Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure.
APPLIED OPTICS 1999;
38:1295-1301. [PMID:
18305745 DOI:
10.1364/ao.38.001295]
[Citation(s) in RCA: 12] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]
Abstract
A precision laser pattern generator for writing arbitrary diffractive elements was developed as an alternative to Cartesian coordinate laser/electron-beam writers. This system allows for the fabrication of concentric continuous-relief and arbitrary binary patterns with minimum feature sizes of less than 0.6 microm and position accuracy of 0.1 microm over 300-mm substrates. Two resistless technologies of writing on chromium and on amorphous silicon films were developed and implemented. We investigated limit characteristics by writing special test structures. A 58-mm f/1.1 zone plate written directly is demonstrated at a lambda/50 rms wave-front error corresponding to a 0.06-microm pattern accuracy. Several examples of fabricated diffractive elements are presented.
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