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Farokh Payam A, Passian A. Imaging beyond the surface region: Probing hidden materials via atomic force microscopy. SCIENCE ADVANCES 2023; 9:eadg8292. [PMID: 37379392 DOI: 10.1126/sciadv.adg8292] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/24/2023] [Accepted: 05/24/2023] [Indexed: 06/30/2023]
Abstract
Probing material properties at surfaces down to the single-particle scale of atoms and molecules has been achieved, but high-resolution subsurface imaging remains a nanometrology challenge due to electromagnetic and acoustic dispersion and diffraction. The atomically sharp probe used in scanning probe microscopy (SPM) has broken these limits at surfaces. Subsurface imaging is possible under certain physical, chemical, electrical, and thermal gradients present in the material. Of all the SPM techniques, atomic force microscopy has entertained unique opportunities for nondestructive and label-free measurements. Here, we explore the physics of the subsurface imaging problem and the emerging solutions that offer exceptional potential for visualization. We discuss materials science, electronics, biology, polymer and composite sciences, and emerging quantum sensing and quantum bio-imaging applications. The perspectives and prospects of subsurface techniques are presented to stimulate further work toward enabling noninvasive high spatial and spectral resolution investigation of materials including meta- and quantum materials.
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Affiliation(s)
- Amir Farokh Payam
- Nanotechnology and Integrated Bioengineering Centre, School of Engineering, Ulster University, Belfast, UK
| | - Ali Passian
- Quantum Computing and Sensing, Oak Ridge National Laboratory, Oak Ridge, TN 37830, USA
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Measurement of Sub-Surface Microstructures Based on a Developed Ultrasonic Atomic Force Microscopy. APPLIED SCIENCES-BASEL 2022. [DOI: 10.3390/app12115460] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
Abstract
Accurate and non-destructive technology for detection of subsurface defect has become a key requirement with the emergence of various ultra-precision machining technologies and the application of ultra-precision components. The combination of acoustic technique for sub-surface detection and atomic force microscopy (AFM) for measurement with high resolution is a potential method for studying the subsurface structure of workpiece. For this purpose, contact-resonance AFM (CR-AFM) is a typical technique. In this paper, a CR-AFM system with a different principle from commercially available instruments is set up and used for the detection of sub-surface Si samples with grating structures and covered by different thickness of highly oriented pyrolytic graphite (HOPG). The influence of subsurface burial depth on the detection capability is studied by simulations and experiments. The thickest HOPG film allowing for sub-surface measurement by the proposed method is verified to be about 30 μm, which is much larger than the feature size of the subsurface microstructure. The manuscript introduces the difference between this subsurface topography measurement principle and the commercially available AFM measurement principle, and analyzes its advantages and disadvantages. The experimental results demonstrates that the technique has the capability to reveal sub-surface microstructures with relatively large buried depth and is potential for engineering application in ultra-precision technologies.
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Zhao Y, Liu Y, Wang Z, Wang L, Li L, Hou F, Song Z, Weng Z. Study of SU-8 photoresist cross-linking process by atomic force acoustic microscopy. J Microsc 2019; 276:136-144. [PMID: 31769508 DOI: 10.1111/jmi.12848] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/30/2019] [Revised: 11/18/2019] [Accepted: 11/21/2019] [Indexed: 11/30/2022]
Abstract
In this paper, a method is presented to detect the different phases of epoxy cross-linking process and the subsurface structures of SU-8 thin films by atomic force acoustic microscopy (AFAM). The AFAM imaging of SU-8 thin films was investigated under different exposure and bake conditions. Optimized conditions were obtained for the cross-linking of SU-8 thin film at the exposure does of eight laser pulses with the laser fluence 10 mJ cm-2 per pulse and the post exposure bake (PEB) time at 90 s. The subsurface structures of undeveloped SU-8 thin films were visible in the AFAM images. This method provides an effective and low-cost way for the determination of different phases of epoxy cross-linking process in nanostructured compounds, for the non-destructive testing of subsurface defects, and for the evaluation of the quality of patterned structures.
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Affiliation(s)
- Y Zhao
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun, China.,International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun, China
| | - Y Liu
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun, China.,International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun, China
| | - Z Wang
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun, China.,International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun, China.,JR3CN & IRAC, University of Bedfordshire, Luton, UK
| | - L Wang
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun, China.,International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun, China
| | - L Li
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun, China.,International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun, China
| | - F Hou
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun, China.,International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun, China
| | - Z Song
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun, China.,International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun, China
| | - Z Weng
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun, China.,International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun, China
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Liu Y, Li L, Chen X, Wang Y, Liu MN, Yan J, Cao L, Wang L, Wang ZB. Atomic force acoustic microscopy reveals the influence of substrate stiffness and topography on cell behavior. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2019; 10:2329-2337. [PMID: 31886109 PMCID: PMC6902897 DOI: 10.3762/bjnano.10.223] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/15/2019] [Accepted: 10/24/2019] [Indexed: 05/15/2023]
Abstract
The stiffness and the topography of the substrate at the cell-substrate interface are two key properties influencing cell behavior. In this paper, atomic force acoustic microscopy (AFAM) is used to investigate the influence of substrate stiffness and substrate topography on the responses of L929 fibroblasts. This combined nondestructive technique is able to characterize materials at high lateral resolution. To produce substrates of tunable stiffness and topography, we imprint nanostripe patterns on undeveloped and developed SU-8 photoresist films using electron-beam lithography (EBL). Elastic deformations of the substrate surfaces and the cells are revealed by AFAM. Our results show that AFAM is capable of imaging surface elastic deformations. By immunofluorescence experiments, we find that the L929 cells significantly elongate on the patterned stiffness substrate, whereas the elasticity of the pattern has only little effect on the spreading of the L929 cells. The influence of the topography pattern on the cell alignment and morphology is even more pronounced leading to an arrangement of the cells along the nanostripe pattern. Our method is useful for the quantitative characterization of cell-substrate interactions and provides guidance for the tissue regeneration therapy in biomedicine.
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Affiliation(s)
- Yan Liu
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, China
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, China
- Computer Department, Changchun Medical College, Changchun 130031, China
| | - Li Li
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, China
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, China
| | - Xing Chen
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, China
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, China
| | - Ying Wang
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, China
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, China
| | - Meng-Nan Liu
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, China
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, China
| | - Jin Yan
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, China
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, China
| | - Liang Cao
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, China
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, China
| | - Lu Wang
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, China
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, China
| | - Zuo-Bin Wang
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, China
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, China
- JR3CN & IRAC, University of Bedfordshire, Luton LU1 3JU, UK
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Subsurface imaging of rigid particles buried in a polymer matrix based on atomic force microscopy mechanical sensing. Ultramicroscopy 2019; 207:112832. [PMID: 31473533 DOI: 10.1016/j.ultramic.2019.112832] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/19/2018] [Revised: 07/12/2019] [Accepted: 08/23/2019] [Indexed: 11/22/2022]
Abstract
Several subsurface imaging methods based on atomic force microscopy (AFM) linear nanomechanical mapping, namely contact resonance (CR), bimodal and harmonic AFMs, are investigated and compared. Their respective subsurface detection capability is estimated and evaluated on a model specimen, which is prepared by embedding SiO2 microparticles in a PDMS elastomer. The measured CR frequency, bimodal and harmonic amplitudes are related to local mechanical properties by analyzing cantilever dynamics and further linked to subsurface depths of the particles by finite element analysis. The maximum detectable depths are obtained from the apparent particle diameters in subsurface image channels via employing a simple geometrical model. Under common experimental settings, results demonstrate that the depth limits reach up to about 812 nm, 212 nm and 127 nm for CR, bimodal and harmonic AFM modes, respectively. The depth sensitivity can be tuned and optimized by using either different cantilever eigenmodes in CR-AFM or spectroscopy analysis in bimodal and harmonic AFMs. The three imaging methods have their own suitable application situations. The comparisons can advance a further step into understanding the subsurface image contrast via AFM mechanical sensing.
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Wang W, Ma C, Chen Y, Zheng L, Liu H, Chu J. Subsurface imaging of flexible circuits via contact resonance atomic force microscopy. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2019; 10:1636-1647. [PMID: 31467825 PMCID: PMC6693404 DOI: 10.3762/bjnano.10.159] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 04/09/2019] [Accepted: 07/15/2019] [Indexed: 06/10/2023]
Abstract
Subsurface imaging of Au circuit structures embedded in poly(methyl methacrylate) (PMMA) thin films with a cover thickness ranging from 52 to 653 nm was carried out by using contact resonance atomic force microscopy (CR-AFM). The mechanical difference of the embedded metal layer leads to an obvious CR-AFM frequency shift and therefore its unambiguous differentiation from the polymer matrix. The contact stiffness contrast, determined from the tracked frequency images, was employed for quantitative evaluation. The influence of various parameter settings and sample properties was systematically investigated by combining experimental results with theoretical analysis from finite element simulations. The results show that imaging with a softer cantilever and a lower eigenmode will improve the subsurface contrast. The experimental results and theoretical calculations provide a guide to optimizing parameter settings for the nondestructive diagnosis of flexible circuits. Defect detection of the embedded circuit pattern was also carried out, which indicates the capability of imaging tiny subsurface structures smaller than 100 nm by using CR-AFM.
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Affiliation(s)
- Wenting Wang
- Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei 230026, Anhui, China
| | - Chengfu Ma
- Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei 230026, Anhui, China
| | - Yuhang Chen
- Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei 230026, Anhui, China
| | - Lei Zheng
- The 38th Research Institute of China Electronics Technology Group Corporation, Hefei 230088, Anhui, China
| | - Huarong Liu
- The 38th Research Institute of China Electronics Technology Group Corporation, Hefei 230088, Anhui, China
| | - Jiaru Chu
- Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei 230026, Anhui, China
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Yip K, Cui T, Sun Y, Filleter T. Investigating the detection limit of subsurface holes under graphite with atomic force acoustic microscopy. NANOSCALE 2019; 11:10961-10967. [PMID: 31140525 DOI: 10.1039/c9nr03730f] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
The subsurface imaging capabilities of atomic force acoustic microscopy (AFAM) was investigated by imaging graphite flakes suspended over holes in a silicon dioxide substrate. The graphite thickness and the hole size were varied to determine the detection limit on the maximum graphite thickness and the smallest detectable hole size. Parameters including operating frequency, eigenmode, contact force, and cantilever stiffness were investigated for their influence of defect detection. AFAM was reliably able to detect 2.5 μm diameter holes through a maximum graphite thickness of 570 nm and sub 100 nm holes through 140 nm of graphite. The smallest detectable defect size was a 50 nm hole covered by an 80 nm thick graphite flake. Increasing the graphite thickness and decreasing the hole size both resulted in a decrease in subsurface contrast. However, the non-linear trend observed from increasing the graphite thickness indicates thickness has a greater effect on subsurface defect detection than variations in defect size. Through investigating various parameters, we have found certain cases to increase the observed contrast of the embedded subsurface holes, however the smallest detectable defect size remained the same. This technique's ability to reveal sub 100 nm defects buried under graphite has previously only been demonstrated in much softer polymer systems.
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Affiliation(s)
- Kevin Yip
- Department of Mechanical and Industrial Engineering, University of Toronto, Toronto, ON M5S 3G8, Canada.
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Soliman M, Ding Y, Tetard L. Nanoscale subsurface imaging. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2017; 29:173001. [PMID: 28140334 DOI: 10.1088/1361-648x/aa5b4a] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
The ability to probe structures and functional properties of complex systems at the nanoscale, both at their surface and in their volume, has drawn substantial attention in recent years. Besides detecting heterogeneities, cracks and defects below the surface, more advanced explorations of chemical or electrical properties are of great interest. In this article, we review some approaches developed to explore heterogeneities below the surface, including recent progress in the different aspects of metrology in optics, electron microscopy, and scanning probe microscopy. We discuss the principle and mechanisms of image formation associated with each technique, including data acquisition, data analysis and modeling for nanoscale structural and functional imaging. We highlight the advances based on atomic force microscopy (AFM). Our discussion first introduces methods providing structural information of the buried structures, such as position in the volume and geometry. Next we present how functional properties including conductivity, capacitance, and composition can be extracted from the modalities available to date and how they could eventually enable tomography reconstructions of systems such as overlay structures in transistors or living systems. Finally we propose a perspective regarding the outstanding challenges and needs to push the field forward.
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Affiliation(s)
- M Soliman
- NanoScience Technology Center, 12424 Research Parkway, University of Central Florida, Orlando, FL, 32826, United States of America. Materials Science and Engineering, 12760 Pegasus Drive, University of Central Florida, Orlando, FL, 32816, United States of America
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