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Jungwirth F, Salvador-Porroche A, Porrati F, Jochmann NP, Knez D, Huth M, Gracia I, Cané C, Cea P, De Teresa JM, Barth S. Gas-Phase Synthesis of Iron Silicide Nanostructures Using a Single-Source Precursor: Comparing Direct-Write Processing and Thermal Conversion. THE JOURNAL OF PHYSICAL CHEMISTRY. C, NANOMATERIALS AND INTERFACES 2024; 128:2967-2977. [PMID: 38444783 PMCID: PMC10910579 DOI: 10.1021/acs.jpcc.3c08250] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 12/18/2023] [Revised: 01/24/2024] [Accepted: 01/29/2024] [Indexed: 03/07/2024]
Abstract
The investigation of precursor classes for the fabrication of nanostructures is of specific interest for maskless fabrication and direct nanoprinting. In this study, the differences in material composition depending on the employed process are illustrated for focused-ion-beam- and focused-electron-beam-induced deposition (FIBID/FEBID) and compared to the thermal decomposition in chemical vapor deposition (CVD). This article reports on specific differences in the deposit composition and microstructure when the (H3Si)2Fe(CO)4 precursor is converted into an inorganic material. Maximum metal/metalloid contents of up to 90 at. % are obtained in FIBID deposits and higher than 90 at. % in CVD films, while FEBID with the same precursor provides material containing less than 45 at. % total metal/metalloid content. Moreover, the Fe:Si ratio is retained well in FEBID and CVD processes, but FIBID using Ga+ ions liberates more than 50% of the initial Si provided by the precursor. This suggests that precursors for FIBID processes targeting binary materials should include multiple bonding such as bridging positions for nonmetals. In addition, an in situ method for investigations of supporting thermal effects of precursor fragmentation during the direct-writing processes is presented, and the applicability of the precursor for nanoscale 3D FEBID writing is demonstrated.
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Affiliation(s)
- Felix Jungwirth
- Institute
of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, Frankfurt am Main 60323, Germany
- Institute
for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, Frankfurt 60438, Germany
| | - Alba Salvador-Porroche
- Instituto
de Nanociencia y Materiales de Aragón (INMA), CSIC−Universidad de Zaragoza, Zaragoza 50009, Spain
| | - Fabrizio Porrati
- Institute
of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, Frankfurt am Main 60323, Germany
| | - Nicolas P. Jochmann
- Institute
of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, Frankfurt am Main 60323, Germany
- Institute
for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, Frankfurt 60438, Germany
| | - Daniel Knez
- Institute
of Electron Microscopy and Nanoanalysis, Graz University of Technology, Steyrergasse 17, Graz 8010, Austria
| | - Michael Huth
- Institute
of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, Frankfurt am Main 60323, Germany
| | - Isabel Gracia
- Institut
de Microelectrònica de Barcelona (IMB), Centre Nacional de
Microelectrònica (CNM), Consejo Superior
de Investigaciones Científicas (CSIC), Barcelona 08193, Spain
| | - Carles Cané
- Institut
de Microelectrònica de Barcelona (IMB), Centre Nacional de
Microelectrònica (CNM), Consejo Superior
de Investigaciones Científicas (CSIC), Barcelona 08193, Spain
| | - Pilar Cea
- Instituto
de Nanociencia y Materiales de Aragón (INMA), CSIC−Universidad de Zaragoza, Zaragoza 50009, Spain
- Laboratorio
de Microscopías Avanzadas (LMA), Universidad de Zaragoza, Edificio de
I+D+i, Campus Río Ebro, Zaragoza 50018, Spain
| | - José María De Teresa
- Instituto
de Nanociencia y Materiales de Aragón (INMA), CSIC−Universidad de Zaragoza, Zaragoza 50009, Spain
| | - Sven Barth
- Institute
of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, Frankfurt am Main 60323, Germany
- Institute
for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, Frankfurt 60438, Germany
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Haslinger MJ, Maier OS, Pribyl M, Taus P, Kopp S, Wanzenboeck HD, Hingerl K, Muehlberger MM, Guillén E. Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:nano13091556. [PMID: 37177101 PMCID: PMC10180511 DOI: 10.3390/nano13091556] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/06/2023] [Revised: 04/28/2023] [Accepted: 04/29/2023] [Indexed: 05/15/2023]
Abstract
Structural anti-reflective coating and bactericidal surfaces, as well as many other effects, rely on high-aspect-ratio (HAR) micro- and nanostructures, and thus, are of great interest for a wide range of applications. To date, there is no widespread fabrication of dense or isolated HAR nanopillars based on UV nanoimprint lithography (UV-NIL). In addition, little research on fabricating isolated HAR nanopillars via UV-NIL exists. In this work, we investigated the mastering and replication of HAR nanopillars with the smallest possible diameters for dense and isolated arrangements. For this purpose, a UV-based nanoimprint lithography process was developed. Stability investigations with capillary forces were performed and compared with simulations. Finally, strategies were developed in order to increase the stability of imprinted nanopillars or to convert them into nanoelectrodes. We present UV-NIL replication of pillars with aspect ratios reaching up to 15 with tip diameters down to 35 nm for the first time. We show that the stability could be increased by a factor of 58 when coating them with a 20 nm gold layer and by a factor of 164 when adding an additional 20 nm thick layer of SiN. The coating of the imprints significantly improved the stability of the nanopillars, thus making them interesting for a wide range of applications.
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Affiliation(s)
| | - Oliver S Maier
- PROFACTOR GmbH, 4407 Steyr-Gleink, Austria
- Center for Surface and Nanoanalytics, Johannes Kepler University Linz, 4040 Linz, Austria
| | - Markus Pribyl
- TU Wien, Institute for Solid State Electronics, 1040 Vienna, Austria
| | - Philipp Taus
- TU Wien, Institute for Solid State Electronics, 1040 Vienna, Austria
| | - Sonja Kopp
- PROFACTOR GmbH, 4407 Steyr-Gleink, Austria
| | | | - Kurt Hingerl
- Center for Surface and Nanoanalytics, Johannes Kepler University Linz, 4040 Linz, Austria
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