1
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Kulhánek J, Burešová Z, Klikar M, Sdralias L, Katsidas A, Pytela O, Pařík P, Růžička A, Fakis M, Bureš F. Synthesis, photophysics and two-photon absorption of imidazole-centred tripodal chromophores. Phys Chem Chem Phys 2024; 26:20908-20918. [PMID: 39045806 DOI: 10.1039/d4cp02227k] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 07/25/2024]
Abstract
Tripodal push-pull chromophores with D-(π-A)3 arrangement were synthesized using 1-methyl-2,4,5-triphenyl-1H-imidazole as a central electron donor, and their thermal, electrochemical, photophysical and non-linear optical properties were studied and corroborated with quantum-chemical calculations. Their facile synthesis involved Suzuki-Miyaura and Knoevenagel reactions, allowing the installation of various peripheral electron acceptors such as formyl, cyano, ester, trifluoromethyl and more complex moieties such as malonic/acetic acid derivatives, indan-1,3-dione and rhodanine. All phenyl rings appended at the central imidazole core were more or less twisted depending on the peripheral substitution. Although imidazole undergoes reversible one-electron oxidation, peripheral acceptors are reduced irreversibly in a multi-electron process. This behaviour is further seen as a variation of the LUMO, while the HOMO remained almost unaltered across the whole series. TD-DFT calculations revealed centrifugal charge transfer from the central imidazole to all C2, C4 and C5 branches occupied by the LUMO, LUMO+1 and LUMO+2. The HOMO-LUMO gap is tuneable within the range of 3.55-2.31 eV, while the longest-wavelength absorption/emission maxima were found within the broad range of 304-448/393-612 nm. Although the absorption spectra are solvent-independent, the emission depends strongly on the solvent polarity and the electron-withdrawing power of the peripheral acceptors. Extended chromophores with complex electron acceptors were investigated as two-photon absorbers, revealing relatively good cross-section values of up to 521 GM and a figure-of-merit (ΦF × δ2PA) of around 190 GM.
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Affiliation(s)
- Jiří Kulhánek
- Institute of Organic Chemistry and Technology, Faculty of Chemical Technology, University of Pardubice, Studentská 573, Pardubice, 53210, Czech Republic.
| | - Zuzana Burešová
- Institute of Organic Chemistry and Technology, Faculty of Chemical Technology, University of Pardubice, Studentská 573, Pardubice, 53210, Czech Republic.
| | - Milan Klikar
- Institute of Organic Chemistry and Technology, Faculty of Chemical Technology, University of Pardubice, Studentská 573, Pardubice, 53210, Czech Republic.
| | - Lampros Sdralias
- Department of Physics, University of Patras, Patras, 26504, Greece.
| | | | - Oldřich Pytela
- Institute of Organic Chemistry and Technology, Faculty of Chemical Technology, University of Pardubice, Studentská 573, Pardubice, 53210, Czech Republic.
| | - Patrik Pařík
- Institute of Organic Chemistry and Technology, Faculty of Chemical Technology, University of Pardubice, Studentská 573, Pardubice, 53210, Czech Republic.
| | - Aleš Růžička
- Department of General and Inorganic Chemistry, Faculty of Chemical Technology, University of Pardubice, Studentská 573, Pardubice, 53210, Czech Republic
| | - Mihalis Fakis
- Department of Physics, University of Patras, Patras, 26504, Greece.
| | - Filip Bureš
- Institute of Organic Chemistry and Technology, Faculty of Chemical Technology, University of Pardubice, Studentská 573, Pardubice, 53210, Czech Republic.
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2
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Tang J, Xu N, Ren A, Ma L, Xu W, Han Z, Chen Z, Li Q. Two-Orders-of-Magnitude Enhancement of Photoinitiation Activity via a Simple Surface Engineering of Metal Nanoclusters. Angew Chem Int Ed Engl 2024; 63:e202403645. [PMID: 38530138 DOI: 10.1002/anie.202403645] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/21/2024] [Revised: 03/21/2024] [Accepted: 03/25/2024] [Indexed: 03/27/2024]
Abstract
Development of high-performance photoinitiator is the key to enhance the printing speed, structure resolution and product quality in 3D laser printing. Here, to improve the printing efficiency of 3D laser nanoprinting, we investigate the underlying photochemistry of gold and silver nanocluster initiators under multiphoton laser excitation. Experimental results and DFT calculations reveal the high cleavage probability of the surface S-C bonds in gold and silver nanoclusters which generate multiple radicals. Based on this understanding, we design several alkyl-thiolated gold nanoclusters and achieve a more than two-orders-of-magnitude enhancement of photoinitiation activity, as well as a significant improvement in printing resolution and fabrication window. Overall, this work for the first time unveils the detailed radical formation pathways of gold and silver nanoclusters under multiphoton activation and substantially improves their photoinitiation sensitivity via surface engineering, which pushes the limit of the printing efficiency of 3D laser lithography.
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Affiliation(s)
- Jin Tang
- Ministry of Education Key Laboratory of Macromolecular Synthesis and Functionalization; Department of Polymer Science and Engineering, Zhejiang University, Hangzhou, 310058, China
| | - Ning Xu
- School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310058, China
- Department of Physics, School of Physical Science and Technology, Ningbo University, Ningbo, 315211, China
| | - An Ren
- The State Key Laboratory of Fluid Power and Mechatronic Systems. School of Mechanical Engineering, Zhejiang University, Hangzhou, 310058, China
| | - Liang Ma
- The State Key Laboratory of Fluid Power and Mechatronic Systems. School of Mechanical Engineering, Zhejiang University, Hangzhou, 310058, China
| | - Wenwu Xu
- Department of Physics, School of Physical Science and Technology, Ningbo University, Ningbo, 315211, China
| | - Zhongkang Han
- School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310058, China
| | - Zijie Chen
- Ministry of Education Key Laboratory of Macromolecular Synthesis and Functionalization; Department of Polymer Science and Engineering, Zhejiang University, Hangzhou, 310058, China
| | - Qi Li
- Ministry of Education Key Laboratory of Macromolecular Synthesis and Functionalization; Department of Polymer Science and Engineering, Zhejiang University, Hangzhou, 310058, China
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3
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Guan L, Cao C, Liu X, Liu Q, Qiu Y, Wang X, Yang Z, Lai H, Sun Q, Ding C, Zhu D, Kuang C, Liu X. Light and matter co-confined multi-photon lithography. Nat Commun 2024; 15:2387. [PMID: 38493192 PMCID: PMC10944545 DOI: 10.1038/s41467-024-46743-5] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/12/2023] [Accepted: 03/08/2024] [Indexed: 03/18/2024] Open
Abstract
Mask-free multi-photon lithography enables the fabrication of arbitrary nanostructures low cost and more accessible than conventional lithography. A major challenge for multi-photon lithography is to achieve ultra-high precision and desirable lateral resolution due to the inevitable optical diffraction barrier and proximity effect. Here, we show a strategy, light and matter co-confined multi-photon lithography, to overcome the issues via combining photo-inhibition and chemical quenchers. We deeply explore the quenching mechanism and photoinhibition mechanism for light and matter co-confined multiphoton lithography. Besides, mathematical modeling helps us better understand that the synergy of quencher and photo-inhibition can gain a narrowest distribution of free radicals. By using light and matter co-confined multiphoton lithography, we gain a 30 nm critical dimension and 100 nm lateral resolution, which further decrease the gap with conventional lithography.
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Affiliation(s)
- Lingling Guan
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Chun Cao
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, 310027, Hangzhou, China.
- School of Mechanical Engineering, Hangzhou Dianzi University, 310018, Hangzhou, China.
| | - Xi Liu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Qiulan Liu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Yiwei Qiu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Xiaobing Wang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Zhenyao Yang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Huiying Lai
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Qiuyuan Sun
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Chenliang Ding
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Dazhao Zhu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Cuifang Kuang
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, 310027, Hangzhou, China.
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, 311200, Hangzhou, China.
| | - Xu Liu
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, 310027, Hangzhou, China.
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, 311200, Hangzhou, China.
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4
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Kam D, Rulf O, Reisinger A, Lieberman R, Magdassi S. 3D printing by stereolithography using thermal initiators. Nat Commun 2024; 15:2285. [PMID: 38480705 PMCID: PMC10937977 DOI: 10.1038/s41467-024-46532-0] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/16/2023] [Accepted: 02/28/2024] [Indexed: 03/17/2024] Open
Abstract
Additive manufacturing technologies based on stereolithography rely on initiating spatial photopolymerization by using photoinitiators activated by UV-visible light. Many applications requiring printing in water are limited since water-soluble photoinitiators are scarce, and their price is skyrocketing. On the contrary, thermal initiators are widely used in the chemical industry for polymerization processes due to their low cost and simplicity of initiation by heat at low temperatures. However, such initiators were never used in 3D printing technologies, such as vat photopolymerization stereolithography, since localizing the heat at specific printing voxels is impossible. Here we propose using a thermal initiator for 3D printing for localized polymerization processes by near-infrared and visible light irradiation without conventional photoinitiators. This is enabled by using gold nanorods or silver nanoparticles at very low concentrations as photothermal converters in aqueous and non-aqueous mediums. Our proof of concept demonstrates the fabrication of hydrogel and polymeric objects using stereolithography-based 3D printers, vat photopolymerization, and two-photon printing.
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Affiliation(s)
- Doron Kam
- The Institute of Chemistry, Hebrew University of Jerusalem, Jerusalem, 91904, Israel
| | - Omri Rulf
- The Institute of Chemistry, Hebrew University of Jerusalem, Jerusalem, 91904, Israel
| | - Amir Reisinger
- The Institute of Chemistry, Hebrew University of Jerusalem, Jerusalem, 91904, Israel
| | - Rama Lieberman
- The Institute of Chemistry, Hebrew University of Jerusalem, Jerusalem, 91904, Israel
| | - Shlomo Magdassi
- The Institute of Chemistry, Hebrew University of Jerusalem, Jerusalem, 91904, Israel.
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5
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Pingali R, Kim H, Saha SK. A Computational Evaluation of Minimum Feature Size in Projection Two-Photon Lithography for Rapid Sub-100 nm Additive Manufacturing. MICROMACHINES 2024; 15:158. [PMID: 38276857 PMCID: PMC10820352 DOI: 10.3390/mi15010158] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/15/2023] [Revised: 01/17/2024] [Accepted: 01/19/2024] [Indexed: 01/27/2024]
Abstract
Two-photon lithography (TPL) is a laser-based additive manufacturing technique that enables the printing of arbitrarily complex cm-scale polymeric 3D structures with sub-micron features. Although various approaches have been investigated to enable the printing of fine features in TPL, it is still challenging to achieve rapid sub-100 nm 3D printing. A key limitation is that the physical phenomena that govern the theoretical and practical limits of the minimum feature size are not well known. Here, we investigate these limits in the projection TPL (P-PTL) process, which is a high-throughput variant of TPL, wherein entire 2D layers are printed at once. We quantify the effects of the projected feature size, optical power, exposure time, and photoinitiator concentration on the printed feature size through finite element modeling of photopolymerization. Simulations are performed rapidly over a vast parameter set exceeding 10,000 combinations through a dynamic programming scheme, which is implemented on high-performance computing resources. We demonstrate that there is no physics-based limit to the minimum feature sizes achievable with a precise and well-calibrated P-TPL system, despite the discrete nature of illumination. However, the practically achievable minimum feature size is limited by the increased sensitivity of the degree of polymer conversion to the processing parameters in the sub-100 nm regime. The insights generated here can serve as a roadmap towards fast, precise, and predictable sub-100 nm 3D printing.
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Affiliation(s)
| | | | - Sourabh K. Saha
- G.W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA; (R.P.); (H.K.)
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6
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Gauci SC, Vranic A, Blasco E, Bräse S, Wegener M, Barner-Kowollik C. Photochemically Activated 3D Printing Inks: Current Status, Challenges, and Opportunities. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2306468. [PMID: 37681744 DOI: 10.1002/adma.202306468] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/03/2023] [Revised: 08/23/2023] [Indexed: 09/09/2023]
Abstract
3D printing with light is enabled by the photochemistry underpinning it. Without fine control over the ability to photochemically gate covalent bond formation by the light at a certain wavelength and intensity, advanced photoresists with functions spanning from on-demand degradability, adaptability, rapid printing speeds, and tailored functionality are impossible to design. Herein, recent advances in photoresist design for light-driven 3D printing applications are critically assessed, and an outlook of the outstanding challenges and opportunities is provided. This is achieved by classing the discussed photoresists in chemistries that function photoinitiator-free and those that require a photoinitiator to proceed. Such a taxonomy is based on the efficiency with which photons are able to generate covalent bonds, with each concept featuring distinct advantages and drawbacks.
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Affiliation(s)
- Steven C Gauci
- School of Chemistry and Physics, Centre for Materials Science, Queensland University of Technology (QUT), 2 George Street, Brisbane, Queensland, 4000, Australia
| | - Aleksandra Vranic
- Institute of Organic Chemistry (IOC), Karlsruhe institute of Technology (KIT), Fritz-Haber-Weg 6, 76133, Karlsruhe, Germany
| | - Eva Blasco
- Institute for Molecular Systems Engineering and Advanced Materials (IMSEAM), Heidelberg University, 69120, Heidelberg, Germany
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
| | - Stefan Bräse
- Institute of Organic Chemistry (IOC), Karlsruhe institute of Technology (KIT), Fritz-Haber-Weg 6, 76133, Karlsruhe, Germany
- Institute of Biological and Chemical Systems-Functional Molecular Systems (IBCS-FMS), Karlsruhe Institute of Technology (KIT), 76133, Karlsruhe, Germany
| | - Martin Wegener
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
- Institute of Applied Physics (APH), Karlsruhe Institute of Technology (KIT), 76128, Karlsruhe, Germany
| | - Christopher Barner-Kowollik
- School of Chemistry and Physics, Centre for Materials Science, Queensland University of Technology (QUT), 2 George Street, Brisbane, Queensland, 4000, Australia
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
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7
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Gugulothu S, Asthana S, Homer-Vanniasinkam S, Chatterjee K. Trends in Photopolymerizable Bioinks for 3D Bioprinting of Tumor Models. JACS AU 2023; 3:2086-2106. [PMID: 37654587 PMCID: PMC10466332 DOI: 10.1021/jacsau.3c00281] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/01/2023] [Revised: 07/25/2023] [Accepted: 07/26/2023] [Indexed: 09/02/2023]
Abstract
Three-dimensional (3D) bioprinting technologies involving photopolymerizable bioinks (PBs) have attracted enormous attention in recent times owing to their ability to recreate complex structures with high resolution, mechanical stability, and favorable printing conditions that are suited for encapsulating cells. 3D bioprinted tissue constructs involving PBs can offer better insights into the tumor microenvironment and offer platforms for drug screening to advance cancer research. These bioinks enable the incorporation of physiologically relevant cell densities, tissue-mimetic stiffness, and vascularized channels and biochemical gradients in the 3D tumor models, unlike conventional two-dimensional (2D) cultures or other 3D scaffold fabrication technologies. In this perspective, we present the emerging techniques of 3D bioprinting using PBs in the context of cancer research, with a specific focus on the efforts to recapitulate the complexity of the tumor microenvironment. We describe printing approaches and various PB formulations compatible with these techniques along with recent attempts to bioprint 3D tumor models for studying migration and metastasis, cell-cell interactions, cell-extracellular matrix interactions, and drug screening relevant to cancer. We discuss the limitations and identify unexplored opportunities in this field for clinical and commercial translation of these emerging technologies.
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Affiliation(s)
- Sriram
Bharath Gugulothu
- Department
of Materials Engineering Indian Institute of Science, Bangalore, Karnataka 560012, India
| | - Sonal Asthana
- Department
of Materials Engineering Indian Institute of Science, Bangalore, Karnataka 560012, India
- Department
of Hepatobiliary and Multi-Organ Transplantation Surgery, Aster CMI Hospital, Bangalore 560024, India
| | - Shervanthi Homer-Vanniasinkam
- Department
of Materials Engineering Indian Institute of Science, Bangalore, Karnataka 560012, India
- Department
of Mechanical Engineering and Division of Surgery, University College, London WC1E 7JE, U.K.
| | - Kaushik Chatterjee
- Department
of Materials Engineering Indian Institute of Science, Bangalore, Karnataka 560012, India
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8
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Zeppuhar AN, Falvey DE. Lamp vs Laser: A Visible Light Photoinitiator That Promotes Radical Polymerization at Low Intensities and Cationic Polymerization at High Intensities. J Org Chem 2023. [PMID: 37418315 DOI: 10.1021/acs.joc.3c00636] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 07/09/2023]
Abstract
A visible light absorbing anthraquinone derivative 1-tosyloxy-2-methoxy-9,10-anthraquinone (QT) mediates both cationic and radical polymerizations depending on the intensity of visible light used. A previous study showed that this initiator generates para-toluenesulfonic acid through a stepwise, two-photon excitation mechanism. Thus, under high-intensity irradiation, QT generates acid in sufficient quantities to catalyze the cationic ring-opening polymerization of lactones. However, under low-intensity (lamp) conditions, the two-photon process is negligible, and QT photooxidizes DMSO, generating methyl radicals which initiate the RAFT polymerization of acrylates. This dual capability was utilized to switch between radical and cationic polymerizations to synthesize a copolymer using a one-pot procedure.
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Affiliation(s)
- Andrea N Zeppuhar
- Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742, United States
| | - Daniel E Falvey
- Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742, United States
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9
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Cao C, Shen X, Chen S, He M, Wang H, Ding C, Zhu D, Dong J, Chen H, Huang N, Kuang C, Jin M, Liu X. High-Precision and Rapid Direct Laser Writing Using a Liquid Two-Photon Polymerization Initiator. ACS APPLIED MATERIALS & INTERFACES 2023. [PMID: 37316963 DOI: 10.1021/acsami.3c06601] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Two-photon polymerization based direct laser writing (DLW) is an emerging micronano 3D fabrication technology wherein two-photon initiators (TPIs) are a key component in photoresists. Upon exposure to a femtosecond laser, TPIs can trigger the polymerization reaction, leading to the solidification of photoresists. In other words, TPIs directly determine the rate of polymerization, physicochemical properties of polymers, and even the photolithography feature size. However, they generally exhibit extremely poor solubility in photoresist systems, severely inhibiting their application in DLW. To break through this bottleneck, we propose a strategy to prepare TPIs as liquids via molecular design. The maximum weight fraction of the as-prepared liquid TPI in photoresist significantly increases to 2.0 wt %, which is several times higher than that of commercial 7-diethylamino-3-thenoylcoumarin (DETC). Meanwhile, this liquid TPI also exhibits an excellent absorption cross section (64 GM), allowing it to absorb femtosecond laser efficiently and generate abundant active species to initiate polymerization. Remarkably, the respective minimum feature sizes of line arrays and suspended lines are 47 and 20 nm, which are comparable to that of the-state-of-the-art electron beam lithography. Besides, the liquid TPI can be utilized to fabricate various high-quality 3D microstructures and manufacture large-area 2D devices at a considerable writing speed (1.045 m s-1). Therefore, the liquid TPI would be one of the promising initiators for micronano fabrication technology and pave the way for future development of DLW.
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Affiliation(s)
- Chun Cao
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Xiaoming Shen
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Shixiong Chen
- Department of Polymer Materials, School of Materials Science and Engineering, Tongji University, 4800 Caoan Road, Shanghai 201804, P. R. China
| | - Minfei He
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China
| | - Hongqing Wang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Chenliang Ding
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Dazhao Zhu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Jianjie Dong
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Hongzheng Chen
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China
| | - Ning Huang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China
| | - Cuifang Kuang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China
| | - Ming Jin
- Department of Polymer Materials, School of Materials Science and Engineering, Tongji University, 4800 Caoan Road, Shanghai 201804, P. R. China
| | - Xu Liu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China
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10
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Hua JG, Ren H, Huang J, Luan ML, Chen QD, Juodkazis S, Sun HB. Laser-Induced Cavitation-Assisted True 3D Nano-Sculpturing of Hard Materials. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2023; 19:e2207968. [PMID: 36899492 DOI: 10.1002/smll.202207968] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/07/2023] [Revised: 02/16/2023] [Indexed: 06/15/2023]
Abstract
Femtosecond lasers enable flexible and thermal-damage-free ablation of solid materials and are expected to play a critical role in high-precision cutting, drilling, and shaping of electronic chips, display panels, and industrial parts. Although the potential applications are theoretically predicted, true 3D nano-sculpturing of solids such as glasses and crystals, has not yet been demonstrated, owing to the technical challenge of negative cumulative effects of surface changes and debris accumulation on the delivery of laser pulses and subsequent material removal during direct-write ablation. Here, a femtosecond laser-induced cavitation-assisted true 3D nano-sculpturing technique based on the ingenious combination of cavitation dynamics and backside ablation is proposed to achieve stable clear-field point-by-point material removal in real time for precise 3D subtractive fabrication on various difficult-to-process materials. As a result, 3D devices including free-form silica lenses, micro-statue with vivid facial features, and rotatable sapphire micro-mechanical turbine, all with surface roughness less than 10 nm are readily produced. The true 3D processing capability can immediately enable novel structural and functional micro-nano optics and non-silicon micro-electro-mechanical systems based on various hard solids.
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Affiliation(s)
- Jian-Guan Hua
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China
| | - Hang Ren
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China
| | - Jiatai Huang
- State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing, 100084, China
| | - Mei-Ling Luan
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China
| | - Qi-Dai Chen
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China
| | - Saulius Juodkazis
- Optical Sciences Centre and ARC Training Centre in Surface Engineering for Advanced Materials (SEAM), School of Science, Computing and Engineering Technologies, Swinburne University of Technology, Hawthorn, VIC 3122, Australia
- Melbourne Centre for Nanofabrication, ANFF, 151 Wellington Road, Clayton, VIC 3168, Australia
| | - Hong-Bo Sun
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China
- State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing, 100084, China
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11
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O'Halloran S, Pandit A, Heise A, Kellett A. Two-Photon Polymerization: Fundamentals, Materials, and Chemical Modification Strategies. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2023; 10:e2204072. [PMID: 36585380 PMCID: PMC9982557 DOI: 10.1002/advs.202204072] [Citation(s) in RCA: 11] [Impact Index Per Article: 11.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 07/15/2022] [Revised: 11/28/2022] [Indexed: 06/17/2023]
Abstract
Two-photon polymerization (TPP) has become a premier state-of-the-art method for microscale fabrication of bespoke polymeric devices and surfaces. With applications ranging from the production of optical, drug delivery, tissue engineering, and microfluidic devices, TPP has grown immensely in the past two decades. Significantly, the field has expanded from standard acrylate- and epoxy-based photoresists to custom formulated monomers designed to change the hydrophilicity, surface chemistry, mechanical properties, and more of the resulting structures. This review explains the essentials of TPP, from its initial conception through to standard operating principles and advanced chemical modification strategies for TPP materials. At the outset, the fundamental chemistries of radical and cationic polymerization are described, along with strategies used to tailor mechanical and functional properties. This review then describes TPP systems and introduces an array of commonly used photoresists including hard polyacrylic resins, soft hydrogel acrylic esters, epoxides, and organic/inorganic hybrid materials. Specific examples of each class-including chemically modified photoresists-are described to inform the understanding of their applications to the fields of tissue-engineering scaffolds, micromedical, optical, and drug delivery devices.
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Affiliation(s)
- Seán O'Halloran
- CÚRAMthe SFI Research Centre for Medical DevicesSchool of Chemical SciencesDublin City UniversityGlasnevinDublin 9Ireland
| | - Abhay Pandit
- CÚRAMthe SFI Research Centre for Medical DevicesUniversity of GalwayGalwayH91 W2TYIreland
| | - Andreas Heise
- RCSIUniversity of Medicine and Health SciencesDepartment of Chemistry123 St. Stephens GreenDublinDublin 2Ireland
- Advanced Materials and Bioengineering Research Centre (AMBER)RCSI University of Medicine and Health Sciences and Trinity College DublinDublinDublin 2Ireland
- CÚRAMthe SFI Research Centre for Medical DevicesRCSI University of Medicine and Health SciencesDublin and National University of Ireland GalwayGalwayH91 W2TYIreland
| | - Andrew Kellett
- CÚRAMthe SFI Research Centre for Medical DevicesSchool of Chemical SciencesDublin City UniversityGlasnevinDublin 9Ireland
- SSPCthe SFI Research Centre for PharmaceuticalsDublin City UniversityGlasnevinDublinDublin 9Ireland
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The Use of Graphene and Its Derivatives for the Development of Polymer Matrix Composites by Stereolithographic 3D Printing. APPLIED SCIENCES-BASEL 2022. [DOI: 10.3390/app12073521] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/07/2023]
Abstract
Significant advances in graphene-based materials have facilitated the development of various composites structures in a diverse range of industry sectors. At present, the preparation of graphene-added materials is mainly developed through traditional methods. However, in recent years, additive manufacturing emerged as a promising approach that enables the printing of complex objects in a layer-by-layer fashion, without the need for moulds or machining equipment. This paper reviews the most recent reports on graphene-based photopolymerizable resins developed for stereolithography (SLA), with particular consideration for medical applications. The characteristics of the SLA technology, the most suitable raw materials and formulations and the properties of final 3D products are described. Throughout, a specific focus is placed on the mechanical properties and biocompatibility of the final 3D-printed object. Finally, remaining challenges and future directions are also discussed.
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