The simultaneous deposition of nickel and hydrogen on vitreous carbon

Effect of 2-Mercapto-1-methylimidazole on the Electrodeposition of Nickel on an Ordered Au(111) Electrode

A nickel film electroplated onto a metal substrate can be used as a catalyst for water splitting and a magnetic material for spin valves. Although the nucleation and growth of Ni on Au(111) have already been examined with in situ scanning tunneling microscopy (STM), the current study provides new insights of the structure of the first layer of Ni on an ordered Au(111) electrode in 0.1 M KSO4 + 1 mM H2SO4 + 10 mM NiSO4 (pH 3). Prolonged STM scanning of the Ni monolayer on a Au(111) electrode revealed interfacial mixing to produce a surface alloy, initially assuming segregated Ni domains and later transforming them to a homogeneous Ni/Au phase. The formation of the Ni/Au(111) surface alloy affected the structure of the subsequent bulk Ni deposition. The inclusion of 2-mercapto-1-methylimidazole (MMI) in the deposition bath incurred Ni deposition at a less negative potential and a faster rate, resulting in an overall 5.3 times more Ni deposited on the Au electrode in potentiodynamic experiments. MMI molecules were adsorbed on the Ni deposit to prevent Ni dissolution in the Au(111) electrode. MMI could catalyze the presumed rate-determining step from Ni2+ to Ni+ en route to the metallic Ni. The resultant Ni film with MMI had a 3D texture without a preferred crystal orientation on the Au electrode, as opposed to a layer type growth of Ni on Au(111) without MMI.

Electrochemical deposition of nickel targets from aqueous electrolytes for medical radioisotope production in accelerators: a review

This paper reviews reported methods of the electrochemical deposition of nickel layers which are used as target materials for accelerator production of medical radioisotopes. The review focuses on the electrodeposition carried out from aqueous electrolytes. It describes the main challenges related to the preparation of suitable Ni target layers, such as work with limited amounts of expensive isotopically enriched nickel; electrodeposition of sufficiently thick, smooth and free of cracks layers; and recovery of unreacted Ni isotopes from the irradiated targets and from used electrolytic baths.

NUCLEATION AND STRUCTURAL PROPERTIES OF NICKEL FILMS ELECTRODEPOSITED FROM, CHLORIDE AND SULFATE BATHS

Nickel films electrodeposited from chloride and sulfate baths at pH 3.8 have been investigated. The influence of the plating baths on the electrochemical growth and the characteristics of nickel were studied by means of cyclic voltammetry, potentiostatic steps (chronoamperometry), atomic force microscopy (AFM) and X-ray diffraction (XRD) techniques. The electrocrystallization mechanism was analyzed using the Scharifker and Hills model. The nucleation mechanism was found to be progressive at -1.1 V versus SCE, while at elevated overpotentials (more negative than -1.2 V versus SCE) instantaneous nucleation behavior was obtained. AFM characterization of the deposits indicated that the baths composition influences greatly the morphology of the deposits. XRD analysis indicated polycrystalline growth of the Ni film with a preferred (111) orientation with the fcc structure for both baths. The Ni crystallite sizes are 19–31 nm for the sulfate bath and 14–33 nm for the chloride one.

In-Situ Stm Studies on the Electrodeposition of Ultrathin Nickel Films

An in-situ STM study of the initial stages of Ni electrodeposition on Au and Cu single-crystals is presented. On reconstructed Au(111) a complex, potential-dependent nucleation and growth process is found, involving selective Ni island formation at specific surface sites and growth of two types (compact and needle-like) of Ni monolayer islands. At higher coverages (1 ML ≤ θ ≤ 5 ML) an almost perfect layer-by-layer growth of a metallic Ni(111)-film was observed. Considerably rougher films were found on Au(100) and Cu(100).