Formation mechanism of amorphous silicon nanoparticles with additional counter-flow quenching gas by induction thermal plasma

Modeling of Advanced Silicon Nanomaterial Synthesis Approach: From Reactive Thermal Plasma Jet to Nanosized Particles

A three-dimensional numerical modelling of a time-dependent, turbulent thermal plasma jet was developed to synthetize silicon nanopowder. Computational fluid dynamics and particle models were employed via COMSOL Multiphysics® v. 5.4 (COMSOL AB, Stockholm, Sweden) to simulate fluid and particle motion in the plasma jet, as well as the heat dependency. Plasma flow and particle interactions were exemplified in terms of momentum, energy, and turbulence flow. The transport of nanoparticles through convection, diffusion, and thermophoresis were also considered. The trajectories and heat transfer of both plasma jet fields, and particles are represented. The swirling flow controls the plasma jet and highly affects the dispersion of the nanoparticles. We demonstrate a decrease in both particles’ velocity and temperature distribution at a higher carrier gas injection velocity. The increase in the particle size and number affects the momentum transfer, turbulence modulation, and energy of particles, and also reduces plasma jet parameters. On the other hand, the upstream flame significantly impacts the particle’s behavior under velocity and heat transfer variation. Our findings open the door for examining thermal plasma impact in nanoparticle synthesis, where it plays a major role in optimizing the growth parameters, ensuring high quality with a low-cost technique.

Chemical Vapor Synthesis of Nonagglomerated Nickel Nanoparticles by In-Flight Coating

Nickel (Ni) nanoparticles (NPs) prepared through vapor-phase synthesis (VPS) are preferred for multilayer ceramic capacitor electrodes due to their high purity and crystallinity advantages. Agglomerated Ni NPs are usually generated using VPS but are undesirable because they cause various problems such as low packing density and electrical shorts. This study proposes the use of coating-assisted chemical vapor synthesis (CVS) for agglomerate inhibition using NaCl or KCl as a coating agent. We have found that the agglomeration ratio, 34.40%, for conventional CVS, can be reduced to 4.80% in the proposed method by in-flight coating with KCl at 900 °C by image analysis using field-emission scanning electron microscopy. Furthermore, the X-ray diffraction and X-ray fluorescence analyses confirm that the NaCl and KCl coating agent can be removed by washing with distilled water. We believe that this coating process can be used to inhibit the formation of agglomerates during the CVS of Ni NPs.

Computational Study of Quenching Effects on Growth Processes and Size Distributions of Silicon Nanoparticles at a Thermal Plasma Tail

In this paper, quenching effects on silicon nanoparticle growth processes and size distributions at a typical range of cooling rates in a thermal plasma tail are investigated computationally. We used a nodal-type model that expresses a size distribution evolving temporally with simultaneous homogeneous nucleation, heterogeneous condensation, interparticle coagulation, and melting point depression. The numerically obtained size distributions exhibit similar size ranges and tendencies to those of experiment results obtained with and without quenching. In a highly supersaturated state, 40–50% of the vapor atoms are converted rapidly to nanoparticles. After most vapor atoms are consumed, the nanoparticles grow by coagulation, which occurs much more slowly than condensation. At higher cooling rates, one obtains greater total number density, smaller size, and smaller standard deviation. Quenching in thermal plasma fabrication is effectual, but it presents limitations for controlling nanoparticle characteristics.