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Hari S, van Dorp WF, Mulders JJL, Trompenaars PHF, Kruit P, Hagen CW. Sidewall angle tuning in focused electron beam-induced processing. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2024; 15:447-456. [PMID: 38711581 PMCID: PMC11070960 DOI: 10.3762/bjnano.15.40] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 01/15/2024] [Accepted: 03/20/2024] [Indexed: 05/08/2024]
Abstract
Structures fabricated using focused electron beam-induced deposition (FEBID) have sloped sidewalls because of the very nature of the deposition process. For applications this is highly undesirable, especially when neighboring structures are interconnected. A new technique combining FEBID and focused electron beam-induced etching (FEBIE) has been developed to fabricate structures with vertical sidewalls. The sidewalls of carbon FEBID structures have been modified by etching with water and it is shown, using transmission electron microscopy imaging, that the sidewall angle can be tuned from outward to inward by controlling the etch position on the sidewall. A surprising under-etching due to the emission of secondary electrons from the deposit was observed, which was not indicated by a simple model based on etching. An analytical model was developed to include continued etching once the deposit has been removed at the exposed pixel. At this stage the secondary electrons from the substrate then cause the adsorbed water molecules to become effective in etching the deposit from below, resulting in under-etched structures. The evolution of the sidewall angle during etching has also been experimentally observed in a scanning electron microscope by continuously monitoring the secondary electron detector signal.
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Affiliation(s)
- Sangeetha Hari
- Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, 2628CJ Delft, Netherlands
- Delmic B.V., Oostsingel 209, 2612 HL Delft, Netherlands
| | - Willem F van Dorp
- Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, 2628CJ Delft, Netherlands
- Uniresearch B.V., Delftechpark 37j, 2628 XJ, Delft, Netherlands
| | | | | | - Pieter Kruit
- Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, 2628CJ Delft, Netherlands
| | - Cornelis W Hagen
- Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, 2628CJ Delft, Netherlands
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2
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Magén C, Pablo-Navarro J, De Teresa JM. Focused-Electron-Beam Engineering of 3D Magnetic Nanowires. NANOMATERIALS 2021; 11:nano11020402. [PMID: 33557442 PMCID: PMC7914621 DOI: 10.3390/nano11020402] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 12/16/2020] [Revised: 01/27/2021] [Accepted: 01/30/2021] [Indexed: 11/25/2022]
Abstract
Focused-electron-beam-induced deposition (FEBID) is the ultimate additive nanofabrication technique for the growth of 3D nanostructures. In the field of nanomagnetism and its technological applications, FEBID could be a viable solution to produce future high-density, low-power, fast nanoelectronic devices based on the domain wall conduit in 3D nanomagnets. While FEBID has demonstrated the flexibility to produce 3D nanostructures with almost any shape and geometry, the basic physical properties of these out-of-plane deposits are often seriously degraded from their bulk counterparts due to the presence of contaminants. This work reviews the experimental efforts to understand and control the physical processes involved in 3D FEBID growth of nanomagnets. Co and Fe FEBID straight vertical nanowires have been used as benchmark geometry to tailor their dimensions, microstructure, composition and magnetism by smartly tuning the growth parameters, post-growth purification treatments and heterostructuring.
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Affiliation(s)
- César Magén
- Instituto de Nanociencia y Materiales de Aragón (INMA), Universidad de Zaragoza-CSIC, 50009 Zaragoza, Spain; (J.P.-N.); (J.M.D.T.)
- Laboratorio de Microscopías Avanzadas (LMA), Universidad de Zaragoza, 50018 Zaragoza, Spain
- Departamento de Física de la Materia Condensada, Universidad de Zaragoza, 50009 Zaragoza, Spain
- Correspondence: ; Tel.: +34-876-555369; Fax: +34-976-762-776
| | - Javier Pablo-Navarro
- Instituto de Nanociencia y Materiales de Aragón (INMA), Universidad de Zaragoza-CSIC, 50009 Zaragoza, Spain; (J.P.-N.); (J.M.D.T.)
- Laboratorio de Microscopías Avanzadas (LMA), Universidad de Zaragoza, 50018 Zaragoza, Spain
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, 01328 Dresden, Germany
| | - José María De Teresa
- Instituto de Nanociencia y Materiales de Aragón (INMA), Universidad de Zaragoza-CSIC, 50009 Zaragoza, Spain; (J.P.-N.); (J.M.D.T.)
- Laboratorio de Microscopías Avanzadas (LMA), Universidad de Zaragoza, 50018 Zaragoza, Spain
- Departamento de Física de la Materia Condensada, Universidad de Zaragoza, 50009 Zaragoza, Spain
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3
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Kuhness D, Gruber A, Winkler R, Sattelkow J, Fitzek H, Letofsky-Papst I, Kothleitner G, Plank H. High-Fidelity 3D Nanoprinting of Plasmonic Gold Nanoantennas. ACS APPLIED MATERIALS & INTERFACES 2021; 13:1178-1191. [PMID: 33372522 DOI: 10.1021/acsami.0c17030] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/28/2023]
Abstract
The direct-write fabrication of freestanding nanoantennas for plasmonic applications is a challenging task, as demands for overall morphologies, nanoscale features, and material qualities are very high. Within the small pool of capable technologies, three-dimensional (3D) nanoprinting via focused electron beam-induced deposition (FEBID) is a promising candidate due to its design flexibility. As FEBID materials notoriously suffer from high carbon contents, the chemical postgrowth transfer into pure metals is indispensably needed, which can severely harm or even destroy FEBID-based 3D nanoarchitectures. Following this challenge, we first dissect FEBID growth characteristics and then combine individual advantages by an advanced patterning approach. This allows the direct-write fabrication of high-fidelity shapes with nanoscale features in the sub-10 nm range, which allow a shape-stable chemical transfer into plasmonically active Au nanoantennas. The here-introduced strategy is a generic approach toward more complex 3D architectures for future applications in the field of 3D plasmonics.
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Affiliation(s)
- David Kuhness
- Christian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes, Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria
| | | | - Robert Winkler
- Christian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes, Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria
| | - Jürgen Sattelkow
- Christian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes, Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria
| | - Harald Fitzek
- Graz Centre for Electron Microscopy, 8010 Graz, Austria
| | - Ilse Letofsky-Papst
- Graz Centre for Electron Microscopy, 8010 Graz, Austria
- Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria
| | - Gerald Kothleitner
- Graz Centre for Electron Microscopy, 8010 Graz, Austria
- Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria
| | - Harald Plank
- Christian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes, Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria
- Graz Centre for Electron Microscopy, 8010 Graz, Austria
- Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria
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4
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de Vera P, Azzolini M, Sushko G, Abril I, Garcia-Molina R, Dapor M, Solov'yov IA, Solov'yov AV. Multiscale simulation of the focused electron beam induced deposition process. Sci Rep 2020; 10:20827. [PMID: 33257728 PMCID: PMC7705715 DOI: 10.1038/s41598-020-77120-z] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/31/2020] [Accepted: 11/03/2020] [Indexed: 11/09/2022] Open
Abstract
Focused electron beam induced deposition (FEBID) is a powerful technique for 3D-printing of complex nanodevices. However, for resolutions below 10 nm, it struggles to control size, morphology and composition of the structures, due to a lack of molecular-level understanding of the underlying irradiation-driven chemistry (IDC). Computational modeling is a tool to comprehend and further optimize FEBID-related technologies. Here we utilize a novel multiscale methodology which couples Monte Carlo simulations for radiation transport with irradiation-driven molecular dynamics for simulating IDC with atomistic resolution. Through an in depth analysis of [Formula: see text] deposition on [Formula: see text] and its subsequent irradiation with electrons, we provide a comprehensive description of the FEBID process and its intrinsic operation. Our analysis reveals that simulations deliver unprecedented results in modeling the FEBID process, demonstrating an excellent agreement with available experimental data of the simulated nanomaterial composition, microstructure and growth rate as a function of the primary beam parameters. The generality of the methodology provides a powerful tool to study versatile problems where IDC and multiscale phenomena play an essential role.
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Affiliation(s)
- Pablo de Vera
- MBN Research Center, Altenhöferallee 3, 60438, Frankfurt am Main, Germany.
- Departamento de Física - Centro de Investigación en Óptica y Nanofísica (CIOyN), Universidad de Murcia, 30100, Murcia, Spain.
| | - Martina Azzolini
- European Centre for Theoretical Studies in Nuclear Physics and Related Areas (ECT*), 38123, Trento, Italy
| | - Gennady Sushko
- MBN Research Center, Altenhöferallee 3, 60438, Frankfurt am Main, Germany
| | - Isabel Abril
- Departament de Física Aplicada, Universitat d'Alacant, 03080, Alacant, Spain
| | - Rafael Garcia-Molina
- Departamento de Física - Centro de Investigación en Óptica y Nanofísica (CIOyN), Universidad de Murcia, 30100, Murcia, Spain
| | - Maurizio Dapor
- European Centre for Theoretical Studies in Nuclear Physics and Related Areas (ECT*), 38123, Trento, Italy
| | - Ilia A Solov'yov
- Department of Physics, Carl von Ossietzky University, Carl-von-Ossietzky Straße 9-11, 26129, Oldenburg, Germany
| | - Andrey V Solov'yov
- MBN Research Center, Altenhöferallee 3, 60438, Frankfurt am Main, Germany
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5
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Pablo-Navarro J, Sangiao S, Magén C, de Teresa JM. Diameter modulation of 3D nanostructures in focused electron beam induced deposition using local electric fields and beam defocus. NANOTECHNOLOGY 2019; 30:505302. [PMID: 31491780 DOI: 10.1088/1361-6528/ab423c] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Focused electron beam induced deposition (FEBID) is a leading nanolithography technique in terms of resolution and the capability for three-dimensional (3D) growth of functional nanostructures. However, FEBID still presents some limitations with respect to the precise control of the dimensions of the grown nano-objects as well as its use on insulating substrates. In the present work, we overcome both limitations by employing electrically-biased metal structures patterned on the surface of insulating substrates. Such patterned metal structures serve for charge dissipation and also allow the application of spatially-dependent electric fields. We demonstrate that such electric fields can dramatically change the dimensions of the growing 3D nanostructures by acting on the primary electron beam and the generated secondary electrons. In the performed experiments, the diameter of Pt-C and W-C vertical nanowires grown on quartz, MgO and amorphous SiO2 is tuned by application of moderate voltages (up to 200 V) on the patterned metal microstructures during growth, achieving diameters as small as 50 nm. We identify two competing effects arising from the generated electric fields: a slight change in the primary beam focus point and a strong action on the secondary electrons. Beam defocus is exploited to achieve the in situ modulation of the diameter of 3D FEBID structures during growth.
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Affiliation(s)
- Javier Pablo-Navarro
- Laboratorio de Microscopías Avanzadas (LMA)-Instituto de Nanociencia de Aragón (INA), Universidad de Zaragoza, E-50018 Zaragoza, Spain
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6
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Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. MICROMACHINES 2019; 10:mi10120799. [PMID: 31766480 PMCID: PMC6952801 DOI: 10.3390/mi10120799] [Citation(s) in RCA: 15] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 10/22/2019] [Revised: 11/14/2019] [Accepted: 11/18/2019] [Indexed: 11/17/2022]
Abstract
In this contribution, we compare the performance of Focused Electron Beam-induced Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature and under cryogenic conditions (the prefix “Cryo” is used here for cryogenic). Under cryogenic conditions, the precursor material condensates on the substrate, forming a layer that is several nm thick. Its subsequent exposure to a focused electron or ion beam and posterior heating to 50 °C reveals the deposit. Due to the extremely low charge dose required, Cryo-FEBID and Cryo-FIBID are found to excel in terms of growth rate, which is typically a few hundred/thousand times higher than room-temperature deposition. Cryo-FIBID using the W(CO)6 precursor has demonstrated the growth of metallic deposits, with resistivity not far from the corresponding deposits grown at room temperature. This paves the way for its application in circuit edit and the fast and direct growth of micro/nano-electrical contacts with decreased ion damage. The last part of the contribution is dedicated to the comparison of these techniques with other charge-based lithography techniques in terms of the charge dose required and process complexity. The comparison indicates that Cryo-FIBID is very competitive and shows great potential for future lithography developments.
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7
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Thorman RM, Unlu I, Johnson K, Bjornsson R, McElwee-White L, Fairbrother DH, Ingólfsson O. Low energy electron-induced decomposition of (η5-Cp)Fe(CO)2Mn(CO)5, a potential bimetallic precursor for focused electron beam induced deposition of alloy structures. Phys Chem Chem Phys 2018; 20:5644-5656. [DOI: 10.1039/c7cp06705d] [Citation(s) in RCA: 10] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Low energy electron-induced decomposition of a potential bimetallic nanofabrication precursor is studied in gas-phase, at surfaces and by quantum chemical calculations.
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Affiliation(s)
- Rachel M. Thorman
- Science Institute and Department of Chemistry
- University of Iceland
- Reykjavik
- Iceland
| | - Ilyas Unlu
- Department of Chemistry
- Johns Hopkins University
- Baltimore
- USA
| | - Kelsea Johnson
- Department of Chemistry
- University of Florida
- Gainesville
- USA
| | - Ragnar Bjornsson
- Science Institute and Department of Chemistry
- University of Iceland
- Reykjavik
- Iceland
| | | | | | - Oddur Ingólfsson
- Science Institute and Department of Chemistry
- University of Iceland
- Reykjavik
- Iceland
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8
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Winkler R, Schmidt FP, Haselmann U, Fowlkes JD, Lewis BB, Kothleitner G, Rack PD, Plank H. Direct-Write 3D Nanoprinting of Plasmonic Structures. ACS APPLIED MATERIALS & INTERFACES 2017; 9:8233-8240. [PMID: 28269990 DOI: 10.1021/acsami.6b13062] [Citation(s) in RCA: 72] [Impact Index Per Article: 10.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/05/2023]
Abstract
During the past decade, significant progress has been made in the field of resonant optics ranging from fundamental aspects to concrete applications. While several techniques have been introduced for the fabrication of highly defined metallic nanostructures, the synthesis of complex, free-standing three-dimensional (3D) structures is still an intriguing, but so far intractable, challenge. In this study, we demonstrate a 3D direct-write synthesis approach that addresses this challenge. Specifically, we succeeded in the direct-write fabrication of 3D nanoarchitectures via electron-stimulated reactions, which are applicable on virtually any material and surface morphology. By that, complex 3D nanostructures composed of highly compact, pure gold can be fabricated, which reveal strong plasmonic activity and pave the way for a new generation of 3D nanoplasmonic architectures that can be printed on-demand.
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Affiliation(s)
- Robert Winkler
- Graz Centre for Electron Microscopy, Steyrergasse 17, 8010 Graz, Austria
| | - Franz-Philipp Schmidt
- Graz Centre for Electron Microscopy, Steyrergasse 17, 8010 Graz, Austria
- Institute of Physics, Karl-Franzens-University , Universitätsplatz 5, 8010 Graz, Austria
| | - Ulrich Haselmann
- Graz Centre for Electron Microscopy, Steyrergasse 17, 8010 Graz, Austria
| | - Jason D Fowlkes
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory , Oak Ridge, Tennessee 37831, United States
- Department of Materials Science and Engineering, University of Tennessee , Knoxville, Tennessee 37996, United States
| | - Brett B Lewis
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory , Oak Ridge, Tennessee 37831, United States
- Department of Materials Science and Engineering, University of Tennessee , Knoxville, Tennessee 37996, United States
| | - Gerald Kothleitner
- Graz Centre for Electron Microscopy, Steyrergasse 17, 8010 Graz, Austria
- Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology , 8010 Graz, Austria
| | - Philip D Rack
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory , Oak Ridge, Tennessee 37831, United States
- Department of Materials Science and Engineering, University of Tennessee , Knoxville, Tennessee 37996, United States
| | - Harald Plank
- Graz Centre for Electron Microscopy, Steyrergasse 17, 8010 Graz, Austria
- Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology , 8010 Graz, Austria
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9
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Thorman RM, Brannaka JA, McElwee-White L, Ingólfsson O. Low energy electron-induced decomposition of (η3-C3H5)Ru(CO)3Br, a potential focused electron beam induced deposition precursor with a heteroleptic ligand set. Phys Chem Chem Phys 2017; 19:13264-13271. [DOI: 10.1039/c7cp01696d] [Citation(s) in RCA: 16] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/14/2022]
Abstract
Low energy electron induced fragmentation of (η3-C3H5)Ru(CO)3Br is reported in relation to the suitability of different ligands in the design of focused electron beam induced deposition precursors.
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Affiliation(s)
- Rachel M. Thorman
- Science Institute and Department of Chemistry
- University of Iceland
- Reykjavik
- Iceland
| | | | | | - Oddur Ingólfsson
- Science Institute and Department of Chemistry
- University of Iceland
- Reykjavik
- Iceland
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10
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Ganner T, Sattelkow J, Rumpf B, Eibinger M, Reishofer D, Winkler R, Nidetzky B, Spirk S, Plank H. Direct-Write Fabrication of Cellulose Nano-Structures via Focused Electron Beam Induced Nanosynthesis. Sci Rep 2016; 6:32451. [PMID: 27585861 PMCID: PMC5009462 DOI: 10.1038/srep32451] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/02/2016] [Accepted: 08/08/2016] [Indexed: 12/23/2022] Open
Abstract
In many areas of science and technology, patterned films and surfaces play a key role in engineering and development of advanced materials. Here, we introduce a new generic technique for the fabrication of polysaccharide nano-structures via focused electron beam induced conversion (FEBIC). For the proof of principle, organosoluble trimethylsilyl-cellulose (TMSC) thin films have been deposited by spin coating on SiO2 / Si and exposed to a nano-sized electron beam. It turns out that in the exposed areas an electron induced desilylation reaction takes place converting soluble TMSC to rather insoluble cellulose. After removal of the unexposed TMSC areas, structured cellulose patterns remain on the surface with FWHM line widths down to 70 nm. Systematic FEBIC parameter sweeps reveal a generally electron dose dependent behavior with three working regimes: incomplete conversion, ideal doses and over exposure. Direct (FT-IR) and indirect chemical analyses (enzymatic degradation) confirmed the cellulosic character of ideally converted areas. These investigations are complemented by a theoretical model which suggests a two-step reaction process by means of TMSC → cellulose and cellulose → non-cellulose material conversion in excellent agreement with experimental data. The extracted, individual reaction rates allowed the derivation of design rules for FEBIC parameters towards highest conversion efficiencies and highest lateral resolution.
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Affiliation(s)
- Thomas Ganner
- Institute for Electron Microscopy and Nanoanalysis, Graz
University of Technology, Steyrergasse 17, A-8010
Graz, Austria
| | - Jürgen Sattelkow
- Institute for Electron Microscopy and Nanoanalysis, Graz
University of Technology, Steyrergasse 17, A-8010
Graz, Austria
| | - Bernhard Rumpf
- Institute for Electron Microscopy and Nanoanalysis, Graz
University of Technology, Steyrergasse 17, A-8010
Graz, Austria
| | - Manuel Eibinger
- Institute of Biotechnology and Biochemical Engineering, Graz
University of Technology, Petersgasse 12, A-8010
Graz, Austria
| | - David Reishofer
- Institute for Chemistry and Technology of Materials, Graz
University of Technology, Stremayrgasse 9, 8010
Graz, Austria
| | - Robert Winkler
- Graz Centre for Electron Microscopy, Steyrergasse
17, A-8010
Graz, Austria
| | - Bernd Nidetzky
- Institute of Biotechnology and Biochemical Engineering, Graz
University of Technology, Petersgasse 12, A-8010
Graz, Austria
- Austrian Centre of Industrial Biotechnology,
Petersgasse 14, A-8010
Graz, Austria
| | - Stefan Spirk
- Institute for Chemistry and Technology of Materials, Graz
University of Technology, Stremayrgasse 9, 8010
Graz, Austria
| | - Harald Plank
- Institute for Electron Microscopy and Nanoanalysis, Graz
University of Technology, Steyrergasse 17, A-8010
Graz, Austria
- Graz Centre for Electron Microscopy, Steyrergasse
17, A-8010
Graz, Austria
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11
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Jesse S, Borisevich AY, Fowlkes JD, Lupini AR, Rack PD, Unocic RR, Sumpter BG, Kalinin SV, Belianinov A, Ovchinnikova OS. Directing Matter: Toward Atomic-Scale 3D Nanofabrication. ACS NANO 2016; 10:5600-18. [PMID: 27183171 DOI: 10.1021/acsnano.6b02489] [Citation(s) in RCA: 25] [Impact Index Per Article: 3.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/19/2023]
Abstract
Enabling memristive, neuromorphic, and quantum-based computing as well as efficient mainstream energy storage and conversion technologies requires the next generation of materials customized at the atomic scale. This requires full control of atomic arrangement and bonding in three dimensions. The last two decades witnessed substantial industrial, academic, and government research efforts directed toward this goal through various lithographies and scanning-probe-based methods. These technologies emphasize 2D surface structures, with some limited 3D capability. Recently, a range of focused electron- and ion-based methods have demonstrated compelling alternative pathways to achieving atomically precise manufacturing of 3D structures in solids, liquids, and at interfaces. Electron and ion microscopies offer a platform that can simultaneously observe dynamic and static structures at the nano- and atomic scales and also induce structural rearrangements and chemical transformation. The addition of predictive modeling or rapid image analytics and feedback enables guiding these in a controlled manner. Here, we review the recent results that used focused electron and ion beams to create free-standing nanoscale 3D structures, radiolysis, and the fabrication potential with liquid precursors, epitaxial crystallization of amorphous oxides with atomic layer precision, as well as visualization and control of individual dopant motion within a 3D crystal lattice. These works lay the foundation for approaches to directing nanoscale level architectures and offer a potential roadmap to full 3D atomic control in materials. In this paper, we lay out the gaps that currently constrain the processing range of these platforms, reflect on indirect requirements, such as the integration of large-scale data analysis with theory, and discuss future prospects of these technologies.
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Affiliation(s)
| | | | - Jason D Fowlkes
- Department of Materials Sciences, University of Tennessee , Knoxville, Tennessee 37996, United States
| | | | - Philip D Rack
- Department of Materials Sciences, University of Tennessee , Knoxville, Tennessee 37996, United States
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12
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Huth M, Gölzhäuser A. Focused particle beam-induced processing. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2015; 6:1883-5. [PMID: 26665058 PMCID: PMC4660902 DOI: 10.3762/bjnano.6.191] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/11/2015] [Accepted: 08/17/2015] [Indexed: 06/05/2023]
Affiliation(s)
- Michael Huth
- Goethe Universität, Physikalisches Institut, Max-von-Laue-Str. 1, D-60438 Frankfurt am Main, Germany
| | - Armin Gölzhäuser
- Universität Bielefeld, Fakultät für Physik, Universitätsstr. 25, D-33615 Bielefeld, Germany
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