Permeability- and Surface-Energy-Tunable Polyurethane Acrylate Molds for Capillary Force Lithography

Ultrathin, reflective light-field imaging film realized by self-releasing UV-curable nanoimprinting lithography

Light-field imaging has emerged as a technology allowing the capture of richer visual information from the world. Ultrathin, reflective light-field imaging film is fabricated by using self-releasing ultraviolet (UV)-curable nanoimprinting lithography. The plenoptic function is built to generate the dense reflective light field in a two-dimension plane in which the occlusion perception can be seamlessly incorporated in the recording process. A self-releasing nanoimprinting technique is developed to realize the imaging film with a thickness of 25 µm and a full field of view (FOV). The results pave the way toward developing high-performance light-field imaging device that can be used as a visual security feature or in virtual/augmented reality and computer vision applications, etc.

Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming Nanoimprint

Nanoimprint technology is powerful for fabricating nanostructures in a large area. However, expensive equipment, high cost, and complex process conditions hinder the application of nano-imprinting technology. Therefore, double-layer self-priming nanoimprint technology was proposed to fabricate ordered metal nanostructures uniformly on 4-inch soft and hard substrates without the aid of expensive instruments. Different nanostructure (gratings, nanoholes and nanoparticles) and different materials (metal and MoS2) were patterned, which shows wide application of double-layer self-priming nanoimprint technology. Moreover, by a double-layer system, the width and the height of metal can be adjusted through the photoresist thickness and developing condition, which provide a programmable way to fabricate different nanostructures using a single mold. The double-layer self-priming nanoimprint method can be applied in poor condition without equipment and be programmable in nanostructure parameters using a single mold, which reduces the cost of instruments and molds.

Hierarchically Patterned Elastomeric and Thermoplastic Polymer Films through Nanoimprinting and Ultraviolet Light Exposure

The surface relief structure of polymer films over large areas can be controlled by combining nanoscale imprinting and microscale ultraviolet-ozone (UVO) radiation, resulting in hierarchical structured surfaces. First, nanoscale patterns were formed by nanoimprinting elastomer [poly(dimethylsiloxane) (PDMS)] films with a pattern on a digital video disk. Micron-scale patterns were then superimposed on the nanoimprinted PDMS films by exposing them to ultraviolet radiation in oxygen (UVO) through a transmission electron microscopy grid mask having variable microscale patterning. UVO exposure leads to conversion and densification of PDMS to SiO x , leading to micron height relief features that follow a linear scaling relation with pattern dimension. Further, the pattern scopes are shown to collapse into a master curve by normalized feature values. Interestingly, these relief structures preserve the nanoscale features. In this paper, the influence of the self-limiting PDMS densification, wall stress at the boundary of micro-depression, and UVO exposure energy is studied in control of the micro-depression scale. This simple two-step imprinting process involving both nanoimprinting and UV radiation allows for facile fabrication of the dimension adjustable micro-nano hierarchically structures not only on elastomer films but also on thermoplastic polymer films. Coarse-grained molecular dynamics simulations were performed to correlate the surface tension and elastic properties of polymeric materials to the deformation of the pattern structure.

Surface energy-tunable iso decyl acrylate based molds for low pressure-nanoimprint lithography

We presented surface energy-tunable nanoscale molds for unconventional lithography. The mold is highly robust, transparent, has a minimized haze, does not contain additives, and is a non-fluorinated isodecyl acrylate and trimethylolpropane triacrylate based polymer. By changing the mixing ratio of the polymer components, the cross-linking density, mechanical modulus, and surface energy (crucial factors in low pressure ((1-2) × 10⁵ N m^-2) low pressure-nanoimprint lithography (LP-NIL)), can be controlled. To verify these properties of the molds, we also characterized the surface energy by measuring the contact angles and calculating the work of adhesion among the wafer, polymer film, and mold for successful demolding in nanoscale structures. Moreover, the molds showed high optical clarity and precisely tunable mechanical and surface properties, capable of replicating sub-100 nm patterns by thermal LP-NIL and UV-NIL.

Designs and processes toward high-aspect-ratio nanostructures at the deep nanoscale: unconventional nanolithography and its applications

The patterning of high-resolution-featured deep-nanoscale structures with a high aspect ratio (AR) has received increasing attention in recent years as a promising technique for a wide range of applications, including electrical, optical, mechanical and biological systems. Despite extensive efforts to develop viable nanostructure fabrication processes, a superior technique enabling defect-free, high-resolution control over a large area is still required. In this review, we focus on recent important advances in the designs and processes of high-resolution nanostructures possessing a high AR, including hierarchical and 3D patterns. The unique applications of these materials are also discussed.

FT-IR spectroscopic and thermal study of waterborne polyurethane-acrylate leather coatings using tartaric acid as an ionomer

Waterborne polyurethane (WDPU) comprising polycaprolactone diol and hexamethylene diisocyanate was prepared by using tartaric acid (TA) as an ionomer. WDPU was further modified with polymethyl methacrylate (PMMA). Hybrid WDPU-PMMA coatings were formed by using unsaturate end capping agents such as 2-hydroxyethylmethacrylate. WDPU-PMMA blend coatings were formed by using chain extenders such as ethylene glycol, ethylene diamine and mixed with PMMA. Thermal behavior and structural characterizations were investigated by means of thermogravimetric analysis and Fourier transformm infrared (FT-IR) spectroscopy, respectively. Chemical and solvent resistance was checked against various chemicals and solvents. Bio-stability was evaluated in CoCl2/H2O2 solution. Gloss, film flexibility, tackiness, abrasion resistance and adhesive prosperities of WDPU-PMMA coatings were also checked by applying these coatings on a leather sheet.

Process, Design and Materials for Unidirectionally Tilted Polymeric Micro/Nanohairs and Their Adhesion Characteristics

Recent research in the field of gecko-inspired dry adhesive has focused on modifying the material and structural properties of polymer-based nanohairs. Polymers such as polystyrene (PS), high-density polyethylene (HDPE), ultraviolet curable epoxy (SU-8), polyurethane acrylate (PUA), polycarbonate (PC), and polydimethyl siloxane (PDMS) can fulfill many mechanical property requirements, are easily tunable, and can be produced via large-scale fabrication. However, the fabrication process for tilted structure remains challenging. The tilted structure is a crucial factor in high-degree conformal contact, which facilitates high adhesion, low effective modulus, and directional adhesion properties. Recent studies have attempted to create a tilted structure by applying beam irradiation, mechanical and thermal stress, and magnetic fields. This review provides a comprehensive investigation into advanced strategies for producing tilted polymeric nanostructures and their potential applications in the near future.

Large-Area Sub-Wavelength Optical Patterning via Long-Range Ordered Polymer Lens Array

Fabrication of large-area, highly orderly, and high-resolution nanostructures in a cost-effective fashion prompts advances in nanotechnology. Herein, for the first time, we demonstrate a unique strategy to prepare a long-range highly regular polymer lens from photoresist nanotrenches based templates, which are obtained from underexposure. The relationship between exposure dose and the cross-sectional morphology of produced photoresist nanostructures is revealed for the first time. The polymer lens arrays are repeatedly used for rapid generation of sub-100 nm nanopatterns across centimeter-scale areas. The light focusing properties of the nanoscale polymer lens are investigated by both simulation and experiment. It is found that the geometry, size of the lens, and the exposure dose can be deployed to adjust the produced feature size, spacing, and shapes. Because the polymer lenses are derived from top-down photolithography, the nearly perfect long-range periodicity of produced nanopatterns is ensured, and the feature shapes can be flexibly designed. Because this nanolithographic strategy enables subwavelength periodical nanopatterns with controllable feature size, geometry, and composition in a cost-effective manner, it can be optimized as a viable and potent nanofabrication tool for various technological applications.