Subthreshold Laser Ablation Measurements by Langmuir Probe Method for ns Irradiation of HfO2 and ZrO2

The unbiased Langmuir probe (LP) method was used to perform measurements on HfO₂ and ZrO₂ samples around the laser ablation threshold on a wide range of irradiation conditions. Important changes in the lifetime (from ms to μs) and the shape of the charge particle current were seen with the increase of the laser fluence. The ablation threshold was estimated by evaluating the overall average ablated charge as a function of the laser fluence. Above the ablation threshold, the generation of high kinetic species is seen, which can reach several keV. An important jump in ion acceleration potential is observed for values above 1 J/cm², which coincides with the dominant presence of negative ions in the plasma. The evolution of several plasma parameters (ion density, expansion velocity, electron temperature, Debye length) was investigated and correlated with the fundamental ablation mechanism involved in various irradiation regimes. The LP data were correlated with COMSOL simulations on the maximum surface temperature reached during irradiation. Important correlations between the evaporation and melting processes and ablation threshold fluence and ion acceleration phenomena are also reported.

Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma

One of the cleaning processes in semiconductor fabrication is the ashing process using oxygen plasma, which has been normally used N₂ gas as additive gas to increase the ashing rate, and it is known that the ashing rate is strongly related to the concentration of oxygen radicals measured OES. However, by performing a comprehensive experiment of the O₂ plasma ashing process in various N₂/O₂ mixing ratios and RF powers, our investigation revealed that the tendency of the density measured using only OES did not exactly match the ashing rate. This problematic issue can be solved by considering the plasma parameter, such as electron density. This study can suggest a method inferring the exact maximum condition of the ashing rate based on the plasma diagnostics such as OES, Langmuir probe, and cutoff probe, which might be useful for the next-generation plasma process.

On the Dynamics of Transient Plasmas Generated by Nanosecond Laser Ablation of Several Metals

The dynamics of transient plasma generated by UV ns-laser ablation of selected metals (Co, Cu, Ag, Bi) were investigated by the Langmuir Probe method in angle- and time-resolved modes. Multiple ionic and electronic structures were seen for all plasmas with some corresponding to anions or nanoparticle-dominated structures. The addition of an Ar atmosphere energetically confined the plasma and increased the charge density by several orders of magnitude. For pressure ranges exceeding 0.5 Pa fast ions were generated in the plasma as a result of Ar ionization and acceleration in the double layer defining the front of the plasma plume. Several correlations between the target nature plasma properties were attempted. The individual plasma structure expansion velocity increases with the melting point and decreases with the atomic mass while the corresponding charged particle densities decrease with the melting point, evidencing the relationship between the volatility of the sample and the overall abated mass.

Langmuir Probe Measurements in the Gaseous Electronics Conference RF Reference Cell

The use of a Langmuir probe system in two GEC cells is reviewed. The major problems associated with probe diagnostics in a GEC cell are outlined and discussed. While the data base is still insufficient to give definitive values for many parameters, a number of standard measurements are put forward. The plasma density in argon is 9×10⁹ cm^-3 (±20 %) at an applied rf voltage of 250 V (500 V peak to peak) and a gas pressure of 13.3 Pa (100 mTorr). The electron density scales linearly with applied voltage. The plasma to ground sheath resistance is shown to be very important with a value of 810 Ω in argon at a pressure of 13.3 Pa (100 mTorr) and discharge current of 0.1 A. The value of plasma to ground resistance scales inversely with discharge current and sublinear with pressure. Two standard features in the electron energy distribution function (EEDF) have been proposed as a test of the ability of a probe system to resolve features, first, the transition from a low temperature (<1 eV) bi-Maxwellian distribution to a Druyveysten distribution (3 eV) at 13.3 Pa (100 mTorr) in argon, and the "hole" in the EEDF at 2 eV to 4 eV in nitrogen plasmas.