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Zhu F, Li W, Yeung MC, Zhang Y, Du C, Lin B, Wang Q, Guo X, Hsueh YC, Chen FR, Zhong X. Quantitative Determination of High-Frequency Voltage Attenuation in an Electric-Pulse-Excited Stroboscopic Transmission Electron Microscope. MICROSCOPY AND MICROANALYSIS : THE OFFICIAL JOURNAL OF MICROSCOPY SOCIETY OF AMERICA, MICROBEAM ANALYSIS SOCIETY, MICROSCOPICAL SOCIETY OF CANADA 2025:ozae132. [PMID: 39903509 DOI: 10.1093/mam/ozae132] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/14/2024] [Revised: 12/09/2024] [Accepted: 12/16/2024] [Indexed: 02/06/2025]
Abstract
High-frequency electric pulse signals are often applied to stimulate functional materials in devices. To investigate the relationship between materials structure and dynamic behavior under high-frequency electric excitation, the stroboscopic imaging mode is widely used in a transmission electron microscope (TEM). From a technical point of view, it is crucial to quantitatively determine high-frequency attenuation in an electric-pulse-excited stroboscopic TEM. Here, we propose the quantitative method to evaluate the voltage attenuation by using magnification variation of defocused bright-field transmission electron microscopy images in a stroboscopic mode when applying high-frequency electric pulse signals onto a model system of two opposite tungsten tips. The negative voltage excitation possesses higher high-frequency voltage attenuation than the positive voltage excitation due to the possible nonreciprocal transmission of the triangle waves within the circuit between the biasing sample holder and the arbitrary waveform generator. Our approach of high-frequency attenuation determination provides the experimental foundation for quantitative analysis on the dynamic evolution of materials structure and functionality under electric pulse stimuli.
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Affiliation(s)
- Feng Zhu
- TRACE EM Unit and Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
- City University of Hong Kong Matter Science Research Institute (Futian), No. 3, Binglang Rd, Fubao Street, Futian District, Shenzhen 518048, People's Republic of China
- Nanomanufacturing Laboratory (NML), City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-tech Industrial Park, Nanshan District, Shenzhen 518057, People's Republic of China
| | - Wanpeng Li
- TRACE EM Unit and Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
- City University of Hong Kong Matter Science Research Institute (Futian), No. 3, Binglang Rd, Fubao Street, Futian District, Shenzhen 518048, People's Republic of China
- Nanomanufacturing Laboratory (NML), City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-tech Industrial Park, Nanshan District, Shenzhen 518057, People's Republic of China
- Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 101400, People's Republic of China
| | - Man Chun Yeung
- TRACE EM Unit and Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
- City University of Hong Kong Matter Science Research Institute (Futian), No. 3, Binglang Rd, Fubao Street, Futian District, Shenzhen 518048, People's Republic of China
| | - Yuxuan Zhang
- TRACE EM Unit and Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
| | - Congcong Du
- TRACE EM Unit and Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
- City University of Hong Kong Matter Science Research Institute (Futian), No. 3, Binglang Rd, Fubao Street, Futian District, Shenzhen 518048, People's Republic of China
- Nanomanufacturing Laboratory (NML), City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-tech Industrial Park, Nanshan District, Shenzhen 518057, People's Republic of China
- Qingyuan Innovation Laboratory, Quanzhou 362801, People's Republic of China
| | - Bin Lin
- TRACE EM Unit and Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
- City University of Hong Kong Matter Science Research Institute (Futian), No. 3, Binglang Rd, Fubao Street, Futian District, Shenzhen 518048, People's Republic of China
- Nanomanufacturing Laboratory (NML), City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-tech Industrial Park, Nanshan District, Shenzhen 518057, People's Republic of China
| | - Qi Wang
- TRACE EM Unit and Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
- City University of Hong Kong Matter Science Research Institute (Futian), No. 3, Binglang Rd, Fubao Street, Futian District, Shenzhen 518048, People's Republic of China
- Nanomanufacturing Laboratory (NML), City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-tech Industrial Park, Nanshan District, Shenzhen 518057, People's Republic of China
| | - Xiaofeng Guo
- TRACE EM Unit and Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
- City University of Hong Kong Matter Science Research Institute (Futian), No. 3, Binglang Rd, Fubao Street, Futian District, Shenzhen 518048, People's Republic of China
- Nanomanufacturing Laboratory (NML), City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-tech Industrial Park, Nanshan District, Shenzhen 518057, People's Republic of China
| | - Yu-Chun Hsueh
- TRACE EM Unit and Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
- City University of Hong Kong Matter Science Research Institute (Futian), No. 3, Binglang Rd, Fubao Street, Futian District, Shenzhen 518048, People's Republic of China
- Nanomanufacturing Laboratory (NML), City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-tech Industrial Park, Nanshan District, Shenzhen 518057, People's Republic of China
- Department of Mechanical Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
| | - Fu-Rong Chen
- TRACE EM Unit and Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
- City University of Hong Kong Matter Science Research Institute (Futian), No. 3, Binglang Rd, Fubao Street, Futian District, Shenzhen 518048, People's Republic of China
- Nanomanufacturing Laboratory (NML), City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-tech Industrial Park, Nanshan District, Shenzhen 518057, People's Republic of China
| | - Xiaoyan Zhong
- TRACE EM Unit and Department of Materials Science and Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, People's Republic of China
- City University of Hong Kong Matter Science Research Institute (Futian), No. 3, Binglang Rd, Fubao Street, Futian District, Shenzhen 518048, People's Republic of China
- Nanomanufacturing Laboratory (NML), City University of Hong Kong Shenzhen Research Institute, 8 Yuexing 1st Road, Shenzhen Hi-tech Industrial Park, Nanshan District, Shenzhen 518057, People's Republic of China
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Seo J, Lee H, Eom K, Byun J, Min T, Lee J, Lee K, Eom CB, Oh SH. Feld-induced modulation of two-dimensional electron gas at LaAlO 3/SrTiO 3 interface by polar distortion of LaAlO 3. Nat Commun 2024; 15:5268. [PMID: 38902225 PMCID: PMC11189907 DOI: 10.1038/s41467-024-48946-2] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/13/2023] [Accepted: 05/19/2024] [Indexed: 06/22/2024] Open
Abstract
Since the discovery of two-dimensional electron gas at the LaAlO3/SrTiO3 interface, its intriguing physical properties have garnered significant interests for device applications. Yet, understanding its response to electrical stimuli remains incomplete. Our in-situ transmission electron microscopy analysis of a LaAlO3/SrTiO3 two-dimensional electron gas device under electrical bias reveals key insights. Inline electron holography visualized the field-induced modulation of two-dimensional electron gas at the interface, while electron energy loss spectroscopy showed negligible electromigration of oxygen vacancies. Instead, atom-resolved imaging indicated that electric fields trigger polar distortion in the LaAlO3 layer, affecting two-dimensional electron gas modulation. This study refutes the previously hypothesized role of oxygen vacancies, underscoring the lattice flexibility of LaAlO3 and its varied polar distortions under electric fields as central to two-dimensional electron gas dynamics. These findings open pathways for advanced oxide nanoelectronics, exploiting the interplay of polar and nonpolar distortions in LaAlO3.
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Affiliation(s)
- Jinsol Seo
- Department of Energy Engineering, KENTECH Institute for Energy Materials and Devices, Korea Institute of Energy Technology (KENTECH), Naju, Republic of Korea
| | - Hyungwoo Lee
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin, USA
- Department of Energy Systems Research and Department of Physics, Ajou University, Suwon, Republic of Korea
| | - Kitae Eom
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin, USA
| | - Jinho Byun
- Department of Energy Engineering, KENTECH Institute for Energy Materials and Devices, Korea Institute of Energy Technology (KENTECH), Naju, Republic of Korea
| | - Taewon Min
- Department of Physics, Pusan National University, Busan, Republic of Korea
| | - Jaekwang Lee
- Department of Physics, Pusan National University, Busan, Republic of Korea
| | - Kyoungjun Lee
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin, USA
| | - Chang-Beom Eom
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin, USA
| | - Sang Ho Oh
- Department of Energy Engineering, KENTECH Institute for Energy Materials and Devices, Korea Institute of Energy Technology (KENTECH), Naju, Republic of Korea.
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Heimes D, Chejarla VS, Ahmed S, Hüppe F, Beyer A, Volz K. Impact of beam size and diffraction effects in the measurement of long-range electric fields in crystalline samples via 4DSTEM. Ultramicroscopy 2023; 253:113821. [PMID: 37562100 DOI: 10.1016/j.ultramic.2023.113821] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/04/2023] [Revised: 06/27/2023] [Accepted: 07/25/2023] [Indexed: 08/12/2023]
Abstract
Measuring long-range electric fields by 4-dimensional scanning transmission electron microscopy (4DSTEM) is on the verge to becoming an established method, though quantifying and understanding all underlying processes remains a challenge. To gain further insight into these processes, experimental studies employing the center-of-mass (COM) method of the model system of a GaAs p-n junction are carried out in which three ranges of the semi-convergence angle α are identified, with an intermediate one where measuring the built-in potential Vbi is not feasible. STEM multislice simulations including both atomic and nm-scale fields prove that this intermediate range begins once diffraction disks start overlapping with the undiffracted beam. The range ends when the diffraction disks' intensities become so low that they do not affect the measurement significantly anymore and when high-intensity diffractions overlap the center disk completely. From simulations without influence of atoms it is concluded that measuring Vbi has advantages over measuring the electric-field strength, as the potential difference does neither show a significant dependence on the beam size, nor on the specimen thickness.
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Affiliation(s)
- Damien Heimes
- Material Sciences Center and Department of Physics, Philipps-Universität Marburg, Germany
| | - Varun Shankar Chejarla
- Material Sciences Center and Department of Physics, Philipps-Universität Marburg, Germany
| | - Shamail Ahmed
- Material Sciences Center and Department of Physics, Philipps-Universität Marburg, Germany
| | - Franziska Hüppe
- Material Sciences Center and Department of Physics, Philipps-Universität Marburg, Germany
| | - Andreas Beyer
- Material Sciences Center and Department of Physics, Philipps-Universität Marburg, Germany
| | - Kerstin Volz
- Material Sciences Center and Department of Physics, Philipps-Universität Marburg, Germany.
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Chejarla VS, Ahmed S, Belz J, Scheunert J, Beyer A, Volz K. Measuring Spatially-Resolved Potential Drops at Semiconductor Hetero-Interfaces Using 4D-STEM. SMALL METHODS 2023; 7:e2300453. [PMID: 37246264 DOI: 10.1002/smtd.202300453] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/05/2023] [Indexed: 05/30/2023]
Abstract
Characterizing long-range electric fields and built-in potentials in functional materials at nano to micrometer scales is of supreme importance for optimizing devices, e.g., the functionality of semiconductor hetero-structures or battery materials is determined by the electric fields established at interfaces which can also vary spatially. In this study, momentum-resolved four-dimensional scanning transmission electron microscopy (4D-STEM) is proposed for the quantification of these potentials and the optimization steps required to reach quantitative agreement with simulations for the GaAs/AlAs hetero-junction model system are shown. Using STEM the differences in the mean inner potentials (∆MIP) of two materials forming an interface and resulting dynamic diffraction effects have to be considered. This study shows that the measurement quality is significantly improved by precession, energy filtering and a off-zone-axis alignment of the specimen. Complementary simulations yielding a ∆MIP of 1.3 V confirm that the potential drop due to charge transfer at the intrinsic interface is ≈0.1 V, in agreement with experimental and theoretical values found in literture. These results show the feasibility of accurately measuring built-in potentials across hetero-interfaces of real device structures and its promising application for more complex interfaces of other polycrystalline materials on the nanometer scale.
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Affiliation(s)
- Varun Shankar Chejarla
- Department of Physics and Materials Science Center, Philipps-University Marburg, Hans-Meerwein Str. 6, 35032, Marburg, Germany
| | - Shamail Ahmed
- Department of Physics and Materials Science Center, Philipps-University Marburg, Hans-Meerwein Str. 6, 35032, Marburg, Germany
| | - Jürgen Belz
- Department of Physics and Materials Science Center, Philipps-University Marburg, Hans-Meerwein Str. 6, 35032, Marburg, Germany
| | - Jonas Scheunert
- Department of Physics and Materials Science Center, Philipps-University Marburg, Hans-Meerwein Str. 6, 35032, Marburg, Germany
| | - Andreas Beyer
- Department of Physics and Materials Science Center, Philipps-University Marburg, Hans-Meerwein Str. 6, 35032, Marburg, Germany
| | - Kerstin Volz
- Department of Physics and Materials Science Center, Philipps-University Marburg, Hans-Meerwein Str. 6, 35032, Marburg, Germany
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