1
|
Shin S, Kang K, Jang H, Gwak N, Kim S, Kim TA, Oh N. Ligand-Crosslinking Strategy for Efficient Quantum Dot Light-Emitting Diodes via Thiol-Ene Click Chemistry. Small Methods 2023; 7:e2300206. [PMID: 37160696 DOI: 10.1002/smtd.202300206] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/17/2023] [Revised: 04/25/2023] [Indexed: 05/11/2023]
Abstract
While solution-processable colloidal quantum dots (QDs) offer cost-effective and large-scale manufacturing, they can be susceptible to subsequent solution processes, making continuous processing challenging. To enable complex and integrated device architectures, robust QD films with subsequent patterning are necessary. Here, we report a facile ligand-crosslinking strategy based on thiol-ene click chemistry. Thiol molecules added to QD films react with UV light to form radicals that crosslink with QD ligands containing carbon double bonds, enabling microscale photo-patterning of QD films and enhancing their solvent resistance. This strategy can also be extended to other ligand-capped nanocrystals. It is found that the swelling of QD films during the process of binding with the thiol molecules placed between the ligands contributes to the improvement of photoluminescence and electroluminescence properties. These results suggest that the thiol-ene crosslinking modifies the optoelectronic properties and enables direct optical patterning, expanding the potential applications of QDs.
Collapse
Affiliation(s)
- Seungki Shin
- Division of Materials Science and Engineering, Hanyang University, Seoul, 04763, Republic of Korea
| | - Kyungwan Kang
- Division of Materials Science and Engineering, Hanyang University, Seoul, 04763, Republic of Korea
| | - Hyunwoo Jang
- Division of Materials Science and Engineering, Hanyang University, Seoul, 04763, Republic of Korea
| | - Namyoung Gwak
- Division of Materials Science and Engineering, Hanyang University, Seoul, 04763, Republic of Korea
| | - Seongchan Kim
- Division of Materials Science and Engineering, Hanyang University, Seoul, 04763, Republic of Korea
| | - Tae Ann Kim
- Convergence Research Center for Solutions to Electromagnetic Interference in Future-Mobility, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea
- Division of Energy & Environment Technology, KIST School, Korea University of Science and Technology, Seoul, 02792, Republic of Korea
| | - Nuri Oh
- Division of Materials Science and Engineering, Hanyang University, Seoul, 04763, Republic of Korea
| |
Collapse
|
2
|
Seong I, Kim S, Choi M, Lee W, Jeong W, Cho C, You Y, Lee Y, Seol Y, You S. Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma. Materials (Basel) 2023; 16:5746. [PMID: 37687439 PMCID: PMC10488939 DOI: 10.3390/ma16175746] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/01/2023] [Revised: 08/18/2023] [Accepted: 08/21/2023] [Indexed: 09/10/2023]
Abstract
The understanding of ion dynamics in plasma applications has received significant attention. In this study, we examined these effects between He and Ar species, focusing on the Ar ion flux on the substrate. To control heterogeneous collisions, we varied the He addition rate at fixed chamber pressure and the chamber pressure at fixed Ar/He ratio in an inductively coupled Ar/He plasma source. Throughout the experiments, we maintained an electron density in the bulk plasma and plasma potential as a constant value by adjusting the RF power and applying an additional DC bias to eliminate any disturbances caused by the plasma. Our findings revealed that the addition of He enhances the Ar ion flux, despite a decrease in the Ar ion density at the plasma-sheath boundary due to the presence of He ions. Moreover, we found that this enhancement becomes more prominent with increasing pressure at a fixed He addition rate. These results suggest that the heterogeneous charge transfer collision between Ar atoms and He ions in the sheath region creates additional Ar ions, ultimately leading to an increased Ar ion flux on the substrate. This finding highlights the potential of utilizing heterogeneous charge transfer collisions to enhance ion flux in plasma processing, without the employment of additional equipment.
Collapse
Affiliation(s)
- Inho Seong
- Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea (W.L.)
| | - Sijun Kim
- Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea (W.L.)
- Institute of Quantum Systems (IQS), Chungnam National University, Daejeon 34134, Republic of Korea
| | - Minsu Choi
- Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea (W.L.)
| | - Woobeen Lee
- Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea (W.L.)
| | - Wonnyoung Jeong
- Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea (W.L.)
| | - Chulhee Cho
- Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea (W.L.)
| | - Yebin You
- Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea (W.L.)
| | - Youngseok Lee
- Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea (W.L.)
- Institute of Quantum Systems (IQS), Chungnam National University, Daejeon 34134, Republic of Korea
| | - Youbin Seol
- Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea (W.L.)
- Institute of Quantum Systems (IQS), Chungnam National University, Daejeon 34134, Republic of Korea
| | - Shinjae You
- Applied Physics Lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea (W.L.)
- Institute of Quantum Systems (IQS), Chungnam National University, Daejeon 34134, Republic of Korea
| |
Collapse
|