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Sun YS, Jian YQ, Yang ST, Wang HF, Junisu BA, Chen CY, Lin JM. Epitaxial Growth of Surface Perforations on Parallel Cylinders in Terraced Films of Block Copolymer/Homopolymer Blends. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2024; 40:7680-7691. [PMID: 38551605 PMCID: PMC11008238 DOI: 10.1021/acs.langmuir.4c00385] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/30/2024] [Revised: 03/05/2024] [Accepted: 03/12/2024] [Indexed: 04/10/2024]
Abstract
Due to incommensurability between initial thickness and interdomain distance, thermal annealing inevitably produces relief surface terraces (islands and holes) of various morphologies in thin films of block copolymers. We have demonstrated three kinds of surface terraces in blend films: polygrain terraces with diffuse edges, polygrain terraces with step edges, and pseudo-monograin terraces with island coarsening. The three morphologies were obtained by three different thermal histories, respectively. The thermal histories were imposed on blend films, which were prepared by mixing a homopolystyrene (hPS, 6.1 kg/mol) with a weakly segregated, symmetry polystyrene-block poly(methyl methacrylate) (PS-b-PMMA, 42 kg/mol) followed by spin coating. At a given weight-fraction ratio of PS-b-PMMA/hPS = 75/25, the interior of the blend films forms parallel cylinders. Nevertheless, the surface of the blend films is always dominated by a skin layer of perforations, which epitaxially grow on top of parallel cylinders. By oxygen plasma etching at various time intervals to probe interior nanodomains, the epitaxial relationship between surface perforations and parallel cylinders has been identified by a scanning electron microscope.
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Affiliation(s)
- Ya-Sen Sun
- Department
of Chemical Engineering, National Cheng
Kung University, Tainan 701, Taiwan
| | - Yi-Qing Jian
- Department
of Chemical and Materials Engineering, National
Central University, Taoyuan 32001, Taiwan
| | - Shin-Tung Yang
- Department
of Chemical and Materials Engineering, National
Central University, Taoyuan 32001, Taiwan
| | - Hsiao-Fang Wang
- Department
of Chemical and Materials Engineering, National
Central University, Taoyuan 32001, Taiwan
| | - Belda Amelia Junisu
- Department
of Chemical Engineering, National Cheng
Kung University, Tainan 701, Taiwan
| | - Chun-Yu Chen
- National
Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
| | - Jhih-Min Lin
- National
Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
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2
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Fontelo R, Reis RL, Novoa-Carballal R, Pashkuleva I. Preparation, Properties, and Bioapplications of Block Copolymer Nanopatterns. Adv Healthc Mater 2024; 13:e2301810. [PMID: 37737834 DOI: 10.1002/adhm.202301810] [Citation(s) in RCA: 3] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/07/2023] [Revised: 08/28/2023] [Indexed: 09/23/2023]
Abstract
Block copolymer (BCP) self-assembly has emerged as a feasible method for large-scale fabrication with remarkable precision - features that are not common for most of the nanofabrication techniques. In this review, recent advancements in the molecular design of BCP along with state-of-the-art processing methodologies based on microphase separation alone or its combination with different lithography methods are presented. Furthermore, the bioapplications of the generated nanopatterns in the development of protein arrays, cell-selective surfaces, and antibacterial coatings are explored. Finally, the current challenges in the field are outlined and the potential breakthroughs that can be achieved by adopting BCP approaches already applied in the fabrication of electronic devices are discussed.
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Affiliation(s)
- Raul Fontelo
- 3B's Research Group, I3Bs - Research Institute on Biomaterials, Biodegradables and Biomimetics, University of Minho, Headquarters of the European Institute of Excellence on Tissue Engineering and Regenerative Medicine, AvePark, Parque de Ciência e Tecnologia, Barco, Guimarães, 4805-017, Portugal
- ICVS/3B's-PT Government Associate Laboratory, Braga/Guimarães, Portugal
| | - Rui L Reis
- 3B's Research Group, I3Bs - Research Institute on Biomaterials, Biodegradables and Biomimetics, University of Minho, Headquarters of the European Institute of Excellence on Tissue Engineering and Regenerative Medicine, AvePark, Parque de Ciência e Tecnologia, Barco, Guimarães, 4805-017, Portugal
- ICVS/3B's-PT Government Associate Laboratory, Braga/Guimarães, Portugal
| | - Ramon Novoa-Carballal
- 3B's Research Group, I3Bs - Research Institute on Biomaterials, Biodegradables and Biomimetics, University of Minho, Headquarters of the European Institute of Excellence on Tissue Engineering and Regenerative Medicine, AvePark, Parque de Ciência e Tecnologia, Barco, Guimarães, 4805-017, Portugal
- ICVS/3B's-PT Government Associate Laboratory, Braga/Guimarães, Portugal
- CINBIO, University of Vigo, Campus Universitario de Vigo, Vigo, Pontevedra, 36310, Spain
| | - Iva Pashkuleva
- 3B's Research Group, I3Bs - Research Institute on Biomaterials, Biodegradables and Biomimetics, University of Minho, Headquarters of the European Institute of Excellence on Tissue Engineering and Regenerative Medicine, AvePark, Parque de Ciência e Tecnologia, Barco, Guimarães, 4805-017, Portugal
- ICVS/3B's-PT Government Associate Laboratory, Braga/Guimarães, Portugal
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3
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Murataj I, Angelini A, Cara E, Porro S, Beckhoff B, Kayser Y, Hönicke P, Ciesielski R, Gollwitzer C, Soltwisch V, Perez-Murano F, Fernandez-Regulez M, Carignano S, Boarino L, Castellino M, Ferrarese Lupi F. Hybrid Metrology for Nanostructured Optical Metasurfaces. ACS APPLIED MATERIALS & INTERFACES 2023; 15:57992-58002. [PMID: 37991460 PMCID: PMC10739581 DOI: 10.1021/acsami.3c13923] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/18/2023] [Revised: 10/23/2023] [Accepted: 11/07/2023] [Indexed: 11/23/2023]
Abstract
Metasurfaces have garnered increasing research interest in recent years due to their remarkable advantages, such as efficient miniaturization and novel functionalities compared to traditional optical elements such as lenses and filters. These advantages have facilitated their rapid commercial deployment. Recent advancements in nanofabrication have enabled the reduction of optical metasurface dimensions to the nanometer scale, expanding their capabilities to cover visible wavelengths. However, the pursuit of large-scale manufacturing of metasurfaces with customizable functions presents challenges in controlling the dimensions and composition of the constituent dielectric materials. To address these challenges, the combination of block copolymer (BCP) self-assembly and sequential infiltration synthesis (SIS), offers an alternative for fabrication of high-resolution dielectric nanostructures with tailored composition and optical functionalities. However, the absence of metrological techniques capable of providing precise and reliable characterization of the refractive index of dielectric nanostructures persists. This study introduces a hybrid metrology strategy that integrates complementary synchrotron-based traceable X-ray techniques to achieve comprehensive material characterization for the determination of the refractive index on the nanoscale. To establish correlations between material functionality and their underlying chemical, compositional and dimensional properties, TiO2 nanostructures model systems were fabricated by SIS of BCPs. The results from synchrotron-based analyses were integrated into physical models, serving as a validation scheme for laboratory-scale measurements to determine effective refractive indices of the nanoscale dielectric materials.
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Affiliation(s)
- Irdi Murataj
- Advanced
Materials and Life Science Division, Istituto
Nazionale Ricerca Metrologica (INRiM), Strada delle Cacce 91, 10135, Torino, Italy
- Dipartimento
di Scienza Applicata e Tecnologia, Politecnico
di Torino, Corso Duca degli Abruzzi, 24, 10129, Torino, Italy
| | - Angelo Angelini
- Advanced
Materials and Life Science Division, Istituto
Nazionale Ricerca Metrologica (INRiM), Strada delle Cacce 91, 10135, Torino, Italy
| | - Eleonora Cara
- Advanced
Materials and Life Science Division, Istituto
Nazionale Ricerca Metrologica (INRiM), Strada delle Cacce 91, 10135, Torino, Italy
| | - Samuele Porro
- Dipartimento
di Scienza Applicata e Tecnologia, Politecnico
di Torino, Corso Duca degli Abruzzi, 24, 10129, Torino, Italy
| | - Burkhard Beckhoff
- Physikalisch-Technische
Bundesanstalt (PTB), Abbestraße 2-12, 10587, Berlin, Germany
| | - Yves Kayser
- Physikalisch-Technische
Bundesanstalt (PTB), Abbestraße 2-12, 10587, Berlin, Germany
| | - Philipp Hönicke
- Physikalisch-Technische
Bundesanstalt (PTB), Abbestraße 2-12, 10587, Berlin, Germany
| | - Richard Ciesielski
- Physikalisch-Technische
Bundesanstalt (PTB), Abbestraße 2-12, 10587, Berlin, Germany
| | - Christian Gollwitzer
- Physikalisch-Technische
Bundesanstalt (PTB), Abbestraße 2-12, 10587, Berlin, Germany
| | - Victor Soltwisch
- Physikalisch-Technische
Bundesanstalt (PTB), Abbestraße 2-12, 10587, Berlin, Germany
| | | | | | - Stefano Carignano
- ICCUB, Universitat de Barcelona, Carrer Martí i Franquès,
1, 08028, Barcelona, Spain
| | - Luca Boarino
- Advanced
Materials and Life Science Division, Istituto
Nazionale Ricerca Metrologica (INRiM), Strada delle Cacce 91, 10135, Torino, Italy
| | - Micaela Castellino
- Dipartimento
di Scienza Applicata e Tecnologia, Politecnico
di Torino, Corso Duca degli Abruzzi, 24, 10129, Torino, Italy
| | - Federico Ferrarese Lupi
- Advanced
Materials and Life Science Division, Istituto
Nazionale Ricerca Metrologica (INRiM), Strada delle Cacce 91, 10135, Torino, Italy
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4
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Kuschlan S, Chiarcos R, Laus M, Pérez-Murano F, Llobet J, Fernandez-Regulez M, Bonafos C, Perego M, Seguini G, De Michielis M, Tallarida G. Periodic Arrays of Dopants in Silicon by Ultralow Energy Implantation of Phosphorus Ions through a Block Copolymer Thin Film. ACS APPLIED MATERIALS & INTERFACES 2023; 15:57928-57940. [PMID: 37314734 PMCID: PMC10739587 DOI: 10.1021/acsami.3c03782] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/15/2023] [Accepted: 05/30/2023] [Indexed: 06/15/2023]
Abstract
In this work, block copolymer lithography and ultralow energy ion implantation are combined to obtain nanovolumes with high concentrations of phosphorus atoms periodically disposed over a macroscopic area in a p-type silicon substrate. The high dose of implanted dopants grants a local amorphization of the silicon substrate. In this condition, phosphorus is activated by solid phase epitaxial regrowth (SPER) of the implanted region with a relatively low temperature thermal treatment preventing diffusion of phosphorus atoms and preserving their spatial localization. Surface morphology of the sample (AFM, SEM), crystallinity of the silicon substrate (UV Raman), and position of the phosphorus atoms (STEM- EDX, ToF-SIMS) are monitored during the process. Electrostatic potential (KPFM) and the conductivity (C-AFM) maps of the sample surface upon dopant activation are compatible with simulated I-V characteristics, suggesting the presence of an array of not ideal but working p-n nanojunctions. The proposed approach paves the way for further investigations on the possibility to modulate the dopant distribution within a silicon substrate at the nanoscale by changing the characteristic dimension of the self-assembled BCP film.
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Affiliation(s)
- Stefano Kuschlan
- CNR-IMM,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
- Università
del Piemonte Orientale ‘‘A. Avogadro’’, Viale T. Michel 11, Alessandria I-15121, Italy
| | - Riccardo Chiarcos
- Università
del Piemonte Orientale ‘‘A. Avogadro’’, Viale T. Michel 11, Alessandria I-15121, Italy
| | - Michele Laus
- Università
del Piemonte Orientale ‘‘A. Avogadro’’, Viale T. Michel 11, Alessandria I-15121, Italy
| | | | - Jordi Llobet
- Institute
of Microelectronics of Barcelona (IMB-CNM, CSIC), Bellaterra 08193, Spain
| | | | - Caroline Bonafos
- CEMES-CNRS,
Université de Toulouse, CNRS, Toulouse 31055, France
| | - Michele Perego
- CNR-IMM,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | - Gabriele Seguini
- CNR-IMM,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | - Marco De Michielis
- CNR-IMM,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | - Graziella Tallarida
- CNR-IMM,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
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5
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Droumaguet BL, Grande D. Diblock and Triblock Copolymers as Nanostructured Precursors to Functional Nanoporous Materials: From Design to Application. ACS APPLIED MATERIALS & INTERFACES 2023; 15:58023-58040. [PMID: 37906520 DOI: 10.1021/acsami.3c09859] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/02/2023]
Abstract
Block copolymers have gained tremendous interest from the scientific community in the last two decades. These macromolecular architectures indeed constitute ideal nanostructured precursors for the generation of nanoporous materials meant for various high added value applications. The parallel emergence of controlled polymerization techniques has notably enabled to finely control their molecular features to confer them with unique structural and physicochemical properties, such as low dispersity values (Đ), well-defined volume fractions, and controlled functionality. The nanostructuration and ordering of diblock or triblock copolymers, which can be achieved through various experimental techniques, including channel die processing, solvent vapor or thermal annealing, nonsolvent-induced phase separation or concomitant self-assembly, and nonsolvent-induced phase separation, allows for the preparation of orientated microphase-separated copolymers whose morphology is dictated by three main factors, i.e., Flory-Huggins interaction parameter between constitutive blocks, volume fraction of the blocks, and polymerization degree. This review article provides an overview of the actual state of the art regarding the preparation of functional nanoporous materials from either diblock or triblock copolymers. It will also highlight the major applications of such peculiar materials.
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Affiliation(s)
- Benjamin Le Droumaguet
- Univ Paris Est Creteil, CNRS, Institut de Chimie et des Matériaux Paris-Est (ICMPE), UMR 7182, 2 rue Henri Dunant, Thiais 94320, France
| | - Daniel Grande
- Univ Paris Est Creteil, CNRS, Institut de Chimie et des Matériaux Paris-Est (ICMPE), UMR 7182, 2 rue Henri Dunant, Thiais 94320, France
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6
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Lee TL, Lin JW, Ho RM. Controlled Self-Assembly of Polystyrene- block-Polydimethylsiloxane for Fabrication of Nanonetwork Silica Monoliths. ACS APPLIED MATERIALS & INTERFACES 2022; 14:54194-54202. [PMID: 36404593 DOI: 10.1021/acsami.2c15078] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Herein, this work aims to carry out controlled self-assembly of single-composition block copolymer for the fabrication of various nanonetwork silica monoliths. With the use of lamellae-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS), nanonetwork-structured films could be fabricated by solvent annealing using a PS-selective solvent (chloroform). By simply tuning the flow rate of nitrogen purge to the PS-selective solvent for the controlled self-assembly of the PS-b-PDMS, gyroid- and diamond-structured monoliths can be formed due to the difference in the effective volume of PS in the PS-b-PDMS during solvent annealing. As a result, well-ordered nanonetwork SiO2 (silica) monoliths can be fabricated by templated sol-gel reaction using hydrofluoric acid etched PS-b-PDMS film as a template followed by the removal of the PS. This bottom-up approach for the fabrication of nanonetwork materials through templated synthesis is appealing to create nanonetwork materials for various applications.
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Affiliation(s)
- Tsung-Lun Lee
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu30013, Taiwan
| | - Jheng-Wei Lin
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu30013, Taiwan
| | - Rong-Ming Ho
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu30013, Taiwan
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7
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Liquid Phase Infiltration of Block Copolymers. Polymers (Basel) 2022; 14:polym14204317. [PMID: 36297895 PMCID: PMC9612101 DOI: 10.3390/polym14204317] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/23/2022] [Revised: 10/10/2022] [Accepted: 10/11/2022] [Indexed: 11/11/2022] Open
Abstract
Novel materials with defined composition and structures at the nanoscale are increasingly desired in several research fields spanning a wide range of applications. The development of new approaches of synthesis that provide such control is therefore required in order to relate the material properties to its functionalities. Self-assembling materials such as block copolymers (BCPs), in combination with liquid phase infiltration (LPI) processes, represent an ideal strategy for the synthesis of inorganic materials into even more complex and functional features. This review provides an overview of the mechanism involved in the LPI, outlining the role of the different polymer infiltration parameters on the resulting material properties. We report newly developed methodologies that extend the LPI to the realisation of multicomponent and 3D inorganic nanostructures. Finally, the recently reported implementation of LPI into different applications such as photonics, plasmonics and electronics are highlighted.
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8
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Seguini G, Motta A, Bigatti M, Caligiore FE, Rademaker G, Gharbi A, Tiron R, Tallarida G, Perego M, Cianci E. Al 2O 3 Dot and Antidot Array Synthesis in Hexagonally Packed Poly(styrene- block-methyl methacrylate) Nanometer-Thick Films for Nanostructure Fabrication. ACS APPLIED NANO MATERIALS 2022; 5:9818-9828. [PMID: 35937588 PMCID: PMC9344376 DOI: 10.1021/acsanm.2c02013] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/12/2023]
Abstract
Nanostructured organic templates originating from self-assembled block copolymers (BCPs) can be converted into inorganic nanostructures by sequential infiltration synthesis (SIS). This capability is particularly relevant within the framework of advanced lithographic applications because of the exploitation of the BCP-based nanostructures as hard masks. In this work, Al2O3 dot and antidot arrays were synthesized by sequential infiltration of trimethylaluminum and water precursors into perpendicularly oriented cylinder-forming poly(styrene-block-methyl methacrylate) (PS-b-PMMA) BCP thin films. The mechanism governing the effective incorporation of Al2O3 into the PMMA component of the BCP thin films was investigated evaluating the evolution of the lateral and vertical dimensions of Al2O3 dot and antidot arrays as a function of the SIS cycle number. The not-reactive PS component and the PS/PMMA interface in self-assembled PS-b-PMMA thin films result in additional paths for diffusion and supplementary surfaces for sorption of precursor molecules, respectively. Thus, the mass uptake of Al2O3 into the PMMA block of self-assembled PS-b-PMMA thin films is higher than that in pure PMMA thin films.
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Affiliation(s)
- Gabriele Seguini
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | - Alessia Motta
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | - Marco Bigatti
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | | | | | - Ahmed Gharbi
- Univ.
Grenoble Alpes, CEA, Leti, Grenoble F-38000, France
| | - Raluca Tiron
- Univ.
Grenoble Alpes, CEA, Leti, Grenoble F-38000, France
| | - Graziella Tallarida
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | - Michele Perego
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | - Elena Cianci
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
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9
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Hong JW, Chang JH, Hung HH, Liao YP, Jian YQ, Chang ICY, Huang TY, Nelson A, Lin IM, Chiang YW, Sun YS. Chain Length Effects of Added Homopolymers on the Phase Behavior in Blend Films of a Symmetric, Weakly Segregated Polystyrene- block-poly(methyl methacrylate). Macromolecules 2022. [DOI: 10.1021/acs.macromol.1c02167] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Jia-Wen Hong
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Jung-Hong Chang
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Hsiang-Ho Hung
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Yin-Ping Liao
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Yi-Qing Jian
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Iris Ching-Ya Chang
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Tzu-Yen Huang
- National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
| | - Andrew Nelson
- Australian Nuclear Science and Technology Organisation, Locked Bag 2001, Kirrawee DC, NSW 2232, Australia
| | - I-Ming Lin
- Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
| | - Yeo-Wan Chiang
- Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
| | - Ya-Sen Sun
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
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10
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Hong JW, Chang JH, Chang ICY, Sun YS. Phase behavior in thin films of weakly segregated block copolymer/homopolymer blends. SOFT MATTER 2021; 17:9189-9197. [PMID: 34586138 DOI: 10.1039/d1sm01005k] [Citation(s) in RCA: 7] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
We have demonstrated the phase behavior of substrate-supported films of a symmetric weakly segregated polystyrene-block-poly (methyl methacrylate), P(S-b-MMA), block copolymer and its blends with homopolymer polystyrene (PS) at different compositions. Upon increasing the content of added PS in the blends, lamellae (L), perforated layers (PL), double gyroid (DG) and cylinders (C) are obtained in sequence for films. Among these nanodomains, PL and DG only exist in a narrow ϕPS region (ϕPS denotes the volume fraction of PS). At ϕPS = 64%, tuning film thickness and annealing temperature can produce parallel PL or DG with {121}DG lattice planes being parallel to the substrate surface. The effects of annealing temperature and film thickness on the formation of PL and DG are examined. In thin films with n ≈ 3 (n denotes the ratio of initial film thickness to inter-domain spacing), the PL phase solely exists regardless of temperature. However, for thick films with n ≈ 6 and 10, thermal annealing at the most accessible temperature produces films containing both PL and DG of various fractions, but a low temperature tends to favor a greater fraction of PL. The PL phase becomes the only discernible phase if thick films are shortly annealed at 230 °C.
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Affiliation(s)
- Jia-Wen Hong
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan.
| | - Jung-Hong Chang
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan.
| | - Iris Ching-Ya Chang
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan.
| | - Ya-Sen Sun
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan.
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11
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Chen YF, Hong JW, Chang JH, Junisu BA, Sun YS. Influence of Osmotic Pressure on Nanostructures in Thin Films of a Weakly-Segregated Block Copolymer and Its Blends with a Homopolymer. Polymers (Basel) 2021; 13:polym13152480. [PMID: 34372083 PMCID: PMC8348333 DOI: 10.3390/polym13152480] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/24/2021] [Revised: 07/17/2021] [Accepted: 07/21/2021] [Indexed: 11/16/2022] Open
Abstract
We studied the influence of osmotic pressure on nanostructures in thin films of a symmetric weakly-segregated polystyrene-block-poly (methyl methacrylate), P(S-b-MMA), block copolymer and its mixtures with a polystyrene (PS) homopolymer of various compositions. Thin films were deposited on substrates through surface neutralization. The surface neutralization results from the PS mats, which were oxidized and cross-linked by UV-light exposure. Thus, thermal annealing produced perpendicularly oriented lamellae and perforated layers, depending on the content of added PS chains. Nevertheless, a mixed orientation was obtained from cylinders in thin films, where a high content of PS was blended with the P(S-b-MMA). A combination of UV-light exposure and acetic acid rinsing was used to remove the PMMA block. Interestingly, the treatment of PMMA removal inevitably produced osmotic pressure and consequently resulted in surface wrinkling of perpendicular lamellae. As a result, a hierarchical structure with two periodicities was obtained for wrinkled films with perpendicular lamellae. The formation of surface wrinkling is due to the interplay between UV-light exposure and acetic acid rinsing. UV-light exposure resulted in different mechanical properties between the skin and the inner region of a film. Acetic acid rinsing produced osmotic pressure. It was found that surface wrinkling could be suppressed by reducing film thickness, increasing PS content and using high-molecular-weight P(S-b-MMA) BCPs.
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12
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Recent Advances in Sequential Infiltration Synthesis (SIS) of Block Copolymers (BCPs). NANOMATERIALS 2021; 11:nano11040994. [PMID: 33924480 PMCID: PMC8069880 DOI: 10.3390/nano11040994] [Citation(s) in RCA: 10] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 03/08/2021] [Revised: 04/01/2021] [Accepted: 04/04/2021] [Indexed: 12/15/2022]
Abstract
In the continuous downscaling of device features, the microelectronics industry is facing the intrinsic limits of conventional lithographic techniques. The development of new synthetic approaches for large-scale nanopatterned materials with enhanced performances is therefore required in the pursuit of the fabrication of next-generation devices. Self-assembled materials as block copolymers (BCPs) provide great control on the definition of nanopatterns, promising to be ideal candidates as templates for the selective incorporation of a variety of inorganic materials when combined with sequential infiltration synthesis (SIS). In this review, we report the latest advances in nanostructured inorganic materials synthesized by infiltration of self-assembled BCPs. We report a comprehensive description of the chemical and physical characterization techniques used for in situ studies of the process mechanism and ex situ measurements of the resulting properties of infiltrated polymers. Finally, emerging optical and electrical properties of such materials are discussed.
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13
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Handrea-Dragan M, Botiz I. Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials. Polymers (Basel) 2021; 13:445. [PMID: 33573248 PMCID: PMC7866561 DOI: 10.3390/polym13030445] [Citation(s) in RCA: 10] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/16/2021] [Revised: 01/25/2021] [Accepted: 01/26/2021] [Indexed: 12/20/2022] Open
Abstract
There is an astonishing number of optoelectronic, photonic, biological, sensing, or storage media devices, just to name a few, that rely on a variety of extraordinary periodic surface relief miniaturized patterns fabricated on polymer-covered rigid or flexible substrates. Even more extraordinary is that these surface relief patterns can be further filled, in a more or less ordered fashion, with various functional nanomaterials and thus can lead to the realization of more complex structured architectures. These architectures can serve as multifunctional platforms for the design and the development of a multitude of novel, better performing nanotechnological applications. In this work, we aim to provide an extensive overview on how multifunctional structured platforms can be fabricated by outlining not only the main polymer patterning methodologies but also by emphasizing various deposition methods that can guide different structures of functional nanomaterials into periodic surface relief patterns. Our aim is to provide the readers with a toolbox of the most suitable patterning and deposition methodologies that could be easily identified and further combined when the fabrication of novel structured platforms exhibiting interesting properties is targeted.
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Affiliation(s)
- Madalina Handrea-Dragan
- Interdisciplinary Research Institute in Bio-Nano-Sciences, Babes-Bolyai University, 42 Treboniu Laurian Str. 400271 Cluj-Napoca, Romania;
- Faculty of Physics, Babes-Bolyai University, 1 M. Kogalniceanu Str. 400084 Cluj-Napoca, Romania
| | - Ioan Botiz
- Interdisciplinary Research Institute in Bio-Nano-Sciences, Babes-Bolyai University, 42 Treboniu Laurian Str. 400271 Cluj-Napoca, Romania;
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14
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Dispersity effects on phase behavior and structural evolution in ultrathin films of a deuterated polystyrene-block-poly(methyl methacrylate) diblock copolymer. POLYMER 2020. [DOI: 10.1016/j.polymer.2020.123027] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/18/2022]
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15
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Chervanyov AI. Conductivity of Insulating Diblock Copolymer System Filled with Conductive Particles Having Different Affinities for Dissimilar Copolymer Blocks. Polymers (Basel) 2020; 12:polym12081659. [PMID: 32722506 PMCID: PMC7466120 DOI: 10.3390/polym12081659] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/18/2020] [Revised: 07/21/2020] [Accepted: 07/21/2020] [Indexed: 11/16/2022] Open
Abstract
We investigate the electrical response of the insulating diblock copolymer system (DBC) filled with conductive spherical fillers depending on the affinities of these fillers for copolymer blocks and the interaction between fillers. We demonstrate that the contrast (difference) between the affinities of the fillers for dissimilar copolymer blocks is a decisive factor that determines the distribution of these fillers in the DBC system. The distribution of filler particles, in turn, is found to be directly related to the electrical response of the DBC-particle composite. In particular, increasing the affinity contrast above a certain threshold value results in the insulator-conductor transition. This transition is found to be caused by the preferential localization of the fillers in the microphases of the DBC system having larger affinity for these fillers. The effect of the interaction between fillers is found to be secondary to the described effect of the affinity contrast that dominates in determining the distribution of fillers in the composite. This effect of the inter-particle interactions is shown to be significant only when the affinity contrast and filler volume fraction are sufficiently large.
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Affiliation(s)
- A I Chervanyov
- Institut für Theoretische Physik, Westfälische Wilhelms-Universität Münster, Wilhelm-Klemm-Strasse 9, 48149 Münster, Germany
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16
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Seguini G, Zanenga F, Cannetti G, Perego M. Thermodynamics and ordering kinetics in asymmetric PS-b-PMMA block copolymer thin films. SOFT MATTER 2020; 16:5525-5533. [PMID: 32500912 DOI: 10.1039/d0sm00441c] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]
Abstract
The ordering kinetics of standing cylinder-forming polystyrene-block-poly(methyl methacrylate) block copolymers (molecular weight: 39 kg mol-1) close to the order-disorder transition is experimentally investigated following the temporal evolution of the correlation length at different annealing temperatures. The growth exponent of the grain-coarsening process is determined to be 1/2, signature of a curvature-driven ordering mechanism. The measured activation enthalpy and the resulting Meyer-Neldel temperature for this specific copolymer along with the data already known for PS-b-PMMA block copolymers in strong segregation limit allow investigation of the interplay between the ordering kinetics and the thermodynamic driving force during the grain coarsening. These findings unveil various phenomena concomitantly occurring during the thermally activated ordering kinetics at segmental, single chain, and collective levels.
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Affiliation(s)
- Gabriele Seguini
- IMM-CNR, Unit of Agrate Brianza, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy.
| | - Fabio Zanenga
- IMM-CNR, Unit of Agrate Brianza, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy.
| | - Gianluca Cannetti
- IMM-CNR, Unit of Agrate Brianza, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy.
| | - Michele Perego
- IMM-CNR, Unit of Agrate Brianza, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy.
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17
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Leniart A, Pula P, Sitkiewicz A, Majewski PW. Macroscopic Alignment of Block Copolymers on Silicon Substrates by Laser Annealing. ACS NANO 2020; 14:4805-4815. [PMID: 32159943 PMCID: PMC7497666 DOI: 10.1021/acsnano.0c00696] [Citation(s) in RCA: 23] [Impact Index Per Article: 5.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/24/2020] [Accepted: 03/11/2020] [Indexed: 05/07/2023]
Abstract
Laser annealing is a competitive alternative to conventional oven annealing of block copolymer (BCP) thin films enabling rapid acceleration and precise spatial control of the self-assembly process. Localized heating by a moving laser beam (zone annealing), taking advantage of steep temperature gradients, can additionally yield aligned morphologies. In its original implementation it was limited to specialized germanium-coated glass substrates, which absorb visible light and exhibit low-enough thermal conductivity to facilitate heating at relatively low irradiation power density. Here, we demonstrate a recent advance in laser zone annealing, which utilizes a powerful fiber-coupled near-IR laser source allowing rapid BCP annealing over a large area on conventional silicon wafers. The annealing coupled with photothermal shearing yields macroscopically aligned BCP films, which are used as templates for patterning metallic nanowires. We also report a facile method of transferring laser-annealed BCP films onto arbitrary surfaces. The transfer process allows patterning substrates with a highly corrugated surface and single-step rapid fabrication of multilayered nanomaterials with complex morphologies.
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Affiliation(s)
| | - Przemyslaw Pula
- Department
of Chemistry, University of Warsaw, Warsaw, 02089, Poland
| | | | - Pawel W. Majewski
- Department
of Chemistry, University of Warsaw, Warsaw, 02089, Poland
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18
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Yang WC, Wu SH, Chen YF, Nelson A, Wu CM, Sun YS. Effects of the Density of Chemical Cross-links and Physical Entanglements of Ultraviolet-Irradiated Polystyrene Chains on Domain Orientation and Spatial Order of Polystyrene- block-Poly(methyl methacrylate) Nano-Domains. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2019; 35:14017-14030. [PMID: 31577149 DOI: 10.1021/acs.langmuir.9b02054] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Ultraviolet irradiation (UVI) of varied duration caused cross-linking and neutralization of polystyrene (PS) homopolymers of molar mass (Mn) from 6 to 290 kg mol-1 on a silicon-oxide surface. An optimal neutral skin layer on the surface of the PS was obtained via brief UVI in air (UVIA), by which the PS had no preferential interaction with either block in the copolymer. UVI in an inert environment (gaseous dinitrogen) (UVIN) stabilized the PS layers via cross-linking and enabled the PS networks to have an effective adhesive contact with the underlying substrate. Thorough examination of domain orientations and spatial orders of a series of block copolymer, polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA), thin films deposited on these UVI-treated PS support layers yielded clear evidence that a dense layer of neutralized PS chains was required for the perpendicular orientation of PS-b-PMMA nanodomains. In particular, in addition to neutralization, two factors-the densities of physical entanglements and of chemical crosslinks-both in UVI-treated PS should be considered for the perpendicular orientation of nanolamellae and nanocylinders in symmetric and asymmetric PS-b-PMMA thin films. The density of physical entanglement in PS depends intrinsically on Mn of the PS, whereas the density of chemical cross-links was controlled with a varied duration of UVIN. Sufficiently large densities of physical entanglements and chemical cross-links can prevent PS-b-PMMA chains from penetrating through the neutral skin layer. The total density of physical entanglements and chemical cross-links required for the perpendicular orientation is correlated with the dimensions of the PS-b-PMMA chains.
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Affiliation(s)
- Wei-Chen Yang
- Department of Chemical and Materials Engineering , National Central University , No. 300, Zhongda Rd. , Zhongli District, Taoyuan City 32001 , Taiwan
| | - Song-Hao Wu
- Department of Chemical and Materials Engineering , National Central University , No. 300, Zhongda Rd. , Zhongli District, Taoyuan City 32001 , Taiwan
| | - Yi-Fang Chen
- Department of Chemical and Materials Engineering , National Central University , No. 300, Zhongda Rd. , Zhongli District, Taoyuan City 32001 , Taiwan
| | - Andrew Nelson
- Australian Nuclear Science and Technology Organisation , Locked Bag 2001 , Kirrawee DC , New South Wales 2232 , Australia
| | - Chun-Ming Wu
- National Synchrotron Radiation Research Center , 101 Hsin-Ann Road, Hsinchu Science Park , Hsinchu 30076 , Taiwan
| | - Ya-Sen Sun
- Department of Chemical and Materials Engineering , National Central University , No. 300, Zhongda Rd. , Zhongli District, Taoyuan City 32001 , Taiwan
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19
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Liu K, Yang CM, Yang BM, Zhang L, Huang WC, Ouyang XP, Qi FG, Zhao N, Bian FG. Directed Self-assembly of Vertical PS-b-PMMA Nanodomains Grown on Multilayered Polyelectrolyte Films. CHINESE JOURNAL OF POLYMER SCIENCE 2019. [DOI: 10.1007/s10118-019-2315-z] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
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20
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Mixed morphology in low molar mass fluorinated block copolymers. POLYMER 2019. [DOI: 10.1016/j.polymer.2019.121657] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
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21
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Coarse-Grained Modelling and Temperature Effect on the Morphology of PS- b-PI Copolymer. Polymers (Basel) 2019; 11:polym11061008. [PMID: 31174400 PMCID: PMC6630459 DOI: 10.3390/polym11061008] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/17/2019] [Revised: 05/31/2019] [Accepted: 06/05/2019] [Indexed: 11/16/2022] Open
Abstract
Spontaneous spatial organization behavior and the aggregate morphology of polystyrene-block-polyisoprene (PS-b-PI) copolymer were investigated. Molecular dynamic (MD) and mesoscopic simulations using the dynamic of mean field density functional theory (DDF) were adopted to investigate the morphology changes exhibited by this block copolymer (BCP). In the mesoscopic simulations, several atoms in repeating units were grouped together into a bead representing styrene or isoprene segments as a coarse-grained model. Inter-bead interactions and essential parameters for mesoscopic models were optimized from MD simulations. Study indicated that morphology alternations can be induced in this system at annealing temperature of 393, 493, and 533 K. From our simulations, lamellar, bicontinuous, and hexagonally packed cylindrical equilibrium morphologies were achieved. Our simulated morphologies agree well with the reported experimental evidence at the selected temperature. The process of aggregate formation and morphology evolution were concretely clarified.
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22
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Brassat K, Kool D, Lindner JKN. Modification of block copolymer lithography masks by O 2/Ar plasma treatment: insights from lift-off experiments, nanopore etching and free membranes. NANOTECHNOLOGY 2019; 30:225302. [PMID: 30759427 DOI: 10.1088/1361-6528/ab06dd] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/23/2023]
Abstract
Block copolymer lithography allows for the large-area patterning of surfaces with self-assembled nanoscale features. The created nanostructured polymer films can be applied as masks in common lithography processing steps, such as lift-off and etching for pattern replication and transfer. In this work, we discuss an approach to improve the pattern replication efficiency by modification of the polymer mask prior to lithographical use by means of an O2/Ar plasma treatment. We present a much better quality of pattern replication without loss of features, along with a precise tunability of feature sizes, that can be achieved by short mask treatment. We point out a correlation between nanopore position within the ordered arrays, expressed by its coordination number, the nanopore shape and the replication efficiency. Our experimental strategy to explain these correlations combines the indirect investigation of patterns replicated from the modified polymer masks and direct investigation of the mask top and bottom. Pattern replication is performed either in the form of gold nanodot arrays created via lift-off or nanopores transferred into a SiO2 substrate by reactive ion etching. The direct analysis of free polymer membranes released from the substrate reveals the nanopore shape at the mask top and bottom surfaces.
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Affiliation(s)
- Katharina Brassat
- 'Nanostructuring, Nanoanalysis and Photonic Materials' group, Department of Physics, Paderborn University, D-33098 Paderborn, Germany. Center for Optoelectronics and Photonics Paderborn (CeOPP), Paderborn, Germany
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23
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Brassat K, Kool D, Bürger J, Lindner JKN. Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography. NANOSCALE 2018; 10:10005-10017. [PMID: 29774901 DOI: 10.1039/c8nr01397g] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/08/2023]
Abstract
Bottom-up patterning techniques allow for the creation of surfaces with ordered arrays of nanoscale features on large areas. Two bottom-up techniques suitable for the formation of regular nanopatterns on different length scales are nanosphere lithography (NSL) and block copolymer (BCP) lithography. In this paper it is shown that NSL and BCP lithography can be combined to easily design hierarchically nanopatterned surfaces of different materials. Nanosphere lithography is used for the pre-patterning of surfaces with antidots, i.e. hexagonally arranged cylindrical holes in thin films of Au, Pt and TiO2 on SiO2, providing a periodic chemical and topographical contrast on the surface suitable for templating in subsequent BCP lithography. PS-b-PMMA BCP is used in the second self-assembly step to form hexagonally arranged nanopores with sub-20 nm diameter within the antidots upon microphase separation. To achieve this the microphase separation of BCP on planar surfaces is studied, too, and it is demonstrated for the first time that vertical BCP nanopores can be formed on TiO2, Au and Pt films without using any neutralization layers. To explain this the influence of surface energy, polarity and roughness on the microphase separation is investigated and discussed along with the wetting state of BCP on NSL-pre-patterned surfaces. The presented novel route for the creation of advanced hierarchical nanopatterns is easily applicable on large-area surfaces of different materials. This flexibility makes it suitable for a broad range of applications, from the morphological design of biocompatible surfaces for life science to complex pre-patterns for nanoparticle placement in semiconductor technology.
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Affiliation(s)
- Katharina Brassat
- Dept. of Physics, Paderborn University, Warburgerstr. 100, 33098 Paderborn, Germany.
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24
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Barrera G, Celegato F, Coïsson M, Manzin A, Ferrarese Lupi F, Seguini G, Boarino L, Aprile G, Perego M, Tiberto P. Magnetization switching in high-density magnetic nanodots by a fine-tune sputtering process on a large-area diblock copolymer mask. NANOSCALE 2017; 9:16981-16992. [PMID: 29077107 DOI: 10.1039/c7nr04295g] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
Ordered magnetic nanodot arrays with extremely high density provide unique properties to the growing field of nanotechnology. To overcome the size limitations of conventional lithography, a fine-tuned sputtering deposition process on mesoporous polymeric template fabricated by diblock copolymer self-assembly is herein proposed to fabricate uniform and densely spaced nanometer-scale magnetic dot arrays. This process was successfully exploited to pattern, over a large area, sputtered Ni80Fe20 and Co thin films with thicknesses of 10 and 13 nm, respectively. Carefully tuned sputter-etching at a suitable glancing angle was performed to selectively remove the magnetic material deposited on top of the polymeric template, producing nanodot arrays (dot diameter about 17 nm). A detailed study of magnetization reversal at room temperature as a function of sputter-etching time, together with morphology investigations, was performed to confirm the synthesis of long-range ordered arrays displaying functional magnetic properties. Magnetic hysteresis loops of the obtained nanodot arrays were measured at different temperatures and interpreted via micromagnetic simulations to explore the role of dipole-dipole magnetostatic interactions between dots and the effect of magnetocrystalline anisotropy. The agreement between measurements and numerical modelling results indicates the use of the proposed synthesis technique as an innovative process in the design of large-area nanoscale arrays of functional magnetic elements.
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Affiliation(s)
- G Barrera
- INRiM, Divisione Nanoscienze e materiali, Strada delle Cacce 91, 10135 Torino, Italy.
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25
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Dialameh M, Lupi FF, Imbraguglio D, Zanenga F, Lamperti A, Martella D, Seguini G, Perego M, Rossi AM, De Leo N, Boarino L. Influence of block copolymer feature size on reactive ion etching pattern transfer into silicon. NANOTECHNOLOGY 2017; 28:404001. [PMID: 28729521 DOI: 10.1088/1361-6528/aa8144] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
A successful realisation of sub-20 nm features on silicon (Si) is becoming the focus of many technological studies, strongly influencing the future performance of modern integrated circuits. Although reactive ion etching (RIE), at both micrometric and nanometric scale has already been the target of many studies, a better understanding of the different mechanisms involved at sub-20 nm size etching is still required. In this work, we investigated the influence of the feature size on the etch rate of Si, performed by a cryogenic RIE process through cylinder-forming polystyrene-block-polymethylmethacrylate (PS-b-PMMA) diblock copolymer (DBC) masks with diameter ranging between 19-13 nm. A sensible decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. For all the DBCs under investigation, we determined the process window useful for the correct transfer of the nanometric cylindrical pattern into a Si substrate. A structural and physicochemical investigation of the resulting nanostructured Si is reported in order to delineate the influence of various RIE pattern effects. Feature-size-dependent etch, or RIE-lag, is proved to significantly affect the obtained results.
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Affiliation(s)
- M Dialameh
- Istituto Nazionale di Ricerca Metrologia (INRIM), Strada delle Cacce 91, 10135 Turin, Italy. Politecnico di Torino, Corso Duca degli Abruzzi, 24, 10129, Turin, Italy
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26
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A versatile nanoarray electrode produced from block copolymer thin films for specific detection of proteins. POLYMER 2017. [DOI: 10.1016/j.polymer.2017.07.015] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/20/2022]
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27
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Lee W, Park S, Kim Y, Sethuraman V, Rebello N, Ganesan V, Ryu DY. Effect of Grafting Density of Random Copolymer Brushes on Perpendicular Alignment in PS-b-PMMA Thin Films. Macromolecules 2017. [DOI: 10.1021/acs.macromol.7b00133] [Citation(s) in RCA: 23] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/28/2023]
Affiliation(s)
- Wooseop Lee
- Department
of Chemical and Biomolecular Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Korea
| | - Sungmin Park
- Department
of Chemical and Biomolecular Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Korea
| | - Yeongsik Kim
- Department
of Chemical and Biomolecular Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Korea
| | - Vaidyanathan Sethuraman
- Department
of Chemical Engineering, University of Texas at Austin, Austin, Texas 78712, United States
| | - Nathan Rebello
- Department
of Chemical Engineering, University of Texas at Austin, Austin, Texas 78712, United States
| | - Venkat Ganesan
- Department
of Chemical Engineering, University of Texas at Austin, Austin, Texas 78712, United States
| | - Du Yeol Ryu
- Department
of Chemical and Biomolecular Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Korea
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28
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Aprile G, Ferrarese Lupi F, Fretto M, Enrico E, De Leo N, Boarino L, Volpe FG, Seguini G, Sparnacci K, Gianotti V, Laus M, Garnæs J, Perego M. Toward Lateral Length Standards at the Nanoscale Based on Diblock Copolymers. ACS APPLIED MATERIALS & INTERFACES 2017; 9:15685-15697. [PMID: 28397488 DOI: 10.1021/acsami.7b00509] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
The self-assembly (SA) of diblock copolymers (DBCs) based on phase separation into different morphologies of small and high-density features is widely investigated as a patterning and nanofabrication technique. The integration of conventional top-down approaches with the bottom-up SA of DBCs enables the possibility to address the gap in nanostructured lateral length standards for nanometrology, consequently supporting miniaturization processes in device fabrication. On this topic, we studied the pattern characteristic dimensions (i.e., center-to-center distance L0 and diameter D) of a cylinder-forming polystyrene-b-poly( methyl methacrylate) PS-b-PMMA (54 kg mol-1, styrene fraction 70%) DBC when confined within periodic SiO2 trenches of different widths (W, ranging between 75 and 600 nm) and fixed length (l, 5.7 μm). The characteristic dimensions of the PMMA cylinder structure in the confined configurations were compared with those obtained on a flat surface (L0 = 27.8 ± 0.5 nm, D = 13.0 ± 1.0 nm). The analysis of D as a function of W evolution indicates that the eccentricity of the PMMA cylinders decreases as a result of the deformation of the cylinder in the direction perpendicular to the trenches. The center-to-center distance in the direction parallel to the long side of the trenches (L0l) is equal to L0 measured on the flat surface, whereas the one along the short side (L0w) is subjected to an appreciable variation (ΔL0w = 5 nm) depending on W. The possibility of finely tuning L0w maintaining constant L0l paves the way to the realization of a DBC-based transfer standard for lateral length calibration with periods in the critical range between 20 and 50 nm wherein no commercial transfer standards are available. A prototype transfer standard with cylindrical holes was used to calibrate the linear correction factor c(Δx')xx' of an atomic force microscope for a scan length of Δx' = 1 μm. The relative standard uncertainty of the correction factor was only 1.3%, and the second-order nonlinear correction was found to be significant.
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Affiliation(s)
- Giulia Aprile
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
- Dipartimento di Scienze e Innovazione Tecnologica (DIST), Università del Piemonte Orientale "A. Avogadro", INSTM , Viale T. Michel 11, Alessandria 15121, Italy
| | - Federico Ferrarese Lupi
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, Agrate Brianza, MB 20846, Italy
| | - Matteo Fretto
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
| | - Emanuele Enrico
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
| | - Natascia De Leo
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
| | - Luca Boarino
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
| | | | - Gabriele Seguini
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, Agrate Brianza, MB 20846, Italy
| | - Katia Sparnacci
- Dipartimento di Scienze e Innovazione Tecnologica (DIST), Università del Piemonte Orientale "A. Avogadro", INSTM , Viale T. Michel 11, Alessandria 15121, Italy
| | - Valentina Gianotti
- Dipartimento di Scienze e Innovazione Tecnologica (DIST), Università del Piemonte Orientale "A. Avogadro", INSTM , Viale T. Michel 11, Alessandria 15121, Italy
| | - Michele Laus
- Dipartimento di Scienze e Innovazione Tecnologica (DIST), Università del Piemonte Orientale "A. Avogadro", INSTM , Viale T. Michel 11, Alessandria 15121, Italy
| | - Jørgen Garnæs
- Danish Institute of Fundamental Metrology (DFM) , Matematiktorvet 307, 1. Sal, Kongens Lyngby 2800, Denmark
| | - Michele Perego
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, Agrate Brianza, MB 20846, Italy
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29
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Ferrarese Lupi F, Giammaria TJ, Seguini G, Laus M, Dubček P, Pivac B, Bernstorff S, Perego M. GISAXS Analysis of the In-Depth Morphology of Thick PS-b-PMMA Films. ACS APPLIED MATERIALS & INTERFACES 2017; 9:11054-11063. [PMID: 28263052 DOI: 10.1021/acsami.7b01366] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
The morphological evolution of cylinder-forming poly(styrene)-b-poly(methyl methacrylate) block copolymer (BCP) thick films treated at high temperatures in the rapid thermal processing (RTP) machine was monitored by means of in-depth grazing-incidence small-angle X-ray scattering (GISAXS). The use of this nondisruptive technique allowed one to reveal the formation of buried layers composed of both parallel- and perpendicular-oriented cylinders as a function of the film thickness (24 ≤ h ≤ 840 nm) and annealing time (0 ≤ t ≤ 900 s). Three distinct behaviors were observed depending on the film thickness. Up to h ≤ 160 nm, a homogeneous film consisting of perpendicular-oriented cylinders is observed. When h is between 160 and 700 nm, a decoupling process between both the air-BCP and substrate-BCP interfaces takes place, leading to the formation of mixed orientations (parallel and perpendicular) of the cylinders. Finally, for h > 700 nm, the two interfaces are completely decoupled, and the formation of a superficial layer of about 50 nm composed of perpendicular cylinders is observed. Furthermore, the through-film morphology affects the nanodomain long-range order, which substantially decreases in correspondence with the beginning of the decoupling process. When the thick samples are exposed to longer thermal treatments, an increase in the long-range order of the nanodomains occurs, without any sensible variation of the thickness of the superficial layer.
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Affiliation(s)
- Federico Ferrarese Lupi
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
- Nanoscience and Materials Division, Istituto Nazionale Ricerca Metrologica , Strada delle Cacce 91, 10135 Torino, Italy
| | - Tommaso Jacopo Giammaria
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
- Dipartimento di Scienze e Innovazione Tecnologica, Università del Piemonte Orientale ''A. Avogadro'' , Viale T. Michel 11, 1512 Alessandria, Italy
| | - Gabriele Seguini
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Michele Laus
- Dipartimento di Scienze e Innovazione Tecnologica, Università del Piemonte Orientale ''A. Avogadro'' , Viale T. Michel 11, 1512 Alessandria, Italy
| | - Pavo Dubček
- Institut Ruđer Bošković , Bijenička cesta 54, 10000 Zagreb, Croatia
| | - Branko Pivac
- Institut Ruđer Bošković , Bijenička cesta 54, 10000 Zagreb, Croatia
| | - Sigrid Bernstorff
- Elettra-Sincrotrone Trieste , SS 14, Km 163.5, in AREA Science Park, 34149 Basovizza (TS), Italy
| | - Michele Perego
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
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30
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Castro C, BenAssayag G, Pecassou B, Andreozzi A, Seguini G, Perego M, Schamm-Chardon S. Nanoscale control of Si nanoparticles within a 2D hexagonal array embedded in SiO 2 thin films. NANOTECHNOLOGY 2017; 28:014001. [PMID: 27897142 DOI: 10.1088/0957-4484/28/1/014001] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
In this work, we investigate the ability to control Si nanoparticles (NPs) spatially arranged in a hexagonal network of 20 nm wide nanovolumes at controlled depth within SiO2 thin films. To achieve this goal an unconventional lithographic technique was implemented based on a bottom-up approach, that is fully compatible with the existing semiconductor technology. The method combines ultra-low energy ion beam synthesis with nanostructured block-copolymer thin films that are self-assembled on the SiO2 substrates to form a nanoporous template with hexagonally packed pores. A systematic analytical investigation using time of flight-secondary ion mass spectroscopy and low-loss energy filtered transmission electron microscopy demonstrates that by adjusting few fabrication parameters, it is possible to narrow the size distribution of the NPs and to control the number of NPs per nanovolume. Experimental results are critically discussed on the basis of literature data, providing a description of the mechanism involved in the formation of Si NPs.
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Affiliation(s)
- Celia Castro
- MEM group, CEMES-CNRS UPR 8011 et Université de Toulouse, 29 rue Jeanne Marvig, F-31055 Toulouse, France
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31
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Frascaroli J, Cianci E, Spiga S, Seguini G, Perego M. Ozone-Based Sequential Infiltration Synthesis of Al 2O 3 Nanostructures in Symmetric Block Copolymer. ACS APPLIED MATERIALS & INTERFACES 2016; 8:33933-33942. [PMID: 27960442 DOI: 10.1021/acsami.6b11340] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/25/2023]
Abstract
Sequential infiltration synthesis (SIS) provides an original strategy to grow inorganic materials by infiltrating gaseous precursors in polymeric films. Combined with microphase-separated nanostructures resulting from block copolymer (BCP) self-assembly, SIS selectively binds the precursors to only one domain, mimicking the morphology of the original BCP template. This methodology represents a smart solution for the fabrication of inorganic nanostructures starting from self-assembled BCP thin films, in view of advanced lithographic application and of functional nanostructure synthesis. The SIS process using trimethylaluminum (TMA) and H2O precursors in self-assembled PS-b-PMMA BCP thin films was established as a model system, where the PMMA phase is selectively infiltrated. However, the temperature range allowed by polymeric material restricts the available precursors to highly reactive reagents, such as TMA. In order to extend the SIS methodology and access a wide library of materials, a crucial step is the implementation of processes using reactive reagents that are fully compatible with the initial polymeric template. This work reports a comprehensive morphological (SEM, SE, AFM) and physicochemical (XPS) investigation of alumina nanostructures synthesized by means of a SIS process using O3 as oxygen precursor in self-assembled PS-b-PMMA thin films with lamellar morphology. The comparison with the H2O-based SIS process validates the possibility to use O3 as oxygen precursor, expanding the possible range of precursors for the fabrication of inorganic nanostructures.
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Affiliation(s)
- Jacopo Frascaroli
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Elena Cianci
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Sabina Spiga
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Gabriele Seguini
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Michele Perego
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, Italy
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32
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High temperature surface neutralization process with random copolymers for block copolymer self-assembly. POLYM INT 2016. [DOI: 10.1002/pi.5285] [Citation(s) in RCA: 15] [Impact Index Per Article: 1.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/18/2022]
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33
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Müller-Buschbaum P. GISAXS and GISANS as metrology technique for understanding the 3D morphology of block copolymer thin films. Eur Polym J 2016. [DOI: 10.1016/j.eurpolymj.2016.04.007] [Citation(s) in RCA: 64] [Impact Index Per Article: 8.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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34
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Qiang Z, Ye C, Lin K, Becker ML, Cavicchi KA, Vogt BD. Evolution in surface morphology during rapid microwave annealing of
PS
‐
b
‐
PMMA
thin films. ACTA ACUST UNITED AC 2016. [DOI: 10.1002/polb.24043] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/20/2022]
Affiliation(s)
- Zhe Qiang
- Department of Polymer Engineeringthe University of Akron250 S Forge StAkron Ohio44325
| | - Changhuai Ye
- Department of Polymer Engineeringthe University of Akron250 S Forge StAkron Ohio44325
| | - Kehua Lin
- Department of Polymer Engineeringthe University of Akron250 S Forge StAkron Ohio44325
| | - Matthew L. Becker
- Department of Polymer ScienceGoodyear Polymer Center, the University of Akron170 University CircleAkron Ohio44325
| | - Kevin A. Cavicchi
- Department of Polymer Engineeringthe University of Akron250 S Forge StAkron Ohio44325
| | - Bryan D. Vogt
- Department of Polymer Engineeringthe University of Akron250 S Forge StAkron Ohio44325
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35
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Seguini G, Zanenga F, Giammaria TJ, Ceresoli M, Sparnacci K, Antonioli D, Gianotti V, Laus M, Perego M. Enhanced Lateral Ordering in Cylinder Forming PS-b-PMMA Block Copolymers Exploiting the Entrapped Solvent. ACS APPLIED MATERIALS & INTERFACES 2016; 8:8280-8288. [PMID: 26959626 DOI: 10.1021/acsami.6b00360] [Citation(s) in RCA: 17] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
The self-assembly of block copolymer (BCP) thin films produces dense and ordered nanostructures. Their exploitation as templates for nanolithography requires the capability to control the lateral order of the nanodomains. Among a multiplicity of polymers, the widely studied all-organic polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) BCP can easily form nanodomains perpendicularly oriented with respect to the substrate, since the weakly unbalanced surface interactions are effectively neutralized by grafting to the substrate an appropriate poly(styrene-random-methyl methacrylate) P(S-r-MMA) random copolymer (RCP). This benefit along with the selective etching of the PMMA component and the chemical similarity with the standard photoresist materials deserved for PS-b-PMMA the role of BCP of choice for the technological implementation in nanolithography. This work demonstrates that the synergic effect of thermal annealing with the initial solvent naturally trapped in the basic RCP + BCP system after the deposition process can be exploited to enhance the lateral order. The solvent content embedded in the total RCP + BCP system can be tuned by changing the molecular weight and thus the thickness of the grafted RCP brush layer, without introducing external reservoirs or dedicated setup and/or systems. The appropriate supply of solvent supports a grain coarsening kinetics following a power law with a 1/3 growth exponent for standing hexagonally ordered cylinders.
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Affiliation(s)
- Gabriele Seguini
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy
| | - Fabio Zanenga
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy
| | - Tommaso J Giammaria
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM , UdR Alessandria, Viale T. Michel 11, I-15121 Alessandria, Italy
| | - Monica Ceresoli
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy
- Università degli Studi di Milano , Via Celoria 16, I-20133 Milano, Italy
| | - Katia Sparnacci
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM , UdR Alessandria, Viale T. Michel 11, I-15121 Alessandria, Italy
| | - Diego Antonioli
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM , UdR Alessandria, Viale T. Michel 11, I-15121 Alessandria, Italy
| | - Valentina Gianotti
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM , UdR Alessandria, Viale T. Michel 11, I-15121 Alessandria, Italy
| | - Michele Laus
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM , UdR Alessandria, Viale T. Michel 11, I-15121 Alessandria, Italy
| | - Michele Perego
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy
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36
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Hiroshiba N, Okubo R, Hattori AN, Tanaka H, Nakagawa M. Monitoring Thermally Induced Cylindrical Microphase Separation of Polystyrene-<i>block</i>-poly(methyl methacrylate) by Atomic Force Microscopy. J PHOTOPOLYM SCI TEC 2016. [DOI: 10.2494/photopolymer.29.659] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Affiliation(s)
- Nobuya Hiroshiba
- Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
| | - Ryo Okubo
- Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
| | - Azusa N. Hattori
- The Institute of Scientific and Industrial Research (ISIR), Osaka University
| | - Hidekazu Tanaka
- The Institute of Scientific and Industrial Research (ISIR), Osaka University
| | - Masaru Nakagawa
- Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
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37
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Ferrarese Lupi F, Aprile G, Giammaria TJ, Seguini G, Zuccheri G, De Leo N, Boarino L, Laus M, Perego M. Thickness and Microdomain Orientation of Asymmetric PS-b-PMMA Block Copolymer Films Inside Periodic Gratings. ACS APPLIED MATERIALS & INTERFACES 2015; 7:23615-23622. [PMID: 26439144 DOI: 10.1021/acsami.5b07127] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
The ordering process of asymmetric PS-b-PMMA block copolymers (BCPs) is investigated on flat SiO2 surfaces and on topographically patterned substrates. The topographic patterns consist of periodic gratings of 10 trenches defined by conventional top-down approaches and subsequently neutralized using a P(S-r-MMA) random copolymer (RCP). When the ordering process is accomplished on a flat surface at a temperature ranging between 180 and 230 °C, cylindrical microdomains perpendicularly oriented with respect to the substrate are observed irrespective of annealing temperature. In contrast, when the ordering process occurs on topographically patterned substrates, different phenomena have to be considered. The simultaneous effect of the flow around the gratings and the BCP flux from the zone located between adjacent trenches (mesa) into the inner part of the trenches results in significant thickness variations of the confined BCP film. Therefore, the amount of BCP inside the trenches depends on the width of the mesa region, which acts as a BCP reservoir. Moreover, within each trench group, the BCP thickness progressively decreases from the external to the central trenches composing the periodic grating. The thickness variation of the BCP film within the trenches strongly affects the ordering process, ultimately leading to different orientations of the microdomains within the trenches. In particular, when the annealing temperature is 190 °C a precise confinement of the BCP within the trenches featuring a perpendicular cylinder morphology is observed. At higher temperatures, mixed or parallel orientations of the microdomains are obtained depending on the width of the trenches in the periodic grating.
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Affiliation(s)
| | - Giulia Aprile
- NanoFacility Piemonte, Istituto Nazionale Ricerca Metrologica , Strada delle Cacce 91, 10135 Torino, Italy
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM, UdR Alessandria , Viale T. Michel 11, 1512 Alessandria, Italy
| | - Tommaso Jacopo Giammaria
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM, UdR Alessandria , Viale T. Michel 11, 1512 Alessandria, Italy
| | - Gabriele Seguini
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Giampaolo Zuccheri
- Dipartimento di Farmacia e Biotecnologie, INSTM, Centro S3, CNR-Istituto Nanoscienze , Via Irnerio 48, Bologna 40126, Italy
| | - Natascia De Leo
- NanoFacility Piemonte, Istituto Nazionale Ricerca Metrologica , Strada delle Cacce 91, 10135 Torino, Italy
| | - Luca Boarino
- NanoFacility Piemonte, Istituto Nazionale Ricerca Metrologica , Strada delle Cacce 91, 10135 Torino, Italy
| | - Michele Laus
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM, UdR Alessandria , Viale T. Michel 11, 1512 Alessandria, Italy
| | - Michele Perego
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
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38
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Kipnusu WK, Elmahdy MM, Mapesa EU, Zhang J, Böhlmann W, Smilgies DM, Papadakis CM, Kremer F. Structure and Dynamics of Asymmetric Poly(styrene-b-1,4-isoprene) Diblock Copolymer under 1D and 2D Nanoconfinement. ACS APPLIED MATERIALS & INTERFACES 2015; 7:12328-12338. [PMID: 25660102 DOI: 10.1021/am506848s] [Citation(s) in RCA: 19] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
The impact of 1- and 2-dimensional (2D) confinement on the structure and dynamics of poly(styrene-b-1,4-isoprene) P(S-b-I) diblock copolymer is investigated by a combination of Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), Grazing-Incidence Small-Angle X-ray Scattering (GISAXS), and Broadband Dielectric Spectroscopy (BDS). 1D confinement is achieved by spin coating the P(S-b-I) to form nanometric thin films on silicon substrates, while in the 2D confinement, the copolymer is infiltrated into cylindrical anodized aluminum oxide (AAO) nanopores. After dissolving the AAO matrix having mean pore diameter of 150 nm, the SEM images of the exposed P(S-b-I) show straight nanorods. For the thin films, GISAXS and AFM reveal hexagonally packed cylinders of PS in a PI matrix. Three dielectrically active relaxation modes assigned to the two segmental modes of the styrene and isoprene blocks and the normal mode of the latter are studied selectively by BDS. The dynamic glass transition, related to the segmental modes of the styrene and isoprene blocks, is independent of the dimensionality and the finite sizes (down to 18 nm) of confinement, but the normal mode is influenced by both factors with 2D geometrical constraints exerting greater impact. This reflects the considerable difference in the length scales on which the two kinds of fluctuations take place.
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Affiliation(s)
- Wycliffe K Kipnusu
- †Institute of Experimental Physics I, University of Leipzig, Linnéstraße 5, 04103 Leipzig, Germany
| | - Mahdy M Elmahdy
- †Institute of Experimental Physics I, University of Leipzig, Linnéstraße 5, 04103 Leipzig, Germany
- ‡Department of Physics, Mansoura University, Mansoura 35516, Egypt
| | - Emmanuel U Mapesa
- †Institute of Experimental Physics I, University of Leipzig, Linnéstraße 5, 04103 Leipzig, Germany
| | - Jianqi Zhang
- ¶Physik-Department, Physik weicher Materie, Technische Universität München, James-Franck-Straße 1, 85748 Garching, Germany
| | - Winfried Böhlmann
- §Institute for Experimental Physics II, University of Leipzig, Linnéstraße 5, 04103 Leipzig, Germany
| | - Detlef-M Smilgies
- ∥Cornell High Energy Synchrotron Source (CHESS), Wilson Laboratory, Cornell University, Ithaca, New York 14853, United States
| | - Christine M Papadakis
- ¶Physik-Department, Physik weicher Materie, Technische Universität München, James-Franck-Straße 1, 85748 Garching, Germany
| | - Friedrich Kremer
- †Institute of Experimental Physics I, University of Leipzig, Linnéstraße 5, 04103 Leipzig, Germany
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39
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Frascaroli J, Seguini G, Spiga S, Perego M, Boarino L. Fabrication of periodic arrays of metallic nanoparticles by block copolymer templates on HfO2 substrates. NANOTECHNOLOGY 2015; 26:215301. [PMID: 25948389 DOI: 10.1088/0957-4484/26/21/215301] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
Block copolymer-based templates can be exploited for the fabrication of ordered arrays of metal nanoparticles (NPs) with a diameter down to a few nanometers. In order to develop this technique on metal oxide substrates, we studied the self-assembly of polymeric templates directly on the HfO₂ surface. Using a random copolymer neutralization layer, we obtained an effective HfO₂ surface neutralization, while the effects of surface cleaning and annealing temperature were carefully examined. Varying the block copolymer molecular weight, we produced regular nanoporous templates with feature size variable between 10 and 30 nm and a density up to 1.5 × 10¹¹ cm⁻². With the adoption of a pattern transfer process, we produced ordered arrays of Pt and Pt/Ti NPs with diameters of 12, 21 and 29 nm and a constant size dispersion (σ) of 2.5 nm. For the smallest template adopted, the NP diameter is significantly lower than the original template dimension. In this specific configuration, the granularity of the deposited film probably influences the pattern transfer process and very small NPs of 12 nm were achieved without a significant broadening of the size distribution.
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Affiliation(s)
- Jacopo Frascaroli
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza (MB), Italy. NanoFacility, Divisione elettromagnetismo, INRiM, Strada delle Cacce 91, I-10135 Torino, Italy. Dipartimento di fisica, Università degli studi di Milano, Via Celoria 16, I-20133 Milano, Italy
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40
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Sparnacci K, Antonioli D, Gianotti V, Laus M, Lupi FF, Giammaria TJ, Seguini G, Perego M. Ultrathin random copolymer-grafted layers for block copolymer self-assembly. ACS APPLIED MATERIALS & INTERFACES 2015; 7:10944-10951. [PMID: 25954979 DOI: 10.1021/acsami.5b02201] [Citation(s) in RCA: 47] [Impact Index Per Article: 5.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
Hydroxyl-terminated P(S-r-MMA) random copolymers (RCPs) with molecular weights (Mn) from 1700 to 69000 and a styrene unit fraction of approximately 61% were grafted onto a silicon oxide surface and subsequently used to study the orientation of nanodomains with respect to the substrate, in cylinder-forming PS-b-PMMA block copolymer (BCP) thin films. When the thickness (H) of the grafted layer is greater than 5-6 nm, a perpendicular orientation is always observed because of the efficient decoupling of the BCP film from the polar SiO2 surface. Conversely, if H is less than 5 nm, the critical thickness of the grafted layer, which allows the neutralization of the substrate and promotion of the perpendicular orientation of the nanodomains in the BCP film, is found to depend on the Mn of the RCP. In particular, when Mn = 1700, a 2.0 nm thick grafted layer is sufficient to promote the perpendicular orientation of the PMMA cylinders in the PS-b-PMMA BCP film. A proximity shielding mechanism of the BCP molecules from the polar substrate surface, driven by chain stretching of the grafted RCP molecules, is proposed.
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Affiliation(s)
- Katia Sparnacci
- †Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro", Viale T. Michel 11, 15121 Alessandria, Italy
- ‡INSTM, UdR, Alessandria, Italy
| | - Diego Antonioli
- †Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro", Viale T. Michel 11, 15121 Alessandria, Italy
- ‡INSTM, UdR, Alessandria, Italy
| | - Valentina Gianotti
- †Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro", Viale T. Michel 11, 15121 Alessandria, Italy
- ‡INSTM, UdR, Alessandria, Italy
| | - Michele Laus
- †Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro", Viale T. Michel 11, 15121 Alessandria, Italy
- ‡INSTM, UdR, Alessandria, Italy
| | | | | | - Gabriele Seguini
- §Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Michele Perego
- §Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, Italy
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41
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Frascaroli J, Brivio S, Ferrarese Lupi F, Seguini G, Boarino L, Perego M, Spiga S. Resistive switching in high-density nanodevices fabricated by block copolymer self-assembly. ACS NANO 2015; 9:2518-2529. [PMID: 25743480 DOI: 10.1021/nn505131b] [Citation(s) in RCA: 28] [Impact Index Per Article: 3.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
Bipolar resistive switching memories based on metal oxides offer a great potential in terms of simple process integration, memory performance, and scalability. In view of ultrahigh density memory applications, a reduced device size is not the only requirement, as the distance between different devices is a key parameter. By exploiting a bottom-up fabrication approach based on block copolymer self-assembling, we obtained the parallel production of bilayer Pt/Ti top electrodes arranged in periodic arrays over the HfO2/TiN surface, building memory devices with a diameter of 28 nm and a density of 5 × 10(10) devices/cm(2). For an electrical characterization, the sharp conducting tip of an atomic force microscope was adopted for a selective addressing of the nanodevices. The presence of devices showing high conductance in the initial state was directly connected with scattered leakage current paths in the bare oxide film, while with bipolar voltage operations we obtained reversible set/reset transitions irrespective of the conductance variability in the initial state. Finally, we disclosed a scalability limit for ultrahigh density memory arrays based on continuous HfO2 thin films, in which a cross-talk between distinct nanodevices can occur during both set and reset transitions.
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Affiliation(s)
- Jacopo Frascaroli
- †Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy
- ‡INRiM, NanoFacility, Electromagnetism Division, Strada delle Cacce 91, 10135 Torino, Italy
- §Department of Physics, University of Milan, Via Celoria 16, 20133 Milano, Italy
| | - Stefano Brivio
- †Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy
| | | | - Gabriele Seguini
- †Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy
| | - Luca Boarino
- ‡INRiM, NanoFacility, Electromagnetism Division, Strada delle Cacce 91, 10135 Torino, Italy
| | - Michele Perego
- †Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy
| | - Sabina Spiga
- †Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy
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Sparnacci K, Antonioli D, Gianotti V, Laus M, Zuccheri G, Ferrarese Lupi F, Giammaria TJ, Seguini G, Ceresoli M, Perego M. Thermal stability of functional P(S-r-MMA) random copolymers for nanolithographic applications. ACS APPLIED MATERIALS & INTERFACES 2015; 7:3920-3930. [PMID: 25664773 DOI: 10.1021/am509088s] [Citation(s) in RCA: 10] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
Two strategies are envisioned to improve the thermal stability of the grafted layer and to allow the processing of the random copolymer/block copolymer (RCP/BCP) system at high temperature. From one side, a high-temperature thermal treatment of a commercial α-hydroxyl ω-2,2,6,6-tetramethylpiperidinyloxy functional RCP, namely, TR58, leads to the formation of a stabilized layer able to induce the perpendicular orientation of a symmetric BCP to temperatures higher than 310 °C. On the other side, an α-hydroxyl ω-Br functional RCP, namely, BrR58, with the same molar mass and composition of TR58, was prepared by activator regenerated by electron transfer atom transfer radical polymerization. The resulting brush layer can sustain the self-assembly of the symmetric BCP for processing temperatures as high as 330 °C. In both systems, the disruption of the BCP film, deposited on the grafted RCP layer, occurs because of the formation of bubbles, due to a low-temperature evolution of monomers from the RCP layer. The extent of the low-temperature monomer evolution is higher for TR58 than it is for BrR58 and starts at lower temperatures. For both copolymers, the thermal treatment offsets the low-temperature monomer evolution while still maintaining surface characteristics suitable to induce the perpendicular orientation of the BCPs, thus ultimately extending the range of processing temperatures of the BCP film and consequently speeding the self-organization process.
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Affiliation(s)
- Katia Sparnacci
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'' , Viale T. Michel 11, 15121 Alessandria, Italy
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Ferrarese Lupi F, Giammaria TJ, Volpe FG, Lotto F, Seguini G, Pivac B, Laus M, Perego M. High aspect ratio PS-b-PMMA block copolymer masks for lithographic applications. ACS APPLIED MATERIALS & INTERFACES 2014; 6:21389-21396. [PMID: 25387131 DOI: 10.1021/am506391n] [Citation(s) in RCA: 23] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
The control of the self-assembly (SA) process and nanostructure orientation in diblock copolymer (DBC) thick films is a crucial technological issue. Perpendicular orientation of the nanostructures in symmetric and asymmetric poly(styrene)-b-poly(methyl methacrylate) (PS-b-PMMA) block copolymer films obtained by means of simple thermal treatments was demonstrated to occur in well-defined thickness windows featuring modest maximum values, thus resulting in low aspect ratio (h/d < 2) of the final lithographic mask. In this manuscript, the thickness window corresponding to the perpendicular orientation of the cylindrical structures in asymmetric DBC is investigated at high temperatures (190 °C ≤ T ≤ 310 °C) using a rapid thermal processing machine. A systematic study of the annealing conditions (temperature and time) of asymmetric PS-b-PMMA (Mn = 67.1, polydispersity index = 1.09) films, with thicknesses ranging from 10 to 400 nm, allowed ordered patterns, with a maximum value of orientational correlation length of 350 nm, to be obtained for film thicknesses up to 200 nm. The complete propagation of the cylindrical structures through the whole film thickness in a high aspect ratio PS template (h/d ≈ 7) is probed by lift-off process. Si nanopillars are obtained having the same lateral ordering and characteristic dimensions of the DBC lithographic mask as further confirmed by grazing-incidence small-angle X-ray scattering experiments.
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Affiliation(s)
- F Ferrarese Lupi
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Monza and Brianza, Italy
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