Grafted Nanoparticle Surface Wetting during Phase Separation in Polymer Nanocomposite Films

Using Focused Ion Beam Time-of-Flight Secondary Ion Mass Spectrometry to Depth Profile Nanoparticles in Polymer Nanocomposites

Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is a versatile surface-sensitive technique for characterizing both hard and soft matter. Its chemical and molecular specificity, high spatial resolution, and superior sensitivity make it an ideal method for depth profiling polymeric systems, including those comprised of both inorganic and organic constituents (i.e., polymer nanocomposites, PNCs). To best utilize ToF-SIMS for characterizing PNCs, experimental conditions must be optimized to minimize challenges such as the matrix effect and charge accumulation. Toward that end, we have successfully used ToF-SIMS with a Xe+ focused ion beam to depth profile silica nanoparticles grafted with poly(methyl methacrylate) (PMMA-NP) in a poly(styrene-ran-acrylonitrile) matrix film by selecting conditions that address charge compensation and the primary incident beam angles. By tracking the sputtered Si+ species and fitting the resultant concentration profile, the diffusion coefficient of PMMA-NP was determined to be D = 2.4 × 10-14 cm2/s. This value of D lies between that measured using Rutherford backscattering spectrometry (6.4 × 10-14 cm2/s) and the value predicted by the Stokes-Einstein model (2.5 × 10-15 cm2/s). With carefully tuned experimental parameters, ToF-SIMS holds great potential for quantitatively characterizing the nanoparticles at the surfaces and interfaces within PNC materials as well as soft matter in general.

Nanoscale Structure-Property Relations in Self-Regulated Polymer-Grafted Nanoparticle Composite Structures

Using a model system of poly(methyl methacrylate)-grafted silica nanoparticles (PMMA-NP) and poly(styrene-ran-acrylonitrile) (SAN), we generate unique polymer nanocomposite (PNC) morphologies by balancing the degree of surface enrichment, phase separation, and wetting within the films. Depending on the annealing temperature and time, thin films undergo different stages of phase evolution, resulting in homogeneously dispersed systems at low temperatures, enriched PMMA-NP layers at the PNC interfaces at intermediate temperatures, and three-dimensional bicontinuous structures of PMMA-NP pillars sandwiched between two PMMA-NP wetting layers at high temperatures. Using a combination of atomic force microscopy (AFM), AFM nanoindentation, contact angle goniometry, and optical microscopy, we show that these self-regulated structures lead to nanocomposites with increased elastic modulus, hardness, and thermal stability compared to analogous PMMA/SAN blends. These studies demonstrate the ability to reliably control the size and spatial correlations of both the surface-enriched and phase-separated nanocomposite microstructures, which have attractive technological applications where properties such as wettability, toughness, and wear resistance are important. In addition, these morphologies lend themselves to substantially broader applications, including: (1) structural color applications, (2) tuning optical adsorption, and (3) barrier coatings.

Facile Entropy-Driven Segregation of Imprinted Polymer-Grafted Nanoparticle Brush Blends by Solvent Vapor Annealing Soft Lithography

Polymer-grafted nanoparticles (PGNPs) have attracted extensive research interest due to their potential for enhancing mechanical and electrical properties of both bulk polymer composite materials, as well as thin polymer films incorporating these nanoparticles (NPs). In previous studies, we have shown that an entropic driving force serves to organize low-molecular-mass PGNPs in imprinted blend films of PGNPs with low-molecular-mass homopolymers. In this work, we developed a novel solvent vapor annealing soft lithography (SVA-SL) method to overcome the technical difficulties in processing the high-molecular-mass PGNP blends due to the intrinsically sluggish melt annealing kinetics found in the phase separation of these blend PGNP materials. In particular, we utilized SVA-SL to create nanopatterns in blends of PGNPs having relatively high-molecular-mass-grafted layers but with cores of NPs having greatly different sizes. The minimization of the entropic free energy in the present system corresponded to larger PGNPs partitioning almost exclusively into the "mesa" regions of the imprinted PGNP blend films, as quantified by the estimation of the partition coefficient, K_p. The use of the SVA-SL processing method is important because it allows facile imprint patterning of PGNP materials and large-scale organization of the PGNPs even when the grafted chain lengths are long enough for the chains to be highly entangled, allowing enhanced thermo-mechanical property enhancements of the resulting films and a corresponding extended range of potential nanotech applications.