Syntheses and Molecular Structures of Liquid Pyrophoric Hydridosilanes

Challenges in the Synthesis and Processing of Hydrosilanes as Precursors for Silicon Deposition

Hydrosilanes are highly attractive compounds, which can be processed as liquids with printing technology to amorphous silicon films on nearly any solid substrate. The silicon layers can be processed for electronic devices like transistors or thin-film solar cells. The endothermic character of hydrosilanes with their positive enthalpies of formation results in favorable properties for processing. The larger the molecules, the lower their decomposition temperature and the higher their photoactivity. Cyclic hydrosilanes such as cyclopentasilane and cyclohexasilane can be easily deposited. The branched neopentasilane is more difficult to deposit but yields better-quality films after processing. The key challenge is the complex synthesis of the precursors and the hydrosilanes. The available preparative methods are presented in this review and their advantages and disadvantages are evaluated. The following synthesis methods are presented and discussed in this article: Wurtz coupling and other reductive coupling processes, dehydrogenative coupling of silanes, plasma synthesis of chlorinated polysilanes, amine- or chloride-induced disproportionations, and transformation of monosilane to higher silanes. Plasma synthesis is already carried out today as a continuous industrial process. The most effective synthesis methods in the laboratory are currently amine- and chloride-induced disproportionations. There is a great need to further optimize the syntheses of hydrosilanes and to develop new simple synthesis variants.

Regioselective Derivatization of Silylated [20]Silafulleranes

Silafulleranes with endohedral Cl^- ions are a unique, scarcely explored class of structurally well-defined silicon clusters and host-guest complexes. Herein, we report regioselective derivatization reactions on the siladodecahedrane [nBu₄N][Cl@Si₂₀(SiCl₃)₁₂Cl₈] ([nBu₄N][1]), which has its cluster surface decorated with 12 SiCl₃ and 8 Cl substituents in perfect T_h symmetry. The room-temperature reaction of [nBu₄N][1] with excess iBu₂AlH in ortho-difluorobenzene (oDFB) furnishes perhydrogenated [nBu₄N][Cl@Si₂₀(SiH₃)₁₂H₈] ([nBu₄N][2]) in 50% yield; the non-pyrophoric [2]^- is the largest structurally authenticated (by X-ray diffraction) hydridosilane known to date. A simple switch from pure oDFB to an oDFB/Et₂O solvent mixture suppresses core hydrogenation and results in the formation of [nBu₄N][Cl@Si₂₀(SiH₃)₁₂Cl₈] ([nBu₄N][3]). In addition to the exhaustive Cl/H exchange at all 44 Si-Cl bonds of [1]^- and the regioselective 36-fold silyl group hydrogenation, we achieved the simultaneous introduction of Me substituents at all 8 SiCl vertices along with the conversion of all 12 SiCl₃ to SiH₃ groups by treating [nBu₄N][1] with Me₂AlH/Me₃Al in oDFB ([nBu₄N][Cl@Si₂₀(SiH₃)₁₂Me₈], [nBu₄N][4]; 73%). Quantum-chemical free-energy calculations find an S_N2-Si-type hydrogenation of the exohedral SiCl₃ moieties in [1]^- (trigonal-bipyramidal intermediate) slightly preferred over metathesis-like S_Ni-Si substitutions (four-membered transition state). Cage hydrogenation likely occurs via S_Ni-Si processes. The experimentally demonstrated influence of an Et₂O co-solvent, which drastically increases the respective reaction barriers, is attributed to the increased stability of the resulting iBu₂AlH-OEt₂ adduct and its higher steric bulk compared to free iBu₂AlH.

Molecular Main Group Metal Hydrides

This review serves to document advances in the synthesis, versatile bonding, and reactivity of molecular main group metal hydrides within Groups 1, 2, and 12-16. Particular attention will be given to the emerging use of said hydrides in the rapidly expanding field of Main Group element-mediated catalysis. While this review is comprehensive in nature, focus will be given to research appearing in the open literature since 2001.

(3,5-Dimethyl-1H-pyrazol-1-yl)trimethylsilane

At 1.782 (2) Å, the Si—N bond is substanti­ally longer than is found in comparable (3,5-di­methyl­pyrazol­yl)silanes. The tri­methyl­silyl group adopts a staggered conformation with respect to the planar 3,5-di­methyl­pyrazolyl unit. C—H⋯N hydrogen bonds between neighboring mol­ecules form a strand of mol­ecules along the b-axis direction.

The title compound, C₈H₁₆N₂Si, crystallizes in the the ortho­rhom­bic space group P2₁2₁2₁ with one mol­ecule in the asymmetric unit. The Si—N bond is 1.782 (2) Å, which is substanti­ally longer than is found in comparable (3,5-di­methyl­pyrazol­yl)silanes. The tri­methyl­silyl group adopts a staggered conformation with respect to the planar 3,5-di­methyl­pyrazolyl unit. C—H⋯N hydrogen bonds between neighboring mol­ecules form a strand of mol­ecules along the b-axis direction.