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Jeong J, Kim HS, Kwon G, Jeong K, Lee H, Lee JH, Park M, Lee C, Yu S, Kim H, Im S, Yoo K, Lee E, Cho MH. Ferroelastic-Ferroelectric Multiferroicity in van der Waals Rhenium Dichalcogenides. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2108777. [PMID: 35293650 DOI: 10.1002/adma.202108777] [Citation(s) in RCA: 7] [Impact Index Per Article: 3.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/01/2021] [Revised: 03/11/2022] [Indexed: 06/14/2023]
Abstract
2D multiferroics with combined ferroic orders have gained attention owing to their novel functionality and underlying science. Intrinsic ferroelastic-ferroelectric multiferroicity in single-crystalline van der Waals rhenium dichalcogenides, whose symmetries are broken by the Peierls distortion and layer-stacking order, is demonstrated. Ferroelastic switching of the domain orientation and accompanying anisotropic properties is achieved with 1% uniaxial strain using the polymer encapsulation method. Based on the electron localization function and bond dissociation energy of the Re-Re bonds, the change in bond configuration during the evolution of the domain wall and the preferred switching between the two specific orientation states are explained. Furthermore, the ferroelastic switching of ferroelectric polarization is confirmed using the photovoltaic effect. The study provides insights into the reversible bond-switching process and potential applications based on 2D multiferroicity.
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Affiliation(s)
- Jaehun Jeong
- Department of Physics, Yonsei University, Seoul, 03722, Republic of Korea
| | - Hyeon-Sik Kim
- Department of Physics, Yonsei University, Seoul, 03722, Republic of Korea
| | - Gihyeon Kwon
- Department of Physics, Yonsei University, Seoul, 03722, Republic of Korea
| | - Kwangsik Jeong
- Division of Physics and Semiconductor Science, Dongguk University, Seoul, 04620, Republic of Korea
| | - Hyangsook Lee
- Samsung Advanced Institute of Technology, Suwon, 16678, Republic of Korea
| | - Ji Hye Lee
- Center for Correlated Electron Systems (CCES), Institute of Basic Science (IBS), Seoul, 08826, Korea
- Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Korea
| | - Myunguk Park
- Department of Physics, Yonsei University, Seoul, 03722, Republic of Korea
| | - Changjun Lee
- Department of Physics, Yonsei University, Seoul, 03722, Republic of Korea
| | - Sanghyuck Yu
- Department of Physics, Yonsei University, Seoul, 03722, Republic of Korea
| | - Heegoo Kim
- Samsung Advanced Institute of Technology, Suwon, 16678, Republic of Korea
| | - Seongil Im
- Department of Physics, Yonsei University, Seoul, 03722, Republic of Korea
| | - Kyunghwa Yoo
- Department of Physics, Yonsei University, Seoul, 03722, Republic of Korea
| | - Eunha Lee
- Samsung Advanced Institute of Technology, Suwon, 16678, Republic of Korea
| | - Mann-Ho Cho
- Department of Physics, Yonsei University, Seoul, 03722, Republic of Korea
- Department of System Semiconductor Engineering, Yonsei University, Seoul, 03722, Republic of Korea
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52
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Chen C, Liu H, Lai Q, Mao X, Fu J, Fu Z, Zeng H. Large-Scale Domain Engineering in Two-Dimensional Ferroelectric CuInP 2S 6 via Giant Flexoelectric Effect. NANO LETTERS 2022; 22:3275-3282. [PMID: 35412313 DOI: 10.1021/acs.nanolett.2c00130] [Citation(s) in RCA: 22] [Impact Index Per Article: 11.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Room-temperature ferroelectricity in two-dimensional (2D) materials is a potential for developing atomic-scale functional devices. However, as a key step for the technology implementations of 2D ferroelectrics in electronics, the controllable generation of uniform domains remains challenging at the current stage because domain engineering through an external electric field at the 2D limit inevitably leads to large leakage currents and material breakdown. Here, we demonstrate a voltage-free method, the flexoelectric effect, to artificially generate large-scale stripe domains in 2D ferroelectric CuInP2S6 with single domain lateral size at the scale of several hundred microns. With giant strain gradients (∼106 m-1), we mechanically switch the out-of-plane polarization in ultrathin CuInP2S6. The flexoelectric control of polarization is understood with a distorted Landau-Ginzburg-Devonshire double well model. Through substrate strain engineering, the stripe domain density is controllable. Our results highlight the potential of developing van der Waals ferroelectrics-based flexible electronics.
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Affiliation(s)
- Chen Chen
- International Center for Quantum Design of Functional Materials (ICQD), Hefei National Laboratory for Physical Science at the Microscale, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
- Key Laboratory of Strongly-Coupled Quantum Matter Physics, Chinese Academy of Sciences, Department of Physics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
| | - Heng Liu
- International Center for Quantum Design of Functional Materials (ICQD), Hefei National Laboratory for Physical Science at the Microscale, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
- Key Laboratory of Strongly-Coupled Quantum Matter Physics, Chinese Academy of Sciences, Department of Physics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
| | - Qinglin Lai
- International Center for Quantum Design of Functional Materials (ICQD), Hefei National Laboratory for Physical Science at the Microscale, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
- Key Laboratory of Strongly-Coupled Quantum Matter Physics, Chinese Academy of Sciences, Department of Physics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
| | - Xiaoyu Mao
- International Center for Quantum Design of Functional Materials (ICQD), Hefei National Laboratory for Physical Science at the Microscale, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
- Key Laboratory of Strongly-Coupled Quantum Matter Physics, Chinese Academy of Sciences, Department of Physics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
| | - Jun Fu
- International Center for Quantum Design of Functional Materials (ICQD), Hefei National Laboratory for Physical Science at the Microscale, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
- Key Laboratory of Strongly-Coupled Quantum Matter Physics, Chinese Academy of Sciences, Department of Physics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
| | - Zhaoming Fu
- College of Physics and Electronic Information, Yunnan Normal University, Kunming 650500, China
- Yunnan Key Laboratory of Optoelectronic Information Technology, Kunming 650500, China
| | - Hualing Zeng
- International Center for Quantum Design of Functional Materials (ICQD), Hefei National Laboratory for Physical Science at the Microscale, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
- Key Laboratory of Strongly-Coupled Quantum Matter Physics, Chinese Academy of Sciences, Department of Physics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
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Chaudhary P, Lu H, Loes M, Lipatov A, Sinitskii A, Gruverman A. Mechanical Stress Modulation of Resistance in MoS 2 Junctions. NANO LETTERS 2022; 22:1047-1052. [PMID: 35041432 DOI: 10.1021/acs.nanolett.1c04019] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Strain engineering is a powerful strategy to control the physical properties of material-enabling devices with enhanced functionality and improved performance. Here, we investigate a modulation of the transport behavior of the two-dimensional MoS2 junctions under the mechanical stress induced by a tip of an atomic force microscope (AFM). We show that the junction resistance can be reversibly tuned by up to 4 orders of magnitude by altering a tip-induced force. Analysis of the stress-induced evolution of the I-V characteristics indicates a combined effect of the tip-induced strain and strain gradient on the energy barrier height and profile. In addition, we show that the tip-generated flexoelectric effect leads to significant enhancement of the photovoltaic effect in the MoS2 junctions. A combination of the optical and mechanical stimuli facilitates reversible photomechanical tuning of resistance of the narrow-band 2D semiconductors and development of devices with an enhanced photovoltaic response.
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Affiliation(s)
- Pradeep Chaudhary
- Department of Physics and Astronomy, University of Nebraska, Lincoln, Nebraska 68588, United States
| | - Haidong Lu
- Department of Physics and Astronomy, University of Nebraska, Lincoln, Nebraska 68588, United States
| | - Michael Loes
- Department of Chemistry, University of Nebraska, Lincoln, Nebraska 68588, United States
| | - Alexey Lipatov
- Department of Chemistry, University of Nebraska, Lincoln, Nebraska 68588, United States
| | - Alexander Sinitskii
- Department of Chemistry, University of Nebraska, Lincoln, Nebraska 68588, United States
| | - Alexei Gruverman
- Department of Physics and Astronomy, University of Nebraska, Lincoln, Nebraska 68588, United States
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Panasci SE, Koos A, Schilirò E, Di Franco S, Greco G, Fiorenza P, Roccaforte F, Agnello S, Cannas M, Gelardi FM, Sulyok A, Nemeth M, Pécz B, Giannazzo F. Multiscale Investigation of the Structural, Electrical and Photoluminescence Properties of MoS 2 Obtained by MoO 3 Sulfurization. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:182. [PMID: 35055201 PMCID: PMC8778062 DOI: 10.3390/nano12020182] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 12/03/2021] [Revised: 01/01/2022] [Accepted: 01/03/2022] [Indexed: 01/27/2023]
Abstract
In this paper, we report a multiscale investigation of the compositional, morphological, structural, electrical, and optical emission properties of 2H-MoS2 obtained by sulfurization at 800 °C of very thin MoO3 films (with thickness ranging from ~2.8 nm to ~4.2 nm) on a SiO2/Si substrate. XPS analyses confirmed that the sulfurization was very effective in the reduction of the oxide to MoS2, with only a small percentage of residual MoO3 present in the final film. High-resolution TEM/STEM analyses revealed the formation of few (i.e., 2-3 layers) of MoS2 nearly aligned with the SiO2 surface in the case of the thinnest (~2.8 nm) MoO3 film, whereas multilayers of MoS2 partially standing up with respect to the substrate were observed for the ~4.2 nm one. Such different configurations indicate the prevalence of different mechanisms (i.e., vapour-solid surface reaction or S diffusion within the film) as a function of the thickness. The uniform thickness distribution of the few-layer and multilayer MoS2 was confirmed by Raman mapping. Furthermore, the correlative plot of the characteristic A1g-E2g Raman modes revealed a compressive strain (ε ≈ -0.78 ± 0.18%) and the coexistence of n- and p-type doped areas in the few-layer MoS2 on SiO2, where the p-type doping is probably due to the presence of residual MoO3. Nanoscale resolution current mapping by C-AFM showed local inhomogeneities in the conductivity of the few-layer MoS2, which are well correlated to the lateral changes in the strain detected by Raman. Finally, characteristic spectroscopic signatures of the defects/disorder in MoS2 films produced by sulfurization were identified by a comparative analysis of Raman and photoluminescence (PL) spectra with CVD grown MoS2 flakes.
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Affiliation(s)
- Salvatore E. Panasci
- Consiglio Nazionale delle Ricerche—Istituto per la Microelettronica e Microsistemi (CNR-IMM), Strada VIII 5, 95121 Catania, Italy; (S.E.P.); (E.S.); (S.D.F.); (G.G.); (P.F.); (F.R.); (S.A.)
- Department of Physics and Astronomy, University of Catania, 95123 Catania, Italy
| | - Antal Koos
- Centre for Energy Research, Institute of Technical Physics and Materials Science, Konkoly-Thege ut 29-33, 1121 Budapest, Hungary; (A.K.); (A.S.); (M.N.)
| | - Emanuela Schilirò
- Consiglio Nazionale delle Ricerche—Istituto per la Microelettronica e Microsistemi (CNR-IMM), Strada VIII 5, 95121 Catania, Italy; (S.E.P.); (E.S.); (S.D.F.); (G.G.); (P.F.); (F.R.); (S.A.)
| | - Salvatore Di Franco
- Consiglio Nazionale delle Ricerche—Istituto per la Microelettronica e Microsistemi (CNR-IMM), Strada VIII 5, 95121 Catania, Italy; (S.E.P.); (E.S.); (S.D.F.); (G.G.); (P.F.); (F.R.); (S.A.)
| | - Giuseppe Greco
- Consiglio Nazionale delle Ricerche—Istituto per la Microelettronica e Microsistemi (CNR-IMM), Strada VIII 5, 95121 Catania, Italy; (S.E.P.); (E.S.); (S.D.F.); (G.G.); (P.F.); (F.R.); (S.A.)
| | - Patrick Fiorenza
- Consiglio Nazionale delle Ricerche—Istituto per la Microelettronica e Microsistemi (CNR-IMM), Strada VIII 5, 95121 Catania, Italy; (S.E.P.); (E.S.); (S.D.F.); (G.G.); (P.F.); (F.R.); (S.A.)
| | - Fabrizio Roccaforte
- Consiglio Nazionale delle Ricerche—Istituto per la Microelettronica e Microsistemi (CNR-IMM), Strada VIII 5, 95121 Catania, Italy; (S.E.P.); (E.S.); (S.D.F.); (G.G.); (P.F.); (F.R.); (S.A.)
| | - Simonpietro Agnello
- Consiglio Nazionale delle Ricerche—Istituto per la Microelettronica e Microsistemi (CNR-IMM), Strada VIII 5, 95121 Catania, Italy; (S.E.P.); (E.S.); (S.D.F.); (G.G.); (P.F.); (F.R.); (S.A.)
- Department of Physics and Chemistry Emilio Segrè, University of Palermo, 90123 Palermo, Italy; (M.C.); (F.M.G.)
- ATEN Center, University of Palermo, 90123 Palermo, Italy
| | - Marco Cannas
- Department of Physics and Chemistry Emilio Segrè, University of Palermo, 90123 Palermo, Italy; (M.C.); (F.M.G.)
| | - Franco M. Gelardi
- Department of Physics and Chemistry Emilio Segrè, University of Palermo, 90123 Palermo, Italy; (M.C.); (F.M.G.)
| | - Attila Sulyok
- Centre for Energy Research, Institute of Technical Physics and Materials Science, Konkoly-Thege ut 29-33, 1121 Budapest, Hungary; (A.K.); (A.S.); (M.N.)
| | - Miklos Nemeth
- Centre for Energy Research, Institute of Technical Physics and Materials Science, Konkoly-Thege ut 29-33, 1121 Budapest, Hungary; (A.K.); (A.S.); (M.N.)
| | - Béla Pécz
- Centre for Energy Research, Institute of Technical Physics and Materials Science, Konkoly-Thege ut 29-33, 1121 Budapest, Hungary; (A.K.); (A.S.); (M.N.)
| | - Filippo Giannazzo
- Consiglio Nazionale delle Ricerche—Istituto per la Microelettronica e Microsistemi (CNR-IMM), Strada VIII 5, 95121 Catania, Italy; (S.E.P.); (E.S.); (S.D.F.); (G.G.); (P.F.); (F.R.); (S.A.)
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Ma H, Xiao X, Wang Y, Sun Y, Wang B, Gao X, Wang E, Jiang K, Liu K, Zhang X. Wafer-scale freestanding vanadium dioxide film. SCIENCE ADVANCES 2021; 7:eabk3438. [PMID: 34878834 PMCID: PMC8654297 DOI: 10.1126/sciadv.abk3438] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/14/2023]
Abstract
Vanadium dioxide (VO2), with well-known metal-to-insulator phase transition, has been used to realize intriguing smart functions in photodetectors, modulators, and actuators. Wafer-scale freestanding VO2 (f-VO2) films are desirable for integrating VO2 with other materials into multifunctional devices. Unfortunately, their preparation has yet to be achieved because the wafer-scale etching needs ultralong time and damages amphoteric VO2 whether in acid or alkaline etchants. Here, we achieved wafer-scale f-VO2 films by a nano-pinhole permeation-etching strategy in 6 min, far less than that by side etching (thousands of minutes). The f-VO2 films retain their pristine metal-to-insulator transition and intrinsic mechanical properties and can be conformably transferred to arbitrary substrates. Integration of f-VO2 films into diverse large-scale smart devices, including terahertz modulators, camouflageable photoactuators, and temperature-indicating strips, shows advantages in low insertion loss, fast response, and low triggering power. These f-VO2 films find more intriguing applications by heterogeneous integration with other functional materials.
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Affiliation(s)
- He Ma
- Institute of Information Photonics Technology, Faculty of Science, Beijing University of Technology, Beijing 100124, P. R. China
| | - Xiao Xiao
- Institute of Information Photonics Technology, Faculty of Science, Beijing University of Technology, Beijing 100124, P. R. China
| | - Yu Wang
- Institute of Information Photonics Technology, Faculty of Science, Beijing University of Technology, Beijing 100124, P. R. China
| | - Yufei Sun
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, P. R. China
| | - Bolun Wang
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, P. R. China
| | - Xinyu Gao
- State Key Laboratory of Low-Dimensional Quantum Physics, Tsinghua-Foxconn Nanotechnology Research Center, Department of Physics, Collaborative Innovation Center of Quantum Matter, Tsinghua University, Beijing 100084, P. R. China
| | - Enze Wang
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, P. R. China
| | - Kaili Jiang
- State Key Laboratory of Low-Dimensional Quantum Physics, Tsinghua-Foxconn Nanotechnology Research Center, Department of Physics, Collaborative Innovation Center of Quantum Matter, Tsinghua University, Beijing 100084, P. R. China
| | - Kai Liu
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, P. R. China
- Corresponding author. (K.L.); (X.Z.)
| | - Xinping Zhang
- Institute of Information Photonics Technology, Faculty of Science, Beijing University of Technology, Beijing 100124, P. R. China
- Corresponding author. (K.L.); (X.Z.)
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