Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y2O3-Y4Al2O9 composite under CF4/Ar/O2 mixed gas conditions

In the semiconductor manufacturing process, when conducting inductively coupled plasma-reactive ion etching in challenging environments, both wafers and the ceramic components comprising the chamber's interior can be influenced by plasma attack. When ceramic components are exposed to long-term plasma environments, the eroded components must be replaced. Furthermore, non-volatile reactants can form and settle on semiconductor chips, acting as contaminants and reducing semiconductor production yield. Therefore, for semiconductor processing equipment parts to be utilized, it is necessary that they exhibit minimized generation of contaminant particles and not deviate significantly from the composition of conventionally used Al2O3 and Y2O3; part must also last long in various physicochemical etching environment. Herein, we investigate the plasma etching behavior of Y2O3-Y4Al2O9 (YAM) composites with a variety of mixing ratios under different gas fraction conditions. The investigation revealed that the etching rates and changes in surface roughness for these materials were significantly less than those of Y2O3 materials subjected to both chemical and physical etching. Microstructure analysis was conducted to demonstrate the minimization of crater formation. Mechanical properties of the composite were also analyzed. The results show that the composite can be commercialized as next-generation ceramic component in semiconductor processing equipment applications.

Plasma etching effect on the molecular structure of chitosan-based hydrogels and its biological properties

To reasonably use hydrogels in healthcare field, this study four kinds of chitosan (CTS)-based hydrogels with different molecular structures. With plasma etching, the morphology, chemical groups' proportion, and hydrophilicity of the hydrogel surface were changed. At 40 min of modification, the ratios of CO and NH₂ on the CTS40-based hydrogel surface increased and reached their maximum values of 40.31 % and 89.17 %, respectively. Combined with the changes in hydrophilic chemical groups and the hydrogel's network structure, the hydrogel surface's wettability changed after plasma etching. From the results, CTS40-based hydrogel showed the lowest contact angle (77.40 ± 3.89°) with 80 min modification due to its dense network structure of CTS and appropriate ratio of hydrophilic groups on the surface. With these molecular structural changes, the antibacterial properties of CTS-based hydrogels against Staphylococcus aureus were improved. Moreover, the functional components delivery system coating with these CTS-based hydrogels showed colon-site controlled-release property. The hydrogels also facilitated the growth of Caco2 and Hic cells, which had 72.74 %-453.27 % cell viability of Caco2 cells on the surface. Therefore, the antibacterial property and biocompatibility of plasma modified CTS-based hydrogels have been demonstrated. The mechanism between molecular structure changes of CTS with plasma etching and its properties was discussed, which would provide a promising carrier material for utilizing healthcare field.

A robust, flexible adhesive tape-based SERS substrate fabricated by polymer etching and subsequent Au coating on the exposed SiO2 nanosphere monolayer

With the rapid development of trace detection, high-performance flexible surface-enhanced Raman scattering (SERS) substrates have enjoyed steady growth of interest. In this paper, a facile method to improve the robustness of the flexible SERS substrate via the synergistic effect of rigid SiO₂ nanospheres and flexible tape was demonstrated for the first time. In detail, the spin-coated SiO₂ nanosphere monolayer was transferred from the host silicon wafer into the tape by peeling-off process, followed by O₂ plasma etching of tape polymer to expose the nanospheres, and final Au coating to form plentiful SERS "hotspots". The as-prepared SERS sample shows a detection limit of Rhodamine 6G (R6G) down to 10^-10 M and can afford a 500 times bending-releasing cyclic test. Our research provides a promising strategy to prepare robust SERS substrates which exhibit good potential in practical molecule detection on curved surfaces.

Converting inert AlOOH into efficient electrocatalyst for oxygen evolution reaction via structural/electronic modulation

Efficient and stable water-splitting electrocatalysts play a key role to obtain green and clean hydrogen energy. However, only a few kinds of materials display an intrinsically good performance towards water splitting. It is significant but challengeable to effectively improve the catalytic activity of inert or less active catalysts for water splitting. Herein, we present a structural/electronic modulation strategy to convert inert AlOOH nanorods into catalytic nanosheets for oxygen evolution reaction (OER) via ball milling, plasma etching and Co doping. Compared to inert AlOOH, the modulated AlOOH delivers much better OER performance with a low overpotential of 400 mV at 10 mA cm^-2 and a very low Tafel slope of 52 mV dec^-1, even lower than commercial OER catalyst RuO₂. Significant performance enhancement is attributed to the electronic and structural modulation. The electronic structure is effectively improved by Co doping, ball milling-induced shear strain, plasma etching-caused rich vacancies; abrupt morphology/microstructure change from nanorod to nanoparticle to nanosheet, as well as rich defects caused by ball milling and plasma etching, can significantly increase active sites; the free energy change of the potential determining step of modulated AlOOH decreases from 2.93 eV to 1.70 eV, suggesting a smaller overpotential is needed to drive the OER processes. This strategy can be extended to improve the electrocatalytic performance for other materials with inert or less catalytic activity.

Playing with sizes and shapes of colloidal particles via dry etching methods

Monolayers of self-assembled quasi-spherical colloidal particles are essential building blocks in the field of materials science and engineering. More typically, they are used as a template for the fabrication of nanostructures if they serve, for instance, as a mask for deposition of new material on the surface on which particles are assembled or for etching of the material underneath; in this case, they are removed afterwards. This is what occurs in colloidal or nanosphere lithography. In some other cases, they are not used as a sacrificial material but they are incorporated in the final structure because they are inherently interesting for their properties. Independently of their specific use and application, different strategies have been devised in order to modify size and shape of colloidal particles, so as to enrich the variety of attainable patterns and to tailor the properties of the final structures and materials. In this review, we will focus on one of the most widespread methods to shape spherical colloidal particles, i.e. dry etching techniques. We will follow the development of such approaches until recent days, so as to trace an extensive panorama of the diverse parameters that can be harnessed to achieve specific morphological changes and highlight the characteristic features of the variants of this method. We will finally discuss how particles modified via dry etching can be used for patterning or can be resuspended in solvents for very diverse applications.

Dataset of N-doped CuO:NiO mixed oxide thin film sensor for glucose oxidation

In this data in brief article dataset of plasma-assisted nitrogen doping of a binderless, spin-coated CuO-NiO mixed oxide thin film was presented (Palmer et al., 2020). A comparison of the CuO, N-CuO/Cu2O, CuO:NiO and N-CuO/Cu2O:NiO are presented. The as prepared films were used for the application of a glucose sensor. The nitrogen doped species, generated during plasma ignition, resulted in a beneficial phase transformation of CuO to Cu2O. Characterisation techniques such as XPS, particle size distribution and EIS techniques were utilized to study the morphology, structural features, doping profile and electrical properties of the various developed electrodes. The electrochemical performance of the thin film sensors was tested using cyclic voltammetry and chronoamperometry. The CuO exhibited a sensitivity of 830 µA/mM cm2 up to 1.65 mM of glucose, N-CuO/Cu2O had a linear range up to 1.91 mM with a sensitivity of 873 µA/mM cm2 and the CuO:NiO electrode had a linear range up to 1.65 mM with a sensitivity of 1103 µA/mM.cm2 respectively. A detailed description of the methodology used is provided below.

A gold coated polystyrene ring microarray formed by two-step patterning: construction of an advanced microelectrode for voltammetric sensing

A two-step patterning process was developed based on nanosphere lithography and plasma etching to fabricate an array of electrodes with two different gold ring structures: the arrays of Au micro-ring electrode (Au-MRE) and Au covered with polystyrene micro-ring electrode (Au-PS-MRE). The Au-MRE structure was fabricated by etching a monolayer of polystyrene (PS) spheres on indium tin oxide (ITO) surface to generate PS rings on ITO glass. PS rings served as a mask in secondary etching for blocking an interaction of oxygen plasma and ITO surface to create a ring-patterned ITO surface. Then, the PS residue was removed and gold was deposited. The site-selective electrodeposition of gold was carried out and an array of a gold ring structure was formed on the ITO glass. The Au-PS-MRE structure was fabricated by keeping the PS residue from second etching before deposition of gold. The Au-PS-MRE microelectrode was studied by using hexacyanoferrate as an electrochemical probe where it displayed steady state current in cyclic voltammetry. The respective calibration plots were acquired at a working potential of 0.31 V and 0.12 V (vs. Ag/AgCl) for oxidation and reduction reaction, respectively. The sensitivity is as high as 163.4-220.7 μA·mM^-1·mm^-2 which is larger by a factor of 95-132 compared to a conventional gold film macroelectrode. The detection limit (at a signal-to-noise ratio of 3) is 2.2 μM. This approach thus yields relatively effective and low-cost fabrication without resorting to high resolution instruments. Conceivably, the technique may be used to produce microelectrode arrays on a large scale. Graphical abstract Schematic presentation of a novel fabrication process of micro-ring electrode arrays. Two-step patterning based on nanosphere lithography leads to electrodes with great electrochemical performance. Direct deposition metal in the presence of polystyrene (PS) mask induces the formation of a new structure with arrays of gold covered with PS microring on the indium tin oxide (ITO) coated glass. The microelectrode-like behavior has been achieved using this fabrication process.

RF Electromagnetic Field Treatment of Tetragonal Kesterite CZTSSe Light Absorbers

In this work, we propose a method to improve electro-optical and structural parameters of light-absorbing kesterite materials. It relies on the application of weak power hydrogen plasma discharges using electromagnetic field of radio frequency range, which improves homogeneity of the samples. The method allows to reduce strain of light absorbers and is suitable for designing solar cells based on multilayered thin film structures. Structural characteristics of tetragonal kesterite Cu₂ZnSn(S, Se)₄ structures and their optical properties were studied by Raman, infrared, and reflectance spectroscopies. They revealed a reduction of the sample reflectivity after RF treatment and a modification of the energy band structure.