1
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Huang Y, Pathak AK, Tsai JY, Rumsey C, Ivill M, Kramer N, Hu Y, Trebbin M, Yan Q, Ren S. Pressure-controlled magnetism in 2D molecular layers. Nat Commun 2023; 14:3186. [PMID: 37268639 DOI: 10.1038/s41467-023-38991-8] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/21/2022] [Accepted: 05/19/2023] [Indexed: 06/04/2023] Open
Abstract
Long-range magnetic ordering of two-dimensional crystals can be sensitive to interlayer coupling, enabling the effective control of interlayer magnetism towards voltage switching, spin filtering and transistor applications. With the discovery of two-dimensional atomically thin magnets, a good platform provides us to manipulate interlayer magnetism for the control of magnetic orders. However, a less-known family of two-dimensional magnets possesses a bottom-up assembled molecular lattice and metal-to-ligand intermolecular contacts, which lead to a combination of large magnetic anisotropy and spin-delocalization. Here, we report the pressure-controlled interlayer magnetic coupling of molecular layered compounds via chromium-pyrazine coordination. Room-temperature long-range magnetic ordering exhibits pressure tuning with a coercivity coefficient up to 4 kOe/GPa, while pressure-controlled interlayer magnetism also presents a strong dependence on alkali metal stoichiometry and composition. Two-dimensional molecular interlayers provide a pathway towards pressure-controlled peculiar magnetism through charge redistribution and structural transformation.
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Affiliation(s)
- Yulong Huang
- Department of Mechanical and Aerospace Engineering, University at Buffalo, The State University of New York, Buffalo, NY, 14260, USA.
| | - Arjun K Pathak
- Department of Physics, SUNY Buffalo State, Buffalo, New York, 14222, USA.
| | - Jeng-Yuan Tsai
- Department of Physics, Northeastern University, Boston, MA, 02115, USA
| | - Clayton Rumsey
- Department of Chemistry, University at Buffalo, The State University of New York, Buffalo, NY, 14260, USA
| | - Mathew Ivill
- DEVCOM Army Research Laboratory, Aberdeen Proving Ground, MD, 21005, USA
| | - Noah Kramer
- Department of Physics, SUNY Buffalo State, Buffalo, New York, 14222, USA
| | - Yong Hu
- Department of Mechanical and Aerospace Engineering, University at Buffalo, The State University of New York, Buffalo, NY, 14260, USA
| | - Martin Trebbin
- Department of Chemistry, University at Buffalo, The State University of New York, Buffalo, NY, 14260, USA
- Research and Education in Energy, Environment and Water (RENEW) Institute, University at Buffalo, The State University of New York, Buffalo, NY, 14260, USA
| | - Qimin Yan
- Department of Physics, Northeastern University, Boston, MA, 02115, USA.
| | - Shenqiang Ren
- Department of Mechanical and Aerospace Engineering, University at Buffalo, The State University of New York, Buffalo, NY, 14260, USA.
- Department of Physics, Northeastern University, Boston, MA, 02115, USA.
- Department of Chemistry, University at Buffalo, The State University of New York, Buffalo, NY, 14260, USA.
- Research and Education in Energy, Environment and Water (RENEW) Institute, University at Buffalo, The State University of New York, Buffalo, NY, 14260, USA.
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2
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Vogel T, Zintler A, Kaiser N, Guillaume N, Lefèvre G, Lederer M, Serra AL, Piros E, Kim T, Schreyer P, Winkler R, Nasiou D, Olivo RR, Ali T, Lehninger D, Arzumanov A, Charpin-Nicolle C, Bourgeois G, Grenouillet L, Cyrille MC, Navarro G, Seidel K, Kämpfe T, Petzold S, Trautmann C, Molina-Luna L, Alff L. Structural and Electrical Response of Emerging Memories Exposed to Heavy Ion Radiation. ACS NANO 2022; 16:14463-14478. [PMID: 36113861 PMCID: PMC9527794 DOI: 10.1021/acsnano.2c04841] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/10/2023]
Abstract
Hafnium oxide- and GeSbTe-based functional layers are promising candidates in material systems for emerging memory technologies. They are also discussed as contenders for radiation-harsh environment applications. Testing the resilience against ion radiation is of high importance to identify materials that are feasible for future applications of emerging memory technologies like oxide-based, ferroelectric, and phase-change random-access memory. Induced changes of the crystalline and microscopic structure have to be considered as they are directly related to the memory states and failure mechanisms of the emerging memory technologies. Therefore, we present heavy ion irradiation-induced effects in emerging memories based on different memory materials, in particular, HfO2-, HfZrO2-, as well as GeSbTe-based thin films. This study reveals that the initial crystallinity, composition, and microstructure of the memory materials have a fundamental influence on their interaction with Au swift heavy ions. With this, we provide a test protocol for irradiation experiments of hafnium oxide- and GeSbTe-based emerging memories, combining structural investigations by X-ray diffraction on a macroscopic, scanning transmission electron microscopy on a microscopic scale, and electrical characterization of real devices. Such fundamental studies can be also of importance for future applications, considering the transition of digital to analog memories with a multitude of resistance states.
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Affiliation(s)
- Tobias Vogel
- Advanced
Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Alexander Zintler
- Advanced
Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Nico Kaiser
- Advanced
Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | | | | | - Maximilian Lederer
- Fraunhofer
IMPS, Center Nanoelectronic Technologies
(CNT), 01109 Dresden, Germany
| | | | - Eszter Piros
- Advanced
Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Taewook Kim
- Advanced
Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Philipp Schreyer
- Advanced
Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Robert Winkler
- Advanced
Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Déspina Nasiou
- Advanced
Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | | | - Tarek Ali
- Fraunhofer
IMPS, Center Nanoelectronic Technologies
(CNT), 01109 Dresden, Germany
| | - David Lehninger
- Fraunhofer
IMPS, Center Nanoelectronic Technologies
(CNT), 01109 Dresden, Germany
| | - Alexey Arzumanov
- Advanced
Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | | | | | | | | | | | - Konrad Seidel
- Fraunhofer
IMPS, Center Nanoelectronic Technologies
(CNT), 01109 Dresden, Germany
| | - Thomas Kämpfe
- Fraunhofer
IMPS, Center Nanoelectronic Technologies
(CNT), 01109 Dresden, Germany
| | - Stefan Petzold
- Advanced
Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Christina Trautmann
- GSI
Helmholtzzentrum
fuer Schwerionenforschung, 64291 Darmstadt, Germany
- Institute
of Materials Science, TU Darmstadt, 64287 Darmstadt, Germany
| | - Leopoldo Molina-Luna
- Advanced
Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Lambert Alff
- Advanced
Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
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3
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Vogel T, Zintler A, Kaiser N, Guillaume N, Lefèvre G, Lederer M, Serra AL, Piros E, Kim T, Schreyer P, Winkler R, Nasiou D, Olivo RR, Ali T, Lehninger D, Arzumanov A, Charpin-Nicolle C, Bourgeois G, Grenouillet L, Cyrille MC, Navarro G, Seidel K, Kämpfe T, Petzold S, Trautmann C, Molina-Luna L, Alff L. Structural and Electrical Response of Emerging Memories Exposed to Heavy Ion Radiation. ACS NANO 2022; 16:14463-14478. [PMID: 36113861 DOI: 10.48328/tudatalib-896] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Subscribe] [Scholar Register] [Indexed: 05/25/2023]
Abstract
Hafnium oxide- and GeSbTe-based functional layers are promising candidates in material systems for emerging memory technologies. They are also discussed as contenders for radiation-harsh environment applications. Testing the resilience against ion radiation is of high importance to identify materials that are feasible for future applications of emerging memory technologies like oxide-based, ferroelectric, and phase-change random-access memory. Induced changes of the crystalline and microscopic structure have to be considered as they are directly related to the memory states and failure mechanisms of the emerging memory technologies. Therefore, we present heavy ion irradiation-induced effects in emerging memories based on different memory materials, in particular, HfO2-, HfZrO2-, as well as GeSbTe-based thin films. This study reveals that the initial crystallinity, composition, and microstructure of the memory materials have a fundamental influence on their interaction with Au swift heavy ions. With this, we provide a test protocol for irradiation experiments of hafnium oxide- and GeSbTe-based emerging memories, combining structural investigations by X-ray diffraction on a macroscopic, scanning transmission electron microscopy on a microscopic scale, and electrical characterization of real devices. Such fundamental studies can be also of importance for future applications, considering the transition of digital to analog memories with a multitude of resistance states.
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Affiliation(s)
- Tobias Vogel
- Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Alexander Zintler
- Advanced Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Nico Kaiser
- Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | | | | | - Maximilian Lederer
- Fraunhofer IMPS, Center Nanoelectronic Technologies (CNT), 01109 Dresden, Germany
| | | | - Eszter Piros
- Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Taewook Kim
- Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Philipp Schreyer
- Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Robert Winkler
- Advanced Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Déspina Nasiou
- Advanced Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | | | - Tarek Ali
- Fraunhofer IMPS, Center Nanoelectronic Technologies (CNT), 01109 Dresden, Germany
| | - David Lehninger
- Fraunhofer IMPS, Center Nanoelectronic Technologies (CNT), 01109 Dresden, Germany
| | - Alexey Arzumanov
- Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | | | | | | | | | | | - Konrad Seidel
- Fraunhofer IMPS, Center Nanoelectronic Technologies (CNT), 01109 Dresden, Germany
| | - Thomas Kämpfe
- Fraunhofer IMPS, Center Nanoelectronic Technologies (CNT), 01109 Dresden, Germany
| | - Stefan Petzold
- Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Christina Trautmann
- GSI Helmholtzzentrum fuer Schwerionenforschung, 64291 Darmstadt, Germany
- Institute of Materials Science, TU Darmstadt, 64287 Darmstadt, Germany
| | - Leopoldo Molina-Luna
- Advanced Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
| | - Lambert Alff
- Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany
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4
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Li Y, Wrobel F, Cheng Y, Yan X, Cao H, Zhang Z, Bhattacharya A, Sun J, Hong H, Wang H, Liu Y, Zhou H, Fong DD. Self-healing Growth of LaNiO 3 on a Mixed-Terminated Perovskite Surface. ACS APPLIED MATERIALS & INTERFACES 2022; 14:16928-16938. [PMID: 35353496 DOI: 10.1021/acsami.2c02357] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/27/2023]
Abstract
Developing atomic-scale synthesis control is a prerequisite for understanding and engineering the exotic physics inherent to transition-metal oxide heterostructures. Thus, far, however, the number of materials systems explored has been extremely limited, particularly with regard to the crystalline substrate, which is routinely SrTiO3. Here, we investigate the growth of a rare-earth nickelate─LaNiO3─on (LaAlO3)(Sr2AlTaO6) (LSAT) (001) by oxide molecular beam epitaxy (MBE). Whereas the LSAT substrates are smooth, they do not exhibit the single surface termination usually assumed necessary for control over the interface structure. Performing both nonresonant and resonant anomalous in situ synchrotron surface X-ray scattering during MBE growth, we show that reproducible heterostructures can be achieved regardless of both the mixed surface termination and the layer-by-layer deposition sequence. The rearrangement of the layers occurs dynamically during growth, resulting in the fabrication of high-quality LaNiO3/LSAT heterostructures with a sharp and consistent interfacial structure. This is due to the thermodynamics of the deposition window as well as the nature of the chemical species at interfaces─here, the flexible charge state of nickel at the oxide surface. This has important implications regarding the use of a wider variety of substrates for fundamental studies on complex oxide synthesis.
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Affiliation(s)
- Yan Li
- Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
- University of Chinese Academy of Sciences, Beijing 100049, China
| | - Friederike Wrobel
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Yingjie Cheng
- College of Physics, Jilin University, Changchun 130012, China
| | - Xi Yan
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Hui Cao
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Zhongying Zhang
- Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China
- University of Chinese Academy of Sciences, Beijing 100049, China
| | - Anand Bhattacharya
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Jirong Sun
- Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
| | - Hawoong Hong
- X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Huanhua Wang
- Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China
- University of Chinese Academy of Sciences, Beijing 100049, China
| | - Yuzi Liu
- Center for Nanoscale Materials, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Hua Zhou
- X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Dillon D Fong
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
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5
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Xie J, Zhen C, Xu L, Su M, Pan C, Ma L, Zhao D, Hou D. Regulation of growth temperature on structure, magnetism of epitaxial FeCo 2O 4 films. CrystEngComm 2022. [DOI: 10.1039/d1ce00700a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Epitaxial FeCo2O4 films were grown by pulsed laser deposition on Al2O3 (0001) substrates at different growth temperatures in this work.
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Affiliation(s)
- Jingtong Xie
- Hebei Key Laboratory of Photophysics Research and Application, College of Physics, Hebei Normal University, Shijiazhuang, 050024, China
| | - Congmian Zhen
- Hebei Key Laboratory of Photophysics Research and Application, College of Physics, Hebei Normal University, Shijiazhuang, 050024, China
| | - Lei Xu
- Hebei Key Laboratory of Photophysics Research and Application, College of Physics, Hebei Normal University, Shijiazhuang, 050024, China
| | - Mengyao Su
- Hebei Key Laboratory of Photophysics Research and Application, College of Physics, Hebei Normal University, Shijiazhuang, 050024, China
| | - Chengfu Pan
- Hebei Key Laboratory of Photophysics Research and Application, College of Physics, Hebei Normal University, Shijiazhuang, 050024, China
| | - Li Ma
- Hebei Key Laboratory of Photophysics Research and Application, College of Physics, Hebei Normal University, Shijiazhuang, 050024, China
| | - Dewei Zhao
- Hebei Key Laboratory of Photophysics Research and Application, College of Physics, Hebei Normal University, Shijiazhuang, 050024, China
| | - Denglu Hou
- Hebei Key Laboratory of Photophysics Research and Application, College of Physics, Hebei Normal University, Shijiazhuang, 050024, China
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6
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Jeong SG, Han G, Song S, Min T, Mohamed AY, Park S, Lee J, Jeong HY, Kim Y, Cho D, Choi WS. Propagation Control of Octahedral Tilt in SrRuO 3 via Artificial Heterostructuring. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2020; 7:2001643. [PMID: 32832374 PMCID: PMC7435247 DOI: 10.1002/advs.202001643] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/04/2020] [Revised: 05/11/2020] [Indexed: 05/25/2023]
Abstract
Bonding geometry engineering of metal-oxygen octahedra is a facile way of tailoring various functional properties of transition metal oxides. Several approaches, including epitaxial strain, thickness, and stoichiometry control, have been proposed to efficiently tune the rotation and tilt of the octahedra, but these approaches are inevitably accompanied by unnecessary structural modifications such as changes in thin-film lattice parameters. In this study, a method to selectively engineer the octahedral bonding geometries is proposed, while maintaining other parameters that might implicitly influence the functional properties. A concept of octahedral tilt propagation engineering is developed using atomically designed SrRuO3/SrTiO3 (SRO/STO) superlattices. In particular, the propagation of RuO6 octahedral tilt within the SRO layers having identical thicknesses is systematically controlled by varying the thickness of adjacent STO layers. This leads to a substantial modification in the electromagnetic properties of the SRO layer, significantly enhancing the magnetic moment of Ru. This approach provides a method to selectively manipulate the bonding geometry of strongly correlated oxides, thereby enabling a better understanding and greater controllability of their functional properties.
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Affiliation(s)
- Seung Gyo Jeong
- Department of PhysicsSungkyunkwan UniversitySuwon16419Republic of Korea
| | - Gyeongtak Han
- Department of Energy SciencesSungkyunkwan UniversitySuwon16419Korea
- Center for Integrated Nanostructure PhysicsInstitute for Basic ScienceSuwon16419Korea
| | - Sehwan Song
- Department of PhysicsPusan National UniversityBusan46241Korea
| | - Taewon Min
- Department of PhysicsPusan National UniversityBusan46241Korea
| | - Ahmed Yousef Mohamed
- IPIT and Department of PhysicsJeonbuk National UniversityJeonju54896Republic of Korea
| | - Sungkyun Park
- Department of PhysicsPusan National UniversityBusan46241Korea
| | - Jaekwang Lee
- Department of PhysicsPusan National UniversityBusan46241Korea
| | - Hu Young Jeong
- UNIST Central Research Facilities and School of Materials Science and EngineeringUlsan National Institute of Science and TechnologyUlsan44919Korea
| | - Young‐Min Kim
- Department of Energy SciencesSungkyunkwan UniversitySuwon16419Korea
- Center for Integrated Nanostructure PhysicsInstitute for Basic ScienceSuwon16419Korea
| | - Deok‐Yong Cho
- IPIT and Department of PhysicsJeonbuk National UniversityJeonju54896Republic of Korea
| | - Woo Seok Choi
- Department of PhysicsSungkyunkwan UniversitySuwon16419Republic of Korea
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7
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Gu Y, Song C, Zhang Q, Li F, Tan H, Xu K, Li J, Saleem MS, Fayaz MU, Peng J, Hu F, Gu L, Liu W, Zhang Z, Pan F. Interfacial Control of Ferromagnetism in Ultrathin SrRuO 3 Films Sandwiched between Ferroelectric BaTiO 3 Layers. ACS APPLIED MATERIALS & INTERFACES 2020; 12:6707-6715. [PMID: 31927907 DOI: 10.1021/acsami.9b20941] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Interfaces between materials provide an intellectually rich arena for fundamental scientific discovery and device design. However, the frustration of magnetization and conductivity of perovskite oxide films under reduced dimensionality is detrimental to their device performance, preventing their active low-dimensional application. Herein, by inserting the ultrathin 4d ferromagnetic SrRuO3 layer between ferroelectric BaTiO3 layers to form a sandwich heterostructure, we observe enhanced physical properties in ultrathin SrRuO3 films, including longitudinal conductivity, Curie temperature, and saturated magnetic moment. Especially, the saturated magnetization can be enhanced to ∼3.12 μB/Ru in ultrathin BaTiO3/SrRuO3/BaTiO3 trilayers, which is beyond the theoretical limit of bulk value (2 μB/Ru). This observation is attributed to the synergistic ferroelectric proximity effect (SFPE) at upper and lower BaTiO3/SrRuO3 heterointerfaces, as revealed by the high-resolution lattice structure analysis. This SFPE in dual-ferroelectric interface cooperatively induces ferroelectric-like lattice distortions in RuO6 oxygen octahedra and subsequent spin-state crossover in SrRuO3, which in turn accounts for the observed enhanced magnetization. Besides the fundamental significance of interface-induced spin-lattice coupling, our findings also provide a viable route to the electrical control of magnetic ordering, taking a step toward low-power applications in all-oxide spintronics.
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Affiliation(s)
- Youdi Gu
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering , Tsinghua University , Beijing 100084 , China
- Shenyang National Laboratory for Materials Science , Institute of Metal Research, University of Chinese Academy of Sciences, Chinese Academy of Sciences , Shenyang 110016 , China
| | - Cheng Song
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering , Tsinghua University , Beijing 100084 , China
| | - Qinghua Zhang
- Beijing National Laboratory for Condensed Matter Physics , Institute of Physics, University of Chinese Academy of Sciences, Chinese Academy of Sciences , Beijing 100190 , China
| | - Fan Li
- Max Planck Institute for Microstructure Physics , Halle (Saale) D-06120 , Germany
| | - Hengxin Tan
- Max Planck Institute for Microstructure Physics , Halle (Saale) D-06120 , Germany
| | - Kun Xu
- National Center for Electron Microscopy in Beijing, School of Materials Science and Engineering , Tsinghua University , Beijing 100084 , China
| | - Jia Li
- Beijing National Laboratory for Condensed Matter Physics , Institute of Physics, University of Chinese Academy of Sciences, Chinese Academy of Sciences , Beijing 100190 , China
| | - Muhammad Shahrukh Saleem
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering , Tsinghua University , Beijing 100084 , China
| | - Muhammad Umer Fayaz
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering , Tsinghua University , Beijing 100084 , China
| | - Jingjing Peng
- Beijing Institute of Aeronautical Materials , Beijing 100095 , China
| | - Fengxia Hu
- Beijing National Laboratory for Condensed Matter Physics , Institute of Physics, University of Chinese Academy of Sciences, Chinese Academy of Sciences , Beijing 100190 , China
| | - Lin Gu
- Beijing National Laboratory for Condensed Matter Physics , Institute of Physics, University of Chinese Academy of Sciences, Chinese Academy of Sciences , Beijing 100190 , China
| | - Wei Liu
- Shenyang National Laboratory for Materials Science , Institute of Metal Research, University of Chinese Academy of Sciences, Chinese Academy of Sciences , Shenyang 110016 , China
| | - Zhidong Zhang
- Shenyang National Laboratory for Materials Science , Institute of Metal Research, University of Chinese Academy of Sciences, Chinese Academy of Sciences , Shenyang 110016 , China
| | - Feng Pan
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering , Tsinghua University , Beijing 100084 , China
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8
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Chen C, Wang C, Cai X, Xu C, Li C, Zhou J, Luo Z, Fan Z, Qin M, Zeng M, Lu X, Gao X, Kentsch U, Yang P, Zhou G, Wang N, Zhu Y, Zhou S, Chen D, Liu JM. Controllable defect driven symmetry change and domain structure evolution in BiFeO 3 with enhanced tetragonality. NANOSCALE 2019; 11:8110-8118. [PMID: 30984948 DOI: 10.1039/c9nr00932a] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Defect engineering has been a powerful tool to enable the creation of exotic phases and the discovery of intriguing phenomena in ferroelectric oxides. However, the accurate control of the concentration of defects remains a big challenge. In this work, ion implantation, which can provide controllable point defects, allows us to produce a controlled defect driven true super-tetragonal (T) phase with a single-domain-state in ferroelectric BiFeO3 thin films. This point-defect engineering is found to drive the phase transition from the as-grown mixed rhombohedral-like (R) and tetragonal-like (MC) phase to true tetragonal (T) symmetry and induce the stripe multi-nanodomains to a single domain state. By further increasing the injected dose of the He ion, we demonstrate an enhanced tetragonality super-tetragonal (super-T) phase with the largest c/a ratio of ∼1.3 that has ever been experimentally achieved in BiFeO3. A combination of the morphology change and domain evolution further confirms that the mixed R/MC phase structure transforms to the single-domain-state true tetragonal phase. Moreover, the re-emergence of the R phase and in-plane nanoscale multi-domains after heat treatment reveal the memory effect and reversible phase transition and domain evolution. Our findings demonstrate the reversible control of R-Mc-T-super T symmetry changes (leading to the creation of true T phase BiFeO3 with enhanced tetragonality) and multidomain-single domain structure evolution through controllable defect engineering. This work also provides a pathway to generate large tetragonality (or c/a ratio) that could be extended to other ferroelectric material systems (such as PbTiO3, BaTiO3 and HfO2) which might lead to strong polarization enhancement.
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Affiliation(s)
- Chao Chen
- Institute for Advanced Materials, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China.
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9
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Li H, Wang C, Li D, Homm P, Menghini M, Locquet JP, Van Haesendonck C, Van Bael MJ, Ruan S, Zeng YJ. Magnetic orders and origin of exchange bias in Co clusters embedded oxide nanocomposite films. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2019; 31:155301. [PMID: 30658346 DOI: 10.1088/1361-648x/aafff0] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Magnetic nanoparticles embedded oxide semiconductors are interesting candidates for spintronics in view of combining ferromagnetic (FM) and semiconducting properties. In this work, Co-ZnO and Co-V2O3 nanocomposite thin films are synthesized by Co ion implantation in crystalline thin films. Magnetic orders vary with the implantation fluence in Co-ZnO, where superparamagnetic (SPM) order appears in the low-fluence films (2 × 1016 and 4 × 1016 ions cm-2) and FM order co-exists with the SPM phase in high-fluence films (1 × 1017 ions cm-2). Exchange bias (EB) appears in the high-fluence films, with an EB field of about 100 Oe at 2 K and a blocking temperature of around 100 K. On the other hand, Co-V2O3 thin films with an implantation fluence of 3.5 × 1016 ions cm-2 exhibit a clear antiferromagnetic (AFM) coupling at low temperatures without the EB effect. The different magnetic behavior of the Co-implanted films with different Co content leads us to conclude that the observed EB effect in the Co-ZnO films results from the FM/AFM coupling between sizable Co nanoparticles and their CoO/Co3O4 surroundings in the (Zn,Co)O matrix. On the other hand, the absence of EB effect in Co-V2O3 appears to be due to the small size of the FM Co nanoparticles in spite of an AFM magnetic order. Detailed studies of magnetic orders and EB effect in magnetic nanocomposite semiconductors can pave the way for their application in spintronics.
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Affiliation(s)
- Hui Li
- Shenzhen Key Laboratory of Laser Engineering, College of Optoelectronic Engineering, Shenzhen University, Nanhai Boulevard 3688, Shenzhen 518060, People's Republic of China. Center for Advanced Material Diagnostic Technology, Shenzhen Technology University, No. 3002, Lantian Road, Pingshan District, Shenzhen 518118, People's Republic of China
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