Hydrodynamics and mass transfer of gas-liquid flow in a falling film microreactor

Sonozonation (sonication/ozonation) for the degradation of organic contaminants - A review

Ozonation (OZ) is an important advanced oxidation process to purify water and wastewater. Because of the lower solubility and instability of ozone (O₃), selective oxidation and dependence on pH value, the industrial applications of OZ have been hindered by the following disadvantages: incomplete removal of pollutants, lower mineralization efficiency and the formation of toxic by-products. Meanwhile, OZ seems to have higher processing costs than other technologies. To improve the treatment efficiency and O₃ utilization, several combined processes, such as H₂O₂/O₃, UV/O₃, and Cavitation/O₃, have been explored, while the combined method of ultrasonication (US) with OZ is a promising treatment technology with a complex physicochemical mechanism. In US alone, the sonolysis of water molecules can produce more powerful unselective oxidant hydroxyl radicals (OH), and directly cause the sonochemical pyrolysis of volatile pollutants. In US/OZ, US can promote the mass transfer of O₃, and also drive the chemical conversion of O₃ to enhance the formation of OH. Various layouts of US/OZ devices and the interactive effects of US/OZ (synergism or antagonism) on the degradation of various organics are illustrated in this review. The main factors, including US frequency, pH value, and radical scavengers, significantly affect the mass transfer and decomposition of O₃, the formation of OH and H₂O₂, the degradation rates of organics and the removal efficiencies of COD and TOC (mineralization). As a result, US can significantly increase the yield of OH, thereby improving the degradation efficiency and mineralization of refractory organics. However, US also enhances the decomposition of ozone, thereby reducing the concentration of O₃ in water and impairing the efficiency of selective oxidation with O₃ molecules.

Mass transfer in falling film microreactors: measurement techniques and effect of operational parameters

Falling film microreactors have contributed to the pursuit of process intensification strategies and have, over the years, been recognized for their potential in performing demanding reactions. In the last few decades, modifications in the measurement techniques and operational parameters of these microstructured devices have been the focus of many research studies with a common target on process improvement. In this work, we present a review dedicated to falling film microreactors, focusing on the recent advances in their design and operation, with particular emphasis on mass transfer enhancement. Analysis of the recent techniques for the measurement of mass transfer as well as the operational parameters used and their effect on the target objective, particularly in the liquid phase (being the limiting phase reactant), are included in the review. The relationship between the hydrodynamics of falling thin liquid films and the microreactor design, the discrepancies between measured and model results, the major challenges, and the future outlook for these promising microreactors are also presented.

Abatement of tetrafluoromethane by chemical absorption with molten aluminum

Chemical absorption with molten aluminum to abate tetrafluoromethane (CF₄) was investigated in this paper. The experiments were conducted at a series of different temperatures of 973 K, 1003 K, 1103 K, and 1188 K and the abatement rate of CF₄ was calculated. It was found that CF₄ can be adsorbed firstly and then react with molten aluminum automatically. The initial abatement rate of CF₄ in molten aluminum was 3.10 × 10^-2 mol·m^-3·s^-1 at 973 K, while it reached its maximum value of 1.08 × 10^-1 mol·m^-3·s^-1 at the temperature of 1103 K. The highest abatement efficiency was 48.4%, reached at 1003 K. Higher temperatures up to 1188 K did not affect the abatement efficiency, however, they accelerated slightly the initial reaction rate. The products of the chemical absorption are white solid AlF₃ and black graphite powder identified by XRD and SEM-EDS analysis. Due to density differences, solid AlF₃ and graphite powder in the product tend to accumulate on the top of molten aluminum where they form two separate layers. This makes them recover more easily. The gas-liquid reaction process between CF₄ and molten aluminum is accorded with the two-film theory model, diffusion process is considered to be the control step of the whole process.

Confined methane-water interfacial layers and thickness measurements using in situ Raman spectroscopy

Gas-liquid interfaces broadly impact our planet, yet confined interfaces behave differently than unconfined ones. We report the role of tangential fluid motion in confined methane-water interfaces. The interfaces are created using microfluidics and investigated by in situ 1D, 2D and 3D Raman spectroscopy. The apparent CH₄ and H₂O concentrations are reported for Reynolds numbers (Re), ranging from 0.17 to 8.55. Remarkably, the interfaces are comprised of distinct layers of thicknesses varying from 23 to 57 μm. We found that rarefaction, mixture, thin film, and shockwave layers together form the interfaces. The results indicate that the mixture layer thickness (δ) increases with Re (δ ∝ Re), and traditional transport theory for unconfined interfaces does not explain the confined interfaces. A comparison of our results with thin film theory of air-water interfaces (from mass transfer experiments in capillary microfluidics) supports that the hydrophobicity of CH₄ could decrease the strength of water-water interactions, resulting in larger interfacial thicknesses. Our findings help explain molecular transport in confined gas-liquid interfaces, which are common in a broad range of societal applications.

Photonic contacting of gas–liquid phases in a falling film microreactor for continuous-flow photochemical catalysis with visible light

A microstructured falling film reactor was applied to the dye-sensitized photochemical conversion of 1,5-dihydroxynaphthalene to juglone for reactor and process evaluation.