The morphology and structure of PS-b-P4VP block copolymer films by solvent annealing: effect of the solvent parameter

Amplified EQCM-D detection of extracellular vesicles using 2D gold nanostructured arrays fabricated by block copolymer self-assembly

Extracellular vesicles (EVs) are routinely released from nearly all cell types as transport vehicles and for cell communication. Crucially, they contain biomolecular content for the identification of health and disease states that can be detected from readily accessible physiological fluids, including urine, plasma, or saliva. Despite their clinical utility within noninvasive diagnostic platforms such as liquid biopsies, the currently available portfolio of analytical approaches are challenged by EV heterogeneity in size and composition, as well as the complexity of native biofluids. Quartz crystal microbalance with dissipation monitoring (QCM-D) has recently emerged as a powerful alternative for the phenotypic detection of EVs, offering multiple modes of analyte discrimination by frequency and dissipation. While providing rich data for sensor development, further progress is required to reduce detection limits and fully exploit the technique's potential within biosensing. Herein, we investigate the impact of nanostructuring the sensor electrode surface for enhancing its detection capabilities. We employ self-assembly of the block copolymer polystyrene-block-poly(4-vinylpyridine) to create well defined 2D gold islands via selective impregnation of the pyridine domain with gold precursors and subsequent removal of the template. When matched to the EV length scale, we find a 4-fold improvement in sensitivity despite a 4-fold reduction in area for analyte and ligand anchoring in comparison to a flat sensor surface. Creation of tailored and confined sensing regions interspersed by non-binding silica provides optimal spatial orientation for EV capture with reduced steric effects and negative cooperativity of grafted antibodies, offering a promising route for facilitated binding and enhanced performance of sensor platforms.

Formation of n-Hexane-in-DMF Nonaqueous Pickering Emulsions: ABC Triblock Worms versus AB Diblock Worms

Nonaqueous Pickering emulsions exhibit promising applications in many industrial areas but have been relatively less studied in the past. In this study, n-hexane-in-DMF nonaqueous Pickering emulsions stabilized by core cross-linked copolymer worms with mixed shells are demonstrated for the first time. Core cross-linked copolymer worms with mixed shells were prepared by seeded reversible addition-fragmentation chain transfer (RAFT) quasi-solution polymerization. Specifically, polystyrene-poly(4-vinylpyridine) (PS-P4VP) diblock copolymer worms were first prepared via RAFT-mediated dispersion polymerization in toluene under the given conditions using PS as both the macro-CTA and the stabilizer block. After the chemical cross-linking of P4VP cores, PS-P4VP diblock copolymer worms were chain-extended with LMA in DMF/toluene (1:9, weight ratio) mixed solvents, producing core cross-linked PS-P4VP-PLMA worms with PS/PLMA mixed shells. The as-prepared core cross-linked PS-P4VP-PLMA worms with mixed PS/PLMA shells were further utilized as Pickering emulsifiers for the generation of nonaqueous n-hexane-in-DMF Pickering emulsions. The emulsifying performances of mixed-shell copolymer worms were compared with those of their spherical and linear analogues with entirely identical chemical compositions as well as PS-P4VP diblock copolymer worm precursors, respectively.

Self-Assembled Fluorescent Block Copolymer Micelles with Responsive Emission

Responsive fluorescent materials offer a high potential for sensing and (bio-)imaging applications. To investigate new concepts for such materials and to broaden their applicability, the previously reported non-fluorescent zinc(II) complex [Zn(L)] that shows coordination-induced turn-on emission was encapsulated into a family of non-fluorescent polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) diblock copolymer micelles leading to brightly emissive materials. Coordination-induced turn-on emission upon incorporation and ligation of the [Zn(L)] in the P4VP core outperform parent [Zn(L)] in pyridine solution with respect to lifetimes, quantum yields, and temperature resistance. The quantum yield can be easily tuned by tailoring the selectivity of the employed solvent or solvent mixture and, thus, the tendency of the PS-b-P4VP diblock copolymers to self-assemble into micelles. A medium-dependent off-on sensor upon micelle formation could be established by suppression of non-micelle-borne emission background pertinent to chloroform through controlled acidification indicating an additional pH-dependent process.

Realizing shape and size control for the synthesis of coordination polymer nanoparticles templated by diblock copolymer micelles

The combination of polymers with nanoparticles offers the possibility to obtain customizable composite materials with additional properties such as sensing or bistability provided by a switchable spin crossover (SCO) core. For all applications, a precise control over size and shape of the nanomaterial is highly important as it will significantly influence its final properties. By confined synthesis of iron(II) SCO coordination polymers within the P4VP cores of polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) micelles in THF we are able to control the size and also the shape of the resulting SCO nanocomposite particles by the composition of the PS-b-P4VP diblock copolymers (dBCPs) and the amount of complex employed. For the nanocomposite samples with the highest P4VP content, a morphological transition from spherical nanoparticles to worm-like structures was observed with increasing coordination polymer content, which can be explained with the impact of complex coordination on the self-assembly of the dBCP. Furthermore, the SCO nanocomposites showed transition temperatures of T_1/2 = 217 K, up to 27 K wide hysteresis loops and a decrease of the residual high-spin fraction down to γ_HS = 14% in the worm-like structures, as determined by magnetic susceptibility measurements and Mössbauer spectroscopy. Thus, SCO properties close or even better (hysteresis) to those of the bulk material can be obtained and furthermore tuned through size and shape control realized by tailoring the block length ratio of the PS-b-P4VP dBCPs.

Sequential Infiltration Synthesis into Maltoheptaose and Poly(styrene): Implications for Sub-10 nm Pattern Transfer

Vapor phase infiltration into a self-assembled block copolymer (BCP) to create a hybrid material in one of the constituent blocks can enhance the etch selectivity for pattern transfer. Multiple pulse infiltration into carbohydrate-based high-χ BCP has previously been shown to enable sub-10 nm feature pattern transfer. By optimizing the amount of infiltrated material, the etch selectivity should be further improved. Here, an investigation of semi-static sequential infiltration synthesis of trimethyl aluminum (TMA) and water into maltoheptaose (MH) films, and into hydroxyl-terminated poly(styrene) (PS-OH) films, was performed, by varying the process parameters temperature, precursor pulse duration, and precursor exposure length. It was found that, by decreasing the exposure time from 100 to 20 s, the volumetric percentage on included pure Al2O3 in MH could be increased from 2 to 40 vol% at the expense of a decreased infiltration depth. Furthermore, the degree of infiltration was minimally affected by temperature between 64 and 100 °C. Shorter precursor pulse durations of 10 ms TMA and 5 ms water, as well as longer precursor pulses of 75 ms TMA and 45 ms water, were both shown to promote a higher degree, 40 vol%, of infiltrated alumina in MH. As proof of concept, 12 nm pitch pattern transfer into silicon was demonstrated using the method and can be concluded to be one of few studies showing pattern transfer at such small pitch. These results are expected to be of use for further understanding of the mechanisms involved in sequential infiltration synthesis of TMA/water into MH, and for further optimization of carbohydrate-based etch masks for sub-10 nm pattern transfer. Enabling techniques for high aspect ratio pattern transfer at the single nanometer scale could be of high interest, e.g., in the high-end transistor industry.

Enhanced Ordering of Block Copolymer Thin Films upon Addition of Magnetic Nanoparticles

The influence of magnetite nanoparticles coated with poly(acrylic acid) (Fe₃O₄@PAA NPs) on the organization of block copolymer thin films via a self-assembly process was investigated. Polystyrene-b-poly(4-vinylpyridine) films were obtained by the dip-coating method and thoroughly examined by X-ray reflectivity, transmission electron microscopy, atomic force microscopy, and grazing incidence small-angle scattering. Magnetic properties of the films were probed via superconducting quantum interference device (SQUID) magnetometry. It was demonstrated that due to the hydrogen bonding between P4VP and PAA, the Fe₃O₄@PAA NPs segregate selectively inside P4VP domains, enhancing the microphase separation process. This in turn, together with employing carefully optimized dip-coating parameters, results in the formation of hybrid thin films with highly ordered nanostructures. The addition of Fe₃O₄@PAA nanoparticles does not change the average interdomain spacing in the film lateral nanostructure. Moreover, it was shown that the nanoparticles can easily be removed to obtain well-ordered nanoporous templates.

Large-Grained Cylindrical Block Copolymer Morphologies by One-Step Room-Temperature Casting

We report a facile method of ordering block copolymer (BCP) morphologies in which the conventional two-step casting and annealing steps are replaced by a single-step process where microphase separation and grain coarsening are seamlessly integrated within the casting protocol. This is achieved by slowing down solvent evaporation during casting by introducing a nonvolatile solvent into the BCP casting solution that effectively prolongs the duration of the grain-growth phase. We demonstrate the utility of this solvent evaporation annealing (SEA) method by producing well-ordered large-molecular-weight BCP thin films in a total processing time shorter than 3 min without resorting to any extra laboratory equipment other than a basic casting device, i.e., spin- or blade-coater. By analyzing the morphologies of the quenched samples, we identify a relatively narrow range of polymer concentration in the wet film, just above the order-disorder concentration, to be critical for obtaining large-grained morphologies. This finding is corroborated by the analysis of the grain-growth kinetics of horizontally oriented cylindrical domains where relatively large growth exponents (1/2) are observed, indicative of a more rapid defect-annihilation mechanism in the concentrated BCP solution than in thermally annealed BCP melts. Furthermore, the analysis of temperature-resolved kinetics data allows us to calculate the Arrhenius activation energy of the grain coarsening in this one-step BCP ordering process.

Conductive Thin Films over Large Areas by Supramolecular Self-Assembly

We report a "one-step" method for preparing conductive thin films with cylindrical microdomains oriented normal to the surface over large areas using the supramolecular assembly of poly(styrene-block-4-vinylpyridine) (PS₁₉-b-P4VP₅) and 5,10,15,20-tetrakis(4-hydroxyphenyl)-21H,23H-porphine (HOTPP). HOTPP interacts with the P4VP block by hydrogen bonding between the hydroxyl group of HOTPP and pyridine ring of PS₁₉-b-P4VP₅, forming cylindrical P4VP(HOTPP) domains having an average diameter of ∼17 nm in a PS matrix. Dynamic light scattering, contact angle, and in situ grazing incidence small-angle X-ray scattering measurements show a morphological transition from spherical micelles in solution to cylindrical microdomains oriented normal to the substrate surface during the drying process. From the dependence of current on voltage, an average current of ∼4.0 nA is found to pass through a single microdomain, pointing to a promising route for organic semiconductor device applications.

Feature size control using surface reconstruction temperature in block copolymer lithography for InAs nanowire growth

Here we present a method to control the size of the openings in hexagonally organized BCP thin films of poly(styrene)-block-poly(4-vinylpyridine) (PS-b-P4VP) by using surface reconstruction. The surface reconstruction is based on selective swelling of the P4VP block in ethanol, and its extraction to the surface of the film, resulting in pores upon drying. We found that the BCP pore diameter increases with ethanol immersion temperature. In our case, the temperature range 18 to 60 °C allowed fine-tuning of the pore size between 14 and 22 nm. A conclusion is that even though the molecular weight of the respective polymer blocks is fixed, the PS-b-P4VP pore diameter can be tuned by controlling temperature during surface reconstruction. These results can be used for BCP-based nanofabrication in general, and for vertical nanowire growth in particular, where high pattern density and diameter control are of importance. Finally, we demonstrate successful growth of indium arsenide InAs vertical nanowires by selective-area metal-organic vapor phase epitaxy (MOVPE), using a silicon nitride mask patterned by the proposed PS-b-P4VP surface reconstruction lithography method.

Perpendicular Structure Formation of Block Copolymer Thin Films during Thermal Solvent Vapor Annealing: Solvent and Thickness Effects

Solvent vapor annealing of block copolymer (BCP) thin films can produce a range of interesting morphologies, especially when the perpendicular orientation of micro-domains with respect to the substrate plays a role. This, for instance, allows BCP thin films to serve as useful templates for nanolithography and hybrid materials preparation. However, precise control of the arising morphologies is essential, but in most cases difficult to achieve. In this work, we investigated the solvent and thickness effects on the morphology of poly(styrene-b-2 vinyl pyridine) (PS-b-P2VP) thin films with a film thickness range from 0.4 L₀ up to 0.8 L₀. Ordered perpendicular structures were achieved. One of the main merits of our work is that the phase behavior of the ultra-high molecular weight BCP thin films, which hold a 100-nm sized domain distance, can be easily monitored via current available techniques, such as scanning electron microscope (SEM), atomic force microscope (AFM), and transmission electron microscope (TEM). Systematic monitoring of the self-assembly behavior during solvent vapor annealing can thus provide an experimental guideline for the optimization of processing conditions of related BCP films systems.

Rapid ordering of block copolymer thin films

Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be finely tuned via block architecture and processing conditions. However, the ultimate usage of these materials in real-world applications may be hampered by the extremely long thermal annealing times-hours or days-required to achieve good order. Here, we provide an overview of the fundamentals of block-copolymer self-assembly kinetics, and review the techniques that have been demonstrated to influence, and enhance, these ordering kinetics. We discuss the inherent tradeoffs between oven annealing, solvent annealing, microwave annealing, zone annealing, and other directed self-assembly methods; including an assessment of spatial and temporal characteristics. We also review both real-space and reciprocal-space analysis techniques for quantifying order in these systems.

Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing

In this work, we are reporting a very simple and efficient method to form lamellar structures of symmetric polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) copolymer thin films with vertically (to the surface plane) orientated lamellae using a solvent annealing approach. The methodology does not require any brush chemistry to engineer a neutral surface and it is the block neutral nature of the film-solvent vapour interface that defines the orientation of the lamellae. The microphase separated structure of two different molecular weight lamellar forming PS-block-P4VP copolymers formed under solvent vapour annealing was monitored using atomic force microscopy (AFM) so as to understand the morphological changes of the films upon different solvent exposure. In particular, the morphology changes from micellar structures to well-defined microphase separated arrangements. The choice of solvent/s (single and dual solvent exposure) and the solvent annealing conditions (temperature, time etc.) has important effects on structural transitions of the films and it was found that a block neutral solvent was required to realize vertically aligned P4VP lamellae. The results of the structural variation of the phase separated nanostructured films through the exposure to ethanol are also described.

Well-Ordered Nanoporous ABA Copolymer Thin Films via Solvent Vapor Annealing, Homopolymer Blending, and Selective Etching of ABAC Tetrablock Terpolymers

Solvent vapor annealing treatments are used to control the orientation of nanostructures produced in thin films of a poly(styrene)-block-poly(isoprene)-block-poly(styrene)-block-poly((±)-lactide) (PS-PI-PS-PLA) and its blends with PLA homopolymer. The PS-PI-PS-PLA tetrablock terpolymer, previously determined to adopt a core(PLA)-shell(PS) cylindrical morphology in the bulk, gave perpendicular alignment of PLA cylinders over a limited range of thicknesses using a mixed solvent environment of tetrahydrofuran and acetone. On the other hand, perpendicular alignment was achieved regardless of film thickness by inclusion of 5 wt % homopolymer PLA in the PS-PI-PS-PLA tetrablock. Tapping mode atomic force microscopy (AFM) was used to visualize film surface morphologies. Subsequent reactive ion etching (RIE) and basic hydrolysis of PLA produced 15 nm pores in a PS-PI-PS triblock thin film matrix. Nanoporosity was confirmed by scanning electron microscopy (SEM) images and the vertical continuity of pores was confirmed by cross-sectional SEM analysis.

Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer

'Directing' block copolymer (BCP) patterns is a possible option for future semiconductor device patterning, but pattern transfer of BCP masks is somewhat hindered by the inherently low etch contrast between blocks. Here, we demonstrate a 'fab' friendly methodology for forming well-registered and aligned silicon (Si) nanofins following pattern transfer of robust metal oxide nanowire masks through the directed self-assembly (DSA) of BCPs. A cylindrical forming poly(styrene)-block-poly(4-vinyl-pyridine) (PS-b-P4VP) BCP was employed producing 'fingerprint' line patterns over macroscopic areas following solvent vapor annealing treatment. The directed assembly of PS-b-P4VP line patterns was enabled by electron-beam lithographically defined hydrogen silsequioxane (HSQ) gratings. We developed metal oxide nanowire features using PS-b-P4VP structures which facilitated high quality pattern transfer to the underlying Si substrate. This work highlights the precision at which long range ordered ∼10 nm Si nanofin features with 32 nm pitch can be defined using a cylindrical BCP system for nanolithography application. The results show promise for future nanocircuitry fabrication to access sub-16 nm critical dimensions using cylindrical systems as surface interfaces are easier to tailor than lamellar systems. Additionally, the work helps to demonstrate the extension of these methods to a 'high χ' BCP beyond the size limitations of the more well-studied PS-b-poly(methyl methylacrylate) (PS-b-PMMA) system.

Structural transitions in asymmetric poly(styrene)-block-poly(lactide) thin films induced by solvent vapor exposure

Successive structural transitions in thin films of asymmetric poly(styrene)-block-poly(lactide) (PS-PLA) block copolymer samples upon exposure to tetrahydrofuran (THF) vapors have been monitored using atomic force microscopy (AFM) and both in situ and ex situ grazing incidence small-angle X-ray scattering (GISAXS). A direct link was established between the structure in the swollen state and the morphology formed in the dried state post solvent evaporation. This was related to the high incompatibility between the constituting blocks of the copolymer that thwarted the system from reaching the homogeneous disordered state in the swollen state under the specific conditions utilized in this study. Upon rapid solvent removal, the morphologies formed in the swollen state were trapped due the fast evaporation kinetics. This work provides a better understanding of the mechanisms associated with block copolymer thin film morphology changes induced by solvent vapor annealing.

Intelligent reversible nanoporous antireflection film by solvent-stimuli-responsive phase transformation of amphiphilic block copolymer

An erasure-reconstruction porous structure with reversible antireflection (AR) property at near-infrared region (NIR) was prepared for the first time based on solvent-stimuli-responsive phase transformation of polystyrene-block-poly(4-vinypyridine) (PS-b-P4VP). The inhomogeneous porous structure with a dense skin and porous underneath, which was obtained by the nonsolvent-induced phase separation of PS-b-P4VP film from micelle solution with mixed solvents (tetrahydrofuran and dimethylformamide), was used as starting porous film. Then, the film was annealed by PS-selective solvent to erase the nanopores because the PS block was swollen effectively by its selective solvent. Afterward, the nonporous film was immersed in linear aliphatic acid to reconstruct the nanoporous structure (loosely packed micelles) by the combination of the hydrogen bond interaction and the positively charge-induced repulsion between each chain. Thus, an intelligent reversible AR property in the NIR region between a high-transmittance porous state (∼99.0%) and a low-transmittance nonporous state (∼90.0%) was realized by alternate treatments of PS-selective solvent and linear aliphatic acids. This reversible erasure-reconstruction porous structure for switching between AR (98.0%) and non-AR (90.0%) properties could be recycled by at least four times.