Indirekte und direkte Anknüpfung von Übergangsmetallen an Silicoide

Siliconoid Expansion by a Single Germanium Atom through Isolated Intermediates

The growth of (semi-)metal clusters is pivotal for nucleation processes in gaseous and condensed phases. We now report the isolation of intermediates during the expansion of a stable unsaturated silicon cluster (siliconoid) by a single germanium atom through a sequence of substitution, rearrangement and reduction. The reaction of ligato-lithiated hexasilabenzpolarene LiSi6 Tip5 (1Li⋅(thf)2 , Tip=2,4,6-triisopropylphenyl) with GeCl2 ⋅NHC (NHC=1,3-diisopropyl-4,5-dimethylimidazol-2-ylidene) initially yields the product with exohedral germanium(II) functionality, which then inserts into an Si-Si bond of the Si6 scaffold. The concomitant transfer of the chloro functionality from germanium to an adjacent silicon preserves the electron-precise nature of the formed endohedral germylene. Full incorporation of the germanium heteroatom to the Si6 Ge cluster core is finally achieved either by reduction under loss of the coordinating NHC or directly by reaction of 1Li⋅(thf)2 with GeCl2 ⋅1,4-dioxane.

Chalcogen-Expanded Unsaturated Silicon Clusters: Thia-, Selena-, and Tellurasiliconoids

Reactions of silylenes with heavier chalcogens (E) typically result in Si=E double bonds or their π-addition products. In contrast, the oxidation of a silylene-functionalized unsaturated silicon cluster (siliconoid) with Group 16 elements selectively yields cluster expanded siliconoids Si7 E (E=S, Se, Te) fully preserving the unsaturated nature of the cluster scaffold as evident from the NMR signatures of the products. Mechanistic considerations by DFT calculations suggest the intermediacy of a Si6 siliconoid with exohedral Si=E functionality. The reaction thus may serve as model system for the oxidation of surface-bonded silylenes at Si(100) by chalcogens and their diffusion into the silicon bulk.