Hierarchical Self-Assembled Structures from POSS-Containing Block Copolymers Synthesized by Living Anionic Polymerization

Morphological dependence on the addition of a soft middle block segment to rigid POSS-containing triblock copolymers for forming cylindrical nanostructures

A series of novel polyhedral oligomelic silsesquioxane (POSS)-containing triblock copolymers that self-assemble into hexagonally-packed cylinders of the POSS domain in a polystyrene (PS) matrix was developed in this study.

Facile Preparation of Hierarchical Structures Using Crystallization-Kinetics Driven Self-Assembly

Hierarchical structures (HSs) constructed by nanoparticle-based building blocks possess not only the properties of the primary building blocks but also collective properties of the assemblies. Here we report the facile preparation of hierarchical Ag nanoparticles/polyhedral oligomeric silsequioxane molecule (POSS) hybrid branched structures within tens of seconds by using spin-coating and doctor-blade methods. An assembly mechanism mainly controlled by POSS-crystallization kinetics and space resistance of Ag nanoparticles toward the diffusion of POSS molecules was tentatively proposed. It was demonstrated as a universal method for the preparation of hierarchical hybrid branched structures on arbitrary substrates, as well as by using other different POSS and inorganic nanoparticles. As a demonstration, Ag hierarchical structures obtained by heat treatment exhibit excellent SERS performance with enhancement factors as high as on the order of 10(7), making them promising sensors for the detection of trace amount of analyte adsorbed on the surface. Two-dimensional SERS mapping was also demonstrated by using a direct imaging system with high mapping speed and high resolution. Moreover, the substrates with Ag hierarchical structures were used as a SERS sensor for in situ detection due to the excellent SERS performance and stability of the structures.

Tunable and rapid self-assembly of block copolymers using mixed solvent vapors

Pattern generation of well-controlled block copolymers (BCPs) with a high Flory-Huggins interaction parameter (χ) is important for applications in sub-20 nm nanolithography. We used mixed solvents of dimethylformamide (DMF) and toluene to control the morphology as well as the time to achieve the targeted morphology via self-assembly of BCPs. By precisely controlling the volume ratio of DMF and toluene, well-ordered line, honeycomb, circular hole, and lamellar nanostructures were obtained from a cylinder-forming poly(styrene-b-2-vinylpyridine) (PS-b-P2VP) BCP with high χ. Furthermore, a well-aligned 12 nm line pattern was successfully achieved in the guiding template within one minute using the mixed solvents. This practical method may also be applicable to self-assembly of other BCPs, providing more opportunities for the next-generation sub-10 nm lithography applications.

Synthesis of High Molecular Weight Polymethacrylates with Polyhedral Oligomeric Silsesquioxane Moieties by Atom Transfer Radical Polymerization

A new polyhedral oligomeric silsesquioxane (POSS) methacrylate monomer, 1-(3-(methacryloyloxy)propyl)dimethylsiloxy-3,5,7,9,11,13,15-hepta(isobutyl)pentacyclo-[9.5.1.1^3,9.1^5,15.1^7,13]octasiloxane ((i-Bu)₇POSS-OSiMe₂-MA, 1), with a flexible spacer between the cubic POSS cage and methacrylate group was synthesized to reduce steric strain and thus achieve polymethacrylates (poly(POSS-MA)s) with high molecular weight (MW). Atom transfer radical polymerization (ATRP) of 1 at high monomer concentration (1 M, corresponding to ca. 85 wt % of 1) led to polymers with the absolute number-average MW, determined by multiangle laser light scattering, M_n,_MALLS = 2 350 000 (and apparent MW, measured by gel permeation chromatography with linear poly(methyl methacrylate) (PMMA) standards, M_n,GPC = 550 000). Optimization of the reaction conditions, including the ATRP catalyst, targeted degrees of polymerization, monomer concentrations, as well as a monomer feeding, resulting in the first well-defined high MW polymers with POSS moieties.

Probing the self-assembled nanostructures of functional polymers with synchrotron grazing incidence X-ray scattering

For advanced functional polymers such as biopolymers, biomimic polymers, brush polymers, star polymers, dendritic polymers, and block copolymers, information about their surface structures, morphologies, and atomic structures is essential for understanding their properties and investigating their potential applications. Grazing incidence X-ray scattering (GIXS) is established for the last 15 years as the most powerful, versatile, and nondestructive tool for determining these structural details when performed with the aid of an advanced third-generation synchrotron radiation source with high flux, high energy resolution, energy tunability, and small beam size. One particular merit of this technique is that GIXS data can be obtained facilely for material specimens of any size, type, or shape. However, GIXS data analysis requires an understanding of GIXS theory and of refraction and reflection effects, and for any given material specimen, the best methods for extracting the form factor and the structure factor from the data need to be established. GIXS theory is reviewed here from the perspective of practical GIXS measurements and quantitative data analysis. In addition, schemes are discussed for the detailed analysis of GIXS data for the various self-assembled nanostructures of functional homopolymers, brush, star, and dendritic polymers, and block copolymers. Moreover, enhancements to the GIXS technique are discussed that can significantly improve its structure analysis by using the new synchrotron radiation sources such as third-generation X-ray sources with picosecond pulses and partial coherence and fourth-generation X-ray laser sources with femtosecond pulses and full coherence.

Organic-inorganic random copolymers from methacrylate-terminated poly(ethylene oxide) with 3-methacryloxypropylheptaphenyl polyhedral oligomeric silsesquioxane: synthesis via RAFT polymerization and self-assembly behavior

In this contribution, we report the synthesis of organic-inorganic random polymers from methacrylate-terminated poly(ethylene oxide) (MAPEO) (Mn = 950) and 3-methacryloxypropylheptaphenyl polyhedral oligomeric silsesquioxane (MAPOSS) macromers via reversible addition-fragmentation chain transfer (RAFT) polymerization with 4-cyano-4-(thiobenzoylthio) valeric acid (CTBTVA) as the chain transfer agent. The organic-inorganic random copolymers were characterized by means of (1)H NMR spectroscopy, gel permeation chromatography (GPC) and differential scanning calorimetry (DSC). The results of GPC indicate that the polymerizations were carried out in a controlled fashion. Transmission electron microscopy (TEM) showed that the organic-inorganic random copolymers in bulk were microphase-separated and the POSS microdomains were formed via POSS-POSS interactions. In aqueous solutions the organic-inorganic random copolymers were capable of self-assembling into spherical nanoobjects as evidenced by transmission electron microscopy (TEM) and dynamic laser scattering (DLS). The self-assembly behavior of the organic-inorganic random copolymers was also found to occur in the mixtures with the precursors of epoxy. The nanostructures were further fixed via subsequent curing reaction and thus the organic-inorganic nanocomposites were obtained. The formation of nanophases in epoxy thermosets was confirmed by transmission electron microscopy (TEM) and dynamic mechanical thermal analysis (DMTA). The organic-inorganic nanocomposites displayed the enhanced surface hydrophobicity as evidenced by surface contact angle measurements.

Facile construction of hybrid polystyrene with a string of lantern shape from monovinyl-substituted POSS and commercial polystyrene via Friedel–Crafts reaction and its properties

Hybrid polystyrene was easily prepared from monovinyl-substituted POSS and commercial polystyrene (PS)viaa straightforward Friedel–Crafts reaction.

Complex Self-Assembled Morphologies of Thin Films of an Asymmetric A3B3C3 Star Polymer

An asymmetric nine-arm star polymer, (polystyrene)₃-(poly(4-methoxystyrene))₃-(polyisoprene)₃ (PS₃-PMOS₃-PI₃) was synthesized, and the details of the structures of its thin films were successfully investigated for the first time by using in situ grazing incidence X-ray scattering (GIXS) with a synchrotron radiation source. Our quantitative GIXS analysis showed that thin films of the star polymer molecules have very complex but highly ordered and preferentially in-plane oriented hexagonal (HEX) structures consisting of truncated PS cylinders and PMOS triangular prisms in a PI matrix. This HEX structure undergoes a partial rotational transformation process at temperatures above 190 °C that produces a 30°-rotated HEX structure; this structural isomer forms with a volume fraction of 23% during heating up to 220 °C and persists during subsequent cooling. These interesting and complex self-assembled nanostructures are discussed in terms of phase separation, arm number, volume ratio, and confinement effects.

Proximity injection of plasticizing molecules to self-assembling polymers for large-area, ultrafast nanopatterning in the sub-10-nm regime

While the uses of block copolymers (BCPs) with a high Flory-Huggins interaction parameter (χ) are advantageous for the improvement of resolution and line edge fluctuations of self-assembled nanoscale patterns, their slow chain diffusion results in a prolonged assembly time. Although solvent vapor annealing has shown great effectiveness in promoting the self-assembly of such BCPs, a practical methodology to achieve a uniform swelling level in wafer-scale BCP thin films has not been reported. Here, we show that a solvent-swollen polymer gel pad can be used as a highly controllable vapor source for the rapid, large-area (>200 mm in diameter) formation of sub-10-nm patterns from a high-χ BCP. The proximal injection of solvent vapors to BCP films and the systematic control of the swelling levels and temperatures can significantly boost the self-assembly kinetics, realizing the formation of well-aligned sub-10-nm half-pitch patterns within 1 min of self-assembly. Moreover, we show that the gel pad can be used for the shear-induced alignment of BCP microdomains in an extremely short time of ~5 s as well as for the generation of three-dimensional crossed-wire nanostructures with controlled alignment angles.

Cylindrical Nanostructure of Rigid-Rod POSS-Containing Polymethacrylate from a Star-Branched Block Copolymer

A nanostructure consisting of rectangular polyhedral oligomeric silsesquioxane (POSS) nanodomains packed into a hexagonal lattice was observed in POSS-containing A₂B star-branched polymers. The A₂B star-branched polymers, which comprised polystyrene (A) and bulky POSS-containing poly(methacrylate) (PMAPOSS) (B) units, were synthesized by anionic polymerization and addition reaction. The self-assembled structures of the A₂B star-branched polymers were studied via transmission electron microscopy (TEM) and small- and wide-angle X-ray scattering (SAXS and WAXS, respectively). It was found that a rectangular nanostructure was packed into a hexagonal arrangement of nanodomains for a PMAPOSS volume fraction of 40 vol. % in the star-branched polymer. In addition, the cylinder-like nanostructure of bulky POSS observed, which is not observed in the case of PS-b-PMAPOSS diblock copolymers, was formed owing to the curvature effect, which is the result of the branched architecture of the copolymer.

Tunable Film Morphologies of Brush-Linear Diblock Copolymer Bearing Difluorene Moieties Yield a Variety of Digital Memory Properties

An amphiphilic brush-linear diblock copolymer bearing a rigid difluorene moiety was synthesized, yielding a copolymer with a high thermal stability and excellent processability. The immiscibility of the blocks induced the formation of a variety of nanostructures, depending on the fabrication conditions, which differed significantly from the nanostructures observed among common diblock copolymers in similar composition. Interestingly, the orientations of the nanostructures could be controlled. The nanostructured polymer displayed a variety of tunable morphologies that yielded distinct electrical memory properties when incorporated as the active layer into a digital memory device. The memory devices could be operated under very low power consumption levels and displayed excellent unipolar switching properties.

Polyhedral Oligomeric Silsesquioxane (POSS)-Containing Polymer Nanocomposites

Hybrid materials with superior structural and functional properties can be obtained by incorporating nanofillers into polymer matrices. Polyhedral oligomeric silsesquioxane (POSS) nanoparticles have attracted much attention recently due to their nanometer size, the ease of which these particles can be incorporated into polymeric materials and the unique capability to reinforce polymers. We review here the state of POSS-containing polymer nanocomposites. We discuss the influence of the incorporation of POSS into polymer matrices via chemical cross-linking or physical blending on the structure of nanocomposites, as affected by surface functional groups, and the POSS concentration.

High density and large area arrays of silicon oxide pillars with tunable domain size for mask etch applications

Silicon oxide pillars with tunable feature sizes and pitches are fabricated based on a block copolymer self-assembly template. By using reactive ion etching (RIE), the feature size of the silicon oxide pillars can be tuned without affecting the pitch. Using BCP with a different molecular weight can change the pitch size of the silicon oxide pillars. An area density of up to 2 teradots/inch(2) is achieved.