Soft-Shear-Aligned Vertically Oriented Lamellar Block Copolymers for Template-Free Sub-10 nm Patterning and Hybrid Nanostructures

Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns

The shear-rolling process is a promising directed self-assembly method that can produce high-quality sub-10 nm block copolymer line-space patterns cost-effectively and straightforwardly over a large area. This study presents a high temperature (280 °C) and rapid (~0.1 s) shear-rolling process that can achieve a high degree of orientation in a single process while effectively preventing film delamination, that can be applied to large-area continuous processes. By minimizing adhesion, normal forces, and ultimate shear strain of the polydimethylsiloxane pad, shearing was successfully performed without peeling up to 280 °C at which the chain mobility significantly increases. This method can be utilized for various high-χ block copolymers and surface neutralization processes. It enables the creation of block copolymer patterns with a half-pitch as small as 8 nm in a unidirectional way. Moreover, the 0.1-second rapid shear-rolling was successfully performed on long, 3-inch width polyimide flexible films to validate its potential for the roll-to-roll process.

Enhanced Dielectric Strength and Capacitive Energy Density of Cyclic Polystyrene Films

The maximum capacitive energy stored in polymeric dielectric capacitors, which are ubiquitous in high-power-density devices, is dictated by the dielectric breakdown strength of the dielectric polymer. The fundamental mechanisms of the dielectric breakdown, however, remain unclear. Based on a simple free-volume model of the polymer fluid state, we hypothesized that the free ends of linear polymer chains might act as “defect” sites, at which the dielectric breakdown can initiate. Thus, the dielectric breakdown strength of cyclic polymers should exhibit enhanced stability in comparison to that of their linear counterparts having the same composition and similar molar mass. This hypothesis is supported by the ∼50% enhancement in the dielectric breakdown strength and ∼80% enhancement in capacitive energy density of cyclic polystyrene melt films in comparison to corresponding linear polystyrene control films. Furthermore, we observed that cyclic polymers exhibit a denser packing density than the linear chain melts, an effect that is consistent with and could account for the observed property changes. Our work demonstrates that polymer topology can significantly influence the capacitive properties of polymer films, and correspondingly, we can expect polymer topology to influence the gas permeability, shear modulus, and other properties of thin films dependent on film density.

Facile Entropy-Driven Segregation of Imprinted Polymer-Grafted Nanoparticle Brush Blends by Solvent Vapor Annealing Soft Lithography

Polymer-grafted nanoparticles (PGNPs) have attracted extensive research interest due to their potential for enhancing mechanical and electrical properties of both bulk polymer composite materials, as well as thin polymer films incorporating these nanoparticles (NPs). In previous studies, we have shown that an entropic driving force serves to organize low-molecular-mass PGNPs in imprinted blend films of PGNPs with low-molecular-mass homopolymers. In this work, we developed a novel solvent vapor annealing soft lithography (SVA-SL) method to overcome the technical difficulties in processing the high-molecular-mass PGNP blends due to the intrinsically sluggish melt annealing kinetics found in the phase separation of these blend PGNP materials. In particular, we utilized SVA-SL to create nanopatterns in blends of PGNPs having relatively high-molecular-mass-grafted layers but with cores of NPs having greatly different sizes. The minimization of the entropic free energy in the present system corresponded to larger PGNPs partitioning almost exclusively into the "mesa" regions of the imprinted PGNP blend films, as quantified by the estimation of the partition coefficient, K_p. The use of the SVA-SL processing method is important because it allows facile imprint patterning of PGNP materials and large-scale organization of the PGNPs even when the grafted chain lengths are long enough for the chains to be highly entangled, allowing enhanced thermo-mechanical property enhancements of the resulting films and a corresponding extended range of potential nanotech applications.