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Liu N, Lu Y, Li Z, Zhao H, Yu Q, Huang Y, Yang J, Huang L. Smart Wrinkled Interfaces: Patterning, Morphing, and Coding of Polymer Surfaces by Dynamic Anisotropic Wrinkling. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2024. [PMID: 39207273 DOI: 10.1021/acs.langmuir.4c02162] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/04/2024]
Abstract
In contrast to traditional static surfaces, smart patterned surfaces with periodical and reversible morphologies offer limitless opportunities for encoding surface functions and properties on demand, facilitating their widespread application as functional building blocks in various devices. Advances in intelligently controlling the macroscopic properties of these smart surfaces have been accomplished through various techniques (such as three-dimensional printing, imprint lithography and femtosecond laser) and responsive materials. In contrast to the sophisticated techniques above, dynamic anisotropic wrinkling, taking advantage of dynamic programmable manipulation of surface wrinkling and its orientation, offers a powerful alternative for fabricating dynamic periodical patterns due to its spontaneous formation, versatility, convenient scale-up fabrication, and sensitivity to various stimuli. This review comprehensively summarizes recent advances in smart patterned surfaces with dynamic oriented wrinkles, covering design principles, fabrication techniques, representative types of physical and chemical stimuli, as well as fine-tuning of wrinkle dimensions and orientation. Finally, advanced applications of these smart patterned surfaces are presented, along with a discussion of current challenges and future prospects in this rapidly evolving field. This review would offer some insights and guidelines for designing and engineering novel stimuli-responsive smart wrinkled surfaces, thereby facilitating their sustainable development and progressing toward commercialization.
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Affiliation(s)
- Ning Liu
- Hubei Key Laboratory of Multi-media Pollution Cooperative Control in Yangtze Basin, School of Environmental Science & Engineering, Huazhong University of Science and Technology, Wuhan, Hubei 430074, China
| | - Yenie Lu
- Hubei Key Laboratory of Multi-media Pollution Cooperative Control in Yangtze Basin, School of Environmental Science & Engineering, Huazhong University of Science and Technology, Wuhan, Hubei 430074, China
| | - Ziyue Li
- Hubei Key Laboratory of Multi-media Pollution Cooperative Control in Yangtze Basin, School of Environmental Science & Engineering, Huazhong University of Science and Technology, Wuhan, Hubei 430074, China
| | - Hongyang Zhao
- Hubei Key Laboratory of Multi-media Pollution Cooperative Control in Yangtze Basin, School of Environmental Science & Engineering, Huazhong University of Science and Technology, Wuhan, Hubei 430074, China
| | - Qingyue Yu
- Hubei Key Laboratory of Multi-media Pollution Cooperative Control in Yangtze Basin, School of Environmental Science & Engineering, Huazhong University of Science and Technology, Wuhan, Hubei 430074, China
| | - Yaxin Huang
- Hubei Key Laboratory of Multi-media Pollution Cooperative Control in Yangtze Basin, School of Environmental Science & Engineering, Huazhong University of Science and Technology, Wuhan, Hubei 430074, China
| | - Jiakuan Yang
- Hubei Key Laboratory of Multi-media Pollution Cooperative Control in Yangtze Basin, School of Environmental Science & Engineering, Huazhong University of Science and Technology, Wuhan, Hubei 430074, China
| | - Liang Huang
- Hubei Key Laboratory of Multi-media Pollution Cooperative Control in Yangtze Basin, School of Environmental Science & Engineering, Huazhong University of Science and Technology, Wuhan, Hubei 430074, China
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Park H, Hwang J, Chae H, Kang DJ. Rapid In-Plane Pattern Growth for Large-Area Inverse Replication Through Electrohydrodynamic Instability of Polymer Films. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2400155. [PMID: 38644332 DOI: 10.1002/smll.202400155] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/07/2024] [Revised: 03/25/2024] [Indexed: 04/23/2024]
Abstract
Nanopatterning driven by electrohydrodynamic (EHD) instability can aid in the resolution of the drawbacks inherent in conventional imprinting or other molding methods. This is because EHD force negates the requirement of physical contact and is easily tuned. However, its potential has not examined owing to the limited size of the pattern replica (several to tens of micrometers). Thus, this study proposes a new route for large-area patterning through high-speed evolution of EHD-driven pattern growth along the in-plane axis. Through the acceleration of the in-plane growth, while selectively controlling a specific edge growth, the pattern replica area can be extended from the micro- to centimeter scale with high fidelity. Moreover, even in the case of nonuniform contact mode, the proposed rapid in-plane growth mode facilitates uniform large-scale replication, which is not possible in conventional imprinting or other molding methods.
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Affiliation(s)
- Hyunje Park
- Research Institute of Basic Sciences, Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do, 16419, Republic of Korea
- Department of Physics, Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do, 16419, Republic of Korea
| | - Jaeseok Hwang
- Wonik IPS Semiconductor Research Center, 75, Jinwisandan-ro, Jinwi-myeon, Pyeongtaek-si, Gyeonggi-do, 17709, Republic of Korea
| | - Heejoon Chae
- Department of Physics, Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do, 16419, Republic of Korea
| | - Dae Joon Kang
- Department of Physics, Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do, 16419, Republic of Korea
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Park H, Choi HY, Chae H, Noe Oo MM, Kang DJ. Electrohydrodynamic Nanopatterning: A Novel Solvent-Assisted Technique for Unconventional Substrates. NANO LETTERS 2023; 23:11949-11957. [PMID: 38079430 DOI: 10.1021/acs.nanolett.3c04177] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/28/2023]
Abstract
Electrohydrodynamic (EHD)-driven patterning is a pioneering lithographic technique capable of replicating and modifying micro/nanostructures efficiently. However, this process is currently restricted to conventional substrates, as it necessitates a uniform and robust electric field over a large area. Consequently, the use of nontraditional substrates, such as those that are flexible, nonflat, or have high insulation, has been notably limited. In our study, we extend the applicability of EHD-driven patterning by introducing a solvent-assisted capillary peel-and-transfer method that allows the successful removal of diverse EHD-induced structures from their original substrates. Compared with the traditional route, our process boasts a success rate close to 100%. The detached structures can then be efficiently transferred to nonconventional substrates, overcoming the limitations of the traditional EHD process. Our method exhibits significant versatility, as evidenced by successful transfer of structures with engineered wettability and patterned structures composed of metals and metal oxides onto nonconventional substrates.
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Affiliation(s)
- Hyunje Park
- Department of Physics, Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 16419, Republic of Korea
- Research Institute of Basic Sciences, Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 16419, Republic of Korea
| | - Ha Young Choi
- Department of Physics, Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 16419, Republic of Korea
| | - Heejoon Chae
- Department of Physics, Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 16419, Republic of Korea
| | - May Myat Noe Oo
- Department of Physics, Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 16419, Republic of Korea
| | - Dae Joon Kang
- Department of Physics, Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 16419, Republic of Korea
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Wang C, Sun J, Fan Y, Shao J. Discretely-supported transfer nanoimprint anti-reflection nanostructures on complex uneven surface of Fresnel lenses. NANOTECHNOLOGY 2023; 35:055303. [PMID: 37883951 DOI: 10.1088/1361-6528/ad074e] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/04/2023] [Accepted: 10/26/2023] [Indexed: 10/28/2023]
Abstract
Nanopatterning complex uneven surface of numerous functional devices to improve their performance is significantly appealing; however, it is extremely challenging. This study proposes a discretely-supported transfer nanoimprint technique to fabricate nanostructures on complex device surfaces containing multi-spatial frequencies. First, a discretely-supported nanoimprint template was designed based on the built energy criterion. A contact fidelity of over 99% was achieved between the designed template and the targeted complex uneven substrate surface. Next, the prefilled nanostructures on the template were transferred to the target surface after contact. By precisely controlling the amount of micro-droplet jetting on the template on-demand, the accumulation of the polymer in the micro-valley sites on the complex substrate was avoided, thus maintaining the morphology and generating function of the devices. Finally, high-quality Fresnel lenses with broadband wide-directional antireflection and excellent imaging performance were developed by imprinting subwavelength-tapered nanostructures on the relief surface.
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Affiliation(s)
- Chunhui Wang
- Micro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an 710049, People's Republic of China
| | - Jiaxing Sun
- Micro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an 710049, People's Republic of China
| | - Yu Fan
- Micro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an 710049, People's Republic of China
| | - Jinyou Shao
- Micro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an 710049, People's Republic of China
- Frontier Institute of Science and Technology (FIST), Xi'an Jiaotong University, Xi'an 710049, People's Republic of China
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Liu N, Sun Q, Yang Z, Shan L, Wang Z, Li H. Wrinkled Interfaces: Taking Advantage of Anisotropic Wrinkling to Periodically Pattern Polymer Surfaces. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2023; 10:e2207210. [PMID: 36775851 PMCID: PMC10131883 DOI: 10.1002/advs.202207210] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 12/31/2022] [Indexed: 06/18/2023]
Abstract
Periodically patterned surfaces can cause special surface properties and are employed as functional building blocks in many devices, yet remaining challenges in fabrication. Advancements in fabricating structured polymer surfaces for obtaining periodic patterns are accomplished by adopting "top-down" strategies based on self-assembly or physico-chemical growth of atoms, molecules, or particles or "bottom-up" strategies ranging from traditional micromolding (embossing) or micro/nanoimprinting to novel laser-induced periodic surface structure, soft lithography, or direct laser interference patterning among others. Thus, technological advances directly promote higher resolution capabilities. Contrasted with the above techniques requiring highly sophisticated tools, surface instabilities taking advantage of the intrinsic properties of polymers induce surface wrinkling in order to fabricate periodically oriented wrinkled patterns. Such abundant and elaborate patterns are obtained as a result of self-organizing processes that are rather difficult if not impossible to fabricate through conventional patterning techniques. Focusing on oriented wrinkles, this review thoroughly describes the formation mechanisms and fabrication approaches for oriented wrinkles, as well as their fine-tuning in the wavelength, amplitude, and orientation control. Finally, the major applications in which oriented wrinkled interfaces are already in use or may be prospective in the near future are overviewed.
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Affiliation(s)
- Ning Liu
- National‐Local Joint Engineering Laboratory for Energy Conservation of Chemical Process Integration and Resources UtilizationSchool of Chemical Engineering and TechnologyHebei University of TechnologyTianjin300130China
| | - Qichao Sun
- National‐Local Joint Engineering Laboratory for Energy Conservation of Chemical Process Integration and Resources UtilizationSchool of Chemical Engineering and TechnologyHebei University of TechnologyTianjin300130China
| | - Zhensheng Yang
- National‐Local Joint Engineering Laboratory for Energy Conservation of Chemical Process Integration and Resources UtilizationSchool of Chemical Engineering and TechnologyHebei University of TechnologyTianjin300130China
| | - Linna Shan
- National‐Local Joint Engineering Laboratory for Energy Conservation of Chemical Process Integration and Resources UtilizationSchool of Chemical Engineering and TechnologyHebei University of TechnologyTianjin300130China
| | - Zhiying Wang
- National‐Local Joint Engineering Laboratory for Energy Conservation of Chemical Process Integration and Resources UtilizationSchool of Chemical Engineering and TechnologyHebei University of TechnologyTianjin300130China
| | - Hao Li
- National‐Local Joint Engineering Laboratory for Energy Conservation of Chemical Process Integration and Resources UtilizationSchool of Chemical Engineering and TechnologyHebei University of TechnologyTianjin300130China
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Yoon T, Kim PU, Ahn H, Kim T, Eom TJ, Kim K, Choi JR. Resolution-enhanced optical inspection system to examine metallic nanostructures using structured illumination. APPLIED OPTICS 2022; 61:6819-6826. [PMID: 36255761 DOI: 10.1364/ao.457806] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/25/2022] [Accepted: 07/15/2022] [Indexed: 06/16/2023]
Abstract
We developed a structured illumination-based optical inspection system to inspect metallic nanostructures in real time. To address this, we used post-image-processing techniques to enhance the image resolution. To examine the fabricated metallic nanostructures in real time, a compact and highly resolved optical inspection system was designed for practical industrial use. Structured illumination microscopy yields multiple images with various linear illumination patterns, which can be used to reconstruct resolution-enhanced images. Images of nanosized posts and complex structures reflected in the structured illumination were reconstructed into images with improved resolution. A comparison with wide-field images demonstrates that the optical inspection system exhibits high performance and is available as a real-time nanostructure inspection platform. Because it does not require special environmental conditions and enables multiple systems to be covered in arrays, the developed system is expected to provide real-time and noninvasive inspections during the production of large-area nanostructured components.
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Zhang L, Chu X, Tian F, Xu Y, Hu H. Bio-Inspired Hierarchical Micro-/Nanostructures for Anti-Icing Solely Fabricated by Metal-Assisted Chemical Etching. MICROMACHINES 2022; 13:mi13071077. [PMID: 35888894 PMCID: PMC9317431 DOI: 10.3390/mi13071077] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 06/19/2022] [Revised: 07/05/2022] [Accepted: 07/05/2022] [Indexed: 02/01/2023]
Abstract
We report a cost-effective and scalable methodology for producing a hierarchical micro-/nanostructured silicon surface solely by metal-assisted chemical etching. It involves two major processing steps of fabricating micropillars and nanowires separately. The process of producing micro-scale structures by masked metal-assisted chemical etching was optimized. Silicon nanowires were created on the micropillar’s surface via maskless metal-assisted chemical etching. The hierarchical micro-/nanostructured surface exhibits superhydrophobic properties with a high contact angle of ~156° and a low sliding angle of <2.5° for deionized water. Furthermore, due to the existence of microscale and nanoscale air trapped at the liquid/solid interface, it exhibits a long ice delay time of 2876 s at −5 °C, more than 5 times longer than that of smooth surfaces. Compared to conventional dry etching methods, the metal-assisted chemical etching approach excludes vacuum environments and high-temperature processes and can be applied for applications requiring hierarchical micro-/nanostructured surfaces or structures.
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Affiliation(s)
- Lansheng Zhang
- ZJU-UIUC Institute, International Campus, Zhejiang University, Haining 314400, China; (L.Z.); (X.C.); (F.T.)
| | - Xiaoyang Chu
- ZJU-UIUC Institute, International Campus, Zhejiang University, Haining 314400, China; (L.Z.); (X.C.); (F.T.)
| | - Feng Tian
- ZJU-UIUC Institute, International Campus, Zhejiang University, Haining 314400, China; (L.Z.); (X.C.); (F.T.)
- School of Micro-Nano Electronics, Zhejiang University, Hangzhou 310000, China;
| | - Yang Xu
- School of Micro-Nano Electronics, Zhejiang University, Hangzhou 310000, China;
| | - Huan Hu
- ZJU-UIUC Institute, International Campus, Zhejiang University, Haining 314400, China; (L.Z.); (X.C.); (F.T.)
- State Key Laboratory of Fluid Power and Mechatronic Systems, Zhejiang University, Hangzhou 310000, China
- Correspondence:
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Lan W, Chen D, Guo Q, Tian B, Xie X, He Y, Chai W, Liu G, Dong P, Xi H, Zhu W, Zhang C. Performance Enhancement of All-Inorganic Carbon-Based CsPbIBr 2 Perovskite Solar Cells Using a Moth-Eye Anti-Reflector. NANOMATERIALS 2021; 11:nano11102726. [PMID: 34685177 PMCID: PMC8538339 DOI: 10.3390/nano11102726] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 09/06/2021] [Revised: 10/11/2021] [Accepted: 10/13/2021] [Indexed: 11/16/2022]
Abstract
All-inorganic carbon-based CsPbIBr2 perovskite solar cells (PSCs) have attracted increasing interest due to the low cost and the balance between bandgap and stability. However, the relatively narrow light absorption range (300 to 600 nm) limited the further improvement of short-circuit current density (JSC) and power conversion efficiency (PCE) of PSCs. Considering the inevitable reflectance loss (~10%) at air/glass interface, we prepared the moth-eye anti-reflector by ultraviolet nanoimprint technology and achieved an average reflectance as low as 5.15%. By attaching the anti-reflector on the glass side of PSCs, the JSC was promoted by 9.4% from 10.89 mA/cm2 to 11.91 mA/cm2, which is the highest among PSCs with a structure of glass/FTO/c-TiO2/CsPbIBr2/Carbon, and the PCE was enhanced by 9.9% from 9.17% to 10.08%. The results demonstrated that the larger JSC induced by the optical reflectance modulation of moth-eye anti-reflector was responsible for the improved PCE. Simultaneously, this moth-eye anti-reflector can withstand a high temperature up to 200 °C, and perform efficiently at a wide range of incident angles from 40° to 90° and under various light intensities. This work is helpful to further improve the performance of CsPbIBr2 PSCs by optical modulation and boost the possible application of wide-range-wavelength anti-reflector in single and multi-junction solar cells.
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Affiliation(s)
- Wensheng Lan
- State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi’an 710071, China; (W.L.); (Q.G.); (B.T.); (Y.H.); (W.C.); (H.X.); (W.Z.)
| | - Dazheng Chen
- State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi’an 710071, China; (W.L.); (Q.G.); (B.T.); (Y.H.); (W.C.); (H.X.); (W.Z.)
- Correspondence: (D.C.); (C.Z.)
| | - Qirui Guo
- State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi’an 710071, China; (W.L.); (Q.G.); (B.T.); (Y.H.); (W.C.); (H.X.); (W.Z.)
| | - Baichuan Tian
- State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi’an 710071, China; (W.L.); (Q.G.); (B.T.); (Y.H.); (W.C.); (H.X.); (W.Z.)
| | - Xiaoping Xie
- Qinghai Huanghe Hydropower Development Co., Ltd., Xining 810008, China; (X.X.); (G.L.); (P.D.)
| | - Yibing He
- State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi’an 710071, China; (W.L.); (Q.G.); (B.T.); (Y.H.); (W.C.); (H.X.); (W.Z.)
| | - Wenming Chai
- State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi’an 710071, China; (W.L.); (Q.G.); (B.T.); (Y.H.); (W.C.); (H.X.); (W.Z.)
| | - Gang Liu
- Qinghai Huanghe Hydropower Development Co., Ltd., Xining 810008, China; (X.X.); (G.L.); (P.D.)
| | - Peng Dong
- Qinghai Huanghe Hydropower Development Co., Ltd., Xining 810008, China; (X.X.); (G.L.); (P.D.)
| | - He Xi
- State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi’an 710071, China; (W.L.); (Q.G.); (B.T.); (Y.H.); (W.C.); (H.X.); (W.Z.)
| | - Weidong Zhu
- State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi’an 710071, China; (W.L.); (Q.G.); (B.T.); (Y.H.); (W.C.); (H.X.); (W.Z.)
| | - Chunfu Zhang
- State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi’an 710071, China; (W.L.); (Q.G.); (B.T.); (Y.H.); (W.C.); (H.X.); (W.Z.)
- Correspondence: (D.C.); (C.Z.)
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Oh DK, Lee T, Ko B, Badloe T, Ok JG, Rho J. Nanoimprint lithography for high-throughput fabrication of metasurfaces. FRONTIERS OF OPTOELECTRONICS 2021; 14:229-251. [PMID: 36637666 PMCID: PMC9743954 DOI: 10.1007/s12200-021-1121-8] [Citation(s) in RCA: 30] [Impact Index Per Article: 10.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/11/2020] [Accepted: 02/02/2021] [Indexed: 05/27/2023]
Abstract
Metasurfaces are composed of periodic sub-wavelength nanostructures and exhibit optical properties that are not found in nature. They have been widely investigated for optical applications such as holograms, wavefront shaping, and structural color printing, however, electron-beam lithography is not suitable to produce large-area metasurfaces because of the high fabrication cost and low productivity. Although alternative optical technologies, such as holographic lithography and plasmonic lithography, can overcome these drawbacks, such methods are still constrained by the optical diffraction limit. To break through this fundamental problem, mechanical nanopatterning processes have been actively studied in many fields, with nanoimprint lithography (NIL) coming to the forefront. Since NIL replicates the nanopattern of the mold regardless of the diffraction limit, NIL can achieve sufficiently high productivity and patterning resolution, giving rise to an explosive development in the fabrication of metasurfaces. In this review, we focus on various NIL technologies for the manufacturing of metasurfaces. First, we briefly describe conventional NIL and then present various NIL methods for the scalable fabrication of metasurfaces. We also discuss recent applications of NIL in the realization of metasurfaces. Finally, we conclude with an outlook on each method and suggest perspectives for future research on the high-throughput fabrication of active metasurfaces.
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Affiliation(s)
- Dong Kyo Oh
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea
| | - Taejun Lee
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea
| | - Byoungsu Ko
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea
| | - Trevon Badloe
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea
| | - Jong G Ok
- Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology (SEOULTECH), Seoul, 01811, Republic of Korea.
| | - Junsuk Rho
- Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea.
- Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea.
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Wang C, Lai D, Fan Y, Tian H, Li X, Chen X, Shao J. Nanoimprinting metal-containing nanoparticle-doped gratings to enhance the polarization of light-emitting chips by induced scattering. NANOTECHNOLOGY 2021; 32:235304. [PMID: 33739938 DOI: 10.1088/1361-6528/abe964] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Polarized radiative luminous semiconductor chips have huge application potential in many highly value-added fields. The integration of a subwavelength grating is recognized to be the most promising method for the development of polarized chips, but still faces the challenge of low polarized radiative performance. This paper describes a proposal for, and the development of, a scattering-induced enhanced-polarization light-emitting diode chip by directly nanoimprinting a metal-containing nanoparticle-doped grating onto the top surface of a common flip chip. The rate at which quantum-well light emission is used by the developed polarized chip is improved by more than 30%. More attractively, the doped scattering nanoparticles function as a scattering-induced polarization state converter that is sandwiched in between the top aluminum grating and the bottom silver reflector of the chips. The originally non-radiated light, with an electric-field vector parallel to the grating lines, is reflected back and forth inside the sandwich until it changes to the perpendicular vibration mode and is radiated outside the chip. Therefore, the polarization extinction ratio is greatly improved, compared to undoped samples.
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Affiliation(s)
- Chunhui Wang
- Micro- and Nano-technology Research Center, State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an 710049, People's Republic of China
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11
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Zhao C, Liu Q, Cheung KM, Liu W, Yang Q, Xu X, Man T, Weiss PS, Zhou C, Andrews AM. Narrower Nanoribbon Biosensors Fabricated by Chemical Lift-off Lithography Show Higher Sensitivity. ACS NANO 2021; 15:904-915. [PMID: 33337135 PMCID: PMC7855841 DOI: 10.1021/acsnano.0c07503] [Citation(s) in RCA: 23] [Impact Index Per Article: 7.7] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/03/2023]
Abstract
Wafer-scale nanoribbon field-effect transistor (FET) biosensors fabricated by straightforward top-down processes are demonstrated as sensing platforms with high sensitivity to a broad range of biological targets. Nanoribbons with 350 nm widths (700 nm pitch) were patterned by chemical lift-off lithography using high-throughput, low-cost commercial digital versatile disks (DVDs) as masters. Lift-off lithography was also used to pattern ribbons with 2 μm or 20 μm widths (4 or 40 μm pitches, respectively) using masters fabricated by photolithography. For all widths, highly aligned, quasi-one-dimensional (1D) ribbon arrays were produced over centimeter length scales by sputtering to deposit 20 nm thin-film In2O3 as the semiconductor. Compared to 20 μm wide microribbons, FET sensors with 350 nm wide nanoribbons showed higher sensitivity to pH over a broad range (pH 5 to 10). Nanoribbon FETs functionalized with a serotonin-specific aptamer demonstrated larger responses to equimolar serotonin in high ionic strength buffer than those of microribbon FETs. Field-effect transistors with 350 nm wide nanoribbons functionalized with single-stranded DNA showed greater sensitivity to detecting complementary DNA hybridization vs 20 μm microribbon FETs. In all, we illustrate facile fabrication and use of large-area, uniform In2O3 nanoribbon FETs for ion, small-molecule, and oligonucleotide detection where higher surface-to-volume ratios translate to better detection sensitivities.
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Affiliation(s)
- Chuanzhen Zhao
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, California 90095, United States
- California NanoSystems Institute, University of California, Los Angeles, Los Angeles, California 90095, United States
| | - Qingzhou Liu
- Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089, United States
| | - Kevin M. Cheung
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, California 90095, United States
- California NanoSystems Institute, University of California, Los Angeles, Los Angeles, California 90095, United States
| | - Wenfei Liu
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, California 90095, United States
- California NanoSystems Institute, University of California, Los Angeles, Los Angeles, California 90095, United States
| | - Qing Yang
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, California 90095, United States
- California NanoSystems Institute, University of California, Los Angeles, Los Angeles, California 90095, United States
| | - Xiaobin Xu
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, California 90095, United States
- California NanoSystems Institute, University of California, Los Angeles, Los Angeles, California 90095, United States
| | - Tianxing Man
- Department of Mechanical and Aerospace Engineering, University of California, Los Angeles, Los Angeles, California 90095, United States
| | - Paul S. Weiss
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, California 90095, United States
- California NanoSystems Institute, University of California, Los Angeles, Los Angeles, California 90095, United States
- Department of Bioengineering, University of California, Los Angeles, Los Angeles, California 90095, United States
- Department of Materials Science and Engineering, University of California, Los Angeles, Los Angeles, California 90095, United States
- Corresponding Authors (AMA), (CZ), and (PSW)
| | - Chongwu Zhou
- Mork Family Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089, United States
- Ming Hsieh Department of Electrical Engineering, University of Southern California, Los Angeles, California 90089, United States
- Corresponding Authors (AMA), (CZ), and (PSW)
| | - Anne M. Andrews
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, California 90095, United States
- California NanoSystems Institute, University of California, Los Angeles, Los Angeles, California 90095, United States
- Department of Psychiatry and Biobehavioral Sciences, Semel Institute for Neuroscience and Human Behavior, and Hatos Center for Neuropharmacology, University of California, Los Angeles, Los Angeles, California 90095, United States
- Corresponding Authors (AMA), (CZ), and (PSW)
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Lv G, Hu X, Hao L, Tian H, Shao J, Yu D. Facile Fabrication of a Flexible Patterned Film with Diverse Micro-/Nanostructures via Electrohydrodynamic Patterning. Ind Eng Chem Res 2020. [DOI: 10.1021/acs.iecr.0c04908] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Guowei Lv
- School of Chemistry, State Key Laboratory of Electrical Insulation and Power Equipments, MOE Key Laboratory for Non-Equilibrium Synthesis and Modulation of Condensed Matter, Xi’an Jiaotong University, Xi’an 710049, Shaanxi, P. R. China
| | - Xiaobing Hu
- College of Chemistry and Chemical Engineering, Shaanxi Province Key Laboratory of Phytochemistry, Baoji University of Arts and Sciences, Baoji 721013, Shaanxi, P. R. China
| | - Lu Hao
- School of Chemistry, State Key Laboratory of Electrical Insulation and Power Equipments, MOE Key Laboratory for Non-Equilibrium Synthesis and Modulation of Condensed Matter, Xi’an Jiaotong University, Xi’an 710049, Shaanxi, P. R. China
| | - Hongmiao Tian
- State Key Laboratory of Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, Shaanxi, P. R. China
| | - Jinyou Shao
- State Key Laboratory of Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, Shaanxi, P. R. China
| | - Demei Yu
- School of Chemistry, State Key Laboratory of Electrical Insulation and Power Equipments, MOE Key Laboratory for Non-Equilibrium Synthesis and Modulation of Condensed Matter, Xi’an Jiaotong University, Xi’an 710049, Shaanxi, P. R. China
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Zhou P, Yu H, Zhong Y, Zou W, Wang Z, Liu L. Fabrication of Waterproof Artificial Compound Eyes with Variable Field of View Based on the Bioinspiration from Natural Hierarchical Micro-Nanostructures. NANO-MICRO LETTERS 2020; 12:166. [PMID: 34138165 PMCID: PMC7770831 DOI: 10.1007/s40820-020-00499-x] [Citation(s) in RCA: 15] [Impact Index Per Article: 3.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/02/2020] [Accepted: 07/15/2020] [Indexed: 05/04/2023]
Abstract
Planar and curved microlens arrays (MLAs) are the key components of miniaturized microoptical systems. In order to meet the requirements for advanced and multipurpose applications in microoptical field, a simple manufacturing method is urgently required for fabricating MLAs with unique properties, such as waterproofness and variable field-of-view (FOV) imaging. Such properties are beneficial for the production of advanced artificial compound eyes for the significant applications in complex microcavity environments with high humidity, for instance, miniature medical endoscopy. However, the simple and effective fabrication of advanced artificial compound eyes still presents significant challenges. In this paper, bioinspired by the natural superhydrophobic surface of lotus leaf, we propose a novel method for the fabrication of waterproof artificial compound eyes. Electrohydrodynamic jet printing was used to fabricate hierarchical MLAs and nanolens arrays (NLAs) on polydimethylsiloxane film. The flexible film of MLAs hybridized with NLAs exhibited excellent superhydrophobic property with a water contact angle of 158°. The MLAs film was deformed using a microfluidics chip to create artificial compound eyes with variable FOV, which ranged from 0° to 160°.
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Affiliation(s)
- Peilin Zhou
- State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang, 110016, People's Republic of China
- Institutes for Robotics and Intelligent Manufacturing, Chinese Academy of Sciences, Shenyang, 110169, People's Republic of China
- University of Chinese Academy of Sciences, Beijing, 100049, People's Republic of China
| | - Haibo Yu
- State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang, 110016, People's Republic of China.
- Institutes for Robotics and Intelligent Manufacturing, Chinese Academy of Sciences, Shenyang, 110169, People's Republic of China.
| | - Ya Zhong
- State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang, 110016, People's Republic of China
- Institutes for Robotics and Intelligent Manufacturing, Chinese Academy of Sciences, Shenyang, 110169, People's Republic of China
- University of Chinese Academy of Sciences, Beijing, 100049, People's Republic of China
| | - Wuhao Zou
- State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang, 110016, People's Republic of China
- Institutes for Robotics and Intelligent Manufacturing, Chinese Academy of Sciences, Shenyang, 110169, People's Republic of China
- University of Chinese Academy of Sciences, Beijing, 100049, People's Republic of China
| | - Zhidong Wang
- State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang, 110016, People's Republic of China
- Department of Advanced Robotics, Chiba Institute of Technology, Chiba, 275-0016, Japan
| | - Lianqing Liu
- State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang, 110016, People's Republic of China.
- Institutes for Robotics and Intelligent Manufacturing, Chinese Academy of Sciences, Shenyang, 110169, People's Republic of China.
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