Gold nanoparticle arrays organized in mixed patterns through directed self-assembly of ultrathin block copolymer films on topographic substrates

Nanoparticle Assembly: From Self-Organization to Controlled Micropatterning for Enhanced Functionalities

Nanoparticles form long-range micropatterns via self-assembly or directed self-assembly with superior mechanical, electrical, optical, magnetic, chemical, and other functional properties for broad applications, such as structural supports, thermal exchangers, optoelectronics, microelectronics, and robotics. The precisely defined particle assembly at the nanoscale with simultaneously scalable patterning at the microscale is indispensable for enabling functionality and improving the performance of devices. This article provides a comprehensive review of nanoparticle assembly formed primarily via the balance of forces at the nanoscale (e.g., van der Waals, colloidal, capillary, convection, and chemical forces) and nanoparticle-template interactions (e.g., physical confinement, chemical functionalization, additive layer-upon-layer). The review commences with a general overview of nanoparticle self-assembly, with the state-of-the-art literature review and motivation. It subsequently reviews the recent progress in nanoparticle assembly without the presence of surface templates. Manufacturing techniques for surface template fabrication and their influence on nanoparticle assembly efficiency and effectiveness are then explored. The primary focus is the spatial organization and orientational preference of nanoparticles on non-templated and pre-templated surfaces in a controlled manner. Moreover, the article discusses broad applications of micropatterned surfaces, encompassing various fields. Finally, the review concludes with a summary of manufacturing methods, their limitations, and future trends in nanoparticle assembly.

Connection of ssDNA to Silicon Substrate Based on a Mechano-Chemical Method

A novel fabrication process to connect single-stranded DNA (ssDNA)to a silicon substrate based on a mechano-chemical method is proposed. In this method, the single crystal silicon substrate was mechanically scribed in a diazonium solution of benzoic acid using a diamond tip which formed silicon free radicals. These combined covalently with organic molecules of diazonium benzoic acid contained in the solution to form self-assembled films (SAMs). The SAMs were characterized and analyzed by AFM, X-ray photoelectron spectroscopy and infrared spectroscopy. The results showed that the self-assembled films were covalently connected to the silicon substrate by Si-C. In this way, a nano-level benzoic acid coupling layer was self-assembled on the scribed area of the silicon substrate. The ssDNA was further covalently connected to the silicon surface by the coupling layer. Fluorescence microscopy showed that ssDNA had been connected, and the influence of ssDNA concentration on the fixation effect was studied. The fluorescence brightness gradually increased with the gradual increase in ssDNA concentration from 5 μmol/L to 15 μmol/L, indicating that the fixed amount of ssDNA increased. However, when the concentration of ssDNA increased from 15 μmol/L to 20 μmol/L, the detected fluorescence brightness decreased, indicating that the hybridization amount decreased. The reason may be related to the spatial arrangement of DNA and the electrostatic repulsion between DNA molecules. It was also found that ssDNA junctions on the silicon surface were not very uniform, which was related to many factors, such as the inhomogeneity of the self-assembled coupling layer, the multi-step experimental operation and the pH value of the fixation solution.

Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement

Directed self-assembly of block copolymers is evolving toward applications that are more defect-tolerant but still require high morphological control and could benefit from simple, inexpensive fabrication processes. Previously, we demonstrated that simply casting ultra-thin block copolymer films on topographically defined substrates leads to hierarchical structures with dual patterns in a controlled manner and unraveled the dependence of the local morphology on the topographic feature dimensions. In this article, we discuss the extreme of the ultraconfined thickness regime at the border of film dewetting. Additional non-bulk morphologies are observed at this extreme, which further elaborate the arsenal of dual patterns that could be obtained in coexistence with full placement control. It is shown that as the thickness confinement approaches its limit, lateral confinement imposed by the width of the plateaus becomes a critical factor influencing the local morphology.

Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature

The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on the plateaus and in the trenches, which leads to the co-existence of two patterns. In this work, we highlight the dependence of the dual patterns on the film profile. We suggest that the steepness of the film profile formed across the plateau edge affects the nucleation of microphase-separated domains near the plateau edges, which influences the morphology that develops on the plateau regions. An analysis of the local film thicknesses in multiple samples exhibiting various combinations of plateau and trench widths for different trench depths enabled the construction of phase diagrams, which unraveled the intricate dependence of the formed patterns not only on the curvature of the film profile but also on the fraction of the film that resides in the trenches. Our analysis facilitates the prediction of the patterns that would develop in the trenches and on the plateaus for a given block copolymer film of known thickness from the dimensions of the topographic features.

Fabrication of Multiscale 1-Octadecene Monolayer Patterned Arrays Based on a Chemomechanical Method

A controlled and self-assembled micromachining system was built to fabricate a mico/nanoscale monolayer patterned array on a silicon surface using a diamond tip. The process was as follows: (1) we preprocessed a silicon wafer to obtain a hydrogen-terminated silicon surface; (2) we scratched three rectangular arrays of 10 μm × 3 μm with a spacing of 2 μm on the silicon surface with a diamond tip in 1-octadecene solution; the Si-H bonds were broken, and silicon free radicals were formed; (3) the 1-octadecene molecules were connected with silicon atoms based on Si-C covalent bonds, and the 1-octadecene nano monolayer was self-assembled on the patterned arrays of the silicon surface. Atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and Sessile water contact angles were used to detect and characterize the self-assembled monolayers (SAMs). The XPS results showed that the Si2p peak and the O1s peak were significantly decreased after self-assembly; however, the C1s peak was successively significantly increased. Sessile water contact angles showed that the hydrophilicity was weakened after the formation of 1-octenecene SAMs on the silicon substrate. The nanofriction of the sample was measured with AFM. The change in nanofriction also demonstrated that the SAMs were formed in accordance with the patterned array. We demonstrated that, by using this method, self-assembled multiscale structures on silicon substrate can be formed quickly and conveniently.