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Pauly S, Schulz A, Walker M, Gorath M, Baumgärtner K, Tovar GEM. Modeling and Experimental Study of a Remote Microwave Plasma Source for High‐Rate Etching. CHEM-ING-TECH 2022. [DOI: 10.1002/cite.202100144] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Affiliation(s)
- Steffen Pauly
- University of Stuttgart Institute of Interfacial Process Engineering and Plasma Technology (IGVP) Pfaffenwaldring 31 70569 Stuttgart Germany
| | - Andreas Schulz
- University of Stuttgart Institute of Interfacial Process Engineering and Plasma Technology (IGVP) Pfaffenwaldring 31 70569 Stuttgart Germany
| | - Matthias Walker
- University of Stuttgart Institute of Interfacial Process Engineering and Plasma Technology (IGVP) Pfaffenwaldring 31 70569 Stuttgart Germany
| | - Moritz Gorath
- MUEGGE GmbH Hochstraße 4–6 64385 Reichelsheim Germany
| | | | - Günter E. M. Tovar
- University of Stuttgart Institute of Interfacial Process Engineering and Plasma Technology (IGVP) Pfaffenwaldring 31 70569 Stuttgart Germany
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