1
|
Wang R, Zheng JC. Theoretical design of active Ga 2O 3 monolayer-based catalysts for electrocatalytic HER. Phys Chem Chem Phys 2024; 26:27406-27418. [PMID: 39445357 DOI: 10.1039/d4cp03007a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/25/2024]
Abstract
Electrocatalytic hydrogen evolution reaction (HER) offers a sustainable and clean route for hydrogen production. Developing a high-efficiency HER catalyst is extremely essential toward meeting future energy needs. Herein, the Sn-doped Ga2O3 monolayer, O-defected Ga2O3 monolayer, and Ru-adsorbed Ga2O3 monolayer with high electrocatalytic performances toward HER are reported (their H adsorption free energies are 0.169, 0.126 and 0.065 eV, respectively). The Sn-doped Ga2O3 monolayer follows the Volmer-Heyrovsky mechanism, and the O-defected Ga2O3 monolayer and Ru-adsorbed Ga2O3 monolayer are suitable for Volmer-Tafel mechanisms. The strain from -4% to 4% in the X- or Y-direction could linearly modulate the HER activities of the Sn-doped Ga2O3 monolayer and O-defected Ga2O3 monolayer. The Sn-doped Ga2O3 monolayer, O-defected Ga2O3 monolayer, and Ru-adsorbed Ga2O3 monolayer only manifest high HER catalytic activities in the strong acidic media. These phenomena can provide a rational approach to enhance the HER activity for Ga2O3 monolayer-based materials.
Collapse
Affiliation(s)
- Rongzhi Wang
- Department of Physics, Fujian Provincial Key Laboratory of Theoretical and Computational Chemistry, Xiamen University, Xiamen 361005, China.
| | - Jin-Cheng Zheng
- Department of Physics, Fujian Provincial Key Laboratory of Theoretical and Computational Chemistry, Xiamen University, Xiamen 361005, China.
- Department of Physics and Department of New Energy Science and Engineering, Xiamen University Malaysia, Sepang 43900, Malaysia
| |
Collapse
|
2
|
Li D, Deng R, Li Y, Jiang D. Wavelength Modulation and Fast Response of Mixed-Phase β-Ga 2O 3:Zn/SnO 2 in-Plane Heterojunction Ultraviolet Photodetectors. ACS APPLIED MATERIALS & INTERFACES 2024; 16:45156-45165. [PMID: 39149806 DOI: 10.1021/acsami.4c07802] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/17/2024]
Abstract
Ultraviolet photodetectors based on wide bandgap mixed-phase β-Ga2O3:Zn/SnO2 thin films formed through doping on the c-sapphire substrate (c-Al2O3) are prepared to construct in-plane heterojunctions employing a low-cost and simple preparation method. The mixed-phase thin film photodetectors have a low dark current of 0.74 nA, and the photo-to-dark current ratio ranges from 36.43 to 642.38 at 10 V. The photodetectors also have wavelength modulation, with response peaks ranging from 260 nm (4 mA/W) to 295 nm (1.63 A/W). Furthermore, the photodetectors have a fast response time with a rise time of 0.07 s/0.22 s and a decay time of 0.04 s/0.22 s at 1 V. The excellent performance of the devices is attributed to the reduction of VO and the establishment of multiple electric fields in the mixed-phase films, which indicates the feasibility of implementing wavelength-modulated and fast-response β-Ga2O3 photodetectors using the sol-gel method.
Collapse
Affiliation(s)
- Donglin Li
- School of Materials Science and Engineering, Changchun University of Science and Technology, Changchun 130022, China
| | - Rui Deng
- School of Materials Science and Engineering, Changchun University of Science and Technology, Changchun 130022, China
| | - Yongfeng Li
- Key Laboratory of Physics and Technology for Advanced Batteries (Ministry of Education), College of Physics, Jilin University, Changchun 130012, China
| | - Dayong Jiang
- School of Materials Science and Engineering, Changchun University of Science and Technology, Changchun 130022, China
| |
Collapse
|
3
|
Chen R, Sathasivam S, Borowiec J, Carmalt CJ. An Aerosol-Assisted Chemical Vapor Deposition Route to Tin-Doped Gallium Oxide Thin Films with Optoelectronic Properties. ACS APPLIED ELECTRONIC MATERIALS 2024; 6:6085-6091. [PMID: 39221136 PMCID: PMC11360363 DOI: 10.1021/acsaelm.4c00973] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/29/2024] [Revised: 07/27/2024] [Accepted: 07/29/2024] [Indexed: 09/04/2024]
Abstract
Gallium oxide is a wide-bandgap compound semiconductor material renowned for its diverse applications spanning gas sensors, liquid crystal displays, transparent electrodes, and ultraviolet detectors. This paper details the aerosol assisted chemical vapor deposition synthesis of tin doped gallium oxide thin films using gallium acetylacetonate and monobutyltin trichloride dissolved in methanol. It was observed that Sn doping resulted in a reduction in the transmittance of Ga2O3 films within the visible spectrum, while preserving the wide bandgap characteristics of 4.8 eV. Furthermore, Hall effect testing revealed a substantial decrease in the resistivity of Sn-doped Ga2O3 films, reducing it from 4.2 × 106 Ω cm to 2 × 105 Ω cm for the 2.5 at. % Sn:Ga2O3 compared to the nominally undoped Ga2O3.
Collapse
Affiliation(s)
- Ruizhe Chen
- Materials
Chemistry Centre, Department of Chemistry, University College London, 20 Gordon Street, London WC1H 0AJ, U.K.
| | - Sanjayan Sathasivam
- Materials
Chemistry Centre, Department of Chemistry, University College London, 20 Gordon Street, London WC1H 0AJ, U.K.
- School
of Engineering, London South Bank University, London SE1 0AA, U.K.
| | - Joanna Borowiec
- Materials
Chemistry Centre, Department of Chemistry, University College London, 20 Gordon Street, London WC1H 0AJ, U.K.
| | - Claire J Carmalt
- Materials
Chemistry Centre, Department of Chemistry, University College London, 20 Gordon Street, London WC1H 0AJ, U.K.
| |
Collapse
|
4
|
Cottam ND, Dewes BT, Shiffa M, Cheng TS, Novikov SV, Mellor CJ, Makarovsky O, Gonzalez D, Ben T, Patanè A. Thin Ga 2O 3 Layers by Thermal Oxidation of van der Waals GaSe Nanostructures for Ultraviolet Photon Sensing. ACS APPLIED NANO MATERIALS 2024; 7:17553-17560. [PMID: 39144400 PMCID: PMC11320379 DOI: 10.1021/acsanm.4c02685] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/09/2024] [Revised: 07/17/2024] [Accepted: 07/22/2024] [Indexed: 08/16/2024]
Abstract
Two-dimensional semiconductors (2DSEM) based on van der Waals crystals offer important avenues for nanotechnologies beyond the constraints of Moore's law and traditional semiconductors, such as silicon (Si). However, their application necessitates precise engineering of material properties and scalable manufacturing processes. The ability to oxidize Si to form silicon dioxide (SiO2) was crucial for the adoption of Si in modern technologies. Here, we report on the thermal oxidation of the 2DSEM gallium selenide (GaSe). The nanometer-thick layers are grown by molecular beam epitaxy on transparent sapphire (Al2O3) and feature a centro-symmetric polymorph of GaSe. Thermal annealing of the layers in an oxygen-rich environment promotes the chemical transformation and full conversion of GaSe into a thin layer of crystalline Ga2O3, paralleled by the formation of coherent Ga2O3/Al2O3 interfaces. Versatile functionalities are demonstrated in photon sensors based on GaSe and Ga2O3, ranging from electrical insulation to unfiltered deep ultraviolet optoelectronics, unlocking the technological potential of GaSe nanostructures and their amorphous and crystalline oxides.
Collapse
Affiliation(s)
- Nathan D. Cottam
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, United
Kingdom
| | - Benjamin T. Dewes
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, United
Kingdom
| | - Mustaqeem Shiffa
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, United
Kingdom
| | - Tin S. Cheng
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, United
Kingdom
| | - Sergei V. Novikov
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, United
Kingdom
| | - Christopher J. Mellor
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, United
Kingdom
| | - Oleg Makarovsky
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, United
Kingdom
| | - David Gonzalez
- University
Research Institute on Electron Microscopy and Materials, IMEYMAT, Universidad de Cadiz, 11510 Cadiz, Spain
| | - Teresa Ben
- University
Research Institute on Electron Microscopy and Materials, IMEYMAT, Universidad de Cadiz, 11510 Cadiz, Spain
| | - Amalia Patanè
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, United
Kingdom
| |
Collapse
|
5
|
Zhao F, He Y, Huang B, Zhang T, Zhu H. A Review of Diamond Materials and Applications in Power Semiconductor Devices. MATERIALS (BASEL, SWITZERLAND) 2024; 17:3437. [PMID: 39063728 PMCID: PMC11278176 DOI: 10.3390/ma17143437] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/20/2024] [Revised: 07/06/2024] [Accepted: 07/08/2024] [Indexed: 07/28/2024]
Abstract
Diamond is known as the ultimate semiconductor material for electric devices with excellent properties such as an ultra-wide bandgap (5.47 eV), high carrier mobility (electron mobility 4000 cm2/V·s, hole mobility 3800 cm2/V·s), high critical breakdown electric field (20 MV/cm), and high thermal conductivity (22 W/cm·K), showing good prospects in high-power applications. The lack of n-type diamonds limits the development of bipolar devices; most of the research focuses on p-type Schottky barrier diodes (SBDs) and unipolar field-effect transistors (FETs) based on terminal technology. In recent years, breakthroughs have been made through the introduction of new structures, dielectric materials, heterogeneous epitaxy, etc. Currently, diamond devices have shown promising applications in high-power applications, with a BV of 10 kV, a BFOM of 874.6 MW/cm2, and a current density of 60 kA/cm2 already realized. This review summarizes the research progress of diamond materials, devices, and specific applications, with a particular focus on the development of SBDs and FETs and their use in high-power applications, aiming to provide researchers with the relevant intuitive parametric comparisons. Finally, the paper provides an outlook on the parameters and development directions of diamond power devices.
Collapse
Affiliation(s)
- Feiyang Zhao
- School of Microelectronics, Fudan University, Shanghai 200433, China; (F.Z.); (Y.H.); (B.H.); (T.Z.)
| | - Yongjie He
- School of Microelectronics, Fudan University, Shanghai 200433, China; (F.Z.); (Y.H.); (B.H.); (T.Z.)
| | - Bin Huang
- School of Microelectronics, Fudan University, Shanghai 200433, China; (F.Z.); (Y.H.); (B.H.); (T.Z.)
| | - Tianyi Zhang
- School of Microelectronics, Fudan University, Shanghai 200433, China; (F.Z.); (Y.H.); (B.H.); (T.Z.)
| | - Hao Zhu
- School of Microelectronics, Fudan University, Shanghai 200433, China; (F.Z.); (Y.H.); (B.H.); (T.Z.)
- National Integrated Circuit Innovation Center, Shanghai 201203, China
| |
Collapse
|
6
|
Znati S, Wharwood J, Tezanos KG, Li X, Mohseni PK. Metal-assisted chemical etching beyond Si: applications to III-V compounds and wide-bandgap semiconductors. NANOSCALE 2024; 16:10901-10946. [PMID: 38804075 DOI: 10.1039/d4nr00857j] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2024]
Abstract
Metal-assisted chemical etching (MacEtch) has emerged as a versatile technique for fabricating a variety of semiconductor nanostructures. Since early investigations in 2000, research in this field has provided a deeper understanding of the underlying mechanisms of catalytic etching processes and enabled high control over etching conditions for diverse applications. In this Review, we present an overview of recent developments in the application of MacEtch to nanomanufacturing and processing of III-V based semiconductor materials and other materials beyond Si. We highlight the key findings and developments in MacEtch as applied to GaAs, GaN, InP, GaP, InGaAs, AlGaAs, InGaN, InGaP, SiC, β-Ga2O3, and Ge material systems. We further review a series of active and passive devices enabled by MacEtch, including light-emitting diodes (LEDs), field-effect transistors (FETs), optical gratings, sensors, capacitors, photodiodes, and solar cells. By reviewing demonstrated control of morphology, optimization of etch conditions, and catalyst-material combinations, we aim to distill the current understanding of beyond-Si MacEtch mechanisms and to provide a bank of reference recipes to stimulate progress in the field.
Collapse
Affiliation(s)
- Sami Znati
- Microsystem Engineering, Rochester Institute of Technology, Rochester, NY 16423, USA.
- NanoPower Research Laboratories, Rochester Institute of Technology, Rochester, NY 14623, USA
| | - Juwon Wharwood
- NanoPower Research Laboratories, Rochester Institute of Technology, Rochester, NY 14623, USA
- Department of Electrical and Computer Engineering, Howard University, Washington, DC 20059, USA
| | - Kyle G Tezanos
- NanoPower Research Laboratories, Rochester Institute of Technology, Rochester, NY 14623, USA
- School of Materials Science and Chemistry, Rochester Institute of Technology, Rochester, NY 14623, USA
| | - Xiuling Li
- Department of Electrical and Computer Engineering, Microelectronics Research Center, The University of Texas at Austin, Austin, TX 78758, USA
| | - Parsian K Mohseni
- Microsystem Engineering, Rochester Institute of Technology, Rochester, NY 16423, USA.
- NanoPower Research Laboratories, Rochester Institute of Technology, Rochester, NY 14623, USA
- School of Materials Science and Chemistry, Rochester Institute of Technology, Rochester, NY 14623, USA
- Department of Electrical and Microelectronic Engineering, Rochester Institute of Technology, Rochester, NY 14623, USA
| |
Collapse
|
7
|
Zhang Z, Wang T, Jiang H, Qi R, Li Y, Wang J, Sheng S, Li N, Shi R, Wei J, Liu F, Zhang S, Huo X, Du J, Zhang J, Xu J, Rong X, Gao P, Shen B, Wang X. Probing Hyperbolic Shear Polaritons in β-Ga 2O 3 Nanostructures Using STEM-EELS. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2204884. [PMID: 38374724 DOI: 10.1002/adma.202204884] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/30/2022] [Revised: 01/23/2024] [Indexed: 02/21/2024]
Abstract
Phonon polaritons, quasiparticles arising from strong coupling between electromagnetic waves and optical phonons, have potential for applications in subdiffraction imaging, sensing, thermal conduction enhancement, and spectroscopy signal enhancement. A new class of phonon polaritons in low-symmetry monoclinic crystals, hyperbolic shear polaritons (HShPs), have been verified recently in β-Ga2O3 by free electron laser (FEL) measurements. However, detailed behaviors of HShPs in β-Ga2O3 nanostructures still remain unknown. Here, by using monochromatic electron energy loss spectroscopy in conjunction with scanning transmission electron microscopy, the experimental observation of multiple HShPs in β-Ga2O3 in the mid-infrared (MIR) and far-infrared (FIR) ranges is reported. HShPs in various β-Ga2O3 nanorods and a β-Ga2O3 nanodisk are excited. The frequency-dependent rotation and shear effect of HShPs reflect on the distribution of EELS signals. The propagation and reflection of HShPs in nanostructures are clarified by simulations of electric field distribution. These findings suggest that, with its tunable broad spectral HShPs, β-Ga2O3 is an excellent candidate for nanophotonic applications.
Collapse
Affiliation(s)
- Zhenyu Zhang
- State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, 100871, China
- Electron Microscopy Laboratory, School of Physics, Peking University, Beijing, 100871, China
| | - Tao Wang
- State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, 100871, China
- Electron Microscopy Laboratory, School of Physics, Peking University, Beijing, 100871, China
| | - Hailing Jiang
- State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, 100871, China
| | - Ruishi Qi
- Electron Microscopy Laboratory, School of Physics, Peking University, Beijing, 100871, China
| | - Yuehui Li
- Electron Microscopy Laboratory, School of Physics, Peking University, Beijing, 100871, China
- International Center for Quantum Materials, School of Physics, Peking University, Beijing, 100871, China
| | - Jinlin Wang
- State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, 100871, China
| | - Shanshan Sheng
- State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, 100871, China
| | - Ning Li
- Electron Microscopy Laboratory, School of Physics, Peking University, Beijing, 100871, China
| | - Ruochen Shi
- Electron Microscopy Laboratory, School of Physics, Peking University, Beijing, 100871, China
| | - Jiaqi Wei
- State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, 100871, China
| | - Fang Liu
- State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, 100871, China
| | - Shengnan Zhang
- The 46th Research Institute, China Electronics Technology Group Corporation (CETC), Tianjin, 300220, China
| | - Xiaoqing Huo
- The 46th Research Institute, China Electronics Technology Group Corporation (CETC), Tianjin, 300220, China
| | - Jinlong Du
- Electron Microscopy Laboratory, School of Physics, Peking University, Beijing, 100871, China
| | - Jingmin Zhang
- Electron Microscopy Laboratory, School of Physics, Peking University, Beijing, 100871, China
| | - Jun Xu
- Electron Microscopy Laboratory, School of Physics, Peking University, Beijing, 100871, China
| | - Xin Rong
- State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, 100871, China
| | - Peng Gao
- Electron Microscopy Laboratory, School of Physics, Peking University, Beijing, 100871, China
- International Center for Quantum Materials, School of Physics, Peking University, Beijing, 100871, China
- Collaborative Innovation Center of Quantum Matter, Peking University, Beijing, 100871, China
| | - Bo Shen
- State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, 100871, China
- Collaborative Innovation Center of Quantum Matter, Peking University, Beijing, 100871, China
- Peking University Yangtze Delta Institute of Optoelectronics, Nantong, Jiangsu, 226010, China
| | - Xinqiang Wang
- State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, 100871, China
- Collaborative Innovation Center of Quantum Matter, Peking University, Beijing, 100871, China
- Peking University Yangtze Delta Institute of Optoelectronics, Nantong, Jiangsu, 226010, China
| |
Collapse
|
8
|
He Y, Zhao F, Huang B, Zhang T, Zhu H. A Review of β-Ga 2O 3 Power Diodes. MATERIALS (BASEL, SWITZERLAND) 2024; 17:1870. [PMID: 38673227 PMCID: PMC11052528 DOI: 10.3390/ma17081870] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/29/2024] [Revised: 04/15/2024] [Accepted: 04/15/2024] [Indexed: 04/28/2024]
Abstract
As the most stable phase of gallium oxide, β-Ga2O3 can enable high-quality, large-size, low-cost, and controllably doped wafers by the melt method. It also features a bandgap of 4.7-4.9 eV, a critical electric field strength of 8 MV/cm, and a Baliga's figure of merit (BFOM) of up to 3444, which is 10 and 4 times higher than that of SiC and GaN, respectively, showing great potential for application in power devices. However, the lack of effective p-type Ga2O3 limits the development of bipolar devices. Most research has focused on unipolar devices, with breakthroughs in recent years. This review mainly summarizes the research progress fora different structures of β-Ga2O3 power diodes and gives a brief introduction to their thermal management and circuit applications.
Collapse
Affiliation(s)
- Yongjie He
- School of Microelectronics, Fudan University, Shanghai 200433, China; (Y.H.); (F.Z.); (B.H.); (T.Z.)
| | - Feiyang Zhao
- School of Microelectronics, Fudan University, Shanghai 200433, China; (Y.H.); (F.Z.); (B.H.); (T.Z.)
| | - Bin Huang
- School of Microelectronics, Fudan University, Shanghai 200433, China; (Y.H.); (F.Z.); (B.H.); (T.Z.)
| | - Tianyi Zhang
- School of Microelectronics, Fudan University, Shanghai 200433, China; (Y.H.); (F.Z.); (B.H.); (T.Z.)
| | - Hao Zhu
- School of Microelectronics, Fudan University, Shanghai 200433, China; (Y.H.); (F.Z.); (B.H.); (T.Z.)
- National Integrated Circuit Innovation Center, Shanghai 201203, China
| |
Collapse
|
9
|
Ren WL, Li CZ, Ullah A, Yu XZ. Boron deficiency decreased the root activity of Ga-exposed rice seedlings by reducing iron accumulation and increasing Ga in iron plaque. ECOTOXICOLOGY (LONDON, ENGLAND) 2024; 33:142-150. [PMID: 38282122 DOI: 10.1007/s10646-024-02731-5] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Accepted: 01/08/2024] [Indexed: 01/30/2024]
Abstract
Gallium (Ga) is an emerging chemical pollutant chiefly associated with high-tech industries. Boron (B) alleviates the negative effects of toxic elements on plant growth. Thereby, the effects of B fertilization on Ga toxicity in rice seedlings was studied to clarify the role of iron plaque in the distribution of Ga, Fe, and B in Ga-treated rice seedlings in the presence or absence of B. Gallium exposure significantly reduced the biomass of rice seedlings. Boron deficiency induced a significant change in the distribution of B in Ga-treated rice seedlings compared with "Ga+B" treatments. Accumulation of Ga in roots, dithionite-citrate-bicarbonate (DCB) extracts, and shoots showed a dose-dependent manner from both +B and -B rice seedlings. Boron nutrition levels affect the distribution of Fe in roots, DCB extracts, and shoots, in which DCB-extractable Fe was significantly decreased from "Ga-B" treatments compared with "Ga+B" treatments. Root activity was significantly decreased in both Ga-exposed rice seedlings; however, B-deficient seedlings showed a severe reduction than +B rice seedlings. These results reveal that Fe plaque might be a temporary sink for B accumulation when plants are grown with proper B, wherein the re-utilization of DCB-extractable B stored in Fe plaque is mandatory for plant growth under B deficiency. Correlation analysis revealed that B deficiency decreased the root activity of Ga-exposed rice seedlings by reducing DCB-extractable Fe and increasing DCB-extractable Ga in Fe plaque. This study enhances our understanding of how B nutritional levels affect Ga toxicity in rice plants.
Collapse
Affiliation(s)
- Wei-Lin Ren
- College of Environmental Science & Engineering, Guilin University of Technology, Guilin, 541004, People's Republic of China
| | - Cheng-Zhi Li
- College of Environmental Science & Engineering, Guilin University of Technology, Guilin, 541004, People's Republic of China
| | - Abid Ullah
- College of Environmental Science & Engineering, Guilin University of Technology, Guilin, 541004, People's Republic of China
| | - Xiao-Zhang Yu
- College of Environmental Science & Engineering, Guilin University of Technology, Guilin, 541004, People's Republic of China.
| |
Collapse
|
10
|
Zhang DC, Ullah A, Tian P, Yu XZ. Response to gallium (Ga) exposure and its distribution in rice plants. ENVIRONMENTAL SCIENCE AND POLLUTION RESEARCH INTERNATIONAL 2023; 30:121908-121914. [PMID: 37964144 DOI: 10.1007/s11356-023-30975-x] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/16/2023] [Accepted: 11/05/2023] [Indexed: 11/16/2023]
Abstract
Root architecture is the temporal and spatial configuration of root system in the heterogeneous matrix of soil that is prone to chemical stresses. Gallium (Ga) is among the emerging chemical pollutants that are mostly associated with high-tech industries, specifically associated with semiconductors. In view of its potential risk and increasing distribution in the environment, this study was designed to evaluate the inhibition rate, Ga distribution in different tissues, and root architecture of rice seedlings under different concentrations of Ga. We observed that 2.59, 46.7, and 168.2 mg Ga/L were minimum (EC20), medium (EC50), and maximum (EC75) effective concentrations for rice plants that corresponded to the 20, 50, and 75% inhibition on the relative growth rate, respectively. Distribution of Ga in rice tissues showed that accumulation of Ga was much higher in roots than shoots of rice seedlings, and it increased with an increase in Ga doses. Evan blue staining technique reveals that the number of damaged/dead cell was dose-dependent on Ga. Moreover, several traits associated with root system architecture demonstrating that rice root system architecture altered in response to Ga stress. Collectively, the results reveal that Ga exposure inhibited the growth and development of rice plants. This study will enhance our understanding that how different concentrations of Ga in the environment can affect plants; however, more comprehensive studies are essential to further determine plant response against Ga stress.
Collapse
Affiliation(s)
- Dong-Chi Zhang
- College of Environmental Science & Engineering, Guilin University of Technology, Guilin, 541004, People's Republic of China
| | - Abid Ullah
- College of Environmental Science & Engineering, Guilin University of Technology, Guilin, 541004, People's Republic of China
| | - Peng Tian
- College of Environmental Science & Engineering, Guilin University of Technology, Guilin, 541004, People's Republic of China
| | - Xiao-Zhang Yu
- College of Environmental Science & Engineering, Guilin University of Technology, Guilin, 541004, People's Republic of China.
| |
Collapse
|
11
|
Zhang Q, Li N, Zhang T, Dong D, Yang Y, Wang Y, Dong Z, Shen J, Zhou T, Liang Y, Tang W, Wu Z, Zhang Y, Hao J. Enhanced gain and detectivity of unipolar barrier solar blind avalanche photodetector via lattice and band engineering. Nat Commun 2023; 14:418. [PMID: 36697428 PMCID: PMC9877014 DOI: 10.1038/s41467-023-36117-8] [Citation(s) in RCA: 35] [Impact Index Per Article: 35.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/08/2022] [Accepted: 01/16/2023] [Indexed: 01/27/2023] Open
Abstract
Ga2O3-based solar blind avalanche photodetectors exhibit low voltage operation, optical filter-free and monolithic integration of photodetector arrays, and therefore they are promising to be an alternative to the bulky and fragile photomultiplier tubes for weak signal detection in deep-ultraviolet region. Here, by deliberate lattice and band engineering, we construct an n-Barrier-n unipolar barrier avalanche photodetector consisting of β-Ga2O3/MgO/Nb:SrTiO3 heterostructure, in which the enlarged conduction band offsets fortify the reverse breakdown and suppress the dark current while the negligible valance band offsets faciliate minority carrier flow across the heterojunction. The developed devices exhibit record-high avalanche gain up to 5.9 × 105 and detectivity of 2.33 × 1016 Jones among the reported wafer-scale grown Ga2O3-based photodetectors, which are even comparable to the commercial photomultiplier tubes. These findings provide insights into precise manipulation of band alignment in avalanche photodetectors, and also offer exciting opportunities for further developing high-performance Ga2O3-based electronics and optoelectronics.
Collapse
Affiliation(s)
- Qingyi Zhang
- grid.31880.320000 0000 8780 1230State Key Laboratory of Information Photonics and Optical Communications & School of Science, Beijing University of Posts and Telecommunications, Beijing, 100876 P. R. China
| | - Ning Li
- grid.31880.320000 0000 8780 1230State Key Laboratory of Information Photonics and Optical Communications & School of Science, Beijing University of Posts and Telecommunications, Beijing, 100876 P. R. China
| | - Tao Zhang
- grid.31880.320000 0000 8780 1230State Key Laboratory of Information Photonics and Optical Communications & School of Science, Beijing University of Posts and Telecommunications, Beijing, 100876 P. R. China
| | - Dianmeng Dong
- grid.31880.320000 0000 8780 1230State Key Laboratory of Information Photonics and Optical Communications & School of Science, Beijing University of Posts and Telecommunications, Beijing, 100876 P. R. China
| | - Yongtao Yang
- grid.31880.320000 0000 8780 1230State Key Laboratory of Information Photonics and Optical Communications & School of Science, Beijing University of Posts and Telecommunications, Beijing, 100876 P. R. China
| | - Yuehui Wang
- grid.31880.320000 0000 8780 1230State Key Laboratory of Information Photonics and Optical Communications & School of Science, Beijing University of Posts and Telecommunications, Beijing, 100876 P. R. China
| | - Zhengang Dong
- grid.31880.320000 0000 8780 1230State Key Laboratory of Information Photonics and Optical Communications & School of Science, Beijing University of Posts and Telecommunications, Beijing, 100876 P. R. China
| | - Jiaying Shen
- grid.31880.320000 0000 8780 1230State Key Laboratory of Information Photonics and Optical Communications & School of Science, Beijing University of Posts and Telecommunications, Beijing, 100876 P. R. China
| | - Tianhong Zhou
- grid.216938.70000 0000 9878 7032Institute of Modern Optics & Tianjin Key Laboratory of Micro-Scale Optical Information Science and Technology, Nankai University, Tianjin, 300071 P. R. China
| | - Yuanlin Liang
- grid.216938.70000 0000 9878 7032Institute of Modern Optics & Tianjin Key Laboratory of Micro-Scale Optical Information Science and Technology, Nankai University, Tianjin, 300071 P. R. China
| | - Weihua Tang
- grid.31880.320000 0000 8780 1230State Key Laboratory of Information Photonics and Optical Communications & School of Science, Beijing University of Posts and Telecommunications, Beijing, 100876 P. R. China
| | - Zhenping Wu
- grid.31880.320000 0000 8780 1230State Key Laboratory of Information Photonics and Optical Communications & School of Science, Beijing University of Posts and Telecommunications, Beijing, 100876 P. R. China
| | - Yang Zhang
- grid.216938.70000 0000 9878 7032Institute of Modern Optics & Tianjin Key Laboratory of Micro-Scale Optical Information Science and Technology, Nankai University, Tianjin, 300071 P. R. China
| | - Jianhua Hao
- grid.16890.360000 0004 1764 6123Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Hong Kong, P. R. China ,grid.16890.360000 0004 1764 6123The Hong Kong Polytechnic University Shenzhen Research Institute, Shenzhen, 518057 P. R. China
| |
Collapse
|
12
|
Electrochemical behavior of gallium electrodeposition and inhibition of hydrogen evolution reaction in alkaline electrolyte. J APPL ELECTROCHEM 2022. [DOI: 10.1007/s10800-022-01825-4] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/23/2022]
|
13
|
Zhu J, Xu Z, Ha S, Li D, Zhang K, Zhang H, Feng J. Gallium Oxide for Gas Sensor Applications: A Comprehensive Review. MATERIALS (BASEL, SWITZERLAND) 2022; 15:7339. [PMID: 36295403 PMCID: PMC9611408 DOI: 10.3390/ma15207339] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/19/2022] [Revised: 10/09/2022] [Accepted: 10/12/2022] [Indexed: 06/16/2023]
Abstract
Ga2O3 has emerged as a promising ultrawide bandgap semiconductor for numerous device applications owing to its excellent material properties. In this paper, we present a comprehensive review on major advances achieved over the past thirty years in the field of Ga2O3-based gas sensors. We begin with a brief introduction of the polymorphs and basic electric properties of Ga2O3. Next, we provide an overview of the typical preparation methods for the fabrication of Ga2O3-sensing material developed so far. Then, we will concentrate our discussion on the state-of-the-art Ga2O3-based gas sensor devices and put an emphasis on seven sophisticated strategies to improve their gas-sensing performance in terms of material engineering and device optimization. Finally, we give some concluding remarks and put forward some suggestions, including (i) construction of hybrid structures with two-dimensional materials and organic polymers, (ii) combination with density functional theoretical calculations and machine learning, and (iii) development of optical sensors using the characteristic optical spectra for the future development of novel Ga2O3-based gas sensors.
Collapse
Affiliation(s)
- Jun Zhu
- School of Physical Science and Technology, Inner Mongolia University, Hohhot 010021, China
| | - Zhihao Xu
- Global Zero Emission Research Center (GZR), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 3058560, Japan
| | - Sihua Ha
- College of Sciences, Inner Mongolia University of Technology, Hohhot 010051, China
| | - Dongke Li
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, School of Materials Science and Engineering, Zhejiang University, Hangzhou 311200, China
| | - Kexiong Zhang
- School of Microelectronics, Dalian University of Technology, Dalian 116602, China
| | - Hai Zhang
- College of Sciences, Inner Mongolia University of Technology, Hohhot 010051, China
| | - Jijun Feng
- Shanghai Key Laboratory of Modern Optical System, Engineering Research Center of Optical Instrument and System (Ministry of Education), School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China
| |
Collapse
|