Quantitative investigation on a period variation reduction method for the fabrication of large-area gratings using two-spherical-beam laser interference lithography

Gratings produced by two-spherical-beam Laser Interference Lithography (LIL) will have a nonuniform period, and the associated period variation is larger with the increase of the substrate size. This work quantitatively investigates a noninvasive method for improving the period variation on 4-inch silicon wafers. By temporarily deforming the flexible silicon wafer using a customized concave vacuum chuck [J. Vac. Sci. Technol. B19(6), 2347 (2001)10.1116/1.1421558], we show that the fabricated gratings will have improved period uniformity, with the period variation reduced by 86% at the 1000 nm central grating period setting. This process is a simple and efficient way to achieve linear gratings without altering the LIL configuration with two spherical beams. We present experimental results on the impact of a concave vacuum chuck on the chirp reduction at different grating period settings. Then, we compare two different LIL configurations with different wavelength sources concerning their influence on the efficiency of period variation reduction. Finally, the flatness of the 4-inch silicon wafers due to the temporary bending process is verified using optical profilometry measurements.

Versatile Zirconium Oxide (ZrO2) Sol-Gel Development for the Micro-Structuring of Various Substrates (Nature and Shape) by Optical and Nano-Imprint Lithography

Zirconium oxide (ZrO₂) is a well-studied and promising material due to its remarkable chemical and physical properties. It is used, for example, in coatings for corrosion protection layer, wear and oxidation, in optical applications (mirror, filters), for decorative components, for anti-counterfeiting solutions and for medical applications. ZrO₂ can be obtained as a thin film using different deposition methods such as physical vapor deposition (PVD) or chemical vapor deposition (CVD). These techniques are mastered but they do not allow easy micro-nanostructuring of these coatings due to the intrinsic properties (high melting point, mechanical and chemical resistance). An alternative approach described in this paper is the sol-gel method, which allows direct micro-nanostructuring of the ZrO₂ layers without physical or chemical etching processes, using optical or nano-imprint lithography. In this paper, the authors present a complete and suitable ZrO₂ sol-gel method allowing to achieve complex micro-nanostructures by optical or nano-imprint lithography on substrates of different nature and shape (especially non-planar and foil-based substrates). The synthesis of the ZrO₂ sol-gel is presented as well as the micro-nanostructuring process by masking, colloidal lithography and nano-imprint lithography on glass and plastic substrates as well as on plane and curved substrates.

Photocrosslinking and photopatterning of magneto-optical nanocomposite sol-gel thin film under deep-UV irradiation

This paper is aimed at investigating the process of photocrosslinking under Deep-UV irradiation of nanocomposite thin films doped with cobalt ferrite magnetic nanoparticles (MNPs). This material is composed of a hybrid sol-gel matrix in which MNP can be introduced with high concentrations up to 20 vol%. Deep-UV (193 nm) is not only interesting for high-resolution patterning but we also show an efficient photopolymerization pathway even in the presence of high concentration of MNPs. In this study, we demonstrate that the photocrosslinking is based on the free radical polymerization of the methacrylate functions of the hybrid precursor. This process is initiated by Titanium-oxo clusters. The impact of the nanoparticles on the photopolymerization kinetic and photopatterning is investigated. We finally show that the photosensitive nanocomposite is suitable to obtain micropatterns with sub-micron resolution, with a simple and versatile process, which opens many opportunities for fabrication of miniaturized magneto-optical devices for photonic applications.

Longitudinal magneto-optical effect enhancement with high transmission through a 1D all-dielectric resonant guided mode grating

A significant enhancement of the longitudinal magneto-optical effect is demonstrated numerically and experimentally in transmission, and for small angles of incidence, through a subwavelength resonant structure consisting of a dielectric grating on top of a magneto-optical waveguide. The enhanced polarization rotation is associated with a high transmittance. These low footprint devices may thus be suitable for applications like magnetic field sensors or in non-destructive testing.

Enhancement of Both Faraday and Kerr Effects with an All-Dielectric Grating Based on a Magneto-Optical Nanocomposite Material

We report on the design, fabrication, and characterization of an all-dielectric one-dimensional (1D) resonant device formed by a silicon nitride grating impregnated by a low-index magneto-optical silica-type matrix. This impregnation is realized through the dipping of the 966 nm periodic template in a sol-gel solution previously doped with CoFe₂O₄ nanoparticles, and able to fill the grating slits. By a proper adjustment of the geometrical parameters of such a photonic crystal membrane, simultaneous excitation of transverse electric (TE) and transverse magnetic (TM) polarization resonances is nearly achieved at 1570 nm. This TE/TM phase-matching situation leads to a fivefold enhancement of the Faraday effect in the resonance area with an increased merit factor of 0.32°. Moreover, the device demonstrates its ability to enhance longitudinal and transverse Kerr effects for the other directions of the applied magnetic field. Taking benefits from the ability of the nanocomposite material to be processed on photonic platforms, and despite its quite low magneto-optical activity compared to classical magnetic materials, this work proves that an all-dielectric 1D device can produce a high magneto-optical sensitivity to every magnetic field directions.

Cancellation of the zeroth order in a phase mask by mode interplay in a high index contrast binary grating

A new grating phase mask is designed that allows the cancellation of the zeroth transmitted order in a diffraction configuration where the grating period is smaller than twice the exposure wavelength. An analytical treatment based on the true-mode method delivers the structure parameters, achieving 100% interference contrast. This modal approach is used to describe the modal operation of the giant reflection to zero-order device.