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For: Yang JY, Jung S, Byeon EY, Lee HH, Kim DG, Kim HJ, Jang HW, Lee S. Preliminary Validation of a Continuum Model for Dimple Patterns on Polyethylene Naphthalate via Ar Ion Beam Sputtering. Polymers (Basel) 2021;13:1932. [PMID: 34200831 PMCID: PMC8230451 DOI: 10.3390/polym13121932] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/08/2021] [Revised: 06/08/2021] [Accepted: 06/08/2021] [Indexed: 11/19/2022]  Open
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