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Lozovoy K. Application of Nanostructures in Biology and Medicine. Int J Mol Sci 2024; 25:9931. [PMID: 39337418 PMCID: PMC11432499 DOI: 10.3390/ijms25189931] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/27/2024] [Accepted: 09/12/2024] [Indexed: 09/30/2024] Open
Abstract
At present, nanomaterials are used in a wide range of applications in all spheres of civil needs, including energy, medicine, and industry [...].
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Affiliation(s)
- Kirill Lozovoy
- Department of Quantum Electronics and Photonics, Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia
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Zhao L, Huang L, Wang K, Mu W, Wu Q, Ma Z, Ren K. Mechanical and Lattice Thermal Properties of Si-Ge Lateral Heterostructures. Molecules 2024; 29:3823. [PMID: 39202901 PMCID: PMC11357318 DOI: 10.3390/molecules29163823] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/10/2024] [Revised: 08/06/2024] [Accepted: 08/08/2024] [Indexed: 09/03/2024] Open
Abstract
Two-dimensional (2D) materials have drawn extensive attention due to their exceptional characteristics and potential uses in electronics and energy storage. This investigation employs simulations using molecular dynamics to examine the mechanical and thermal transport attributes of the 2D silicene-germanene (Si-Ge) lateral heterostructure. The pre-existing cracks of the Si-Ge lateral heterostructure are addressed with external strain. Then, the effect of vacancy defects and temperature on the mechanical attributes is also investigated. By manipulating temperature and incorporating vacancy defects and pre-fabricated cracks, the mechanical behaviors of the Si-Ge heterostructure can be significantly modulated. In order to investigate the heat transport performance of the Si-Ge lateral heterostructure, a non-equilibrium molecular dynamics approach is employed. The efficient phonon average free path is obtained as 136.09 nm and 194.34 nm, respectively, in the Si-Ge heterostructure with a zigzag and armchair interface. Our results present the design and application of thermal management devices based on the Si-Ge lateral heterostructure.
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Affiliation(s)
- Liuhuan Zhao
- School of Mechanical and Electronic Engineering, Nanjing Forestry University, Nanjing 210037, China
| | - Lei Huang
- School of Mechanical Engineering, Southeast University, Nanjing 211189, China;
| | - Ke Wang
- School of Automation, Xi’an University of Posts & Telecommunications, Xi’an 710121, China
| | - Weihua Mu
- Wenzhou Institute, University of Chinese Academy of Sciences, Wenzhou 325000, China
| | - Qiong Wu
- School of Mechanical and Electronic Engineering, Nanjing Forestry University, Nanjing 210037, China
| | - Zhen Ma
- School of Agricultural Engineering, Jiangsu University, Zhenjiang 212013, China;
| | - Kai Ren
- School of Mechanical and Electronic Engineering, Nanjing Forestry University, Nanjing 210037, China
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Lozovoy KA, Douhan RMH, Dirko VV, Deeb H, Khomyakova KI, Kukenov OI, Sokolov AS, Akimenko NY, Kokhanenko AP. Silicon-Based Avalanche Photodiodes: Advancements and Applications in Medical Imaging. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:3078. [PMID: 38063774 PMCID: PMC10707864 DOI: 10.3390/nano13233078] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/15/2023] [Revised: 12/01/2023] [Accepted: 12/03/2023] [Indexed: 09/11/2024]
Abstract
Avalanche photodiodes have emerged as a promising technology with significant potential for various medical applications. This article presents an overview of the advancements and applications of avalanche photodiodes in the field of medical imaging. Avalanche photodiodes offer distinct advantages over traditional photodetectors, including a higher responsivity, faster response times, and superior signal-to-noise ratios. These characteristics make avalanche photodiodes particularly suitable for medical-imaging modalities that require a high detection efficiency, excellent timing resolution, and enhanced spatial resolution. This review explores the key features of avalanche photodiodes, discusses their applications in medical-imaging techniques, and highlights the challenges and future prospects in utilizing avalanche photodiodes for medical purposes. Special attention is paid to the recent progress in silicon-compatible avalanche photodiodes.
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Affiliation(s)
- Kirill A. Lozovoy
- Department of Quantum Electronics and Photonics, Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (R.M.H.D.); (V.V.D.); (H.D.); (K.I.K.); (O.I.K.); (A.S.S.); (A.P.K.)
| | - Rahaf M. H. Douhan
- Department of Quantum Electronics and Photonics, Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (R.M.H.D.); (V.V.D.); (H.D.); (K.I.K.); (O.I.K.); (A.S.S.); (A.P.K.)
| | - Vladimir V. Dirko
- Department of Quantum Electronics and Photonics, Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (R.M.H.D.); (V.V.D.); (H.D.); (K.I.K.); (O.I.K.); (A.S.S.); (A.P.K.)
| | - Hazem Deeb
- Department of Quantum Electronics and Photonics, Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (R.M.H.D.); (V.V.D.); (H.D.); (K.I.K.); (O.I.K.); (A.S.S.); (A.P.K.)
| | - Kristina I. Khomyakova
- Department of Quantum Electronics and Photonics, Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (R.M.H.D.); (V.V.D.); (H.D.); (K.I.K.); (O.I.K.); (A.S.S.); (A.P.K.)
| | - Olzhas I. Kukenov
- Department of Quantum Electronics and Photonics, Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (R.M.H.D.); (V.V.D.); (H.D.); (K.I.K.); (O.I.K.); (A.S.S.); (A.P.K.)
| | - Arseniy S. Sokolov
- Department of Quantum Electronics and Photonics, Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (R.M.H.D.); (V.V.D.); (H.D.); (K.I.K.); (O.I.K.); (A.S.S.); (A.P.K.)
| | - Nataliya Yu. Akimenko
- Department of Engineering Systems and Technosphere Safety, Pacific National University, Tihookeanskaya St. 136, 680035 Khabarovsk, Russia;
| | - Andrey P. Kokhanenko
- Department of Quantum Electronics and Photonics, Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (R.M.H.D.); (V.V.D.); (H.D.); (K.I.K.); (O.I.K.); (A.S.S.); (A.P.K.)
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Dirko VV, Lozovoy KA, Kokhanenko AP, Kukenov OI, Korotaev AG, Voitsekhovskii AV. Peculiarities of the 7 × 7 to 5 × 5 Superstructure Transition during Epitaxial Growth of Germanium on Silicon (111) Surface. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:231. [PMID: 36677983 PMCID: PMC9862873 DOI: 10.3390/nano13020231] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 11/23/2022] [Revised: 12/30/2022] [Accepted: 12/30/2022] [Indexed: 06/17/2023]
Abstract
This paper presents the results of studying the processes of epitaxial growth of germanium on silicon with crystallographic orientation (111) in a wide temperature range. The temperature dependences of the duration of the transition stage from the 7 × 7 to 5 × 5 superstructure and the values of the critical thickness of the transition from two-dimensional to three-dimensional growth in the range from 250 to 700 °C are determined using the reflection high-energy electron diffraction method. It was shown for the first time that the transition time from the 7 × 7 superstructure to 5 × 5 superstructure depends on the temperature of epitaxial growth. The region of low temperatures of synthesis, which has received insufficient attention so far, is also considered.
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Kosarev IV, Dmitriev SV, Semenov AS, Korznikova EA. Stability of Strained Stanene Compared to That of Graphene. MATERIALS (BASEL, SWITZERLAND) 2022; 15:5900. [PMID: 36079279 PMCID: PMC9457046 DOI: 10.3390/ma15175900] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 07/21/2022] [Revised: 08/18/2022] [Accepted: 08/22/2022] [Indexed: 06/15/2023]
Abstract
Stanene, composed of tin atoms, is a member of 2D-Xenes, two-dimensional single element materials. The properties of the stanene can be changed and improved by applying deformation, and it is important to know the range of in-plane deformation that the stanene can withstand. Using the Tersoff interatomic potential for calculation of phonon frequencies, the range of stability of planar stanene under uniform in-plane deformation is analyzed and compared with the known data for graphene. Unlike atomically flat graphene, stanene has a certain thickness (buckling height). It is shown that as the tensile strain increases, the thickness of the buckled stanene decreases, and when a certain tensile strain is reached, the stanene becomes absolutely flat, like graphene. Postcritical behaviour of stanene depends on the type of applied strain: critical tensile strain leads to breaking of interatomic bonds and critical in-plane compressive strain leads to rippling of stanene. It is demonstrated that application of shear strain reduces the range of stability of stanene. The existence of two energetically equivalent states of stanene is shown, and consequently, the possibility of the formation of domains separated by domain walls in the stanene is predicted.
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Affiliation(s)
- Igor V. Kosarev
- Research Laboratory for Metals and Alloys under Extreme Impacts, Ufa State Aviation Technical University, 450008 Ufa, Russia
| | - Sergey V. Dmitriev
- Mechanical Engineering Research Institute of the Russian Academy of Sciences–Branch of Federal Research Center “Institute of Applied Physics of RAS”, 603024 Nizhny Novgorod, Russia
- Center for Design of Functional Materials, Bashkir State University, 450076 Ufa, Russia
| | - Alexander S. Semenov
- Polytechnic Institute Mirny Branch, North-Eastern Federal University, 678170 Mirny, Russia
| | - Elena A. Korznikova
- Institute of Oil and Gas Engineering and Digital Technologies, Ufa State Petroleum Technological University, 450064 Ufa, Russia
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Lozovoy KA, Izhnin II, Kokhanenko AP, Dirko VV, Vinarskiy VP, Voitsekhovskii AV, Fitsych OI, Akimenko NY. Single-Element 2D Materials beyond Graphene: Methods of Epitaxial Synthesis. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:2221. [PMID: 35808055 PMCID: PMC9268513 DOI: 10.3390/nano12132221] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/30/2022] [Revised: 06/23/2022] [Accepted: 06/24/2022] [Indexed: 02/01/2023]
Abstract
Today, two-dimensional materials are one of the key research topics for scientists around the world. Interest in 2D materials is not surprising because, thanks to their remarkable mechanical, thermal, electrical, magnetic, and optical properties, they promise to revolutionize electronics. The unique properties of graphene-like 2D materials give them the potential to create completely new types of devices for functional electronics, nanophotonics, and quantum technologies. This paper considers epitaxially grown two-dimensional allotropic modifications of single elements: graphene (C) and its analogs (transgraphenes) borophene (B), aluminene (Al), gallenene (Ga), indiene (In), thallene (Tl), silicene (Si), germanene (Ge), stanene (Sn), plumbene (Pb), phosphorene (P), arsenene (As), antimonene (Sb), bismuthene (Bi), selenene (Se), and tellurene (Te). The emphasis is put on their structural parameters and technological modes in the method of molecular beam epitaxy, which ensure the production of high-quality defect-free single-element two-dimensional structures of a large area for promising device applications.
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Affiliation(s)
- Kirill A. Lozovoy
- Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (A.P.K.); (V.V.D.); (V.P.V.); (A.V.V.)
| | - Ihor I. Izhnin
- Scientific Research Company “Electron-Carat”, Stryjska St. 202, 79031 Lviv, Ukraine;
| | - Andrey P. Kokhanenko
- Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (A.P.K.); (V.V.D.); (V.P.V.); (A.V.V.)
| | - Vladimir V. Dirko
- Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (A.P.K.); (V.V.D.); (V.P.V.); (A.V.V.)
| | - Vladimir P. Vinarskiy
- Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (A.P.K.); (V.V.D.); (V.P.V.); (A.V.V.)
| | - Alexander V. Voitsekhovskii
- Faculty of Radiophysics, National Research Tomsk State University, Lenin Av. 36, 634050 Tomsk, Russia; (A.P.K.); (V.V.D.); (V.P.V.); (A.V.V.)
| | - Olena I. Fitsych
- P. Sagaidachny National Army Academy, Gvardijska St. 32, 79012 Lviv, Ukraine;
| | - Nataliya Yu. Akimenko
- Department of Engineering Systems and Technosphere Safety, Pacific National University, Tihookeanskaya St. 136, 680035 Khabarovsk, Russia;
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Lin H, Zhang Z, Zhang H, Lin KT, Wen X, Liang Y, Fu Y, Lau AKT, Ma T, Qiu CW, Jia B. Engineering van der Waals Materials for Advanced Metaphotonics. Chem Rev 2022; 122:15204-15355. [PMID: 35749269 DOI: 10.1021/acs.chemrev.2c00048] [Citation(s) in RCA: 20] [Impact Index Per Article: 10.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/16/2022]
Abstract
The outstanding chemical and physical properties of 2D materials, together with their atomically thin nature, make them ideal candidates for metaphotonic device integration and construction, which requires deep subwavelength light-matter interaction to achieve optical functionalities beyond conventional optical phenomena observed in naturally available materials. In addition to their intrinsic properties, the possibility to further manipulate the properties of 2D materials via chemical or physical engineering dramatically enhances their capability, evoking new science on light-matter interaction, leading to leaped performance of existing functional devices and giving birth to new metaphotonic devices that were unattainable previously. Comprehensive understanding of the intrinsic properties of 2D materials, approaches and capabilities for chemical and physical engineering methods, the resulting property modifications and novel functionalities, and applications of metaphotonic devices are provided in this review. Through reviewing the detailed progress in each aspect and the state-of-the-art achievement, insightful analyses of the outstanding challenges and future directions are elucidated in this cross-disciplinary comprehensive review with the aim to provide an overall development picture in the field of 2D material metaphotonics and promote rapid progress in this fast emerging and prosperous field.
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Affiliation(s)
- Han Lin
- School of Science, RMIT University, Melbourne, Victoria 3000, Australia.,The Australian Research Council (ARC) Industrial Transformation Training, Centre in Surface Engineering for Advanced Materials (SEAM), Swinburne University of Technology, Hawthorn, Victoria 3122, Australia
| | - Zhenfang Zhang
- School of Textile Science and Engineering, Xi'an Polytechnic University, Xi'an 710048, China
| | - Huihui Zhang
- Centre for Translational Atomaterials, School of Science, Computing and Engineering Technologies, Swinburne University of Technology, P.O. Box 218, Hawthorn, Victoria 3122, Australia
| | - Keng-Te Lin
- School of Science, RMIT University, Melbourne, Victoria 3000, Australia
| | - Xiaoming Wen
- Centre for Translational Atomaterials, School of Science, Computing and Engineering Technologies, Swinburne University of Technology, P.O. Box 218, Hawthorn, Victoria 3122, Australia
| | - Yao Liang
- Centre for Translational Atomaterials, School of Science, Computing and Engineering Technologies, Swinburne University of Technology, P.O. Box 218, Hawthorn, Victoria 3122, Australia
| | - Yang Fu
- Centre for Translational Atomaterials, School of Science, Computing and Engineering Technologies, Swinburne University of Technology, P.O. Box 218, Hawthorn, Victoria 3122, Australia
| | - Alan Kin Tak Lau
- Centre for Translational Atomaterials, School of Science, Computing and Engineering Technologies, Swinburne University of Technology, P.O. Box 218, Hawthorn, Victoria 3122, Australia
| | - Tianyi Ma
- School of Science, RMIT University, Melbourne, Victoria 3000, Australia.,Centre for Translational Atomaterials, School of Science, Computing and Engineering Technologies, Swinburne University of Technology, P.O. Box 218, Hawthorn, Victoria 3122, Australia
| | - Cheng-Wei Qiu
- Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Singapore
| | - Baohua Jia
- School of Science, RMIT University, Melbourne, Victoria 3000, Australia.,The Australian Research Council (ARC) Industrial Transformation Training, Centre in Surface Engineering for Advanced Materials (SEAM), Swinburne University of Technology, Hawthorn, Victoria 3122, Australia.,Centre for Translational Atomaterials, School of Science, Computing and Engineering Technologies, Swinburne University of Technology, P.O. Box 218, Hawthorn, Victoria 3122, Australia
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Dirko VV, Lozovoy KA, Kokhanenko AP, Voitsekhovskii AV. High-resolution RHEED analysis of dynamics of low-temperature superstructure transitions in Ge/Si(001) epitaxial system. NANOTECHNOLOGY 2021; 33:115603. [PMID: 34935639 DOI: 10.1088/1361-6528/ac3f56] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/14/2021] [Accepted: 12/02/2021] [Indexed: 06/14/2023]
Abstract
In this paper, we analyze superstructural transitions during epitaxial growth of two-dimensional layers and the formation of quantum dots by the Stranski-Krastanov mechanism in elastically stressed systems by the reflection high-energy electron diffraction method. Detailed dependences of the periodicity parameterNof the 2 × Nreconstruction on the effective thickness of the deposited material in a wide range of growth temperatures during epitaxy of germanium on a silicon surface with a crystallographic orientation (001) are obtained. Superstructural transitions and the change in the value of the parameterNat low temperatures of epitaxy in this system have been investigated for the first time. It is shown that the length of dimer rows in such a reconstruction during the growth of pure germanium on silicon can reach a value of no less thanN = 11. A relationship is found between the value of the parameterN, determined by elastic strains in the system, and the critical thickness of the transition from two-dimensional to three-dimensional growth. Based on this relationship, a physical mechanism is proposed that explains the nature of the temperature dependence of the critical thickness of the Stranski-Krastanov transition, which has been the subject of constant scientific disputes until now.
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Affiliation(s)
- Vladimir V Dirko
- National Research Tomsk State University, Department of Radiophysics, 36 Lenin av., Tomsk 634050, Russia
| | - Kirill A Lozovoy
- National Research Tomsk State University, Department of Radiophysics, 36 Lenin av., Tomsk 634050, Russia
| | - Andrey P Kokhanenko
- National Research Tomsk State University, Department of Radiophysics, 36 Lenin av., Tomsk 634050, Russia
| | - Alexander V Voitsekhovskii
- National Research Tomsk State University, Department of Radiophysics, 36 Lenin av., Tomsk 634050, Russia
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Dirko VV, Lozovoy KA, Kokhanenko AP, Voitsekhovskii AV. Thickness-dependent elastic strain in Stranski-Krastanow growth. Phys Chem Chem Phys 2020; 22:19318-19325. [PMID: 32820766 DOI: 10.1039/d0cp03538f] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 02/05/2023]
Abstract
In this paper, we comprehensively consider the effect of the dependence of elastic strain on the thickness of deposited material on the formation of two-dimensional layers and quantum dots by the Stranski-Krastanow mechanism. The nucleation and growth of germanium quantum dots on silicon surface (100) are used as a model system for conducting experimental studies and theoretical calculations. A detailed dependence of the value of elastic strains on the effective thickness of deposited germanium is obtained. It is also shown that the magnitude of the 1/N superstructural periodicity in this system reaches 12.5%. Based on the obtained thickness dependence of lattice mismatch, a new theory is constructed for calculating the parameters of the formed islands, generalizing previously used thermodynamic models. The equilibrium and critical thicknesses of the wetting layer are determined for the first time under the assumption that lattice mismatch depends on the thickness of the deposited material. In this approximation, some unexpected results are obtained that refine traditional thermodynamic models and confirmed by experimental data. The results of this work and proposed theoretical model may be applied for strain engineering in other material systems where growth of two-dimensional materials and quantum-sized islands by the Stranski-Krastanow mechanism is realized.
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Affiliation(s)
- Vladimir V Dirko
- National Research Tomsk State University, Faculty of Radiophysics, Laboratory of Quantum Information Technologies, 36 Lenin av., Tomsk 634050, Russian Federation. and National Research Tomsk State University, Faculty of Radiophysics, Laboratory of Nanoelectronics and Nanophotonics, 36 Lenin av., Tomsk 634050, Russian Federation
| | - Kirill A Lozovoy
- National Research Tomsk State University, Faculty of Radiophysics, Laboratory of Quantum Information Technologies, 36 Lenin av., Tomsk 634050, Russian Federation. and National Research Tomsk State University, Faculty of Radiophysics, Laboratory of Nanoelectronics and Nanophotonics, 36 Lenin av., Tomsk 634050, Russian Federation
| | - Andrey P Kokhanenko
- National Research Tomsk State University, Faculty of Radiophysics, Laboratory of Quantum Information Technologies, 36 Lenin av., Tomsk 634050, Russian Federation. and National Research Tomsk State University, Faculty of Radiophysics, Laboratory of Nanoelectronics and Nanophotonics, 36 Lenin av., Tomsk 634050, Russian Federation
| | - Alexander V Voitsekhovskii
- National Research Tomsk State University, Faculty of Radiophysics, Laboratory of Nanoelectronics and Nanophotonics, 36 Lenin av., Tomsk 634050, Russian Federation
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