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An In Situ Reflectance Spectroscopic Investigation to Monitor Two-Dimensional MoS 2 Flakes on a Sapphire Substrate. MATERIALS 2020; 13:ma13245794. [PMID: 33353072 PMCID: PMC7766002 DOI: 10.3390/ma13245794] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/11/2020] [Revised: 12/15/2020] [Accepted: 12/16/2020] [Indexed: 11/25/2022]
Abstract
In this work, we demonstrate the application of differential reflectance spectroscopy (DRS) to monitor the growth of molybdenum disulfide (MoS2) using chemical vapor deposition (CVD). The growth process, optical properties, and structure evolution of MoS2 were recorded by in-situ DRS. Indeed, blue shifts of the characteristic peak B were discussed with the decrease of temperature. We also obtained the imaginary part of the MoS2 dielectric constant according to reflectance spectra. This method provides an approach for studying the change of two-dimensional (2D) materials’ dielectric constant with temperature. More importantly, our work emphasizes that the DRS technique is a non-destructive and effective method for in-situ monitoring the growth of 2D materials, which is helpful in guiding the preparation of 2D materials.
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Chowdhury T, Sadler EC, Kempa TJ. Progress and Prospects in Transition-Metal Dichalcogenide Research Beyond 2D. Chem Rev 2020; 120:12563-12591. [DOI: 10.1021/acs.chemrev.0c00505] [Citation(s) in RCA: 74] [Impact Index Per Article: 18.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/27/2023]
Affiliation(s)
- Tomojit Chowdhury
- Department of Chemistry, Johns Hopkins University, Baltimore 21218, United States
| | - Erick C. Sadler
- Department of Chemistry, Johns Hopkins University, Baltimore 21218, United States
| | - Thomas J. Kempa
- Department of Chemistry, Johns Hopkins University, Baltimore 21218, United States
- Department of Materials Science and Engineering, Johns Hopkins University, Baltimore 21218, United States
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Strange LE, Yadav J, Garg S, Shinde PS, Hill JW, Hill CM, Kung P, Pan S. Investigating the Redox Properties of Two-Dimensional MoS 2 Using Photoluminescence Spectroelectrochemistry and Scanning Electrochemical Cell Microscopy. J Phys Chem Lett 2020; 11:3488-3494. [PMID: 32286830 DOI: 10.1021/acs.jpclett.0c00769] [Citation(s) in RCA: 13] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Control over photophysical and chemical properties of two-dimensional (2D) transition metal dichalcogenides (TMDs) is the key to advance their applications in next-generation optoelectronics. Although chemical doping and surface modification with plasmonic metals have been reported to tune the photophysical and catalytic properties of 2D TMDs, there have been few reports of tuning optical properties using dynamic electrochemical control of electrode potential. Herein, we report (1) the photoluminescence (PL) enhancement and red-shift in the PL spectrum of 2D MoS2, synthesized by chemical vapor deposition and subsequent transfer onto an indium tin oxide electrode, upon electrochemical anodization and (2) spatial heterogeneities in its photoelectrochemical (PEC) activities. Spectroelectrochemistry shows that positive electrochemical bias causes an initial ten-fold increase in the PL intensity followed by a quick decrease in the enhancement. The PL enhancement and spectrum red-shift are associated with the decrease in nonradiative decay rates of excitons formed upon electrochemical anodization of 2D MoS2. Additionally, scanning electrochemical cell microscopy (SECCM) study shows that the 2D MoS2 crystal is spatially sensitive to PEC oxidation at positive potentials. SECCM also shows a photocurrent increase caused by spatially heterogeneous edge-type defect sites of the crystal.
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Affiliation(s)
| | | | | | | | - Joshua W Hill
- Department of Chemistry, University of Wyoming, Laramie, Wyoming 82071, United States
| | - Caleb M Hill
- Department of Chemistry, University of Wyoming, Laramie, Wyoming 82071, United States
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Zhang X, Jin Z, Wang L, Hachtel JA, Villarreal E, Wang Z, Ha T, Nakanishi Y, Tiwary CS, Lai J, Dong L, Yang J, Vajtai R, Ringe E, Idrobo JC, Yakobson BI, Lou J, Gambin V, Koltun R, Ajayan PM. Low Contact Barrier in 2H/1T' MoTe 2 In-Plane Heterostructure Synthesized by Chemical Vapor Deposition. ACS APPLIED MATERIALS & INTERFACES 2019; 11:12777-12785. [PMID: 30854848 DOI: 10.1021/acsami.9b00306] [Citation(s) in RCA: 33] [Impact Index Per Article: 6.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Metal-semiconductor contact has been a critical topic in the semiconductor industry because it influences device performance remarkably. Conventional metals have served as the major contact material in electronic and optoelectronic devices, but such a selection becomes increasingly inadequate for emerging novel materials such as two-dimensional (2D) materials. Deposited metals on semiconducting 2D channels usually form large resistance contacts due to the high Schottky barrier. A few approaches have been reported to reduce the contact resistance but they are not suitable for large-scale application or they cannot create a clean and sharp interface. In this study, a chemical vapor deposition (CVD) technique is introduced to produce large-area semiconducting 2D material (2H MoTe2) planarly contacted by its metallic phase (1T' MoTe2). We demonstrate the phase-controllable synthesis and systematic characterization of large-area MoTe2 films, including pure 2H phase or 1T' phase, and 2H/1T' in-plane heterostructure. Theoretical simulation shows a lower Schottky barrier in 2H/1T' junction than in Ti/2H contact, which is confirmed by electrical measurement. This one-step CVD method to synthesize large-area, seamless-bonding 2D lateral metal-semiconductor junction can improve the performance of 2D electronic and optoelectronic devices, paving the way for large-scale 2D integrated circuits.
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Affiliation(s)
| | | | | | - Jordan A Hachtel
- Center for Nanophase Materials Sciences , Oak Ridge National Laboratory , Oak Ridge , Tennessee 37831 , United States
| | | | | | - Teresa Ha
- NG Next, Northrop Grumman Corporation , Redondo Beach , California 90278 , United States
| | | | - Chandra Sekhar Tiwary
- Metallurgical and Materials Engineering , Indian Institute of Technology Kharagpur , West Bengal 721301 , India
| | | | | | | | - Robert Vajtai
- Interdisciplinary Excellence Centre, Department of Applied and Environmental Chemistry, University of Szeged, Rerrich Béla tér1. , Szeged , Hungary
| | | | - Juan Carlos Idrobo
- Center for Nanophase Materials Sciences , Oak Ridge National Laboratory , Oak Ridge , Tennessee 37831 , United States
| | | | | | - Vincent Gambin
- NG Next, Northrop Grumman Corporation , Redondo Beach , California 90278 , United States
| | - Rachel Koltun
- NG Next, Northrop Grumman Corporation , Redondo Beach , California 90278 , United States
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