λ/12 Super Resolution Achieved in Maskless Optical Projection Nanolithography for Efficient Cross-Scale Patterning

Femtosecond Laser Maskless Optical Projection Lithography of Cartilage PCM Inspired 3D Protein Matrix to Chondrocyte Phenotype

Hydrogels containing chondrocytes have exhibited excellent potential in regenerating hyaline cartilage. However, chondrocytes are vulnerable to dedifferentiation during in vitro culture, leading to fibrosis and mechanical degradation of newly formed cartilage. It is proposed to modulate cartilage formation via the developed chondrocyte pericellular matrix (PCM) -like scaffolds for the first time, in which the S, M, and L-sized scaffolds are fabricated by femtosecond laser maskless optical projection lithography (FL-MOPL) of bovine serum albumin-glyceryl methacrylate hydrogel. Chondrocytes on the M PCM-like scaffold can maintain round morphology and synthesize extracellular matrix (ECM) to induce regeneration of hyaline cartilage microtissues by geometrical restriction. A series of M PCM-like scaffolds is fabricated with different stiffness and those with a high Young's modulus are more effective in maintaining the chondrocyte phenotype. The proposed PCM-like scaffolds are effective in modulating cartilage formation influenced by pore size, depth, and stiffness, which will pave the way for a better understanding of the geometric cues of mechanotransduction interactions in regulating cell fate and open up new avenues for tissue engineering.

Light and matter co-confined multi-photon lithography

Mask-free multi-photon lithography enables the fabrication of arbitrary nanostructures low cost and more accessible than conventional lithography. A major challenge for multi-photon lithography is to achieve ultra-high precision and desirable lateral resolution due to the inevitable optical diffraction barrier and proximity effect. Here, we show a strategy, light and matter co-confined multi-photon lithography, to overcome the issues via combining photo-inhibition and chemical quenchers. We deeply explore the quenching mechanism and photoinhibition mechanism for light and matter co-confined multiphoton lithography. Besides, mathematical modeling helps us better understand that the synergy of quencher and photo-inhibition can gain a narrowest distribution of free radicals. By using light and matter co-confined multiphoton lithography, we gain a 30 nm critical dimension and 100 nm lateral resolution, which further decrease the gap with conventional lithography.

High-Throughput Two-Photon 3D Printing Enabled by Holographic Multi-Foci High-Speed Scanning

The emerging two-photon polymerization (TPP) technique enables high-resolution printing of complex 3D structures, revolutionizing micro/nano additive manufacturing. Various fast scanning and parallel processing strategies have been proposed to promote its efficiency. However, obtaining large numbers of uniform focal spots for parallel high-speed scanning remains challenging, which hampers the realization of higher throughput. We report a TPP printing platform that combines galvanometric mirrors and liquid crystal on silicon spatial light modulator (LCoS-SLM). By setting the target light field at LCoS-SLM's diffraction center, sufficient energy is acquired to support simultaneous polymerization of over 400 foci. With fast scanning, the maximum printing speed achieves 1.49 × 108 voxels s-1, surpassing the existing scanning-based TPP methods while maintaining high printing resolution and flexibility. To demonstrate the processing capability, functional 3D microstructure arrays are rapidly fabricated and applied in micro-optics and micro-object manipulation. Our method may expand the prospects of TPP in large-scale micro/nanomanufacturing.

Digital inverse patterning solutions for fabrication of high-fidelity microstructures in spatial light modulator (SLM)-based projection lithography

Digital mask projection lithography (DMPL) technology is gaining significant attention due to its characteristics of free-mask, flexibility, and low cost. However, when dealing with target layouts featuring sizes smaller than the wavelength scale, accurately producing resist patterns that closely match the target layout using conventional methods to design the modulation coefficients of digital masks produced by spatial light modulators (SLM) becomes challenging. Here, we present digital inversion lithography technology (DILT), which offers what we believe to be a novel approach to reverse engineer the modulation coefficients of digital masks. In the case of binary amplitude modulation, DILT achieves a remarkable reduction in pattern errors (PE), reaching the original 0.26. At the same time, in the case of the gray amplitude modulation, the PE can be reduced to the original 0.05, which greatly improves the high-fidelity transfer of the target layout. This significant improvement enhances the accuracy of target design transfer. By leveraging the capabilities of DILT, DMPL can now attain higher precision and reliability, paving the way for more advanced applications in the field of micro-nano device manufacturing.

Optical proximity correction of hot-spot patterns with subwavelength size in DMD maskless projection lithography

When the critical dimension (CD) of resist patterns nears the resolution limit of the digital micromirror device (DMD) maskless projection lithography (DMD-MPL), significant distortion can emerge in the silicon wafer due to the optical proximity effect (OPE). The significant distortion (breakpoints, line-end scaling, corner rounding, etc.) between resist patterns and target patterns results in reduced lithographic quality. To address this issue, we have proposed a pixel-based optical proximity correction (PB-OPC) method used for the hot-spot patterns with subwavelength sizes specifically designed for DMD-MPL. Employing an end-to-end learning neural network, the PB-OPC algorithm is both straightforward and efficient. A well-trained U-net framework facilitates the mapping from unoptimized masks to optimized masks. Experimental exposure trials have demonstrated that this method not only corrects OPC in general patterns but also effectively rectifies hot-spot patterns. The pattern error (PE) value can be reduced by about 30% in the design layouts. We believe this approach holds the potential to enhance the resolution and fidelity of resist patterns in DMD maskless lithography.

Cost-Effective Laboratory Matrix Projection Micro-Lithography System

This paper presents a home-built projection lithographer designed to transfer the image from a DLP (digital light processing) projector MEMS matrix onto the microscope objective's field of view, where a photoresist-covered substrate is placed. The photoresist is exposed using blue light with a wavelength of 450 nm. To calibrate the device and adjust focal lengths, we utilize a red light that does not affect the photoresist. The substrate is located on a movable platform, allowing the exposure field to be shifted, enabling the exposure of designs with lateral sizes of 1 × 1 cm2 at a resolution of a few micrometers. Our setup showcases a 2 μm resolution for the single frame 200 × 100 μm2, and a 5 μm resolution for 1 × 1 cm2 with field stitching. The exposure speed, approximately 1 mm2/100 s, proves to be sufficient for a variety of laboratory prototyping needs. This system offers a significant advantage due to its utilization of easily accessible and budget-friendly components, thereby enhancing its accessibility for a broader user base. The exposure speed and resolution meet the requirements for laboratory prototyping in the fields of 2D materials, quantum optics, superconducting microelectronics, microfluidics, and biology.

Dynamic Color-Switching of Hydrogel Micropillar Array under Ethanol Vapor for Optical Encryption

Responsive structural colors from artificially engineered micro/nanostructures are critical to the development of anti-counterfeiting, optical encryption, and intelligent display. Herein, the responsive structural color of hydrogel micropillar array is demonstrated under the external stimulus of ethanol vapor. Micropillar arrays with full color are fabricated via femtosecond laser direct writing by controlling the height and diameter of the micropillars according to the FDTD simulation. Color-switching of the micropillar arrays is achieved in <1 s due to the formation of liquid film among micropillars. More importantly, the structural color blueshift of the micropillar arrays is sensitive to the micropillar diameter, instead of the micropillar height. The micropillar array with a diameter of 772 nm takes 400 ms to complete blueshift under ethanol vapor, while that with a diameter of 522 nm blueshifts at 2400 ms. Microscale patterns are realized by employing the size-dependent color-switching of designed micropillar arrays under ethanol vapor. Moreover, Morse code and directional blueshift of structural colors are realized in the micropillar arrays. The advantages of controllable color-switching of the hydrogel micropillar array would be prospective in the areas of optical encryption, dynamic display, and anti-counterfeiting.

Dual-Stimuli Cooperative Responsive Hydrogel Microactuators Via Two-Photon Lithography

With the development of bionics as well as materials science, intelligent soft actuators have shown promising applications in many fields such as soft robotics, sensing, and remote manipulation. Microfabrication technologies have enabled the reduction of the size of responsive soft actuators to the micron level. However, it is still challenging to construct microscale actuators capable of responding to different external stimuli in complex and diverse conditions. Here, this work demonstrates a dual-stimuli cooperative responsive hydrogel microactuator by asymmetric fabrication via femtosecond laser direct writing. The dual response of the hydrogel microstructure is achieved by employing responsive hydrogel with functional monomer 2-(dimethylamino)ethyl methacrylate. Raman spectra of the hydrogel microstructures suggest that the pH and temperature response of the hydrogel is generated by the changes in tertiary amine groups and hydrogen bonds, respectively. The asymmetric hydrogel microstructures show opposite bending direction when being heated to high temperature or exposed to acid solution, and can independently accomplish the grasp of polystyrene microspheres. Moreover, this work depicts the cooperative response of the hydrogel microactuator to pH and temperature at the same time. The dual-stimuli cooperative responsive hydrogel microactuators will provide a strategy for designing and fabricating controllable microscale actuators with promising applications in microrobotics and microfluidics.

3D gradient printing based on digital light processing

3D gradient printing is a type of fabrication technique that builds three-dimensional objects with gradually changing properties. Gradient digital light processing based 3D printing has garnered considerable attention in recent years. This function-oriented technology precisely manipulates the performance of different positions of materials and prints them as a monolithic structure to realize specific functions. This review presents a conceptual understanding of gradient properties, covering an overview of current techniques and materials that can produce gradient structures, as well as their limitations and challenges. The principle of digital light processing (DLP) technology and feasible strategies for 3D gradient printing to overcome any barriers are also presented. Additionally, this review discusses the promising future of 4D bioprinting systems based on DLP printing.

Genetic algorithm-based optical proximity correction for DMD maskless lithography

We present an optical proximity correction (OPC) method based on a genetic algorithm for reducing the optical proximity effect-induced pattern distortion in digital micromirror device (DMD) maskless lithography. Via this algorithm-assisted grayscale modulation of the initial mask at the pixel level, the exposure pattern can be enhanced significantly. Actual exposure experiments revealed that the rate of matching between the final exposure pattern and the mask pattern can be increased by up to 20%. This method's applicability to complex masks further demonstrates its universality for mask pattern optimization. We believe that our algorithm-assisted OPC could be highly helpful for high-fidelity and efficient DMD maskless lithography for microfabrication.

Generating an M2 × N2 spot array with a dual-period hybrid Dammann grating fabricated using maskless projection lithography

The Dammann grating (DG), which redistributes a collimated laser beam into a spot array with a uniform intensity, is a widely adopted approach for profile measurement. Conventional DGs for dense spot projection are binary phase gratings with precisely designed groove structures, which suffer from low efficiency, poor uniformity, and a hard-to-fabricate fine feature size when utilized for a large field of view (FOV). Here, we propose a new, to the best of our knowledge, hybrid DG architecture consisting of two different grating periods which effectively generates an engineering M² × N² spot array with a non-complex structural design. As a proof-of-concept, a dual-period hybrid DG with a two-scale grating period ratio of 11.88 μm/95.04 μm (∼1/8) is designed and fabricated as a means to generate a dense 7²× 7² diffraction spot array with a FOV of 17° × 17°. In addition, the DG exhibits superior performance, with a high efficiency (>60%) and a low non-uniformity (<18%) at a wavelength of 532 nm. This kind of hybrid DG constructed from photoresist patterns with a minimum feature size of ∼1.2 μm can be perfectly fabricated by maskless projection lithography for large-scale and low-cost production. The proposed dual-period hybrid DG can pave the way for depth-perception-related applications such as face unlocking and motion sensing.

Wetting of Cell Aggregates on Microdisk Topography Structures Achieved by Maskless Optical Projection Lithography

Cell aggregates as a 3D culture model can effectively mimic the physiological processes such as embryonic development, immune response, and tissue renewal in vivo. Researches show that the topography of biomaterials plays an important role in regulating cell proliferation, adhesion, and differentiation. It is of great significance to understand how cell aggregates respond to surface topography. Herein, microdisk array structures with the optimized size are used to investigate the wetting of cell aggregates. Cell aggregates exhibit complete wetting with distinct wetting velocities on the microdisk array structures of different diameters. The wetting velocity of cell aggregates reaches a maximum of 293 µm h^-1 on microdisk structures with a diameter of 2 µm and is a minimum of 247 µm h^-1 on microdisk structures of 20 µm diameter, which suggests that the cell-substrates adhesion energy on the latter is smaller. Actin stress fibers, focal adhesions (FAs), and cell morphology are analyzed to reveal the mechanisms of variation of wetting velocity. Furthermore, it is demonstrated that cell aggregates adopt climb and detour wetting modes on small and large-sized microdisk structures, respectively. This work reveals the response of cell aggregates to micro-scale topography, providing guidance for better understanding of tissue infiltration.

Magnetically driven micro-optical choppers fabricated by two-photon polymerization

In this Letter, a series of magnetically driven micro-optical choppers based on customized photoresist were fabricated by two-photon polymerization (TPP) technology. Synthetic Fe₃O₄ nanoparticles (NPs) were modified and dispersed in the original photoresist to achieve magnetic field response. After accurately formulating a magnetic photoresist containing Rhodamine B to reduce the light transmittance, four micro-optical choppers with different slot widths were printed using optimized processing parameters. The micro-optical choppers were remotely manipulated to rotate by the external magnetic field. More importantly, the function demonstration of the micro-optical choppers with an excellent chopping effect was achieved at a given light wavelength of 515 nm. The magnetically driven micro-optical choppers provide a new approach, to the best of our knowledge, for the fabrication of external field-responsive optical components.

Micropattern of Silver/Polyaniline Core-Shell Nanocomposite Achieved by Maskless Optical Projection Lithography

With the development of device miniaturization, a flexible and fast preparation method is in demand for achieving microstructures with desired patterns. We develop a novel photoreduction-polymerization method for preparing conductive metal-polymer patterns. Ag/polyaniline (PANI) nanocomposites have been successfully synthesized by maskless optical projection lithography (MOPL) technology, which is based on multiphoton absorption and the localized surface plasmon resonance (LSPR) effect. The individualized design and synthesis of the nanocomposite patterns at the micro-nano scale are flexibly realized on a variety of substrates. The surface-enhanced Raman scattering (SERS) effect of Rhodamine 6G (R6G) is demonstrated on the microstructure of a square maze-shaped Ag/PANI nanocomposite. The electrical conductivity of the as-prepared nanocomposite is obtained. The preparation protocol proposed in this study opens up new avenues for the fabrication of micro-nano devices such as sensors and detectors.

Consistent pattern printing of the gap structure in femtosecond laser DMD projection lithography

Maskless lithography technologies have been developed and played an important role in the fabrication of functional micronano devices for microelectronics, biochips and photonics. Optical projection lithography based on digital micromirror device (DMD) is an efficient maskless lithography technology that can rapidly fabricate complex structures. The precise modulation of gap width by DMD maskless optical projection lithography (MOPL) using femtosecond laser becomes important for achieving micronano structures. Herein, we have investigated the relationship between the structure morphology and the light intensity distribution at the image plane by multi-slit diffraction model and Abbe imaging principle, and optimized the gap width more accurately by modulating exposure energy. The aperture diameter of the objective lens has a substantial effect on the pattern consistency. The continuously adjustable structural gap widths of 2144 nm, 2158 nm and 1703 nm corresponding to 6, 12, 24 pixels are obtained by varying the exposure energy in the home-built MOPL system. However, the ideal gap structure cannot be obtained only by adjusting the exposure energy when the gap width is small, such as 1 or 2 pixels. Furthermore, we have proposed an alternative way to achieve fine gap structures through the structural decomposition design and precise control of exposure energy in different regions without changing the MOPL optical system. This study would provide a promising protocol for fabricating gap microstructures with controllable configuration using MOPL technique.

λ/30 inorganic features achieved by multi-photon 3D lithography

It’s critically important to construct arbitrary inorganic features with high resolution. As an inorganic photoresist, hydrogen silsesquioxane (HSQ) has been patterned by irradiation sources with short wavelength, such as EUV and electron beam. However, the fabrication of three- dimensional nanoscale HSQ features utilizing infrared light sources is still challenging. Here, we demonstrate femtosecond laser direct writing (FsLDW) of HSQ through multi-photon absorption process. 26 nm feature size is achieved by using 780 nm fs laser, indicating super-diffraction limit photolithography of λ/30 for HSQ. HSQ microstructures by FsLDW possess nanoscale resolution, smooth surface, and thermal stability up to 600 °C. Furthermore, we perform FsLDW of HSQ to construct structural colour and Fresnel lens with desirable optical properties, thermal and chemical resistance. This study demonstrates that inorganic features can be flexibly achieved by FsLDW of HSQ, which would be prospective for fabricating micro-nano devices requiring nanoscale resolution, thermal and chemical resistance.

Stereolithography has progressed over the years but resolution and feature size is still limited by the properties of materials and resins. Here, the authors demonstrate femtosecond laser direct writing of a hydrogen silsesquioxane photoresist using a 780 nm femtosecond laser demonstrating feature sizes of 26 nm.

Maximizing energy utilization in DMD-based projection lithography

In digital micromirror device (DMD)-based projection photolithography, the throughput largely depends on the effectiveness of the laser energy utilization, which is directly correlated to the diffraction efficiency of DMD. Here, to optimize the DMD diffraction efficiency and thus the laser energy utilization, we calculate the diffraction efficiencies E_diffraction of DMD with various pitch sizes at wavelengths ranging from 200 nm to 800 nm, using the two-dimensional blazed grating diffraction theory. Specifically, the light incident angle is optimized for 343 nm laser and 7.56 μm pitch-size DMD, and the maximum single-order diffraction efficiency E_diffraction is increased from 40% to 96%. Experimentally, we use the effective energy utilization η_eff= E_{diffraction,(m,n)}/Σ[E_{diffraction,(m,n)}] at the entrance pupil plane of the objective to verify the effectiveness of the optimized illumination angle in a lithography illumination system with parallel beams of two wavelengths (343 nm and 515 nm). The η_eff of a "blaze" order at a 34° angle of incidence can be optimized up to 88%. The experimental results are consistent with the tendency of the calculated results, indicating that this optimization model can be used to improve the energy utilization of projection lithography with the arbitrarily designable wavelengths and the DMD's pitch size.