1
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Cho JH, Chun SY, Kim GH, Sriboriboon P, Han S, Shin SB, Kim J, Nam S, Kim Y, Kim YH, Yoon JH, Kim MG. Flexible Synaptic Memristors With Controlled Rigidity in Zirconium-Oxo Clusters for High-Precision Neuromorphic Computing. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2025:e2412289. [PMID: 39854124 DOI: 10.1002/advs.202412289] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/04/2024] [Revised: 11/24/2024] [Indexed: 01/26/2025]
Abstract
Flexible memristors are promising candidates for multifunctional neuromorphic computing applications, overcoming the limitations of conventional computing devices. However, unpredictable switching behavior and poor mechanical stability in conventional memristors present significant challenges to achieving device reliability. Here, a reliable and flexible memristor using zirconium-oxo cluster (Zr6O4OH4(OMc)12) as the resistive switching layer is demonstrated. The optimization of the structural rigidity of the hybrid oxo-cluster network by thermal polymerization allows the precise formation of dispersed conductive cluster networks, enhancing the repeatability of the resistive switching with mechanical flexibility. The optimized memristor exhibits endurance of ∼104 cycles and stable memory retention performance up to 104 s, maintaining a high ION/IOFF ratio of 104 under a bending radius of 2.5 mm. Moreover, the device achieves a pattern recognition accuracy of 97.44%, enabled by highly symmetric analog switching with multilevel conductance states. These results highlight that hybrid metal-oxo clusters can provide novel material design principles for flexible and reliable neuromorphic applications, contributing to the development of artificial neural networks.
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Affiliation(s)
- Jae-Hyeok Cho
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| | - Suk Yeop Chun
- KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul, 02841, Republic of Korea
| | - Ga Hye Kim
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| | - Panithan Sriboriboon
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| | - Sanghee Han
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| | - Seung Beom Shin
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| | - Jeehoon Kim
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| | - San Nam
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| | - Yunseok Kim
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| | - Yong-Hoon Kim
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| | - Jung Ho Yoon
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| | - Myung-Gil Kim
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
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2
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Woo KS, Williams RS, Kumar S. Localized Conduction Channels in Memristors. Chem Rev 2025; 125:294-325. [PMID: 39702905 DOI: 10.1021/acs.chemrev.4c00454] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/21/2024]
Abstract
Since the early 2000s, the impending end of Moore's scaling, as the physical limits to shrinking transistors have been approached, has fueled interest in improving the functionality and efficiency of integrated circuits by employing memristors or two-terminal resistive switches. Formation (or avoidance) of localized conducting channels in many memristors, often called "filaments", has been established as the basis for their operation. While we understand some qualitative aspects of the physical and thermodynamic origins of conduction localization, there are not yet quantitative models that allow us to predict when they will form or how large they will be. Here we compile observations and explanations of channel formation that have appeared in the literature since the 1930s, show how many of these seemingly unrelated pieces fit together, and outline what is needed to complete the puzzle. This understanding will be a necessary predictive component for the design and fabrication of post-Moore's-era electronics.
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Affiliation(s)
- Kyung Seok Woo
- Sandia National Laboratories, Livermore, California 94550, United States
- Department of Electrical and Computer Engineering, Texas A&M University, College Station, Texas 77843, United States
- Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States
| | - R Stanley Williams
- Sandia National Laboratories, Livermore, California 94550, United States
- Department of Electrical and Computer Engineering, Texas A&M University, College Station, Texas 77843, United States
| | - Suhas Kumar
- Sandia National Laboratories, Livermore, California 94550, United States
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3
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Hu Z, Dou H, Zhang Y, Shen J, Ahmad L, Han S, Hollander EG, Lu J, Zhang Y, Shang Z, Cao Y, Huang J, Wang H. Integration of CeO 2-Based Memristor with Vertically Aligned Nanocomposite Thin Film: Enabling Selective Conductive Filament Formation for High-Performance Electronic Synapses. ACS APPLIED MATERIALS & INTERFACES 2024; 16:64951-64962. [PMID: 39547660 PMCID: PMC11615853 DOI: 10.1021/acsami.4c10687] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/27/2024] [Revised: 09/22/2024] [Accepted: 10/04/2024] [Indexed: 11/17/2024]
Abstract
The CeO2-based memristor has attracted significant attention due to its intrinsic resistive switching (RS) properties, large on/off ratio, and great plasticity, making it a promising candidate for artificial synapses. However, significant challenges such as high power consumption and poor device reliability hinder its broad application in neuromorphic microchips. To tackle these issues, in this work, we design a novel bilayer (BL) memristor by integrating a CeO2-based memristor with a Co-CeO2 vertically aligned nanocomposite (VAN) layer and compare it with the single layer (SL) memristor. Preliminary electrical testing reveals that the BL memristor offers a reduced set/reset voltage (∼67% lower), a higher on/off ratio (∼5 × 102), enhanced device reliability, and improved device-to-device variation compared to the SL memristor. Insight from COMSOL simulation, coupled with microstructural analysis, provides a comprehensive elucidation on how the VAN layer facilitates the selective conductive filament (CF) formation. Subsequently, the plasticity of the BL memristor is evaluated through long-term potentiation/depression (LTP/LTD), paired-pulse facilitation (PPF), and spike-time-dependent plasticity (STDP). The spiking neural network (SNN) built upon the BL memristor achieves remarkable accuracy (∼94%) after only 12 iterations, underscoring its potential for high-performance neural networks.
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Affiliation(s)
- Zedong Hu
- Elmore
Family School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47906, United States
| | - Hongyi Dou
- School
of Materials Engineering, Purdue University, West Lafayette, Indiana 47906, United States
| | - Yizhi Zhang
- School
of Materials Engineering, Purdue University, West Lafayette, Indiana 47906, United States
| | - Jianan Shen
- School
of Materials Engineering, Purdue University, West Lafayette, Indiana 47906, United States
| | - Laveeza Ahmad
- Department
of Materials Science and Engineering, University
of Texas at Arlington, Arlington, Texas 76019, United States
| | - Shuyao Han
- School
of Materials, Shenzhen Campus of Sun Yat-sen
University, Shenzhen 518107, China
| | - Elijah Gordon Hollander
- School
of Materials Engineering, Purdue University, West Lafayette, Indiana 47906, United States
| | - Juanjuan Lu
- School
of Materials Engineering, Purdue University, West Lafayette, Indiana 47906, United States
| | - Yifan Zhang
- School
of Materials Engineering, Purdue University, West Lafayette, Indiana 47906, United States
| | - Zhongxia Shang
- School
of Materials Engineering, Purdue University, West Lafayette, Indiana 47906, United States
| | - Ye Cao
- Department
of Materials Science and Engineering, University
of Texas at Arlington, Arlington, Texas 76019, United States
| | - Jijie Huang
- School
of Materials, Shenzhen Campus of Sun Yat-sen
University, Shenzhen 518107, China
| | - Haiyan Wang
- Elmore
Family School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47906, United States
- School
of Materials Engineering, Purdue University, West Lafayette, Indiana 47906, United States
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4
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Speckbacher M, Rinderle M, Bienek O, Sharp ID, Gagliardi A, Tornow M. Conductive filament distribution in nano-scale electrochemical metallization cells. NANOSCALE 2024; 16:19675-19682. [PMID: 39397512 DOI: 10.1039/d4nr02870h] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/15/2024]
Abstract
We report a combined experimental and theoretical study of the spatial distributions and sizes of conductive filaments in nano-scale electrochemical metallization (ECM) cells. Each cell comprises a silver nanocube as active electrode, a titanium dioxide (TiO2) or aluminum oxide (Al2O3) layer as dielectric, and a highly-doped silicon substrate as passive counter electrode. Following electroforming of the ECM cell and subsequent mechanical delamination of the silver nanocubes, current maps at previous particle locations reveal an intriguing metal distribution in the TiO2, with preferential accumulation close to the original locations of the nanocube edges. We assign this behavior to electric field enhancements close to the cube edge positions. In contrast, filaments in Al2O3 layers show a comparatively homogenous distribution, which may be assigned to its lower dielectric permittivity. By increasing the oxide thickness, the total area of conductive spots in the current maps increases monotonically for both materials. Kinetic Monte-Carlo simulations of ion migration dynamics in TiO2 confirm the experimental observations, describing both the preferred locations and oxide thickness-dependent metal loadings associated with filament formation. Overall, our findings are highly valuable for the design of future electrochemical metallization cells, especially in the sub-100 nm regime, where optimal filament control is of major importance for achieving lowest device-to-device variability.
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Affiliation(s)
- Maximilian Speckbacher
- Molecular Electronics, Department of Electrical Engineering, TUM School of Computation, Information and Technology, Technical University of Munich, 85748 Garching, Germany.
| | - Michael Rinderle
- Chair of Simulation of Nanosystems for Energy Conversion, Department of Electrical Engineering, TUM School of Computation, Information and Technology, Atomistic Modeling Center (AMC), Munich Data Science Institute (MDSI), Technical University of Munich, 85748 Garching, Germany.
| | - Oliver Bienek
- Walter Schottky Institute, Technical University of Munich, 85748 Garching, Germany
- Physics Department, TUM School of Natural Sciences, Technical University of Munich, 85748 Garching, Germany
| | - Ian D Sharp
- Walter Schottky Institute, Technical University of Munich, 85748 Garching, Germany
- Physics Department, TUM School of Natural Sciences, Technical University of Munich, 85748 Garching, Germany
| | - Alessio Gagliardi
- Chair of Simulation of Nanosystems for Energy Conversion, Department of Electrical Engineering, TUM School of Computation, Information and Technology, Atomistic Modeling Center (AMC), Munich Data Science Institute (MDSI), Technical University of Munich, 85748 Garching, Germany.
| | - Marc Tornow
- Molecular Electronics, Department of Electrical Engineering, TUM School of Computation, Information and Technology, Technical University of Munich, 85748 Garching, Germany.
- Fraunhofer Institute for Electronic Microsystems and Solid State Technologies (EMFT), 80686 Munich, Germany
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5
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Wang Y, Wang H, Guo D, An Z, Zheng J, Huang R, Bi A, Jiang J, Wang S. High-Linearity Ta 2O 5 Memristor and Its Application in Gaussian Convolution Image Denoising. ACS APPLIED MATERIALS & INTERFACES 2024; 16:47879-47888. [PMID: 39188162 DOI: 10.1021/acsami.4c09056] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/28/2024]
Abstract
In the image Gaussian filtering process, convolving with a Gaussian matrix is essential due to the numerous arithmetic computations involved, predominantly multiplications and additions. This can heavily tax the system's memory, particularly with frequent use. To address this issue, a W/Ta2O5/Ag memristor was employed to substantially mitigate the computational overhead associated with convolution operations. Additionally, an interlayer of ZnO was subsequently introduced into the memristor. The resulting Ta2O5/ZnO heterostructure layer exhibited improved linearity in the pulse response, which enhanced linearity facilitates easy adjustment of the conductance magnitude through a linear mapping of the number of pulses and the conductance. Subsequently, the conductance of the W/Ta2O5/ZnO/Ag bilayer memristor was employed as the weights for the convolution kernel in convolution operations. Gaussian noise removal in image processing was achieved by assembling a 5 × 5 memristor array as the kernel. When denoising was performed using memristor arrays, compared to denoising achieved through Gaussian matrix convolution, an average loss of less than 5% was observed. The provided memristors demonstrate significant potential in convolutional computations, particularly for subsequent applications in convolutional neural networks (CNNs).
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Affiliation(s)
- Yucheng Wang
- Research & Development Institute of Northwestern Polytechnical University in Shenzhen, Shenzhen 518057, China
| | - Hexin Wang
- School of Microelectronics, Northwestern Polytechnical University, Xi'an 710072, China
| | - Dingyun Guo
- School of Microelectronics, Northwestern Polytechnical University, Xi'an 710072, China
| | - Zeyang An
- School of Microelectronics, Northwestern Polytechnical University, Xi'an 710072, China
| | - Jiawei Zheng
- School of Microelectronics, Northwestern Polytechnical University, Xi'an 710072, China
| | - Ruixi Huang
- School of Microelectronics, Northwestern Polytechnical University, Xi'an 710072, China
| | - Antong Bi
- School of Microelectronics, Northwestern Polytechnical University, Xi'an 710072, China
| | - Junyu Jiang
- School of Microelectronics, Northwestern Polytechnical University, Xi'an 710072, China
| | - Shaoxi Wang
- School of Microelectronics, Northwestern Polytechnical University, Xi'an 710072, China
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6
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Gamage S, Manna S, Zajac M, Hancock S, Wang Q, Singh S, Ghafariasl M, Yao K, Tiwald TE, Park TJ, Landau DP, Wen H, Sankaranarayanan SKS, Darancet P, Ramanathan S, Abate Y. Infrared Nanoimaging of Hydrogenated Perovskite Nickelate Memristive Devices. ACS NANO 2024; 18:2105-2116. [PMID: 38198599 PMCID: PMC10811663 DOI: 10.1021/acsnano.3c09281] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/25/2023] [Revised: 12/21/2023] [Accepted: 12/22/2023] [Indexed: 01/12/2024]
Abstract
Solid-state devices made from correlated oxides, such as perovskite nickelates, are promising for neuromorphic computing by mimicking biological synaptic function. However, comprehending dopant action at the nanoscale poses a formidable challenge to understanding the elementary mechanisms involved. Here, we perform operando infrared nanoimaging of hydrogen-doped correlated perovskite, neodymium nickel oxide (H-NdNiO3, H-NNO), devices and reveal how an applied field perturbs dopant distribution at the nanoscale. This perturbation leads to stripe phases of varying conductivity perpendicular to the applied field, which define the macroscale electrical characteristics of the devices. Hyperspectral nano-FTIR imaging in conjunction with density functional theory calculations unveils a real-space map of multiple vibrational states of H-NNO associated with OH stretching modes and their dependence on the dopant concentration. Moreover, the localization of excess charges induces an out-of-plane lattice expansion in NNO which was confirmed by in situ X-ray diffraction and creates a strain that acts as a barrier against further diffusion. Our results and the techniques presented here hold great potential for the rapidly growing field of memristors and neuromorphic devices wherein nanoscale ion motion is fundamentally responsible for function.
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Affiliation(s)
- Sampath Gamage
- Department
of Physics and Astronomy, University of
Georgia, Athens, Georgia 30602, United States
| | - Sukriti Manna
- Center for
Nanoscale Materials, Argonne National Laboratory, Lemont, Illinois 60439, United States
- Department
of Mechanical and Industrial Engineering, University of Illinois, Chicago, Illinois 60607, United States
| | - Marc Zajac
- Advanced
Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Steven Hancock
- Center
for
Simulational Physics and Department of Physics and Astronomy, University of Georgia, Athens, Georgia 30602, United States
| | - Qi Wang
- School
of
Materials Engineering, Purdue University, West Lafayette, Indiana 47907, United States
| | - Sarabpreet Singh
- Department
of Physics and Astronomy, University of
Georgia, Athens, Georgia 30602, United States
| | - Mahdi Ghafariasl
- Department
of Physics and Astronomy, University of
Georgia, Athens, Georgia 30602, United States
| | - Kun Yao
- School
of
Electrical and Computer Engineering, University
of Georgia, Athens, Georgia 30602, United States
| | - Tom E. Tiwald
- J.A. Woollam
Co., Inc., Lincoln, Nebraska 68508, United States
| | - Tae Joon Park
- School
of
Materials Engineering, Purdue University, West Lafayette, Indiana 47907, United States
| | - David P. Landau
- Center
for
Simulational Physics and Department of Physics and Astronomy, University of Georgia, Athens, Georgia 30602, United States
| | - Haidan Wen
- Advanced
Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, United States
- Materials
Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Subramanian K.
R. S. Sankaranarayanan
- Center for
Nanoscale Materials, Argonne National Laboratory, Lemont, Illinois 60439, United States
- Department
of Mechanical and Industrial Engineering, University of Illinois, Chicago, Illinois 60607, United States
| | - Pierre Darancet
- Center for
Nanoscale Materials, Argonne National Laboratory, Lemont, Illinois 60439, United States
- Northwestern
Argonne Institute of Science and Engineering, Evanston, Illinois 60208, United States
| | - Shriram Ramanathan
- School
of
Materials Engineering, Purdue University, West Lafayette, Indiana 47907, United States
- Department
of Electrical & Computer Engineering, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854, United States
| | - Yohannes Abate
- Department
of Physics and Astronomy, University of
Georgia, Athens, Georgia 30602, United States
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