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Majchrzak D, Kulinowski K, Olszewski W, Kuna R, Hlushchenko D, Piejko A, Grodzicki M, Hommel D, Kudrawiec R. Engineering of Interface Barrier in Hybrid MXene/GaN Heterostructures for Schottky Diode Applications. ACS APPLIED MATERIALS & INTERFACES 2024; 16:59567-59575. [PMID: 39422295 PMCID: PMC11533156 DOI: 10.1021/acsami.4c13225] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/06/2024] [Revised: 09/30/2024] [Accepted: 10/09/2024] [Indexed: 10/19/2024]
Abstract
The Fermi level position at the interface of a heterostructure is a critical factor for device functionality, strongly influenced by surface-related phenomena. In this study, contactless electroreflectance (CER) was utilized for the first time to investigate the built-in electric field in MXene/GaN structures with the goal of understanding the carrier transfer across the MXene/GaN interface. Five MXenes with high work functions were examined: Cr2C, Mo2C, V2C, V4C3, and Ti3C2. The physicochemical properties of the MXene/GaN structures were analyzed by using X-ray and UV photoelectron spectroscopies. It was shown that upon the coverage of the GaN surface by all investigated MXenes, a shift in the position of the surface Fermi level occurs, consequently raising the interface barrier. Additionally, the physicochemical stability of MXenes on the GaN surface was studied after annealing the structures at 750 °C. Our findings indicate that the annealing process increases the barrier height and the ionization energies of all studied structures. Furthermore, it has been shown that removing excess MXene material from the surface did not significantly impact the built-in electric field, emphasizing the robust physicochemical stability of the MXenes on the GaN surface. To validate the potential of engineering of MXene/GaN interface barrier, Schottky diodes with MXenes exhibiting the highest barrier height (Mo2C and V2C) were demonstrated.
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Affiliation(s)
- Dominika Majchrzak
- Łukasiewicz
Research Network - PORT Polish Center for Technology Development, Stabłowicka 147, 54-066 Wrocław, Poland
| | - Karol Kulinowski
- Department
of Semiconductor Materials Engineering, Wrocław University of Science and Technology, Wyb. Wyspiańskiego 27, 50-370 Wrocław, Poland
| | - Wojciech Olszewski
- Łukasiewicz
Research Network - PORT Polish Center for Technology Development, Stabłowicka 147, 54-066 Wrocław, Poland
- Institute
of Experimental Physics, University of Wrocław, Maksa Borna 9, 50-204 Wrocław, Poland
| | - Rafał Kuna
- Łukasiewicz
Research Network - PORT Polish Center for Technology Development, Stabłowicka 147, 54-066 Wrocław, Poland
| | - Daria Hlushchenko
- Łukasiewicz
Research Network - PORT Polish Center for Technology Development, Stabłowicka 147, 54-066 Wrocław, Poland
- Department
of Semiconductor Materials Engineering, Wrocław University of Science and Technology, Wyb. Wyspiańskiego 27, 50-370 Wrocław, Poland
| | - Adrianna Piejko
- Łukasiewicz
Research Network - PORT Polish Center for Technology Development, Stabłowicka 147, 54-066 Wrocław, Poland
- Department
of Nanometrology, Wroclaw University of
Science and Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland
| | - Miłosz Grodzicki
- Łukasiewicz
Research Network - PORT Polish Center for Technology Development, Stabłowicka 147, 54-066 Wrocław, Poland
- Department
of Semiconductor Materials Engineering, Wrocław University of Science and Technology, Wyb. Wyspiańskiego 27, 50-370 Wrocław, Poland
| | - Detlef Hommel
- Łukasiewicz
Research Network - PORT Polish Center for Technology Development, Stabłowicka 147, 54-066 Wrocław, Poland
- Institute
of Low Temperature and Structure Research, Polish Academy of Sciences, Okólna 2, 50-422 Wrocław, Poland
| | - Robert Kudrawiec
- Łukasiewicz
Research Network - PORT Polish Center for Technology Development, Stabłowicka 147, 54-066 Wrocław, Poland
- Department
of Semiconductor Materials Engineering, Wrocław University of Science and Technology, Wyb. Wyspiańskiego 27, 50-370 Wrocław, Poland
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Nitika, Ahlawat DS, Arora S. Ab-initio study of strain-tunable g-GaN/BN nanoheterostructure for optoelectronic and photocatalytic applications. J Mol Model 2024; 30:128. [PMID: 38598043 DOI: 10.1007/s00894-024-05927-y] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/01/2024] [Accepted: 04/04/2024] [Indexed: 04/11/2024]
Abstract
CONTEXT Two-dimensional (2D) nanoheterostructures of materials, integrating various phase or materials into a single nanosheet have stimulated large-scale research interest for designing novel two dimensional devices. In contemporary analysis present work, we examined the structural and electronic properties of the isolated 2D BN and GaN monolayers. We have investigated the structural stability and optoelectronic and photocatalytic response of the g-GaN/BN nanoheterostructure along with its response to strain. Nanoheterostructure g-GaN/BN is predicted to be a direct bandgap semiconductor with wide gap of 4.45 eV, whose value can be effectively modulated by applied strain ( ϵ ) , ranging from 4.55 ( ϵ = - 4%) to 3.58 eV ( ϵ = 8%). We also discovered that the tensile strain of 8% can substantially tune the direct bandgap of nanoheterostructure to indirect band gap nature. Even more important, the biaxial tensile strain engineering accentuates an enhancement of optical absorption in the UV region, broadening the light harvesting of the g-GaN/BN nanoheterostructure with the shifting of first absorption peak from 4.64 ( ϵ = - 4%) to 3.71 eV ( ϵ = 8%). Furthermore, strain-tuned band edge potentials arrangement perfectly fits the water reduction and oxidation redox potentials. Our findings portend that the g-GaN/BN nanoheterostructure has application in prospective nanoscale optoelectronic devices and photocatalytic hydrogen evolution system. METHODS First principles calculations in this study are performed using density functional theory. Generalized gradient approximation within PBEsol functional employed to address the electron-electron exchange-correlation effects. For avoiding periodic interactions between the layers, we have inserted a vacuum region of thickness 10 Å in the z-direction. For ensuring the convergence accuracy of the computed results, convergence criteria of the iteration process is set to be 0.0001 eV. Local modified Becke-Johnson, a semi local functional, is applied for calculating electronic and optical properties for more accuracy of results. As in layered 2D nanoheterostructure, a factual depiction of the van der Waals interactions cannot be provided by conventional DFT techniques. Accordingly, in order to incorporate these interactions, we had employed the dispersion correction method of Grimme's.
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Affiliation(s)
- Nitika
- Department of Physics, Chaudhary Devi Lal University, Sirsa-125055 (Hry.), India
| | | | - Sandeep Arora
- Department of Physics, Chaudhary Devi Lal University, Sirsa-125055 (Hry.), India
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Peng Y, Yang Y, Xiao K, Yang Y, Ding H, Deng J, Sun W. Direct Synthesis of Vertical Self-Assembly Oriented Hexagonal Boron Nitride on Gallium Nitride and Ultrahigh Photoresponse Ultraviolet Photodetectors. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:nano13091546. [PMID: 37177091 PMCID: PMC10180724 DOI: 10.3390/nano13091546] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/08/2023] [Revised: 04/29/2023] [Accepted: 05/02/2023] [Indexed: 05/15/2023]
Abstract
The applications of three-dimensional materials combined with two-dimensional materials are attractive for constructing high-performance electronic and photoelectronic devices because of their remarkable electronic and optical properties. However, traditional preparation methods usually involve mechanical transfer, which has a complicated process and cannot avoid contamination. In this work, chemical vapor deposition was proposed to vertically synthesize self-assembly oriented hexagonal boron nitride on gallium nitride directly. The material composition, crystalline quality and orientation were investigated using multiple characterization methods. Thermal conductivity was found to be enhanced twofold in the h-BN incorporated sample by using the optothermal Raman technique. A vertical-ordered (VO)h-BN/GaN heterojunction photodetector was produced based on the synthesis. The photodetector exhibited a high ultraviolet photoresponsivity of up to 1970.7 mA/W, and detectivity up to 2.6 × 1013 Jones, and was stable in harsh high temperature conditions. Our work provides a new synthesis method to prepare h-BN on GaN-based materials directly, and a novel vertically oriented structure of VO-h-BN/GaN heterojunction, which has great application potential in optoelectronic devices.
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Affiliation(s)
- Yi Peng
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science & Technology, Guangxi University, Nanning 530004, China
| | - Yufei Yang
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science & Technology, Guangxi University, Nanning 530004, China
| | - Kai Xiao
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science & Technology, Guangxi University, Nanning 530004, China
| | - Yanlian Yang
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science & Technology, Guangxi University, Nanning 530004, China
| | - Haoran Ding
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science & Technology, Guangxi University, Nanning 530004, China
| | - Jianyu Deng
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science & Technology, Guangxi University, Nanning 530004, China
| | - Wenhong Sun
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science & Technology, Guangxi University, Nanning 530004, China
- State Key Laboratory of Featured Metal Materials and Life-Cycle Safety for Composite Structures, Nanning 530004, China
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Yang Y, Peng Y, Saleem MF, Chen Z, Sun W. Hexagonal Boron Nitride on III–V Compounds: A Review of the Synthesis and Applications. MATERIALS 2022; 15:ma15134396. [PMID: 35806522 PMCID: PMC9267908 DOI: 10.3390/ma15134396] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/25/2022] [Revised: 06/09/2022] [Accepted: 06/11/2022] [Indexed: 01/11/2023]
Abstract
Since the successful separation of graphene from its bulk counterpart, two-dimensional (2D) layered materials have become the focus of research for their exceptional properties. The layered hexagonal boron nitride (h-BN), for instance, offers good lubricity, electrical insulation, corrosion resistance, and chemical stability. In recent years, the wide-band-gap layered h-BN has been recognized for its broad application prospects in neutron detection and quantum information processing. In addition, it has become very important in the field of 2D crystals and van der Waals heterostructures due to its versatility as a substrate, encapsulation layer, and a tunneling barrier layer for various device applications. However, due to the poor adhesion between h-BN and substrate and its high preparation temperature, it is very difficult to prepare large-area and denseh-BN films. Therefore, the controllable synthesis of h-BN films has been the focus of research in recent years. In this paper, the preparation methods and applications of h-BN films on III–V compounds are systematically summarized, and the prospects are discussed.
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Affiliation(s)
- Yufei Yang
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science and Technology, Guangxi University, Nanning 530004, China; (Y.Y.); (Y.P.)
| | - Yi Peng
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science and Technology, Guangxi University, Nanning 530004, China; (Y.Y.); (Y.P.)
| | - Muhammad Farooq Saleem
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science and Technology, Guangxi University, Nanning 530004, China; (Y.Y.); (Y.P.)
- GBA Branch of Aerospace Information Research Institute, Chinese Academy of Sciences, Guangzhou 510700, China
- Correspondence: (W.S.); (M.F.S.); (Z.C.)
| | - Ziqian Chen
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science and Technology, Guangxi University, Nanning 530004, China; (Y.Y.); (Y.P.)
- Correspondence: (W.S.); (M.F.S.); (Z.C.)
| | - Wenhong Sun
- Research Center for Optoelectronic Materials and Devices, Guangxi Key Laboratory for the Relativistic Astrophysics, School of Physical Science and Technology, Guangxi University, Nanning 530004, China; (Y.Y.); (Y.P.)
- MOE Key Laboratory of New Processing Technology for Nonferrous Metals and the Guangxi Key of Processing for Non-Ferrous Metals and Featured Materials, Nanning 530004, China
- Correspondence: (W.S.); (M.F.S.); (Z.C.)
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Lu S, Shen P, Zhang H, Liu G, Guo B, Cai Y, Chen H, Xu F, Zheng T, Xu F, Chen X, Cai D, Kang J. Towards n-type conductivity in hexagonal boron nitride. Nat Commun 2022; 13:3109. [PMID: 35661712 PMCID: PMC9166779 DOI: 10.1038/s41467-022-30762-1] [Citation(s) in RCA: 10] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/14/2022] [Accepted: 05/12/2022] [Indexed: 12/02/2022] Open
Abstract
Asymmetric transport characteristic in n- and p-type conductivity has long been a fundamental difficulty in wide bandgap semiconductors. Hexagonal boron nitride (h-BN) can achieve p-type conduction, however, the n-type conductivity still remains unavailable. Here, we demonstrate a concept of orbital split induced level engineering through sacrificial impurity coupling and the realization of efficient n-type transport in 2D h-BN monolayer. We find that the O 2pz orbital has both symmetry and energy matching to the Ge 4pz orbital, which promises a strong coupling. The introduction of side-by-side O to Ge donor can effectively push up the donor level by the formation of another sacrificial deep level. We discover that a Ge-O2 trimer brings the extremely shallow donor level and very low ionization energy. By low-pressure chemical vapor deposition method, we obtain the in-situ Ge-O doping in h-BN monolayer and successfully achieve both through-plane (~100 nA) and in-plane (~20 nA) n-type conduction. We fabricate a vertically-stacked n-hBN/p-GaN heterojunction and show distinct rectification characteristics. The sacrificial impurity coupling method provides a highly viable route to overcome the n-type limitation of h-BN and paves the way for the future 2D optoelectronic devices. Asymmetric n/p conductivity is a fundamental difficulty in wide bandgap semiconductors. Here the authors demonstrate a concept of orbital level engineering through sacrificial impurity coupling to achieve n-type conductivity (ne ~1016 cm-3) in hexagonal BN.
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Affiliation(s)
- Shiqiang Lu
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China
| | - Peng Shen
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China
| | - Hongye Zhang
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China
| | - Guozhen Liu
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China
| | - Bin Guo
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China
| | - Yehang Cai
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China
| | - Han Chen
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China
| | - Feiya Xu
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China
| | - Tongchang Zheng
- Department of Physics, School of Science, Jimei University, Xiamen, 361021, China
| | - Fuchun Xu
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China
| | - Xiaohong Chen
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China
| | - Duanjun Cai
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China.
| | - Junyong Kang
- Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen, 361005, China
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Lin H, Jiang A, Xing S, Li L, Cheng W, Li J, Miao W, Zhou X, Tian L. Advances in Self-Powered Ultraviolet Photodetectors Based on P-N Heterojunction Low-Dimensional Nanostructures. NANOMATERIALS 2022; 12:nano12060910. [PMID: 35335723 PMCID: PMC8953703 DOI: 10.3390/nano12060910] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/11/2022] [Revised: 03/02/2022] [Accepted: 03/03/2022] [Indexed: 02/04/2023]
Abstract
Self-powered ultraviolet (UV) photodetectors have attracted considerable attention in recent years because of their vast applications in the military and civil fields. Among them, self-powered UV photodetectors based on p-n heterojunction low-dimensional nanostructures are a very attractive research field due to combining the advantages of low-dimensional semiconductor nanostructures (such as large specific surface area, excellent carrier transmission channel, and larger photoconductive gain) with the feature of working independently without an external power source. In this review, a selection of recent developments focused on improving the performance of self-powered UV photodetectors based on p-n heterojunction low-dimensional nanostructures from different aspects are summarized. It is expected that more novel, dexterous, and intelligent photodetectors will be developed as soon as possible on the basis of these works.
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Affiliation(s)
- Haowei Lin
- School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China; (A.J.); (S.X.); (L.L.); (W.C.); (J.L.); (W.M.); (X.Z.); (L.T.)
- Henan International Joint Laboratory of Nano-Photoelectric Magnetic Materials, Henan University of Technology, Zhengzhou 450001, China
- Correspondence:
| | - Ao Jiang
- School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China; (A.J.); (S.X.); (L.L.); (W.C.); (J.L.); (W.M.); (X.Z.); (L.T.)
| | - Shibo Xing
- School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China; (A.J.); (S.X.); (L.L.); (W.C.); (J.L.); (W.M.); (X.Z.); (L.T.)
| | - Lun Li
- School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China; (A.J.); (S.X.); (L.L.); (W.C.); (J.L.); (W.M.); (X.Z.); (L.T.)
| | - Wenxi Cheng
- School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China; (A.J.); (S.X.); (L.L.); (W.C.); (J.L.); (W.M.); (X.Z.); (L.T.)
| | - Jinling Li
- School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China; (A.J.); (S.X.); (L.L.); (W.C.); (J.L.); (W.M.); (X.Z.); (L.T.)
| | - Wei Miao
- School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China; (A.J.); (S.X.); (L.L.); (W.C.); (J.L.); (W.M.); (X.Z.); (L.T.)
| | - Xuefei Zhou
- School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China; (A.J.); (S.X.); (L.L.); (W.C.); (J.L.); (W.M.); (X.Z.); (L.T.)
| | - Li Tian
- School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China; (A.J.); (S.X.); (L.L.); (W.C.); (J.L.); (W.M.); (X.Z.); (L.T.)
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