1
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Abdelrahman D, Iseli R, Musya M, Jinnai B, Fukami S, Yuasa T, Sai H, Wiesner UB, Saba M, Wilts BD, Steiner U, Llandro J, Gunkel I. Directed Self-Assembly of Diamond Networks in Triblock Terpolymer Films on Patterned Substrates. ACS APPLIED MATERIALS & INTERFACES 2023; 15:57981-57991. [PMID: 37989271 PMCID: PMC10739600 DOI: 10.1021/acsami.3c10619] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/20/2023] [Revised: 10/13/2023] [Accepted: 10/17/2023] [Indexed: 11/23/2023]
Abstract
Block copolymers (BCPs) are particularly effective in creating soft nanostructured templates for transferring complex 3D network structures into inorganic materials that are difficult to fabricate by other methods. However, achieving control of the local ordering within these 3D networks over large areas remains a significant obstacle to advancing material properties. Here, we address this challenge by directing the self-assembly of a 3D alternating diamond morphology by solvent vapor annealing of a triblock terpolymer film on a chemically patterned substrate. The hexagonal substrate patterns were designed to match a (111) plane of the diamond lattice. Commensurability between the sparse substrate pattern and the BCP lattice produced a uniformly ordered diamond network within the polymer film, as confirmed by a combination of atomic force microscopy and cross-sectional imaging using focused ion beam scanning electron microscopy. The successful replication of the complex and well-ordered 3D network structure in gold promises to advance optical metamaterials and has potential applications in nanophotonics.
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Affiliation(s)
- Doha Abdelrahman
- Adolphe
Merkle Institute, University of Fribourg, Chemin des Verdiers 4, 1700 Fribourg, Switzerland
| | - René Iseli
- Adolphe
Merkle Institute, University of Fribourg, Chemin des Verdiers 4, 1700 Fribourg, Switzerland
| | - Michimasa Musya
- Laboratory
for Nanoelectronics and Spintronics, Research
Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira,
Aoba-ku, Sendai 980-8577, Japan
| | - Butsurin Jinnai
- WPI
Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira,
Aoba-ku, Sendai 980-8577, Japan
| | - Shunsuke Fukami
- Laboratory
for Nanoelectronics and Spintronics, Research
Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira,
Aoba-ku, Sendai 980-8577, Japan
- WPI
Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira,
Aoba-ku, Sendai 980-8577, Japan
- Center
for Science and Innovation in Spintronics, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
- Center
for Innovative Integrated Electronic Systems, Tohoku University, 468-1 Aramaki Aza Aoba, Aoba-ku, Sendai 980-0845, Japan
- Inamori
Research Institute for Science, Kyoto 600-8411, Japan
| | - Takeshi Yuasa
- Department
of Materials Science and Engineering, Cornell
University, 214 Bard Hall, Ithaca, New
York 14853-1501, United States
| | - Hiroaki Sai
- Department
of Materials Science and Engineering, Cornell
University, 214 Bard Hall, Ithaca, New
York 14853-1501, United States
| | - Ulrich B. Wiesner
- Department
of Materials Science and Engineering, Cornell
University, 214 Bard Hall, Ithaca, New
York 14853-1501, United States
| | - Matthias Saba
- Adolphe
Merkle Institute, University of Fribourg, Chemin des Verdiers 4, 1700 Fribourg, Switzerland
- Swiss
National Center of Competence in Research (NCCR) Bio-Inspired Materials, University of Fribourg, Chemin des Verdiers 4, 1700 Fribourg, Switzerland
| | - Bodo D. Wilts
- Adolphe
Merkle Institute, University of Fribourg, Chemin des Verdiers 4, 1700 Fribourg, Switzerland
- Department
of Chemistry and Physics of Materials, University
of Salzburg, Jakob-Haringer-Str. 2a, Salzburg 5020, Austria
- Swiss
National Center of Competence in Research (NCCR) Bio-Inspired Materials, University of Fribourg, Chemin des Verdiers 4, 1700 Fribourg, Switzerland
| | - Ullrich Steiner
- Adolphe
Merkle Institute, University of Fribourg, Chemin des Verdiers 4, 1700 Fribourg, Switzerland
- Swiss
National Center of Competence in Research (NCCR) Bio-Inspired Materials, University of Fribourg, Chemin des Verdiers 4, 1700 Fribourg, Switzerland
| | - Justin Llandro
- Laboratory
for Nanoelectronics and Spintronics, Research
Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira,
Aoba-ku, Sendai 980-8577, Japan
- Center
for Science and Innovation in Spintronics, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
| | - Ilja Gunkel
- Adolphe
Merkle Institute, University of Fribourg, Chemin des Verdiers 4, 1700 Fribourg, Switzerland
- Swiss
National Center of Competence in Research (NCCR) Bio-Inspired Materials, University of Fribourg, Chemin des Verdiers 4, 1700 Fribourg, Switzerland
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2
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Guo Y. Effect of Film Thickness on the Self-Assembly of CBABC Symmetric Pentablock Terpolymer Melts under 1D Confinement: A Dissipative Particle Dynamic Study. MATERIALS (BASEL, SWITZERLAND) 2023; 16:6862. [PMID: 37959459 PMCID: PMC10648495 DOI: 10.3390/ma16216862] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/05/2023] [Revised: 10/20/2023] [Accepted: 10/23/2023] [Indexed: 11/15/2023]
Abstract
The study investigates the impact of film thickness on the phase behavior of pentablock terpolymers, denoted as C3B3A6B3C3, when subjected to wall confinement by utilizing the dissipative particle dynamics method. Phase diagrams were constructed to elucidate how factors such as block-block interaction strength, film thickness, and wall properties affect the self-assembly structures. In cases where the wall exhibits no preference for any of the blocks, lamellae phases with orientations perpendicular to the wall are observed. The order-disorder transition (ODT) temperature is found to be influenced by the interaction between the polymer and the wall in thin confinement scenarios. When the wall displays a preference for specific blocks, the orientation of lamellae structures undergoes variations. Lamellae tend to align parallel to the wall when the wall favors A or C blocks, and they orient perpendicularly when B blocks are favored. Furthermore, the mechanical properties of the lamellae structures are related to the conformations of the polymer chains. Structures where chains predominantly adopt a loop conformation exhibit enhanced elastic properties. The ratio of looping to bridging conformations can be adjusted by altering the film thickness and wall selectivity.
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Affiliation(s)
- Yingying Guo
- School of Science, Qingdao University of Technology, Qingdao 266525, China
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3
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Guo Y, Bai L. Dissipative Particle Dynamics Simulation for the Self-Assembly of Symmetric Pentablock Terpolymers Melts under 1D Confinements. Polymers (Basel) 2023; 15:3982. [PMID: 37836033 PMCID: PMC10575399 DOI: 10.3390/polym15193982] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/14/2023] [Revised: 09/30/2023] [Accepted: 10/02/2023] [Indexed: 10/15/2023] Open
Abstract
The phase behavior of CBABC pentablock terpolymers confined in thin films is investigated using the Dissipative Particle Dynamic method. Phase diagrams are constructed and used to reveal how chain length (i-block length), block composition and wall selectivity influence the self-assembly structures. Under neutral walls, four categories of morphologies, i.e., perpendicular lamellae, core-shell types of microstructures, complex networks, and half-domain morphologies, are identified with the change in i-block length. Ordered structures are more common at weak polymer-polymer interaction strengths. For polymers of a consistent chain length, when one of the three components has a relatively smaller length, the morphologies transition is sensitive to block composition. With selective walls, parallel lamellae structures are prevalent. Wall selectivity also impacts chain conformations. While a large portion of chains form loop conformations under A-selective walls, more chains adopt bridge conformation when the wall prefers C-blocks. These findings offer insights for designing nanopatterns using symmetric pentablock terpolymers.
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Affiliation(s)
- Yingying Guo
- School of Science, Qingdao University of Technology, Qingdao 266525, China
| | - Linqing Bai
- School of Mechanical and Automotive Engineering, Qingdao University of Technology, Qingdao 266525, China;
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4
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Cai C, Lin J. Recent advances in the solution self‐assembly of polypeptides. JOURNAL OF POLYMER SCIENCE 2023. [DOI: 10.1002/pol.20220748] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/19/2023]
Affiliation(s)
- Chunhua Cai
- Shanghai Key Laboratory of Advanced Polymeric Materials, Key Laboratory for Ultrafine Materials of Ministry of Education, Frontiers Science Center for Materiobiology and Dynamic Chemistry, School of Materials Science and Engineering East China University of Science and Technology Shanghai China
| | - Jiaping Lin
- Shanghai Key Laboratory of Advanced Polymeric Materials, Key Laboratory for Ultrafine Materials of Ministry of Education, Frontiers Science Center for Materiobiology and Dynamic Chemistry, School of Materials Science and Engineering East China University of Science and Technology Shanghai China
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5
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Michman E, Oded M, Shenhar R. Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature. Polymers (Basel) 2022; 14:polym14122377. [PMID: 35745955 PMCID: PMC9231016 DOI: 10.3390/polym14122377] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/15/2022] [Revised: 06/04/2022] [Accepted: 06/07/2022] [Indexed: 02/01/2023] Open
Abstract
The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on the plateaus and in the trenches, which leads to the co-existence of two patterns. In this work, we highlight the dependence of the dual patterns on the film profile. We suggest that the steepness of the film profile formed across the plateau edge affects the nucleation of microphase-separated domains near the plateau edges, which influences the morphology that develops on the plateau regions. An analysis of the local film thicknesses in multiple samples exhibiting various combinations of plateau and trench widths for different trench depths enabled the construction of phase diagrams, which unraveled the intricate dependence of the formed patterns not only on the curvature of the film profile but also on the fraction of the film that resides in the trenches. Our analysis facilitates the prediction of the patterns that would develop in the trenches and on the plateaus for a given block copolymer film of known thickness from the dimensions of the topographic features.
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6
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Pula P, Leniart A, Majewski PW. Solvent-assisted self-assembly of block copolymer thin films. SOFT MATTER 2022; 18:4042-4066. [PMID: 35608282 DOI: 10.1039/d2sm00439a] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Solvent-assisted block copolymer self-assembly is a compelling method for processing and advancing practical applications of these materials due to the exceptional level of the control of BCP morphology and significant acceleration of ordering kinetics. Despite substantial experimental and theoretical efforts devoted to understanding of solvent-assisted BCP film ordering, the development of a universal BCP patterning protocol remains elusive; possibly due to a multitude of factors which dictate the self-assembly scenario. The aim of this review is to aggregate both seminal reports and the latest progress in solvent-assisted directed self-assembly and to provide the reader with theoretical background, including the outline of BCP ordering thermodynamics and kinetics phenomena. We also indicate significant BCP research areas and emerging high-tech applications where solvent-assisted processing might play a dominant role.
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Affiliation(s)
- Przemyslaw Pula
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
| | - Arkadiusz Leniart
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
| | - Pawel W Majewski
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
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7
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Bayomi RAH, Aoki T, Sasaki S, Sakurai S. Regular ordering of spherical microdomains in dewetted monolayer islands induced by thermal annealing of spin-coated ultrathin films of a triblock copolymer. SOFT MATTER 2021; 17:7396-7407. [PMID: 34318868 DOI: 10.1039/d1sm00699a] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
We report here spontaneous dewetting of a spin-coated, ultra-thin film of a sphere-forming block copolymer (BCP) upon thermal annealing, and that the dewetting resulted in the formation of plateau-shaped islands with a constant thickness consistent with the thickness of a monolayer, in which the spherical microdomains are regularly ordered two-dimensionally in a deformed hexagonal lattice. Thus, the spontaneous dewetting was ascribed to a mismatch between the initial spin-coated film thickness with respect to the monolayer thickness. Such dewetting of sphere-forming BCPs is considered to be deterministic compared to the cases of lamella- and cylinder-forming BCPs, as incommensuration in thickness is avoided by attaining perpendicular orientation without dewetting. We further quantitatively examined the ordering regularity of spherical microdomains in the dewetted monolayer islands to clarify the effect of confinement on sphere ordering. The degree of deformation of the hexagonal lattice was found to have an increasing tendency as a function of the degree of the deformation of the dewetted islands (the island shape), irrespective of the size of the island. Namely, islands with almost round shapes exhibit a well-ordered arrangement of the spherical microdomains in a perfect hexagonal lattice. Another notable finding is that the regular ordering of the spherical microdomains was found to be spoiled in the vicinity of the edge of the island. In other words, the spherical microdomains were well-ordered in a hexagonal lattice far from the edge of the island, while they were not regularly ordered in the vicinity of the edge, which may be due to mismatch between the curvature of the island's perimeter and the polygonal shape of ordered sphere grains.
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Affiliation(s)
- Rasha Ahmed Hanafy Bayomi
- Department of Biobased Materials Science, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan. and Department of Apparel Design and Technology, Faculty of Applied Arts, Helwan University, Orman, Giza 12111, Egypt
| | - Takashi Aoki
- Department of Biobased Materials Science, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan.
| | - Sono Sasaki
- Department of Biobased Materials Science, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan.
| | - Shinichi Sakurai
- Department of Biobased Materials Science, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan. and Department of Chemical Engineering, Indian Institute of Technology Guwahati, Kamrup, Assam 781-039, India
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8
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Robertson M, Zhou Q, Ye C, Qiang Z. Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications. Macromol Rapid Commun 2021; 42:e2100300. [PMID: 34272778 DOI: 10.1002/marc.202100300] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/10/2021] [Revised: 06/23/2021] [Indexed: 01/03/2023]
Abstract
Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.
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Affiliation(s)
- Mark Robertson
- School of Polymer Science and Engineering, University of Southern Mississippi, Hattiesburg, MS, 39406, USA
| | - Qingya Zhou
- State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Materials Science and Engineering, Donghua University, Shanghai, 201620, China
| | - Changhuai Ye
- State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Materials Science and Engineering, Donghua University, Shanghai, 201620, China
| | - Zhe Qiang
- School of Polymer Science and Engineering, University of Southern Mississippi, Hattiesburg, MS, 39406, USA
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9
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Ghoshal T, Senthamaraikannan R, Shaw MT, Lundy R, Selkirk A, Morris MA. Fabrication of Graphoepitaxial Gate-All-Around Si Circuitry Patterned Nanowire Arrays Using Block Copolymer Assisted Hard Mask Approach. ACS NANO 2021; 15:9550-9558. [PMID: 34042425 PMCID: PMC8291765 DOI: 10.1021/acsnano.0c09232] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/04/2020] [Accepted: 05/20/2021] [Indexed: 05/25/2023]
Abstract
We demonstrate the fabrication of sub-20 nm gate-all-around silicon (Si) nanowire field effect transistor structures using self-assembly. To create nanopatterned Si feature arrays, a block-copolymer-assisted hard mask approach was utilized using a topographically patterned substrate with well-defined Si3N4 features for graphoepitaxially alignment of the self-assembled patterns. Microphase-separated long-range ordered polystyrene-b-poly(ethylene oxide) (PS-b-PEO) block-copolymer-derived dot and line nanopatterns were achieved by a thermo-solvent approach within the substrate topographically defined channels of various widths and lengths. Solvent annealing parameters (temperature, annealing time, etc.) were varied to achieve the desired patterns. The BCP structures were modified by anhydrous ethanol to facilitate insertion of iron oxide features within the graphoepitaxial trenches that maintained the parent BCP arrangements. Vertical and horizontal ordered Si nanowire structures within trenches were fabricated using the iron oxide features as hard masks in an inductively coupled plasma (ICP) etch process. Cross-sectional micrographs depict wires of persistent width and flat sidewalls indicating the effectiveness of the mask. The aspect ratios could be varied by varying etch times. The sharp boundaries between the transistor components was also examined through the elemental mapping.
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Affiliation(s)
- Tandra Ghoshal
- School
of Chemistry, AMBER and CRANN, Trinity College
Dublin, Dublin, Ireland D02 AK60
| | | | - Matthew T. Shaw
- Intel
Ireland Ltd., Collinstown Industrial
Park, Leixlip, Co. Kildare, Ireland W23 CX68
| | - Ross Lundy
- School
of Chemistry, AMBER and CRANN, Trinity College
Dublin, Dublin, Ireland D02 AK60
| | - Andrew Selkirk
- School
of Chemistry, AMBER and CRANN, Trinity College
Dublin, Dublin, Ireland D02 AK60
| | - Michael A. Morris
- School
of Chemistry, AMBER and CRANN, Trinity College
Dublin, Dublin, Ireland D02 AK60
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10
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Kim DH, Suh A, Park G, Yoon DK, Kim SY. Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films. ACS APPLIED MATERIALS & INTERFACES 2021; 13:5772-5781. [PMID: 33472362 DOI: 10.1021/acsami.0c19665] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Directed self-assembly (DSA) of block copolymer (BCP) thin films is of particular interest in nanoscience and nanotechnology due to its superior ability to form various well-aligned nanopatterns. Herein, nanoscratch-DSA is introduced as a simple and scalable DSA strategy allowing highly aligned BCP nanopatterns over a large area. A gentle scratching on the target substrate with a commercial diamond lapping film can form uniaxially aligned nanoscratches. As applied in BCP thin films, the nanoscratch effectively guides the self-assembly of overlying BCPs and provides highly aligned nanopatterns along the direction of the nanoscratch. The nanoscratch-DSA is not material-specific, allowing more versatile nanofabrication for various functional nanomaterials. In addition, we demonstrate that the nanoscratch-DSA can be utilized as a direction-controllable and area-selective nanofabrication method.
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Affiliation(s)
- Dong Hyup Kim
- School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
| | - Ahram Suh
- Graduate School of Nanoscience and Technology, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Geonhyeong Park
- Graduate School of Nanoscience and Technology, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Dong Ki Yoon
- Graduate School of Nanoscience and Technology, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea
- Department of Chemistry and KINC, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea
| | - So Youn Kim
- School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
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11
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Jangizehi A, Schmid F, Besenius P, Kremer K, Seiffert S. Defects and defect engineering in Soft Matter. SOFT MATTER 2020; 16:10809-10859. [PMID: 33306078 DOI: 10.1039/d0sm01371d] [Citation(s) in RCA: 23] [Impact Index Per Article: 5.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/07/2023]
Abstract
Soft matter covers a wide range of materials based on linear or branched polymers, gels and rubbers, amphiphilic (macro)molecules, colloids, and self-assembled structures. These materials have applications in various industries, all highly important for our daily life, and they control all biological functions; therefore, controlling and tailoring their properties is crucial. One way to approach this target is defect engineering, which aims to control defects in the material's structure, and/or to purposely add defects into it to trigger specific functions. While this approach has been a striking success story in crystalline inorganic hard matter, both for mechanical and electronic properties, and has also been applied to organic hard materials, defect engineering is rarely used in soft matter design. In this review, we present a survey on investigations on defects and/or defect engineering in nine classes of soft matter composed of liquid crystals, colloids, linear polymers with moderate degree of branching, hyperbranched polymers and dendrimers, conjugated polymers, polymeric networks, self-assembled amphiphiles and proteins, block copolymers and supramolecular polymers. This overview proposes a promising role of this approach for tuning the properties of soft matter.
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Affiliation(s)
- Amir Jangizehi
- Johannes Gutenberg University Mainz, Department of Chemistry, Duesbergweg 10-14, D-55128 Mainz, Germany
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12
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Kollmetz T, Monteiro A I, Gerrard JA, Malmström J. Polystyrene- block-poly(ethylene oxide) Thin Films Fabricated from a Solvent Mixture for the Co-Assembly of Polymers and Proteins. ACS OMEGA 2020; 5:26365-26373. [PMID: 33110964 PMCID: PMC7581074 DOI: 10.1021/acsomega.0c02392] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/21/2020] [Accepted: 09/28/2020] [Indexed: 06/11/2023]
Abstract
The co-assembly of peptides and proteins in poly(styrene-block-ethylene oxide) (PS-b-PEO) thin films has proven to be a promising method to fabricate polymer-biomolecule functional materials. Contrary to the covalent immobilization of biomolecules on surfaces, co-assembly presents the opportunity to arrange cargo within thin films, which can be released upon exposure to an aqueous environment. The use of a mixed solvent system ensures the solubilization of hydrophobic polymer as well as the solubilization and protection of the biomolecule cargo. However, to produce largely defect-free films of PS-b-PEO from a solvent mixture containing water is challenging due to the narrow range of solvent miscibility and polymer/protein solubility. This work explores the limits of using a benzene/methanol/water solvent mixture for the production of thin PS-b-PEO films and provides a template for the fabrication optimization of block copolymer thin films in different complex solvent systems. The film quality is analyzed using optical microscopy and atomic force microscopy and correlated to the solvent composition. By adjusting the solvent composition to 80/18.8/1.2 vol % benzene/methanol/water, it was possible to reliably fabricate thin films with less than 1% macroscopic defect surface coverage. Using the optimized solvent composition, we also demonstrate the fabrication of ordered PS-b-PEO films containing lysozyme. Furthermore, we show the release of lysozyme into aqueous media, which highlights the potential use of such films for drug delivery applications.
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Affiliation(s)
- Tarek Kollmetz
- Department
of Chemical and Materials Engineering, The
University of Auckland, Auckland 1010, New Zealand
- The
MacDiarmid Institute for Advanced Materials and Nanotechnology, Wellington 6140, New Zealand
| | - Isabela Monteiro A
- Department
of Chemical and Materials Engineering, The
University of Auckland, Auckland 1010, New Zealand
- The
MacDiarmid Institute for Advanced Materials and Nanotechnology, Wellington 6140, New Zealand
| | - Juliet A. Gerrard
- The
MacDiarmid Institute for Advanced Materials and Nanotechnology, Wellington 6140, New Zealand
- School
of Biological Sciences, The University of
Auckland, Auckland 1010, New Zealand
- School
of Chemical Sciences, The University of
Auckland, Auckland 1010, New Zealand
| | - Jenny Malmström
- Department
of Chemical and Materials Engineering, The
University of Auckland, Auckland 1010, New Zealand
- The
MacDiarmid Institute for Advanced Materials and Nanotechnology, Wellington 6140, New Zealand
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13
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Tang Z, Li D, Lin J, Zhang L, Cai C, Yao Y, Yang C, Tian X. Self-assembly of rod-coil block copolymers on a substrate into micrometer-scale ordered stripe nanopatterns. Polym Chem 2020. [DOI: 10.1039/d0py01404d] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Micrometer-scale ordered stripe nanopatterns are readily constructed through an adsorption-assembly of rod-coil block copolymers on the substrate.
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Affiliation(s)
- Zhengmin Tang
- Shanghai Key Laboratory of Advanced Polymeric Materials
- Key Laboratory for Ultrafine Materials of Ministry of Education
- Frontiers Science Center for Materiobiology and Dynamic Chemistry
- School of Materials Science and Engineering
- East China University of Science and Technology
| | - Da Li
- Shanghai Key Laboratory of Advanced Polymeric Materials
- Key Laboratory for Ultrafine Materials of Ministry of Education
- Frontiers Science Center for Materiobiology and Dynamic Chemistry
- School of Materials Science and Engineering
- East China University of Science and Technology
| | - Jiaping Lin
- Shanghai Key Laboratory of Advanced Polymeric Materials
- Key Laboratory for Ultrafine Materials of Ministry of Education
- Frontiers Science Center for Materiobiology and Dynamic Chemistry
- School of Materials Science and Engineering
- East China University of Science and Technology
| | - Liangshun Zhang
- Shanghai Key Laboratory of Advanced Polymeric Materials
- Key Laboratory for Ultrafine Materials of Ministry of Education
- Frontiers Science Center for Materiobiology and Dynamic Chemistry
- School of Materials Science and Engineering
- East China University of Science and Technology
| | - Chunhua Cai
- Shanghai Key Laboratory of Advanced Polymeric Materials
- Key Laboratory for Ultrafine Materials of Ministry of Education
- Frontiers Science Center for Materiobiology and Dynamic Chemistry
- School of Materials Science and Engineering
- East China University of Science and Technology
| | - Yuan Yao
- Shanghai Key Laboratory of Advanced Polymeric Materials
- Key Laboratory for Ultrafine Materials of Ministry of Education
- Frontiers Science Center for Materiobiology and Dynamic Chemistry
- School of Materials Science and Engineering
- East China University of Science and Technology
| | - Chunming Yang
- Shanghai Synchrotron Radiation Facility
- Shanghai Advanced Research Institute
- Chinese Academy of Sciences
- Shanghai 201204
- China
| | - Xiaohui Tian
- Shanghai Key Laboratory of Advanced Polymeric Materials
- Key Laboratory for Ultrafine Materials of Ministry of Education
- Frontiers Science Center for Materiobiology and Dynamic Chemistry
- School of Materials Science and Engineering
- East China University of Science and Technology
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14
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Lv C, Wang R, Gao J, Ding N, Dong S, Nie J, Xu J, Du B. PAA-b-PPO-b-PAA triblock copolymers with enhanced phase separation and inverse order-to-order phase transition upon increasing temperature. POLYMER 2019. [DOI: 10.1016/j.polymer.2019.121982] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/24/2022]
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15
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16
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Morimitsu Y, Salatto D, Jiang N, Sen M, Nishitsuji S, Yavitt BM, Endoh MK, Subramanian A, Nam CY, Li R, Fukuto M, Zhang Y, Wiegart L, Fluerasu A, Tanaka K, Koga T. “Structurally Neutral” Densely Packed Homopolymer-Adsorbed Chains for Directed Self-Assembly of Block Copolymer Thin Films. Macromolecules 2019. [DOI: 10.1021/acs.macromol.9b00597] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Yuma Morimitsu
- Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794-2275, United States
- Department of Applied Chemistry, Kyushu University, Fukuoka 819-0395, Japan
| | - Daniel Salatto
- Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794-2275, United States
| | - Naisheng Jiang
- Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794-2275, United States
| | - Mani Sen
- Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794-2275, United States
| | - Shotaro Nishitsuji
- Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794-2275, United States
- Graduate School of Science and Engineering, Yamagata University, Yonezawa, Yamagata 992-8510, Japan
| | - Benjamin M. Yavitt
- Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794-2275, United States
| | - Maya K. Endoh
- Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794-2275, United States
| | - Ashwanth Subramanian
- Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794-2275, United States
| | - Chang-Yong Nam
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973-5000, United States
| | - Ruipeng Li
- National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Masafumi Fukuto
- National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Yugang Zhang
- National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Lutz Wiegart
- National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Andrei Fluerasu
- National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Keiji Tanaka
- Department of Applied Chemistry, Kyushu University, Fukuoka 819-0395, Japan
| | - Tadanori Koga
- Department of Materials Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794-2275, United States
- Department of Chemistry, Stony Brook University, Stony Brook, New York 11794-3400, United States
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17
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Zhang W, Pan H, Lyu X, Gu K, Xiao A, Shen Z, Fan XH. 5 nm Ordered Structures Self-Assembled by C 2 -Symmetric Hybrids with Polyhedral Oligomeric Silsesquioxane and Hexa-peri-Hexabenzocoronene. Chemphyschem 2019; 20:1759-1764. [PMID: 31077530 DOI: 10.1002/cphc.201900196] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Revised: 05/09/2019] [Indexed: 11/09/2022]
Abstract
Hybrids consisting of polyhedral oligomeric silsesquioxane (POSS) and hexa-peri-hexabenzocoronene (HBC) with a dumbbell topology and C2 symmetry were designed and synthesized. They self-assemble into 5 nm ordered structures. In particular, the increased steric effect with increasing POSS units stabilizes a square columnar phase (Colsqu ) which is important in nanotemplating. These hybrids containing discotic liquid crystal HBC and POSS units have an excellent etching contrast and present an approach to obtain 5 nm nanopatterns.
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Affiliation(s)
- Wei Zhang
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Hongbing Pan
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Xiaolin Lyu
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Kehua Gu
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Anqi Xiao
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Zhihao Shen
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Xing-He Fan
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
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18
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Wan L, Ruiz R. Path to Move Beyond the Resolution Limit with Directed Self-Assembly. ACS APPLIED MATERIALS & INTERFACES 2019; 11:20333-20340. [PMID: 31074615 DOI: 10.1021/acsami.9b02925] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Directed self-assembly (DSA) of block copolymers (BCPs) has long been viewed as a powerful alternative to extend the resolution of optical lithography. For full-area patterning applications, despite significant progress, the two most prominent DSA methods (chemoepitaxy and graphoepitaxy) are facing a scalability challenge: the critical dimension (CD) of the guiding patterns will need to be continuously scaled down to closely match the dimension of the BCP microdomain, a task that not only contravenes some of the resolution gains achieved by density multiplication but that will also become particularly difficult below 10 nm. To avoid this conundrum, we propose here a synergistic integration of graphoepitaxy and chemoepitaxy through self-registered self-assembly (SRSA) to enable the simultaneous realization of feature density multiplication and CD shrinkage resolution gains. We report nearly perfect DSA on prepatterns with high density multiplication factors and CD of several multiples of the BCP microdomain size. A prepattern consisting of alternating stripes of a relatively thicker neutral mat and a thinner neutral brush with preferential wetting sidewalls serves as a topographic pattern to guide an ultrathin BCP blend film inside the trenches. As the oriented BCP pattern assembles, the blend film deploys a layer of chemical markers on the bottom surface through SRSA generating 1:1 chemical contrast patterns inside the trenches. After thorough removal of the blend film, the newly formed self-registered chemical patterns interpolated by the remaining neutral mat strips serve as the guiding patterns for a second chemoepitaxial DSA step to achieve full-area, defect-free DSA of thick BCP films.
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Affiliation(s)
- Lei Wan
- Western Digital Company, WDC Research , 5601 Great Oaks Parkway , San Jose , California 95119 , United States
| | - Ricardo Ruiz
- Western Digital Company, WDC Research , 5601 Great Oaks Parkway , San Jose , California 95119 , United States
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19
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Zhao W, Duan C, Li W. Hybrid line-dot nanopatterns from directed self-assembly of diblock copolymers by trenches. Phys Chem Chem Phys 2019; 21:10011-10021. [PMID: 31041947 DOI: 10.1039/c9cp00949c] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
We demonstrate that the directed self-assembly of AB diblock copolymers by periodic trenches can be used to fabricate large-scale ordered hybrid line-dot nanopatterns in addition to a defect-free dot nanopattern. The formation of line or dot nanopatterns in thin films with proper surface affinities is controlled by the film thickness, which is modulated by a topographic pattern consisting of steps and trenches. Two kinds of line-dot nanopatterns are achieved with cylinder-forming and sphere-forming copolymers, respectively. One kind of hybrid nanopatterns is composed of perpendicularly standing cylinders (dots) on the steps and parallel monolayer cylinders (lines) within the trenches, while the dots of the other kind are replaced by monolayer spheres on the steps. The thermodynamic stability region of target hybrid nanopatterns is identified by constructing two-dimensional phase diagrams with respect to two control parameters of step height and film thickness using self-consistent field theory. Furthermore, a process window of the line-dot nanopatterns is estimated using cell dynamics simulations based on time-dependent Ginzburg-Landau theory, confirming their feasibility in kinetics.
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Affiliation(s)
- Wenfeng Zhao
- State Key Laboratory of Molecular Engineering of Polymers, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University, Shanghai 200433, China.
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20
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Zhu Y, Aissou K, Andelman D, Man X. Orienting Cylinder-Forming Block Copolymer Thin Films: The Combined Effect of Substrate Corrugation and Its Surface Energy. Macromolecules 2019. [DOI: 10.1021/acs.macromol.8b02302] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
| | - Karim Aissou
- Institut Européen des Membranes, Université de Montpellier-CNRS-ENSCM, 300 Avenue du Professeur Emile Jeanbrau, F-34090 Montpellier, France
| | - David Andelman
- Raymond and Beverly Sackler School of Physics and Astronomy, Tel Aviv University, Ramat Aviv 69978, Tel Aviv, Israel
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21
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de Freitas AG, Muraro PI, Bortolotto T, Trindade SG, Schmidt V, Lopes LQ, Ninago M, Satti A, Ciolino A, Villar M, Giacomelli C. Facile one-pot synthesis and solution behavior of poly(acrylic acid)-block-polycaprolactone copolymers. J Mol Liq 2019. [DOI: 10.1016/j.molliq.2018.10.026] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
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22
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Choi J, Koo S, Sakellari I, Kim H, Su Z, Carter KR, Farsari M, Grigoropoulos CP, Russell TP. Guided Assembly of Block Copolymers in Three-Dimensional Woodpile Scaffolds. ACS APPLIED MATERIALS & INTERFACES 2018; 10:42933-42940. [PMID: 30444346 DOI: 10.1021/acsami.8b17172] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Three-dimensional (3D) nanofabrication using the directed self-assembly of block copolymers (BCPs) holds great promise for the nanoscale device fabrication and integration into 3D architectures over large areas with high element densities. In this work, a robust platform is developed for building 3D BCP architectures with tailored functionality using 3D micron-scale woodpile structures (WPSs), fabricated by a multiphoton polymerization technique. By completely filling the spaces of the WPSs and using the interactions of the blocks of the BCPs with the struts of the WPS, well-developed 3D nanoscopic morphologies are produced. Metal ion complexation with one block of the copolymer affords a convenient stain to highlight one of the microdomains of the copolymer for electron microscopy studies but also, with the reduction of the complexing salt to the corresponding metal, a simple strategy is shown to produce 3D constructs with nanoscopic domain resolution.
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Affiliation(s)
- Jaewon Choi
- Polymer Science and Engineering Department , University of Massachusetts Amherst , 120 Governors Drive , Amherst , Massachusetts 01003 , United States
| | - Sangmo Koo
- Laser Thermal Lab, Department of Mechanical Engineering , University of California Berkeley , Berkeley , California 94720 , United States
- Department of Mechanical Engineering , Incheon National University , 119 Academy-ro , Yeonsu-gu, Incheon 22012 , Republic of Korea
| | - Ioanna Sakellari
- Institute of Electronic Structure and Laser (IESL) , Foundation of Research and Technology, Hellas (FORTH) , Nikolaou Plastira 100 , Heraklion 70013 , Crete , Greece
| | - Hyeyoung Kim
- Polymer Science and Engineering Department , University of Massachusetts Amherst , 120 Governors Drive , Amherst , Massachusetts 01003 , United States
| | - Zhengliang Su
- Laser Thermal Lab, Department of Mechanical Engineering , University of California Berkeley , Berkeley , California 94720 , United States
| | - Kenneth R Carter
- Polymer Science and Engineering Department , University of Massachusetts Amherst , 120 Governors Drive , Amherst , Massachusetts 01003 , United States
| | - Maria Farsari
- Institute of Electronic Structure and Laser (IESL) , Foundation of Research and Technology, Hellas (FORTH) , Nikolaou Plastira 100 , Heraklion 70013 , Crete , Greece
| | - Costas P Grigoropoulos
- Laser Thermal Lab, Department of Mechanical Engineering , University of California Berkeley , Berkeley , California 94720 , United States
| | - Thomas P Russell
- Polymer Science and Engineering Department , University of Massachusetts Amherst , 120 Governors Drive , Amherst , Massachusetts 01003 , United States
- Materials Sciences Division , Lawrence Berkeley National Laboratory , 1 Cyclotron Road , Berkeley , California 94720 , United States
- Beijing Advanced Innovation Center for Soft Matter Science and Engineering , Beijing University of Chemical Technology , Haoyang District North Third Ring Road 15 , Beijing 100029 , P. R. China
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23
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Dislocation-controlled formation and kinetics of grain boundary loops in two-dimensional crystals. Proc Natl Acad Sci U S A 2018; 115:6922-6927. [PMID: 29915026 DOI: 10.1073/pnas.1804352115] [Citation(s) in RCA: 23] [Impact Index Per Article: 3.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/18/2022] Open
Abstract
The formation and kinetics of grain boundaries are closely related to the topological constraints imposed on their complex dislocation structure. Loop-shaped grain boundaries are unique structures to establish such a link because their overall topological "charge" is zero due to their null net Burgers vector. Here, we observe that a local rotational deformation of a 2D colloidal crystal with an optical vortex results in a grain boundary loop only if the product of its radius and misorientation exceeds a critical value. Above this value, the deformation is plastic and the grain boundary loop spontaneously shrinks at a rate that solely depends on this product, while otherwise, the deformation is elastically restored. We show that this elastic-to-plastic crossover is a direct consequence of the unique dislocation structure of grain boundary loops. At the critical value, the loop is structurally equivalent to the so-called "flower defect" and the shrinkage rate diverges. Our results thus reveal a general limit on the formation of grain boundary loops in 2D crystals and elucidate the central role of defects in both the onset of plasticity and the kinetics of grain boundaries.
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24
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Wang RY, Huang J, Guo XS, Cao XH, Zou SF, Tong ZZ, Xu JT, Du BY, Fan ZQ. Closed-Loop Phase Behavior of Block Copolymers in the Presence of Competitive Hydrogen-Bonding and Coulombic Interaction. Macromolecules 2018. [DOI: 10.1021/acs.macromol.8b00627] [Citation(s) in RCA: 14] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/14/2022]
Affiliation(s)
- Rui-Yang Wang
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Jie Huang
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Xiao-Shuai Guo
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Xiao-Han Cao
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Shu-Fen Zou
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Zai-Zai Tong
- Key Laboratory of Advanced Textile Materials and Manufacturing Technology (ATMT), Ministry of Education, Department of Materials Science and Engineering, Zhejiang Sci-Tech University, Hangzhou 310018, China
| | - Jun-Ting Xu
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Bin-Yang Du
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Zhi-Qiang Fan
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
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25
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Wang RY, Guo XS, Fan B, Zou SF, Cao XH, Tong ZZ, Xu JT, Du BY, Fan ZQ. Design and Regulation of Lower Disorder-to-Order Transition Behavior in the Strongly Interacting Block Copolymers. Macromolecules 2018. [DOI: 10.1021/acs.macromol.8b00227] [Citation(s) in RCA: 20] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 02/08/2023]
Affiliation(s)
- Rui-Yang Wang
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Xiao-Shuai Guo
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Bin Fan
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Shu-Fen Zou
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Xiao-Han Cao
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Zai-Zai Tong
- Key Laboratory of Advanced Textile Materials and Manufacturing Technology (ATMT), Ministry of Education, Department of Materials Science and Engineering, Zhejiang Sci-Tech University, Hangzhou 310018, China
| | - Jun-Ting Xu
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Bin-Yang Du
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
| | - Zhi-Qiang Fan
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science & Engineering, Zhejiang University, Hangzhou 310027, China
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26
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Abstract
Bioinspired smart asymmetric nanochannel membranes (BSANM) have been explored extensively to achieve the delicate ionic transport functions comparable to those of living organisms. The abiotic system exhibits superior stability and robustness, allowing for promising applications in many fields. In view of the abundance of research concerning BSANM in the past decade, herein, we present a systematic overview of the development of the state-of-the-art BSANM system. The discussion is focused on the construction methodologies based on raw materials with diverse dimensions (i.e. 0D, 1D, 2D, and bulk). A generic strategy for the design and construction of the BSANM system is proposed first and put into context with recent developments from homogeneous to heterogeneous nanochannel membranes. Then, the basic properties of the BSANM are introduced including selectivity, gating, and rectification, which are associated with the particular chemical and physical structures. Moreover, we summarized the practical applications of BSANM in energy conversion, biochemical sensing and other areas. In the end, some personal opinions on the future development of the BSANM are briefly illustrated. This review covers most of the related literature reported since 2010 and is intended to build up a broad and deep knowledge base that can provide a solid information source for the scientific community.
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Affiliation(s)
- Zhen Zhang
- Beijing National Laboratory for Molecular Sciences (BNLMS), Key Laboratory of Green Printing, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China
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27
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Choi J, Li Y, Kim PY, Liu F, Kim H, Yu DM, Huh J, Carter KR, Russell TP. Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns. ACS APPLIED MATERIALS & INTERFACES 2018; 10:8324-8332. [PMID: 29443490 DOI: 10.1021/acsami.7b17713] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
We demonstrate the generation of block copolymer (BCP) line patterns oriented orthogonal to a very small (minimal) topographic trench pattern over arbitrarily large areas using solvent-vapor annealing. Increasing the thickness of BCP films induced an orthogonal alignment of the BCP cylindrical microdomains, where full orthogonal alignment of the cylindrical microdomains with respect to the trench direction was obtained at a film thickness corresponding to 1.70 L0. A capillary flow of the solvent across the trenches was a critical factor in the alignment of the cylindrical microdomains. Grazing incidence small-angle X-ray scattering was used to determine the orientation function of the microdomains, with a value of 0.997 being found reflecting a nearly perfect orientation. This approach to produce orthogonally aligned BCP line patterns could be extended to the nanomanufacturing and fabrication of hierarchical nanostructures.
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Affiliation(s)
- Jaewon Choi
- Department of Polymer Science and Engineering , University of Massachusetts Amherst , 120 Governors Drive , Amherst , Massachusetts 01003 , United States
| | - Yinyong Li
- Department of Polymer Science and Engineering , University of Massachusetts Amherst , 120 Governors Drive , Amherst , Massachusetts 01003 , United States
| | - Paul Y Kim
- Department of Polymer Science and Engineering , University of Massachusetts Amherst , 120 Governors Drive , Amherst , Massachusetts 01003 , United States
| | - Feng Liu
- Materials Science Division , Lawrence Berkeley National Laboratory , 1 Cyclotron Road , Berkeley , California 94720 , United States
| | - Hyeyoung Kim
- Department of Polymer Science and Engineering , University of Massachusetts Amherst , 120 Governors Drive , Amherst , Massachusetts 01003 , United States
| | - Duk Man Yu
- Department of Polymer Science and Engineering , University of Massachusetts Amherst , 120 Governors Drive , Amherst , Massachusetts 01003 , United States
| | - June Huh
- Department of Chemical and Biological Engineering , Korea University , 145 Anam-ro , Seongbuk-gu, Seoul 02841 , Republic of Korea
| | - Kenneth R Carter
- Department of Polymer Science and Engineering , University of Massachusetts Amherst , 120 Governors Drive , Amherst , Massachusetts 01003 , United States
| | - Thomas P Russell
- Department of Polymer Science and Engineering , University of Massachusetts Amherst , 120 Governors Drive , Amherst , Massachusetts 01003 , United States
- Materials Science Division , Lawrence Berkeley National Laboratory , 1 Cyclotron Road , Berkeley , California 94720 , United States
- Beijing Advanced Innovation Center for Soft Matter Science and Engineering , Beijing University of Chemical Technology , Chaoyang District North Third Ring Road 15 , Beijing 100029 , China
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28
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Kim H, Kang BG, Choi J, Sun Z, Yu DM, Mays J, Russell TP. Morphological Behavior of A2B Block Copolymers in Thin Films. Macromolecules 2018. [DOI: 10.1021/acs.macromol.7b02601] [Citation(s) in RCA: 20] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/28/2023]
Affiliation(s)
- Hyeyoung Kim
- Department
of Polymer Science and Engineering, University of Massachusetts, Amherst, 120 Governors Drive, Amherst, Massachusetts 01003, United States
| | - Beom-Goo Kang
- Department
of Chemistry, University of Tennessee, Knoxville, Tennessee 37996, United States
| | - Jaewon Choi
- Department
of Polymer Science and Engineering, University of Massachusetts, Amherst, 120 Governors Drive, Amherst, Massachusetts 01003, United States
| | - Zhiwei Sun
- Department
of Polymer Science and Engineering, University of Massachusetts, Amherst, 120 Governors Drive, Amherst, Massachusetts 01003, United States
| | - Duk Man Yu
- Department
of Polymer Science and Engineering, University of Massachusetts, Amherst, 120 Governors Drive, Amherst, Massachusetts 01003, United States
| | - Jimmy Mays
- Department
of Chemistry, University of Tennessee, Knoxville, Tennessee 37996, United States
| | - Thomas P. Russell
- Department
of Polymer Science and Engineering, University of Massachusetts, Amherst, 120 Governors Drive, Amherst, Massachusetts 01003, United States
- Materials
Science Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, United States
- Beijing
Advanced Innovation Center for Soft Matter Science and Engineering, Beijing University of Chemical Technology, Bejing 100029, China
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29
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Choi C, Park J, Vincent Joseph KL, Lee J, Ahn S, Kwak J, Lee KS, Kim JK. Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker. Nat Commun 2017; 8:1765. [PMID: 29176706 PMCID: PMC5701260 DOI: 10.1038/s41467-017-02019-9] [Citation(s) in RCA: 17] [Impact Index Per Article: 2.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/07/2016] [Accepted: 11/01/2017] [Indexed: 11/09/2022] Open
Abstract
Block copolymers with various nanodomains, such as spheres, cylinders, and lamellae, have received attention for their applicability to nanolithography. However, those microdomains are determined by the volume fraction of one block. Meanwhile, nanopatterns with multiple shapes are required for the next-generation nanolithography. Although various methods have been reported to achieve dual nanopatterns, all the methods need sophisticated processes using E-beam. Here, we synthesized a miktoarm block copolymer capable of cleavage of one block by ultraviolet. Original cylindrical nanodomains of synthesized block copolymer were successfully transformed to lamellar nanodomains due to the change of molecular architecture by ultraviolet. We fabricated dual nanopatterns consisting of dots and lines at desired regions on a single substrate. We also prepared dual nanopatterns utilizing another phase transformation from spheres to cylinders in a block copolymer with higher interaction parameter. Since our concept has versatility to any block copolymer, it could be employed as next-generation nanolithography.
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Affiliation(s)
- Chungryong Choi
- National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology, Kyungbuk, 790-784, Korea
| | - Jichoel Park
- National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology, Kyungbuk, 790-784, Korea
| | - Kanniyambatti L Vincent Joseph
- National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology, Kyungbuk, 790-784, Korea
| | - Jaeyong Lee
- National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology, Kyungbuk, 790-784, Korea
| | - Seonghyeon Ahn
- National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology, Kyungbuk, 790-784, Korea
| | - Jongheon Kwak
- National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology, Kyungbuk, 790-784, Korea
| | - Kyu Seong Lee
- National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology, Kyungbuk, 790-784, Korea
| | - Jin Kon Kim
- National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology, Kyungbuk, 790-784, Korea.
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30
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Choi J, Gunkel I, Li Y, Sun Z, Liu F, Kim H, Carter KR, Russell TP. Macroscopically ordered hexagonal arrays by directed self-assembly of block copolymers with minimal topographic patterns. NANOSCALE 2017; 9:14888-14896. [PMID: 28949359 DOI: 10.1039/c7nr05394k] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
A simple and robust method has been developed for the generation of macroscopically ordered hexagonal arrays from the directed self-assembly (DSA) of cylinder-forming block copolymers (BCPs) based on minimal trench patterns with solvent vapor annealing. The use of minimal trench patterns allows us to probe the guided hexagonal arrays of cylindrical microdomains using grazing incidence small angle X-ray scattering (GISAXS), where the sample stage is rotated on the basis of the six-fold symmetry of a hexagonal system. It is found that the (10) planes of hexagonal arrays of cylindrical microdomains are oriented parallel to the underlying trench direction over macroscopic length scales (∼1 × 1 cm2). However, there are misorientations of the hexagonal arrays with short-range ordering. GISAXS patterns show that the hexagonal arrays on the minimal trench pattern are distorted, deviating from a perfect hexagonal lattice. This distortion has been attributed to the absence of topographic constraints in the unconfined direction on the 1-D minimal trench pattern. Also, the frustration of BCP microdomains, arising from the incommensurability between the trench pitch and natural period of the BCP at the base of the trench, influences the distortion of the hexagonal arrays.
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Affiliation(s)
- Jaewon Choi
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA 01003, USA.
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31
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Wan L, Ruiz R, Gao H, Albrecht TR. Self-Registered Self-Assembly of Block Copolymers. ACS NANO 2017; 11:7666-7673. [PMID: 28714668 DOI: 10.1021/acsnano.7b03284] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
Directed self-assembly (DSA) of block copolymer (BCP) thin films, especially with density multiplication, is one of the most promising options for further improving resolution and throughput in nanolithography. However, controlling defect density has been one of the major hurdles for many DSA applications. Both thermodynamically and kinetically, defect-free patterns favor the use of low density multiplication factors and thinner films, which undermine the promise of enhanced resolution and the formation of robust masks for pattern transfer. Here, we demonstrate a self-registered self-assembly method to enable nearly perfect DSA on loosely defined chemical patterns with high density multiplication factor. Self-registered self-assembly involves two DSA steps. In the first step, an ultrathin BCP blend film is used to obtain vanishingly low defect densities. Concurrently as the film is annealed, preloaded chemical markers separate into the different polymer blocks and graft to the substrate locking in a new chemical contrast pattern with 1:1 feature registration. After thorough removal of the blend film, the remaining self-registered chemical pattern can establish defect-free DSA of thick BCP films.
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Affiliation(s)
- Lei Wan
- HGST, A Western Digital Company, San Jose Research Center , 5601 Great Oaks Parkway, San Jose, California 95119, United States
| | - Ricardo Ruiz
- HGST, A Western Digital Company, San Jose Research Center , 5601 Great Oaks Parkway, San Jose, California 95119, United States
| | - He Gao
- HGST, A Western Digital Company, San Jose Research Center , 5601 Great Oaks Parkway, San Jose, California 95119, United States
| | - Thomas R Albrecht
- HGST, A Western Digital Company, San Jose Research Center , 5601 Great Oaks Parkway, San Jose, California 95119, United States
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32
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Park S, Tsarkova LA. Surface Roughness-Mediated Ordering in Block Copolymer Films toward Spatially Controlled Patterns. Macromolecules 2017. [DOI: 10.1021/acs.macromol.7b01185] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Sungjune Park
- Department
of Chemical and Biomolecular Engineering, North Carolina State University, 911 Partners Way, Raleigh, North Carolina 27695, United States
| | - Larisa A. Tsarkova
- Faculty
of Chemistry, Chair of Colloid Chemistry, Moscow State University, GSP-1, 1-3 Leninskiye Gory, 119991 Moscow 1, Russia
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33
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Riesch C, Radons G, Magerle R. Scaling properties of ageing orientation fluctuations in stripe phases. Interface Focus 2017; 7:20160146. [PMID: 28630676 PMCID: PMC5474038 DOI: 10.1098/rsfs.2016.0146] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/12/2022] Open
Abstract
We investigate the non-equilibrium dynamics of an ordered stripe-forming system free of topological defects. In particular, we study the ageing and the coarsening of orientation fluctuations parallel and perpendicular to the stripes via computer simulations based on a minimal phase-field model (model B with Coulomb interactions). Under the influence of noise, the stripe orientation field develops fluctuations parallel to the stripes, with the dominant modulation length λ*∥ increasing with time t as λ*∥ ∼ t1/4 and the correlation length perpendicular to the stripes ξ⊥θ increasing as ξ⊥θ ∼ t1/2. We explain these anisotropic coarsening dynamics with an analytic theory based on the linear elastic model for stripe displacements first introduced by Landau and Peierls. We thus obtain the scaling forms and the scaling exponents characterizing the correlation functions and the structure factor of the stripe orientation field. Our results reveal how the coarsening of orientation fluctuations prevents a periodically modulated phase free of topological defects from reaching equilibrium.
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Affiliation(s)
- Christian Riesch
- Institut für Physik, Technische Universität Chemnitz, 09107 Chemnitz, Germany
| | - Günter Radons
- Institut für Physik, Technische Universität Chemnitz, 09107 Chemnitz, Germany
| | - Robert Magerle
- Institut für Physik, Technische Universität Chemnitz, 09107 Chemnitz, Germany
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34
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Jin C, Olsen BC, Luber EJ, Buriak JM. Preferential Alignment of Incommensurate Block Copolymer Dot Arrays Forming Moiré Superstructures. ACS NANO 2017; 11:3237-3246. [PMID: 28225584 DOI: 10.1021/acsnano.7b00322] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
Block copolymer (BCP) self-assembly is of great interest as a cost-effective method for large-scale, high-resolution nanopattern fabrication. Directed self-assembly can induce long-range order and registration, reduce defect density, and enable access to patterns of higher complexity. Here we demonstrate preferential orientation of two incommensurate BCP dot arrays. A bottom layer of hexagonal silica dots is prepared via typical self-assembly from a PS-b-PDMS block copolymer. Self-assembly of a second, or top, layer of a different PS-b-PDMS block copolymer that forms a hexagonal dot pattern with different periodicity results in a predictable moiré superstructure. Four distinct moiré superstructures were demonstrated through a combination of different BCPs and different order of annealing. The registration force of the bottom layer of hexagonal dots is sufficient to direct the self-assembly of the top layer to adopt a preferred relative angle of rotation. Large-area helium ion microscopy imaging enabled quantification of the distributions of relative rotations between the two lattices in the moiré superstructures, yielding statistically meaningful results for each combination. It was also found that if the bottom layer dots were too large, the resulting moiré pattern was lost. A small reduction in the bottom layer dot size, however, resulted in large-area moiré superstructures, suggesting a specific size regime where interlayer registration forces can induce long-range preferential alignment of incommensurate BCP dot arrays.
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Affiliation(s)
- Cong Jin
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
| | - Brian C Olsen
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
| | - Erik J Luber
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
| | - Jillian M Buriak
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
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