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Seid BA, Sarisozen S, Peña-Camargo F, Ozen S, Gutierrez-Partida E, Solano E, Steele JA, Stolterfoht M, Neher D, Lang F. Understanding and Mitigating Atomic Oxygen-Induced Degradation of Perovskite Solar Cells for Near-Earth Space Applications. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2311097. [PMID: 38412429 DOI: 10.1002/smll.202311097] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/01/2023] [Revised: 01/26/2024] [Indexed: 02/29/2024]
Abstract
Combining high efficiency with good radiation tolerance, perovskite solar cells (PSCs) are promising candidates to upend expanding space photovoltaic (PV) technologies. Successful employment in a Near-Earth space environment, however, requires high resistance against atomic oxygen (AtOx). This work unravels AtOx-induced degradation mechanisms of PSCs with and without phenethylammonium iodide (PEAI) based 2D-passivation and investigates the applicability of ultrathin silicon oxide (SiO) encapsulation as AtOx barrier. AtOx exposure for 2 h degraded the average power conversion efficiency (PCE) of devices without barrier encapsulation by 40% and 43% (w/o and with 2D-PEAI-passivation) of their initial PCE. In contrast, devices with a SiO-barrier retained over 97% of initial PCE. To understand why 2D-PEAI passivated devices degrade faster than less efficient non-passivated devices, various opto-electrical and structural characterications are conducted. Together, these allowed to decouple different damage mechanisms. Notably, pseudo-J-V curves reveal unchanged high implied fill factors (pFF) of 86.4% and 86.2% in non-passivated and passivated devices, suggesting that degradation of the perovskite absorber itself is not dominating. Instead, inefficient charge extraction and mobile ions, due to a swiftly degrading PEAI interlayer are the primary causes of AtOx-induced device performance degradation in passivated devices, whereas a large ionic FF loss limits non-passivated devices.
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Affiliation(s)
- Biruk Alebachew Seid
- Institute of Physics and Astronomy, University of Potsdam, D-14476, Potsdam-Golm, Germany
| | - Sema Sarisozen
- Institute of Physics and Astronomy, University of Potsdam, D-14476, Potsdam-Golm, Germany
| | - Francisco Peña-Camargo
- Institute of Physics and Astronomy, University of Potsdam, D-14476, Potsdam-Golm, Germany
| | - Sercan Ozen
- Institute of Physics and Astronomy, University of Potsdam, D-14476, Potsdam-Golm, Germany
| | | | - Eduardo Solano
- NCD-SWEET Beamline, ALBA Synchrotron Light Source, Cerdanyola del Vallès, Barcelona, 08290, Spain
| | - Julian A Steele
- Australian Institute for Bioengineering and Nanotechnology, The University of Queensland, Brisbane, Queensland, 4072, Australia
- School of Mathematics and Physics, The University of Queensland, Brisbane, Queensland, 4072, Australia
| | - Martin Stolterfoht
- Institute of Physics and Astronomy, University of Potsdam, D-14476, Potsdam-Golm, Germany
| | - Dieter Neher
- Institute of Physics and Astronomy, University of Potsdam, D-14476, Potsdam-Golm, Germany
| | - Felix Lang
- Institute of Physics and Astronomy, University of Potsdam, D-14476, Potsdam-Golm, Germany
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Childs A, Pereira J, Didier CM, Baksh A, Johnson I, Castro JM, Davidson E, Santra S, Rajaraman S. Plotter Cut Stencil Masks for the Deposition of Organic and Inorganic Materials and a New Rapid, Cost Effective Technique for Antimicrobial Evaluations. MICROMACHINES 2022; 14:14. [PMID: 36677074 PMCID: PMC9864392 DOI: 10.3390/mi14010014] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 11/16/2022] [Revised: 12/12/2022] [Accepted: 12/16/2022] [Indexed: 06/17/2023]
Abstract
Plotter cutters in stencil mask prototyping are underutilized but have several advantages over traditional MEMS techniques. In this paper we investigate the use of a conventional plotter cutter as a highly effective benchtop tool for the rapid prototyping of stencil masks in the sub-250 μm range and characterize patterned layers of organic/inorganic materials. Furthermore, we show a new diagnostic monitoring application for use in healthcare, and a potential replacement of the Standard Kirby-Bauer Diffusion Antibiotic Resistance tests was developed and tested on both Escherichia coli and Xanthomonas alfalfae as pathogens with Oxytetracycline, Streptomycin and Kanamycin. We show that the reduction in area required for the minimum inhibitory concentration tests; allow for three times the number of tests to be performed within the same nutrient agar Petri dish, demonstrated both theoretically and experimentally resulting in correlations of R ≈ 0.96 and 0.985, respectively for both pathogens.
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Affiliation(s)
- Andre Childs
- Department of Material Science and Engineering, University of Central Florida, Orlando, FL 32816, USA
| | - Jorge Pereira
- Department of Chemistry, University of Central Florida, Orlando, FL 32816, USA
| | - Charles M. Didier
- Burnett School of Biomedical Sciences, University of Central Florida, Orlando, FL 32827, USA
| | - Aliyah Baksh
- Burnett School of Biomedical Sciences, University of Central Florida, Orlando, FL 32827, USA
| | - Isaac Johnson
- Department of Mechanical and Aerospace Engineering, University of Central Florida, Orlando, FL 32816, USA
| | - Jorge Manrique Castro
- Department of Electrical and Computer Engineering, University of Central Florida, Orlando, FL 32816, USA
| | - Edwin Davidson
- Department of Chemistry, University of Central Florida, Orlando, FL 32816, USA
| | - Swadeshmukul Santra
- Department of Chemistry, University of Central Florida, Orlando, FL 32816, USA
- Burnett School of Biomedical Sciences, University of Central Florida, Orlando, FL 32827, USA
- NanoScience Technology Center, University of Central Florida, Orlando, FL 32826, USA
| | - Swaminathan Rajaraman
- Department of Material Science and Engineering, University of Central Florida, Orlando, FL 32816, USA
- Burnett School of Biomedical Sciences, University of Central Florida, Orlando, FL 32827, USA
- Department of Electrical and Computer Engineering, University of Central Florida, Orlando, FL 32816, USA
- NanoScience Technology Center, University of Central Florida, Orlando, FL 32826, USA
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The effects of atomic oxygen and ion irradiation degradation on multi-polymers: A combined ground-based exposure and ReaxFF-MD simulation. Polym Degrad Stab 2022. [DOI: 10.1016/j.polymdegradstab.2022.110134] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register]
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