Hefty RC, Holt JR, Tate MR, Gosalvez DB, Bertino MF, Ceyer ST. Dissociation of a product of a surface reaction in the gas phase: XeF2 reaction with Si.
Phys Rev Lett 2004;
92:188302. [PMID:
15169537 DOI:
10.1103/physrevlett.92.188302]
[Citation(s) in RCA: 3] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/20/2003] [Indexed: 05/24/2023]
Abstract
Xenon difluoride interacts with Si(100)2 x 1 by atom abstraction, whereby a dangling bond abstracts a F atom from XeF2, scattering the complementary XeF. Partitioning of the reaction exothermicity produces sufficient XeF rovibrational excitation for dissociation to occur. The resulting F and Xe atoms are shown to arise from dissociation of XeF in the gas phase by demonstrating that the angle-resolved velocity distributions of F, Xe, and XeF conserve momentum, energy, and mass. This experiment documents the first observation of dissociation of a surface reaction product in the gas phase.
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