Directed Self-Assembly of Block Copolymer Thin Films Using Minimal Topographic Patterns

Directed Self-Assembly of Diamond Networks in Triblock Terpolymer Films on Patterned Substrates

Block copolymers (BCPs) are particularly effective in creating soft nanostructured templates for transferring complex 3D network structures into inorganic materials that are difficult to fabricate by other methods. However, achieving control of the local ordering within these 3D networks over large areas remains a significant obstacle to advancing material properties. Here, we address this challenge by directing the self-assembly of a 3D alternating diamond morphology by solvent vapor annealing of a triblock terpolymer film on a chemically patterned substrate. The hexagonal substrate patterns were designed to match a (111) plane of the diamond lattice. Commensurability between the sparse substrate pattern and the BCP lattice produced a uniformly ordered diamond network within the polymer film, as confirmed by a combination of atomic force microscopy and cross-sectional imaging using focused ion beam scanning electron microscopy. The successful replication of the complex and well-ordered 3D network structure in gold promises to advance optical metamaterials and has potential applications in nanophotonics.

Effect of Film Thickness on the Self-Assembly of CBABC Symmetric Pentablock Terpolymer Melts under 1D Confinement: A Dissipative Particle Dynamic Study

The study investigates the impact of film thickness on the phase behavior of pentablock terpolymers, denoted as C3B3A6B3C3, when subjected to wall confinement by utilizing the dissipative particle dynamics method. Phase diagrams were constructed to elucidate how factors such as block-block interaction strength, film thickness, and wall properties affect the self-assembly structures. In cases where the wall exhibits no preference for any of the blocks, lamellae phases with orientations perpendicular to the wall are observed. The order-disorder transition (ODT) temperature is found to be influenced by the interaction between the polymer and the wall in thin confinement scenarios. When the wall displays a preference for specific blocks, the orientation of lamellae structures undergoes variations. Lamellae tend to align parallel to the wall when the wall favors A or C blocks, and they orient perpendicularly when B blocks are favored. Furthermore, the mechanical properties of the lamellae structures are related to the conformations of the polymer chains. Structures where chains predominantly adopt a loop conformation exhibit enhanced elastic properties. The ratio of looping to bridging conformations can be adjusted by altering the film thickness and wall selectivity.

Dissipative Particle Dynamics Simulation for the Self-Assembly of Symmetric Pentablock Terpolymers Melts under 1D Confinements

The phase behavior of CBABC pentablock terpolymers confined in thin films is investigated using the Dissipative Particle Dynamic method. Phase diagrams are constructed and used to reveal how chain length (i-block length), block composition and wall selectivity influence the self-assembly structures. Under neutral walls, four categories of morphologies, i.e., perpendicular lamellae, core-shell types of microstructures, complex networks, and half-domain morphologies, are identified with the change in i-block length. Ordered structures are more common at weak polymer-polymer interaction strengths. For polymers of a consistent chain length, when one of the three components has a relatively smaller length, the morphologies transition is sensitive to block composition. With selective walls, parallel lamellae structures are prevalent. Wall selectivity also impacts chain conformations. While a large portion of chains form loop conformations under A-selective walls, more chains adopt bridge conformation when the wall prefers C-blocks. These findings offer insights for designing nanopatterns using symmetric pentablock terpolymers.

Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature

The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on the plateaus and in the trenches, which leads to the co-existence of two patterns. In this work, we highlight the dependence of the dual patterns on the film profile. We suggest that the steepness of the film profile formed across the plateau edge affects the nucleation of microphase-separated domains near the plateau edges, which influences the morphology that develops on the plateau regions. An analysis of the local film thicknesses in multiple samples exhibiting various combinations of plateau and trench widths for different trench depths enabled the construction of phase diagrams, which unraveled the intricate dependence of the formed patterns not only on the curvature of the film profile but also on the fraction of the film that resides in the trenches. Our analysis facilitates the prediction of the patterns that would develop in the trenches and on the plateaus for a given block copolymer film of known thickness from the dimensions of the topographic features.

Solvent-assisted self-assembly of block copolymer thin films

Solvent-assisted block copolymer self-assembly is a compelling method for processing and advancing practical applications of these materials due to the exceptional level of the control of BCP morphology and significant acceleration of ordering kinetics. Despite substantial experimental and theoretical efforts devoted to understanding of solvent-assisted BCP film ordering, the development of a universal BCP patterning protocol remains elusive; possibly due to a multitude of factors which dictate the self-assembly scenario. The aim of this review is to aggregate both seminal reports and the latest progress in solvent-assisted directed self-assembly and to provide the reader with theoretical background, including the outline of BCP ordering thermodynamics and kinetics phenomena. We also indicate significant BCP research areas and emerging high-tech applications where solvent-assisted processing might play a dominant role.

Regular ordering of spherical microdomains in dewetted monolayer islands induced by thermal annealing of spin-coated ultrathin films of a triblock copolymer

We report here spontaneous dewetting of a spin-coated, ultra-thin film of a sphere-forming block copolymer (BCP) upon thermal annealing, and that the dewetting resulted in the formation of plateau-shaped islands with a constant thickness consistent with the thickness of a monolayer, in which the spherical microdomains are regularly ordered two-dimensionally in a deformed hexagonal lattice. Thus, the spontaneous dewetting was ascribed to a mismatch between the initial spin-coated film thickness with respect to the monolayer thickness. Such dewetting of sphere-forming BCPs is considered to be deterministic compared to the cases of lamella- and cylinder-forming BCPs, as incommensuration in thickness is avoided by attaining perpendicular orientation without dewetting. We further quantitatively examined the ordering regularity of spherical microdomains in the dewetted monolayer islands to clarify the effect of confinement on sphere ordering. The degree of deformation of the hexagonal lattice was found to have an increasing tendency as a function of the degree of the deformation of the dewetted islands (the island shape), irrespective of the size of the island. Namely, islands with almost round shapes exhibit a well-ordered arrangement of the spherical microdomains in a perfect hexagonal lattice. Another notable finding is that the regular ordering of the spherical microdomains was found to be spoiled in the vicinity of the edge of the island. In other words, the spherical microdomains were well-ordered in a hexagonal lattice far from the edge of the island, while they were not regularly ordered in the vicinity of the edge, which may be due to mismatch between the curvature of the island's perimeter and the polygonal shape of ordered sphere grains.

Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications

Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.

Fabrication of Graphoepitaxial Gate-All-Around Si Circuitry Patterned Nanowire Arrays Using Block Copolymer Assisted Hard Mask Approach

We demonstrate the fabrication of sub-20 nm gate-all-around silicon (Si) nanowire field effect transistor structures using self-assembly. To create nanopatterned Si feature arrays, a block-copolymer-assisted hard mask approach was utilized using a topographically patterned substrate with well-defined Si₃N₄ features for graphoepitaxially alignment of the self-assembled patterns. Microphase-separated long-range ordered polystyrene-b-poly(ethylene oxide) (PS-b-PEO) block-copolymer-derived dot and line nanopatterns were achieved by a thermo-solvent approach within the substrate topographically defined channels of various widths and lengths. Solvent annealing parameters (temperature, annealing time, etc.) were varied to achieve the desired patterns. The BCP structures were modified by anhydrous ethanol to facilitate insertion of iron oxide features within the graphoepitaxial trenches that maintained the parent BCP arrangements. Vertical and horizontal ordered Si nanowire structures within trenches were fabricated using the iron oxide features as hard masks in an inductively coupled plasma (ICP) etch process. Cross-sectional micrographs depict wires of persistent width and flat sidewalls indicating the effectiveness of the mask. The aspect ratios could be varied by varying etch times. The sharp boundaries between the transistor components was also examined through the elemental mapping.

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

Directed self-assembly (DSA) of block copolymer (BCP) thin films is of particular interest in nanoscience and nanotechnology due to its superior ability to form various well-aligned nanopatterns. Herein, nanoscratch-DSA is introduced as a simple and scalable DSA strategy allowing highly aligned BCP nanopatterns over a large area. A gentle scratching on the target substrate with a commercial diamond lapping film can form uniaxially aligned nanoscratches. As applied in BCP thin films, the nanoscratch effectively guides the self-assembly of overlying BCPs and provides highly aligned nanopatterns along the direction of the nanoscratch. The nanoscratch-DSA is not material-specific, allowing more versatile nanofabrication for various functional nanomaterials. In addition, we demonstrate that the nanoscratch-DSA can be utilized as a direction-controllable and area-selective nanofabrication method.

Defects and defect engineering in Soft Matter

Soft matter covers a wide range of materials based on linear or branched polymers, gels and rubbers, amphiphilic (macro)molecules, colloids, and self-assembled structures. These materials have applications in various industries, all highly important for our daily life, and they control all biological functions; therefore, controlling and tailoring their properties is crucial. One way to approach this target is defect engineering, which aims to control defects in the material's structure, and/or to purposely add defects into it to trigger specific functions. While this approach has been a striking success story in crystalline inorganic hard matter, both for mechanical and electronic properties, and has also been applied to organic hard materials, defect engineering is rarely used in soft matter design. In this review, we present a survey on investigations on defects and/or defect engineering in nine classes of soft matter composed of liquid crystals, colloids, linear polymers with moderate degree of branching, hyperbranched polymers and dendrimers, conjugated polymers, polymeric networks, self-assembled amphiphiles and proteins, block copolymers and supramolecular polymers. This overview proposes a promising role of this approach for tuning the properties of soft matter.

Polystyrene-block-poly(ethylene oxide) Thin Films Fabricated from a Solvent Mixture for the Co-Assembly of Polymers and Proteins

The co-assembly of peptides and proteins in poly(styrene-block-ethylene oxide) (PS-b-PEO) thin films has proven to be a promising method to fabricate polymer-biomolecule functional materials. Contrary to the covalent immobilization of biomolecules on surfaces, co-assembly presents the opportunity to arrange cargo within thin films, which can be released upon exposure to an aqueous environment. The use of a mixed solvent system ensures the solubilization of hydrophobic polymer as well as the solubilization and protection of the biomolecule cargo. However, to produce largely defect-free films of PS-b-PEO from a solvent mixture containing water is challenging due to the narrow range of solvent miscibility and polymer/protein solubility. This work explores the limits of using a benzene/methanol/water solvent mixture for the production of thin PS-b-PEO films and provides a template for the fabrication optimization of block copolymer thin films in different complex solvent systems. The film quality is analyzed using optical microscopy and atomic force microscopy and correlated to the solvent composition. By adjusting the solvent composition to 80/18.8/1.2 vol % benzene/methanol/water, it was possible to reliably fabricate thin films with less than 1% macroscopic defect surface coverage. Using the optimized solvent composition, we also demonstrate the fabrication of ordered PS-b-PEO films containing lysozyme. Furthermore, we show the release of lysozyme into aqueous media, which highlights the potential use of such films for drug delivery applications.

Self-assembly of rod-coil block copolymers on a substrate into micrometer-scale ordered stripe nanopatterns

Micrometer-scale ordered stripe nanopatterns are readily constructed through an adsorption-assembly of rod-coil block copolymers on the substrate.

5 nm Ordered Structures Self-Assembled by C2 -Symmetric Hybrids with Polyhedral Oligomeric Silsesquioxane and Hexa-peri-Hexabenzocoronene

Hybrids consisting of polyhedral oligomeric silsesquioxane (POSS) and hexa-peri-hexabenzocoronene (HBC) with a dumbbell topology and C₂ symmetry were designed and synthesized. They self-assemble into 5 nm ordered structures. In particular, the increased steric effect with increasing POSS units stabilizes a square columnar phase (Col_squ ) which is important in nanotemplating. These hybrids containing discotic liquid crystal HBC and POSS units have an excellent etching contrast and present an approach to obtain 5 nm nanopatterns.

Path to Move Beyond the Resolution Limit with Directed Self-Assembly

Directed self-assembly (DSA) of block copolymers (BCPs) has long been viewed as a powerful alternative to extend the resolution of optical lithography. For full-area patterning applications, despite significant progress, the two most prominent DSA methods (chemoepitaxy and graphoepitaxy) are facing a scalability challenge: the critical dimension (CD) of the guiding patterns will need to be continuously scaled down to closely match the dimension of the BCP microdomain, a task that not only contravenes some of the resolution gains achieved by density multiplication but that will also become particularly difficult below 10 nm. To avoid this conundrum, we propose here a synergistic integration of graphoepitaxy and chemoepitaxy through self-registered self-assembly (SRSA) to enable the simultaneous realization of feature density multiplication and CD shrinkage resolution gains. We report nearly perfect DSA on prepatterns with high density multiplication factors and CD of several multiples of the BCP microdomain size. A prepattern consisting of alternating stripes of a relatively thicker neutral mat and a thinner neutral brush with preferential wetting sidewalls serves as a topographic pattern to guide an ultrathin BCP blend film inside the trenches. As the oriented BCP pattern assembles, the blend film deploys a layer of chemical markers on the bottom surface through SRSA generating 1:1 chemical contrast patterns inside the trenches. After thorough removal of the blend film, the newly formed self-registered chemical patterns interpolated by the remaining neutral mat strips serve as the guiding patterns for a second chemoepitaxial DSA step to achieve full-area, defect-free DSA of thick BCP films.

Hybrid line-dot nanopatterns from directed self-assembly of diblock copolymers by trenches

We demonstrate that the directed self-assembly of AB diblock copolymers by periodic trenches can be used to fabricate large-scale ordered hybrid line-dot nanopatterns in addition to a defect-free dot nanopattern. The formation of line or dot nanopatterns in thin films with proper surface affinities is controlled by the film thickness, which is modulated by a topographic pattern consisting of steps and trenches. Two kinds of line-dot nanopatterns are achieved with cylinder-forming and sphere-forming copolymers, respectively. One kind of hybrid nanopatterns is composed of perpendicularly standing cylinders (dots) on the steps and parallel monolayer cylinders (lines) within the trenches, while the dots of the other kind are replaced by monolayer spheres on the steps. The thermodynamic stability region of target hybrid nanopatterns is identified by constructing two-dimensional phase diagrams with respect to two control parameters of step height and film thickness using self-consistent field theory. Furthermore, a process window of the line-dot nanopatterns is estimated using cell dynamics simulations based on time-dependent Ginzburg-Landau theory, confirming their feasibility in kinetics.

Guided Assembly of Block Copolymers in Three-Dimensional Woodpile Scaffolds

Three-dimensional (3D) nanofabrication using the directed self-assembly of block copolymers (BCPs) holds great promise for the nanoscale device fabrication and integration into 3D architectures over large areas with high element densities. In this work, a robust platform is developed for building 3D BCP architectures with tailored functionality using 3D micron-scale woodpile structures (WPSs), fabricated by a multiphoton polymerization technique. By completely filling the spaces of the WPSs and using the interactions of the blocks of the BCPs with the struts of the WPS, well-developed 3D nanoscopic morphologies are produced. Metal ion complexation with one block of the copolymer affords a convenient stain to highlight one of the microdomains of the copolymer for electron microscopy studies but also, with the reduction of the complexing salt to the corresponding metal, a simple strategy is shown to produce 3D constructs with nanoscopic domain resolution.

Dislocation-controlled formation and kinetics of grain boundary loops in two-dimensional crystals

The formation and kinetics of grain boundaries are closely related to the topological constraints imposed on their complex dislocation structure. Loop-shaped grain boundaries are unique structures to establish such a link because their overall topological "charge" is zero due to their null net Burgers vector. Here, we observe that a local rotational deformation of a 2D colloidal crystal with an optical vortex results in a grain boundary loop only if the product of its radius and misorientation exceeds a critical value. Above this value, the deformation is plastic and the grain boundary loop spontaneously shrinks at a rate that solely depends on this product, while otherwise, the deformation is elastically restored. We show that this elastic-to-plastic crossover is a direct consequence of the unique dislocation structure of grain boundary loops. At the critical value, the loop is structurally equivalent to the so-called "flower defect" and the shrinkage rate diverges. Our results thus reveal a general limit on the formation of grain boundary loops in 2D crystals and elucidate the central role of defects in both the onset of plasticity and the kinetics of grain boundaries.

Bioinspired smart asymmetric nanochannel membranes

Bioinspired smart asymmetric nanochannel membranes (BSANM) have been explored extensively to achieve the delicate ionic transport functions comparable to those of living organisms. The abiotic system exhibits superior stability and robustness, allowing for promising applications in many fields. In view of the abundance of research concerning BSANM in the past decade, herein, we present a systematic overview of the development of the state-of-the-art BSANM system. The discussion is focused on the construction methodologies based on raw materials with diverse dimensions (i.e. 0D, 1D, 2D, and bulk). A generic strategy for the design and construction of the BSANM system is proposed first and put into context with recent developments from homogeneous to heterogeneous nanochannel membranes. Then, the basic properties of the BSANM are introduced including selectivity, gating, and rectification, which are associated with the particular chemical and physical structures. Moreover, we summarized the practical applications of BSANM in energy conversion, biochemical sensing and other areas. In the end, some personal opinions on the future development of the BSANM are briefly illustrated. This review covers most of the related literature reported since 2010 and is intended to build up a broad and deep knowledge base that can provide a solid information source for the scientific community.

Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns

We demonstrate the generation of block copolymer (BCP) line patterns oriented orthogonal to a very small (minimal) topographic trench pattern over arbitrarily large areas using solvent-vapor annealing. Increasing the thickness of BCP films induced an orthogonal alignment of the BCP cylindrical microdomains, where full orthogonal alignment of the cylindrical microdomains with respect to the trench direction was obtained at a film thickness corresponding to 1.70 L₀. A capillary flow of the solvent across the trenches was a critical factor in the alignment of the cylindrical microdomains. Grazing incidence small-angle X-ray scattering was used to determine the orientation function of the microdomains, with a value of 0.997 being found reflecting a nearly perfect orientation. This approach to produce orthogonally aligned BCP line patterns could be extended to the nanomanufacturing and fabrication of hierarchical nanostructures.

Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

Block copolymers with various nanodomains, such as spheres, cylinders, and lamellae, have received attention for their applicability to nanolithography. However, those microdomains are determined by the volume fraction of one block. Meanwhile, nanopatterns with multiple shapes are required for the next-generation nanolithography. Although various methods have been reported to achieve dual nanopatterns, all the methods need sophisticated processes using E-beam. Here, we synthesized a miktoarm block copolymer capable of cleavage of one block by ultraviolet. Original cylindrical nanodomains of synthesized block copolymer were successfully transformed to lamellar nanodomains due to the change of molecular architecture by ultraviolet. We fabricated dual nanopatterns consisting of dots and lines at desired regions on a single substrate. We also prepared dual nanopatterns utilizing another phase transformation from spheres to cylinders in a block copolymer with higher interaction parameter. Since our concept has versatility to any block copolymer, it could be employed as next-generation nanolithography.

Macroscopically ordered hexagonal arrays by directed self-assembly of block copolymers with minimal topographic patterns

A simple and robust method has been developed for the generation of macroscopically ordered hexagonal arrays from the directed self-assembly (DSA) of cylinder-forming block copolymers (BCPs) based on minimal trench patterns with solvent vapor annealing. The use of minimal trench patterns allows us to probe the guided hexagonal arrays of cylindrical microdomains using grazing incidence small angle X-ray scattering (GISAXS), where the sample stage is rotated on the basis of the six-fold symmetry of a hexagonal system. It is found that the (10) planes of hexagonal arrays of cylindrical microdomains are oriented parallel to the underlying trench direction over macroscopic length scales (∼1 × 1 cm²). However, there are misorientations of the hexagonal arrays with short-range ordering. GISAXS patterns show that the hexagonal arrays on the minimal trench pattern are distorted, deviating from a perfect hexagonal lattice. This distortion has been attributed to the absence of topographic constraints in the unconfined direction on the 1-D minimal trench pattern. Also, the frustration of BCP microdomains, arising from the incommensurability between the trench pitch and natural period of the BCP at the base of the trench, influences the distortion of the hexagonal arrays.

Self-Registered Self-Assembly of Block Copolymers

Directed self-assembly (DSA) of block copolymer (BCP) thin films, especially with density multiplication, is one of the most promising options for further improving resolution and throughput in nanolithography. However, controlling defect density has been one of the major hurdles for many DSA applications. Both thermodynamically and kinetically, defect-free patterns favor the use of low density multiplication factors and thinner films, which undermine the promise of enhanced resolution and the formation of robust masks for pattern transfer. Here, we demonstrate a self-registered self-assembly method to enable nearly perfect DSA on loosely defined chemical patterns with high density multiplication factor. Self-registered self-assembly involves two DSA steps. In the first step, an ultrathin BCP blend film is used to obtain vanishingly low defect densities. Concurrently as the film is annealed, preloaded chemical markers separate into the different polymer blocks and graft to the substrate locking in a new chemical contrast pattern with 1:1 feature registration. After thorough removal of the blend film, the remaining self-registered chemical pattern can establish defect-free DSA of thick BCP films.

Scaling properties of ageing orientation fluctuations in stripe phases

We investigate the non-equilibrium dynamics of an ordered stripe-forming system free of topological defects. In particular, we study the ageing and the coarsening of orientation fluctuations parallel and perpendicular to the stripes via computer simulations based on a minimal phase-field model (model B with Coulomb interactions). Under the influence of noise, the stripe orientation field develops fluctuations parallel to the stripes, with the dominant modulation length λ*∥ increasing with time t as λ*∥ ∼ t1/4 and the correlation length perpendicular to the stripes ξ⊥θ increasing as ξ⊥θ ∼ t1/2. We explain these anisotropic coarsening dynamics with an analytic theory based on the linear elastic model for stripe displacements first introduced by Landau and Peierls. We thus obtain the scaling forms and the scaling exponents characterizing the correlation functions and the structure factor of the stripe orientation field. Our results reveal how the coarsening of orientation fluctuations prevents a periodically modulated phase free of topological defects from reaching equilibrium.

Preferential Alignment of Incommensurate Block Copolymer Dot Arrays Forming Moiré Superstructures

Block copolymer (BCP) self-assembly is of great interest as a cost-effective method for large-scale, high-resolution nanopattern fabrication. Directed self-assembly can induce long-range order and registration, reduce defect density, and enable access to patterns of higher complexity. Here we demonstrate preferential orientation of two incommensurate BCP dot arrays. A bottom layer of hexagonal silica dots is prepared via typical self-assembly from a PS-b-PDMS block copolymer. Self-assembly of a second, or top, layer of a different PS-b-PDMS block copolymer that forms a hexagonal dot pattern with different periodicity results in a predictable moiré superstructure. Four distinct moiré superstructures were demonstrated through a combination of different BCPs and different order of annealing. The registration force of the bottom layer of hexagonal dots is sufficient to direct the self-assembly of the top layer to adopt a preferred relative angle of rotation. Large-area helium ion microscopy imaging enabled quantification of the distributions of relative rotations between the two lattices in the moiré superstructures, yielding statistically meaningful results for each combination. It was also found that if the bottom layer dots were too large, the resulting moiré pattern was lost. A small reduction in the bottom layer dot size, however, resulted in large-area moiré superstructures, suggesting a specific size regime where interlayer registration forces can induce long-range preferential alignment of incommensurate BCP dot arrays.