Orienting Block Copolymer Thin Films via Entropy

Sequential Self-Assembly of Polystyrene-block-Polydimethylsiloxane for 3D Nanopatterning via Solvent Annealing

This study aims to develop a strategy for the fabrication of multilayer nanopatterns through sequential self-assembly of lamella-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS) block copolymer (BCP) from solvent annealing. By simply tuning the solvent selectivity, a variety of self-assembled BCP thin-film morphologies, including hexagonal perforated lamellae (HPL), parallel cylinders, and spheres, can be obtained from single-composition PS-b-PDMS. By taking advantage of reactive ion etching (RIE), topographic SiO2 monoliths with well-ordered arrays of hexagonally packed holes, parallel lines, and hexagonally packed dots can be formed. Subsequently, hole-on-dot and line-on-hole hierarchical textures can be created through a layer-by-layer process with RIE treatment as evidenced experimentally and confirmed theoretically. The results demonstrated the feasibility of creating three-dimensional (3D) nanopatterning from the sequential self-assembly of single-composition PS-b-PDMS via solvent annealing, providing an appealing process for nano-MEMS manufacturing based on BCP lithography.

Anisotropic lens-shaped mesoporous carbon from interfacially perpendicular self-assembly for potassium-ion batteries

Anisotropic lens-shaped nitrogen-doped carbon (Lens-NMC) with unidirectionally aligned mesopores was achieved via perpendicular block copolymer self-assembly at the polymer interface. Lens-NMC is applied as a potassium-ion battery anode material as a next-generation battery system.

Synthesis of PDMS-μ-PCL Miktoarm Star Copolymers by Combinations (Є) of Styrenics-Assisted Atom Transfer Radical Coupling and Ring-Opening Polymerization and Study of the Self-Assembled Nanostructures

Due to their diverse and unique physical properties, miktoarm star copolymers (μ-SCPs) have garnered significant attention. In our study, we employed α-monobomoisobutyryl-terminated polydimethylsiloxane (PDMS-Br) to carry out styrenics-assisted atom transfer radical coupling (SA ATRC) in the presence of 4-vinylbenzyl alcohol (VBA) at 0 °C. By achieving high coupling efficiency (χc = 0.95), we obtained mid-chain functionalized PDMS-VBAm-PDMS polymers with benzylic alcohols. Interestingly, matrix-assisted laser desorption/ionization time of flight mass spectrometry (MALDI-TOF MS) analysis revealed the insertion of only two VBA coupling agents (m = 2). Subsequently, the PDMS-VBA2-PDMS products underwent mid-chain extensions using ε-caprolactone (ε-CL) through ring-opening polymerization (ROP) with an efficient organo-catalyst at 40 °C, resulting in the synthesis of novel (PDMS)2-μ-(PCL)2 μ-SCPs. Eventually, novel (PDMS)2-μ-(PCL)2 μ-SCPs were obtained. The obtained PDMS-μ-PCL μ-SCPs were further subjected to examination of their solid-state self-assembly through small-angle X-ray scattering (SAXS) experiments. Notably, various nanostructures, including lamellae and hexagonally packed cylinders, were observed with a periodic size of approximately 15 nm. As a result, we successfully developed a simple and effective reaction combination (Є) strategy (i.e., SA ATRC-Є-ROP) for the synthesis of well-defined PDMS-μ-PCL μ-SCPs. This approach may open up new possibilities for fabricating nanostructures from siloxane-based materials.

Surface enrichment dictates block copolymer orientation

Orientation of block copolymer (BCP) morphology in thin films is critical to applications as nanostructured coatings. Despite being well-studied, the ability to control BCP orientation across all possible block constituents remains challenging. Here, we deploy coarse-grained molecular dynamics simulations to study diblock copolymer ordering in thin films, focusing on chain makeup, substrate surface energy, and surface tension disparity between the two constituent blocks. We explore the multi-dimensional parameter space of ordering using a machine-learning approach, where an autonomous loop using a Gaussian process (GP) control algorithm iteratively selects high-value simulations to compute. The GP kernel was engineered to capture known symmetries. The trained GP model serves as both a complete map of system response, and a robust means of extracting material knowledge. We demonstrate that the vertical orientation of BCP phases depends on several counter-balancing energetic contributions, including entropic and enthalpic material enrichment at interfaces, distortion of morphological objects through the film depth, and of course interfacial energies. BCP lamellae are found more resistant to these effects, and thus more robustly form vertical orientations across a broad range of conditions; while BCP cylinders are found to be highly sensitive to surface tension disparity.

Tunable Thin Film Periodicities by Controlling the Orientation of Cylindrical Domains in Side Chain Liquid Crystalline Block Copolymers

A facile approach to block copolymer (BCP) domain orientation control in thin films has been demonstrated by employing a BCP with liquid crystalline semifluorinated side chains by tuning the composition of the copolymers of the bottom surface layer (BSL). 1H,1H,2H,2H-Perfluorodecanethiol was attached to a precursor polymer, polystyrene-block-poly(glycidyl methacrylate) (PS-b-PGMA), to obtain a novel BCP with a C8F17-containing liquid crystal (LC) side chain (PS-b-P8FMA). Anisotropic hexagonally packed cylinder domains in a bulk state were first characterized by transmission electron microscopy (TEM) and small angle X-ray scattering (SAXS). The observed morphology transition of BCPs with different fluorinated side chain lengths of –CF3, –C4F9, and –C6F13 suggested the decisive effects of LC side chain ordering on the anisotropic nanostructures. In the thin film study, poly(methyl methacrylate-random-2,2,2-trifluoroethyl methacrylate-random-methacrylic acid) (PMMA-ran-PTFEMA-ran-PMAA) solution was used as BSLs for tuning the desired periodicities. The surface free energy (SFE) of BSL was simply tailored by changing the composition of comonomers. In atomic force microscopy (AFM) characterization, long-range ordered perpendicularly oriented BCP domains in a hexagonally packed array or parallel oriented BCP domains as striation patterns were easily fabricated on non-preferential or preferential BSL, respectively. The study presents a novel approach to tunable thin film periodicities without changing or modifying BCPs, which is desired in next-generation BCP lithography.

Confined Self-Assemblies of Chiral Block Copolymers in Thin Films

Self-assembly of chiral block copolymers (BCPs*) can give rise to ordered chiral nanostructures, that is, a helical phase (H* phase), via chirality transfer from the molecular level to mesoscale. In the present work, we reported the self-assembly of BCPs* under one-dimensional spatial confinement. The morphological dependence of self-assembled BCPs* on the molecular weights and the film thickness was investigated. As chiral nanostructures, the H* phase can be formed in bulk, nonchiral nanostructures that were observed in the thin films. Also, the topology effect of self-assembly of BCPs* was examined. The self-assembly of BCPs* with a star-shaped topology exhibited a distinct morphology compared with that of linear BCPs*. The present work provides new insight into the chirality transfer of macromolecules under spatial confinement.

Miktoarm Star Copolymers Prepared by Transformation from Enhanced Spin Capturing Polymerization to Nitroxide-Mediated Polymerization (ESCP-Ŧ-NMP) toward Nanomaterials

Reversible-deactivation radical polymerization (RDRP) serves as a powerful tool nowadays for the preparations of unique linear and non-linear macromolecules. In this study, enhanced spin capturing polymerizations (ESCPs) of styrene (St) and tert-butyl acrylate (tBA) monomers were, respectively, conducted in the presence of difunctional (1Z,1'Z)-1,1'-(1,4-phenylene) bis (N-tert-butylmethanimine oxide) (PBBN) nitrone. Four-arm (PSt)4 and (PtBA)4 star macroinitiators (MIs) can be afforded. By correspondingly switching the second monomer (i.e., tBA and St), miktoarm star copolymers (μ-stars) of (PSt)2-μ-(PtBA-b-PSt)2 and (PtBA)2-μ-(PSt-b-PtBA)2) were thus obtained. We further conducted hydrolysis of the PtBA segments to PAA (i.e., poly(acrylic acid)) in μ-stars to afford amphiphilic μ-stars of (PSt)2-μ-(PAA-b-PSt)2 and (PAA)2-μ-(PSt-b-PAA)2. We investigated each polymerization step and characterized the obtained two sets of "sequence-isomeric" μ-stars by FT-IR, 1H NMR, differential scanning calorimeter (DSC), and thermogravimetric analysis (TGA). Interestingly, we identified their physical property differences in the case of amphiphilic μ-stars by water contact angle (WCA) and atomic force microscopy (AFM) measurements. We thus proposed two microstructures caused by the difference of polymer chain sequences. Through this polymerization transformation (Ŧ) approach (i.e., ESCP-Ŧ-NMP), we demonstrated an interesting and facile strategy for the preparations of μ-stars with adjustable/switchable interior and exterior polymer structures toward the preparations of various nanomaterials.

Graphoepitaxy of Symmetric Six-Arm Star-Shaped Poly(methyl methacrylate)-block-Polystyrene Copolymer Thin Film

The authors perform directed self-assembly based on graphoepitaxy of symmetric six-arm star-shaped poly(methyl methacrylate)-block-polystyrene copolymer [(PMMA-b-PS)₆ ] thin film. The affinity between each block and the trench wall is adjusted by using polymer brushes or selective gold (Au) deposition. When the surface of the trench is strongly selective for the PMMA block, (n+0.75)L₀ thick (n is the number of the lamellae, L₀ is lamellar domain spacing) lamellae parallel to the trench wall are formed at each side, while nanotubes are formed away from the trench wall. However, for a trench grafted with PS brushes, nanotubes are formed beside (n+0.25)L₀ thick lamellar layers. By adjusting the trench width (W) and the affinity between the block and the wall, various dual nanopatterns consisting of lines and nanotubes are fabricated. Moreover, when the trench wall is selectively deposited by Au, asymmetric dual nanopattern is formed, where different numbers of lines exist on each side wall, while nanotubes are formed in the middle of the trench. The observed morphologies depending on the commensurability condition between W and L₀ are consistent with predictions by self-consistent field theory.

Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications

Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.

Self-Assembly of Low-Molecular-Weight Asymmetric Linear Triblock Terpolymers: How Low Can We Go?

The synthesis of two (2) novel triblock terpolymers of the ABC type and one (1) of the BAC type, where A, B and C are chemically different segments, such as polystyrene (PS), poly(butadiene) (PB1,4) and poly(dimethylsiloxane) (PDMS), is reported; moreover, their corresponding molecular and bulk characterizations were performed. Very low dimensions are evident from the characterization in bulk from transmission electron microscopy studies, verified by small-angle X-ray data, since sub-16 nm domains are evident in all three cases. The self-assembly results justify the assumptions that the high Flory-Huggins parameter, χ, even in low molecular weights, leads to significantly well-ordered structures, despite the complexity of the systems studied. Furthermore, it is the first time that a structure/properties relationship was studied for such systems in bulk, potentially leading to prominent applications in nanotechnology and nanopatterning, for as low as sub-10 nm thin-film manipulations.

Effect of chain architectures on the domain spacing of block copolymers with equivalent segregation degrees

It is crucial to lower the domain spacing in the application of directed self-assembly (DSA) of block copolymers. Architectural design of block copolymers provides a possible route. However, the change of the segregation degree is always coupled with that of domain spacing. Therefore, we rescale the segregation degrees of different multiblock copolymers with reference to that of the AB diblock using self-consistent field theory (SCFT), including the [AB]n linear multiblock, AnBn multi-arm star and Ad,nBd,n dendron-like, such that the density profiles of the lamellar morphology are consistent. Then we compare the lamellar periods of these different copolymers under the condition of equivalent segregation degrees. We find that the star and dendron-like architectures can significantly lower the domain spacing relative to that of the AB diblock, especially when the arm number or the generation number is large. On one hand, our work presents a simple criterion for quantifying the reduction of domain spacing of a specific multiblock architecture relative to that of the AB diblock. On the other hand, our conclusion provides a useful guide for the application of directed self-assembly.

Microphase separation of carbohydrate-based star-block copolymers with sub-10 nm periodicity

Star-block copolymers consisting of polycaprolactone and maltotriose segments with three, four, and six arms were synthesized to achieve sub-10 nm microphase-separated structures.

Orientation and Morphology Control of the Liquid Crystalline Block Copolymer Thin Film by Liquid Crystalline Solvent

The critical challenge to engineer the morphological structures in the strongly phase-segregated block copolymer thin film is to overcome the preferential wetting of the blocks at the interface and direct the self-assembly process. Herein, we utilize surface activity and selective solvation of a nematic (N) liquid crystalline (LC) solvent, 5CB, to facilely alter the LC anchoring and the orientation of the nanophase separated structures of the smectic-nematic (S-N) LC block copolymer thin film. For the neat S-N diblock copolymer thin film, the nanostructures are parallel aligned. In contrast, with continuous introduction of 5CB into the system, the orientations of the characteristic nanostructures and the morphologies of the LC thin film can be consequently changed, yielding the perpendicularly oriented lamellar or cylindrical structures with the feature size below 10 nm. The homeotropic alignment of the 5CB nematics near the air interface plays a critical role to induce this unique behavior in the S-N/5CB systems, which offers an opportunity to fine-tune the interfacial structures and the morphological patterning in the block copolymer thin film.

Thermal Approaches to Perpendicular Block Copolymer Microdomains in Thin Films: A Review and Appraisal

Block copolymer thin films are highly versatile and accessible materials capable of producing nanofeatures in the size regime of a few to hundreds of nanometers by a simple spin-coating-and-anneal process. Unfortunately, this simple protocol usually leads to parallel microdomains, which limits the applicability of such nanofeatures. A great deal of effort has been put into achieving perpendicular microdomains, but those that incorporate thermal annealing are arguably the most practical and reproducible in the lab and industry. This review discusses the recent ongoing efforts on various thermal approaches to achieving perpendicular microdomains in order to provide the readers with a toolbox to work with.

Ionic Liquids as Additives to Polystyrene- Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm Features

Polystyrene- block-poly(methyl methacrylate) (PS- b-PMMA) is one of the prototypical block copolymers in directed self-assembly (DSA) research and development, with standardized protocols in place for processing on industrially relevant 300 mm wafers. Scaling of DSA patterns to pitches below 20 nm using PS- b-PMMA, however, is hindered by the relatively low Flory-Huggins interaction parameter, χ. Here, we investigate the approach of adding small amounts of ionic liquids (ILs) into PS- b-PMMA, which selectively segregates into the PMMA domain and effectively increases the χ parameter and thus the pattern resolution. The amount of IL additive is small enough to result in limited changes in PS- b-PMMA's surface and interfacial properties, thus maintaining industry-friendly processing by thermal annealing with a free surface. Three different ILs are studied comparatively regarding their compositional process window, capability of increasing χ, and thermal stability. By adding ∼3.1 vol % of the champion IL into a low-molecular-weight PS- b-PMMA ( M_n = 10.3k- b-9.5k), we demonstrated DSA on chemically patterned substrates of lamellar structures with feature sizes <8.5 nm. Compatibility of the PS- b-PMMMA/IL blends with the standardized processes that have been previously developed suggests that such blend materials could provide a drop-in solution for sub-10 nm lithography with the processing advantages of PS- b-PMMA.

Directed Self-Assembly of Star-Block Copolymers by Topographic Nanopatterns through Nucleation and Growth Mechanism

Exploring the ordering mechanism and dynamics of self-assembled block copolymer (BCP) thin films under confined conditions are highly essential in the application of BCP lithography. In this study, it is aimed to examine the self-assembling mechanism and kinetics of silicon-containing 3-arm star-block copolymer composed of polystyrene (PS) and poly(dimethylsiloxane) blocks as nanostructured thin films with perpendicular cylinders and controlled lateral ordering by directed self-assembly using topographically patterned substrates. The ordering process of the star-block copolymer within fabricated topographic patterns with PS-functionalized sidewall can be carried out through the type of secondary (i.e., heterogeneous) nucleation for microphase separation initiated from the edge and/or corner of the topographic patterns, and directed to grow as well-ordered hexagonally packed perpendicular cylinders. The growth rate for the confined microphase separation is highly dependent upon the dimension and also the geometric texture of the preformed pattern. Fast self-assembly for ordering of BCP thin film can be achieved by lowering the confinement dimension and also increasing the concern number of the preformed pattern, providing a new strategy for the design of BCP lithography from the integration of top-down and bottom-up approaches.

Influence of topographically patterned angled guidelines on directed self-assembly of block copolymers

Single chain in mean-field Monte Carlo simulations were employed to study the self-assembly of block copolymers (BCP) in thin films that use trapezoidal guidelines to direct the orientation and alignment of lamellar patterns. The present study explored the influence of sidewall interactions and geometry of the trapezoidal guidelines on the self-assembly of perpendicularly oriented lamellar morphologies. When both the sidewall and the top surface exhibit preferential interactions to the same block of the BCP, trapezoidal guidelines with intermediate taper angles were found to result in less defective perpendicularly orientated morphologies. Similarly, when the sidewall and top surface are preferential to distinct blocks of the BCP, intermediate tapering angles were found to be optimal in promoting defect free structures. Such results are rationalized based on the energetics arising in the formation of perpendicularly oriented lamella on patterned substrates.

Reduction of Line Edge Roughness of Polystyrene-block-Poly(methyl methacrylate) Copolymer Nanopatterns By Introducing Hydrogen Bonding at the Junction Point of Two Block Chains

To apply well-defined block copolymer nanopatterns to next-generation lithography or high-density storage devices, small line edge roughness (LER) of nanopatterns should be realized. Although polystyrene-block-poly(methyl methacrylate) copolymer (PS-b-PMMA) has been widely used to fabricate nanopatterns because of easy perpendicular orientation of the block copolymer nanodomains and effective removal of PMMA block by dry etching, the fabricated nanopatterns show poorer line edge roughness (LER) due to relatively small Flory-Huggins interaction parameter (χ) between PS and PMMA chains. Here, we synthesized PS-b-PMMA with urea (U) and N-(4-aminomethyl-benzyl)-4-hydroxymethyl-benzamide (BA) moieties at junction of PS and PMMA chains (PS-U-BA-PMMA) to improve the LER. The U-BA moieties serves as favorable interaction (hydrogen bonding) sites. The LER of PS line patterns obtained from PS-U-BA-PMMA was reduced ∼25% compared with that obtained from neat PS-b-PMMA without BA and U moieties. This is attributed to narrower interfacial width induced by hydrogen bonding between two blocks, which is confirmed by small-angle X-ray scattering. This result implies that the introduction of hydrogen bonding into block copolymer interfaces offers an opportunity to fabricate well-defined nanopatterns with improved LER by block copolymer self-assembly, which could be a promising alternative to next-generation extreme ultraviolet lithography.

Self-Assembled Morphologies of Linear and Miktoarm Star Triblock Copolymer Monolayers

Monolayers of linear and miktoarm star ABC triblock copolymers with equal A and C blocks were investigated using self-consistent field theory. Monolayers of ABC triblock copolymers were formed between two parallel surfaces that were attractive to the A and C blocks. The repulsive interaction parameter χ_ACN between the A and C blocks was chosen to be weaker than the A/B and B/C interactions, quantified by χ_ABN and χ_BCN, respectively, such that the B blocks were confined at the A/C interface, resulting in various B domains with different geometries and arrangements. It was observed that two variables, namely, the strength of the surface fields and the film thickness, were dominant factors controlling the self-assembly of the B blocks into various morphologies. For the linear triblock copolymers, the morphologies of the B domains included disks, stripes (parallel cylinders), and hexagonal networks (inverse disks). For the miktoarm star triblock copolymers, the competition between the tendency to align the junction points along a straight line and the constraint on their arrangement from the surface interactions led to richer ordered morphologies. As a result of the packing of the junction points of the ABC miktoarm star copolymers, a counterintuitive phase sequence from low-curvature phases to high-curvature phases with increasing length of B block was predicted. The study indicates that the self-assembly of monolayers of ABC triblock copolymers provides an interesting platform for engineering novel morphologies.

Synthesis, molecular characterization and self-assembly of (PS-b-PDMS)n type linear (n = 1, 2) and star (n = 3, 4) block copolymers

Well-defined linear (n = 1, 2) and star (n = 3, 4) architecture (PS-b-PDMS)_n block copolymers were synthesized by anionic polymerization in combination with chlorosilane chemistry. The self-assembly is significantly influenced by entropy constraints for the star samples due to overcrowding.

UV-solvent annealing of PDMS-majority and PS-majority PS-b-PDMS block copolymer films

The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority (f _PS = 68%, M _n = 53 kg mol^-1), the other with PDMS block as majority (f _PDMS = 67%, M _n = 44 kg mol^-1). A 5 min UV irradiation was applied during solvent vapor annealing which led to both partial crosslinking of the polymer and a small increase in the temperature of the annealing chamber. This approach was effective for improving the correlation length of the self-assembled microdomain arrays and in limiting subsequent flow of the PDMS in the PDMS-majority BCP to preserve the post-anneal morphology. Ordering and orientation of microdomains were controlled by directed self-assembly of the BCPs in trench substrates. Highly-ordered perpendicular nanochannel arrays were obtained in the PDMS-majority BCP.