon

Synergic Effect of N and Se Facilitates Photoelectric Performance in Co-Hyperdoped Silicon

Femtosecond-laser-fabricated black silicon has been widely used in the fields of solar cells, photodetectors, semiconductor devices, optical coatings, and quantum computing. However, the responsive spectral range limits its application in the near- to mid-infrared wavelengths. To further increase the optical responsivity in longer wavelengths, in this work, silicon (Si) was co-hyperdoped with nitrogen (N) and selenium (Se) through the deposition of Se films on Si followed by femtosecond (fs)-laser irradiation in an atmosphere of NF3. The optical and crystalline properties of the Si:N/Se were found to be influenced by the precursor Se film and laser fluence. The resulting photodetector, a product of this innovative approach, exhibited an impressive responsivity of 24.8 A/W at 840 nm and 19.8 A/W at 1060 nm, surpassing photodetectors made from Si:N, Si:S, and Si:S/Se (the latter two fabricated in SF6). These findings underscore the co-hyperdoping method's potential in significantly improving optoelectronic device performance.

Mono- and Bilayer Graphene/Silicon Photodetectors Based on Optical Microcavities Formed by Metallic and Double Silicon-on-Insulator Reflectors: A Theoretical Investigation

In this work, we theoretically investigate a graphene/silicon Schottky photodetector operating at 1550 nm whose performance is enhanced by interference phenomena occurring inside an innovative Fabry-Pèrot optical microcavity. The structure consists of a hydrogenated amorphous silicon/graphene/crystalline silicon three-layer realized on the top of a double silicon-on-insulator substrate working as a high-reflectivity input mirror. The detection mechanism is based on the internal photoemission effect, and the light-matter interaction is maximized through the concept of confined mode, exploited by embedding the absorbing layer within the photonic structure. The novelty lies in the use of a thick layer of gold as an output reflector. The combination of the amorphous silicon and the metallic mirror is conceived to strongly simplify the manufacturing process by using standard microelectronic technology. Configurations based on both monolayer and bilayer graphene are investigated to optimize the structure in terms of responsivity, bandwidth, and noise-equivalent power. The theoretical results are discussed and compared with the state-of-the-art of similar devices.