Stable biopassive insulation synthesized by initiated chemical vapor deposition of poly(1,3,5-trivinyltrimethylcyclotrisiloxane)

Wafer Scale Insulation of High Aspect Ratio Through-Silicon Vias by iCVD

In microelectronics, one of the main 3D integration strategies consists of vertically stacking and electrically connecting various functional chips using through-silicon vias (TSVs). For the fabrication of the TSVs, one of the challenges is to conformally deposit a low dielectric constant insulator thin film at the surface of the silicon. To date, there is no universal technique that can address all types of TSV integration schemes, especially in the case requiring a low deposition temperature. In this work, an organosilicate polymer deposited by initiated chemical vapor deposition (iCVD) was developed and integrated as an insulating layer for TSVs. Process studies have shown that poly(1,3,5-trivinyl-1,3,5-trimethyl cyclotrisiloxane) (P(V3D3)) can present good conformality on high aspect ratio features by increasing the substrate temperature up to 100 °C. The trade-off is a moderate deposition rate. The thermal stability of the polymer has been investigated, and we show that a thermal annealing at 400 °C (with or without ultraviolet exposure) allows the stabilization of the dielectric films by removing residual oligomers. Then, P(V3D3) was integrated in high aspect ratio TSV (10 × 100 μm) on 300 mm silicon wafers using a standard integration flow for TSV metallization. Functional devices were successfully fabricated (including daisy chains of 754 TSVs) and electrically characterized. Our work shows that the metallization barrier should be carefully selected to eliminate the appearance of voids at the top corner of the TSV after the Cu annealing step. Moreover, an appropriate integration process should be used to avoid the appearance of cohesive cracks in the liner. This work constitutes a first proof of concept of the use of an iCVD polymer in a quasi-industrial microelectronic environment. It also highlights the benefit of iCVD as a promising technique to deposit conformal dielectric thin films in a microelectronic pilot line environment.

Designing Organic and Hybrid Surfaces and Devices with Initiated Chemical Vapor Deposition (iCVD)

The initiated chemical vapor deposition (iCVD) technique is an all-dry method for designing organic and hybrid polymers. Unlike methods utilizing liquids or line-of-sight arrival, iCVD provides conformal surface modification over intricate geometries. Uniform, high-purity, and pinhole-free iCVD films can be grown with thicknesses ranging from >15 µm to <5 nm. The mild conditions permit damage-free growth directly onto flexible substrates, 2D materials, and liquids. Novel iCVD polymer morphologies include nanostructured surfaces, nanoporosity, and shaped particles. The well-established fundamentals of iCVD facilitate the systematic design and optimization of polymers and copolymers. The functional groups provide fine-tuning of surface energy, surface charge, and responsive behavior. Further reactions of the functional groups in the polymers can yield either surface modification, compositional gradients through the layer thickness, or complete chemical conversion of the bulk film. The iCVD polymers are integrated into multilayer device structures as desired for applications in sensing, electronics, optics, electrochemical energy storage, and biotechnology. For these devices, hybrids offer higher values of refractive index and dielectric constant. Multivinyl monomers typically produce ultrasmooth and pinhole-free and mechanically deformable layers and robust interfaces which are especially promising for electronic skins and wearable optoelectronics.

Hydrophobization of Inorganic Oxide Surfaces via Ring-Opening Polymerization of Cyclic Siloxane Vapor

The ability to control the surface chemistry of inorganic oxides has a profound impact on numerous applications, including lubrication, antifouling, and anticorrosion. While often overlooked as potential modifying agents given their lack of traditional functional groups, siloxanes have recently been shown to react readily with and covalently attach to inorganic oxide surfaces. Herein, we examine the reactions of cyclic siloxane vapor with solid interfaces via a ring-opening polymerization (ROP) initiated by the inherent acid/base characteristics of several smooth inorganic oxide surfaces. Surfaces are characterized by ellipsometry, dynamic contact angle analysis, and X-ray photoelectron spectroscopy (XPS). This technique requires no additional solvents and very little reactant to produce nanometer-thick hydrophobic surfaces that exhibit low contact angle hysteresis. Additional studies with particulate surfaces suggest that this method prepares conformal coatings regardless of surface architecture.

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

Here, we report on a simultaneous growth and radical-initiated cross-linking of a hybrid thin film in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited a self-limiting MLD growth behavior and improved properties like 12% higher film density and enhanced stability compared to the non-cross-linked film.

Controlled Release Utilizing Initiated Chemical Vapor Deposited (iCVD) of Polymeric Nanolayers

This review will focus on the controlled release of pharmaceuticals and other organic molecules utilizing polymeric nanolayers grown by initiated chemical vapor deposited (iCVD). The iCVD layers are able conform to the geometry of the underlying substrate, facilitating release from one- and two-dimensional nanostructures with high surface area. The reactors for iCVD film growth can be customized for specific substrate geometries and scaled to large overall dimensions. The absence of surface tension in vapor deposition processes allows the synthesis of pinhole-free layers, even for iCVD layers <10 nm thick. Such ultrathin layers also provide rapid transport of the drug across the polymeric layer. The mild conditions of the iCVD process avoid damage to the drug which is being encapsulated. Smart release is enabled by iCVD hydrogels which are responsive to pH, temperature, or light. Biodegradable iCVD layers have also be demonstrated for drug release.

Vapor phase processing: a novel approach for fabricating functional hybrid materials

Materials science is nowadays facing challenges in optimizing properties of materials which are needed for numerous technological applications and include, but are not limited to, mechanics, electronics, optics, etc. The key issue is that for emerging applications materials are needed which incorporate certain properties from polymers or biopolymers and metals or ceramics at the same time, thus fabrication of functional hybrid materials becomes inevitable. Routes for the synthesis of functional hybrid materials can be manifold. Among the explored routes vapor phase processing is a rather novel approach which opts for compatibility with many existing industrial processes. This topical review summarizes the most important approaches and achievements in the synthesis of functional hybrid materials through vapor phase routes with the goal to fabricate suitable hybrid materials for future mechanical, electronic, optical or biomedical applications. Most of the approaches rely on atomic layer deposition (ALD) and techniques related to this process, including molecular layer deposition (MLD) and vapor phase infiltration (VPI), or variations of chemical vapor deposition (CVD). The thus fabricated hybrid materials or nanocomposites often show exceptional physical or chemical properties, which result from synergies of the hybridized materials families. Even though the research in this field is still in its infancy, the initial results encourage further development and promise great application potential in a large variety of applications fields such as flexible electronics, energy conversion or storage, functional textile, and many more.

Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V3D3) and azasilane

In this work, we report the first ring opening vapor to solid polymerization of cyclotrisiloxane and N-methyl-aza-2,2,4-trimethylsilacyclopentane by molecular layer deposition (MLD). This process was studied in situ with a quartz crystal microbalance and the thin film was characterized by X-ray photoelectron spectroscopy, ATR-FTIR and high-resolution transmission electron microscopy.

Analysis of Al2O3-parylene C bilayer coatings and impact of microelectrode topography on long term stability of implantable neural arrays

OBJECTIVE

Performance of many dielectric coatings for neural electrodes degrades over time, contributing to loss of neural signals and evoked percepts. Studies using planar test substrates have found that a novel bilayer coating of atomic-layer deposited (ALD) Al₂O₃ and parylene C is a promising candidate for neural electrode applications, exhibiting superior stability to parylene C alone. However, initial results from bilayer encapsulation testing on non-planar devices have been less positive. Our aim was to evaluate ALD Al₂O₃-parylene C coatings using novel test paradigms, to rigorously evaluate dielectric coatings for neural electrode applications by incorporating neural electrode topography into test structure design.

APPROACH

Five test devices incorporated three distinct topographical features common to neural electrodes, derived from the utah electrode array (UEA). Devices with bilayer (52 nm Al₂O₃  +  6 µm parylene C) were evaluated against parylene C controls (N  ⩾  6 per device type). Devices were aged in phosphate buffered saline at 67 °C for up to 311 d, and monitored through: (1) leakage current to evaluate encapsulation lifetimes (>1 nA during 5VDC bias indicated failure), and (2) wideband (1-10⁵ Hz) impedance.

MAIN RESULTS

Mean-times-to-failure (MTTFs) ranged from 12 to 506 d for bilayer-coated devices, versus 10 to  >2310 d for controls. Statistical testing (log-rank test, α  =  0.05) of failure rates gave mixed results but favored the control condition. After failure, impedance loss for bilayer devices continued for months and manifested across the entire spectrum, whereas the effect was self-limiting after several days, and restricted to frequencies  <100 Hz for controls. These results correlated well with observations of UEAs encapsulated with bilayer and control films.

SIGNIFICANCE

We observed encapsulation failure modes and behaviors comparable to neural electrode performance which were undetected in studies with planar test devices. We found the impact of parylene C defects to be exacerbated by ALD Al₂O₃, and conclude that inferior bilayer performance arises from degradation of ALD Al₂O₃ when directly exposed to saline. This is an important consideration, given that neural electrodes with bilayer coatings are expected to have ALD Al₂O₃ exposed at dielectric boundaries that delineate electrode sites. Process improvements and use of different inorganic coatings to decrease dissolution in physiological fluids may improve performance. Testing frameworks which take neural electrode complexities into account will be well suited to reliably evaluate such encapsulation schemes.

Reduced cell attachment to poly(2-hydroxyethyl methacrylate)-coated ventricular catheters in vitro

The majority of patients with hydrocephalus are dependent on ventriculoperitoneal shunts for diversion of excess cerebrospinal fluid. Unfortunately, these shunts are failure-prone and over half of all life-threatening pediatric failures are caused by obstruction of the ventricular catheter by the brain's resident immune cells, reactive microglia and astrocytes. Poly(2-hydroxyethyl methacrylate) (PHEMA) hydrogels are widely used for biomedical implants. The extreme hydrophilicity of PHEMA confers resistance to protein fouling, making it a strong candidate coating for ventricular catheters. With the advent of initiated chemical vapor deposition (iCVD), a solvent-free coating technology that creates a polymer in thin film form on a substrate surface by introducing gaseous reactant species into a vacuum reactor, it is now possible to apply uniform polymer coatings on complex three-dimensional substrate surfaces. iCVD was utilized to coat commercially available ventricular catheters with PHEMA. The chemical structure was confirmed on catheter surfaces using Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy. PHEMA coating morphology was characterized by scanning electron microscopy. Testing PHEMA-coated catheters against uncoated clinical-grade catheters in an in vitro hydrocephalus catheter bioreactor containing co-cultured astrocytes and microglia revealed significant reductions in cell attachment to PHEMA-coated catheters at both 17-day and 6-week time points. © 2017 Wiley Periodicals, Inc. J Biomed Mater Res Part B: Appl Biomater, 106B: 1268-1279, 2018.

CVD Polymers for Devices and Device Fabrication

Chemical vapor deposition (CVD) polymerization directly synthesizes organic thin films on a substrate from vapor phase reactants. Dielectric, semiconducting, electrically conducting, and ionically conducting CVD polymers have all been readily integrated into devices. The absence of solvent in the CVD process enables the growth of high-purity layers and avoids the potential of dewetting phenomena, which lead to pinhole defects. By limiting contaminants and defects, ultrathin (<10 nm) CVD polymeric device layers have been fabricated in multiple laboratories. The CVD method is particularly suitable for synthesizing insoluble conductive polymers, layers with high densities of organic functional groups, and robust crosslinked networks. Additionally, CVD polymers are prized for the ability to conformally cover rough surfaces, like those of paper and textile substrates, as well as the complex geometries of micro- and nanostructured devices. By employing low processing temperatures, CVD polymerization avoids damaging substrates and underlying device layers. This report discusses the mechanisms of the major CVD polymerization techniques and the recent progress of their applications in devices and device fabrication, with emphasis on initiated CVD (iCVD) and oxidative CVD (oCVD) polymerization.

Vapor deposition routes to conformal polymer thin films

Vapor phase syntheses, including parylene chemical vapor deposition (CVD) and initiated CVD, enable the deposition of conformal polymer thin films to benefit a diverse array of applications. This short review for nanotechnologists, including those new to vapor deposition methods, covers the basic theory in designing a conformal polymer film vapor deposition, sample preparation and imaging techniques to assess film conformality, and several applications that have benefited from vapor deposited, conformal polymer thin films.

Durable and scalable icephobic surfaces: similarities and distinctions from superhydrophobic surfaces

Formation, adhesion, and accumulation of ice, snow, frost, glaze, rime, or their mixtures can cause severe problems for solar panels, wind turbines, aircrafts, heat pumps, power lines, telecommunication equipment, and submarines. These problems can decrease efficiency in power generation, increase energy consumption, result in mechanical and/or electrical failure, and generate safety hazards. To address these issues, the fundamentals of interfaces between liquids and surfaces at low temperatures have been extensively studied. This has lead to development of so called "icephobic" surfaces, which possess a number of overlapping, yet distinctive, characteristics from superhydrophobic surfaces. Less attention has been given to distinguishing differences between formation and adhesion of ice, snow, glaze, rime, and frost or to developing a clear definition for icephobic, or more correctly pagophobic, surfaces. In this review, we strive to clarify these differences and distinctions, while providing a comprehensive definition of icephobicity. We classify different canonical families of icephobic (pagophobic) surfaces providing a review of those with potential for scalable and robust development.

Synthesis of ultrathin polymer insulating layers by initiated chemical vapour deposition for low-power soft electronics

Insulating layers based on oxides and nitrides provide high capacitance, low leakage, high breakdown field and resistance to electrical stresses when used in electronic devices based on rigid substrates. However, their typically high process temperatures and brittleness make it difficult to achieve similar performance in flexible or organic electronics. Here, we show that poly(1,3,5-trimethyl-1,3,5-trivinyl cyclotrisiloxane) (pV3D3) prepared via a one-step, solvent-free technique called initiated chemical vapour deposition (iCVD) is a versatile polymeric insulating layer that meets a wide range of requirements for next-generation electronic devices. Highly uniform and pure ultrathin films of pV3D3 with excellent insulating properties, a large energy gap (>8 eV), tunnelling-limited leakage characteristics and resistance to a tensile strain of up to 4% are demonstrated. The low process temperature, surface-growth character, and solvent-free nature of the iCVD process enable pV3D3 to be grown conformally on plastic substrates to yield flexible field-effect transistors as well as on a variety of channel layers, including organics, oxides, and graphene.

25th anniversary article: CVD polymers: a new paradigm for surface modification and device fabrication

Well-adhered, conformal, thin (<100 nm) coatings can easily be obtained by chemical vapor deposition (CVD) for a variety of technological applications. Room temperature modification with functional polymers can be achieved on virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and thin film formation. By eliminating the need to dissolve macromolecules, CVD enables insoluble polymers to be coated and prevents solvent damage to the substrate. CVD film growth proceeds from the substrate up, allowing for interfacial engineering, real-time monitoring, and thickness control. Initiated-CVD shows successful results in terms of rationally designed micro- and nanoengineered materials to control molecular interactions at material surfaces. The success of oxidative-CVD is mainly demonstrated for the deposition of organic conducting and semiconducting polymers.

Effect of surface tension, viscosity, and process conditions on polymer morphology deposited at the liquid-vapor interface

We have observed that the vapor-phase deposition of polymers onto liquid substrates can result in the formation of polymer films or particles at the liquid-vapor interface. In this study, we demonstrate the relationship between the polymer morphology at the liquid-vapor interface and the surface tension interaction between the liquid and polymer, the liquid viscosity, the deposition rate, and the deposition time. We show that the thermodynamically stable morphology is determined by the surface tension interaction between the liquid and the polymer. Stable polymer films form when it is energetically favorable for the polymer to spread over the surface of the liquid, whereas polymer particles form when it is energetically favorable for the polymer to aggregate. For systems that do not strongly favor spreading or aggregation, we observe that the initial morphology depends on the deposition rate. Particles form at low deposition rates, whereas unstable films form at high deposition rates. We also observe a transition from particle formation to unstable film formation when we increase the viscosity of the liquid or increase the deposition time. Our results provide a fundamental understanding about polymer growth at the liquid-vapor interface and can offer insight into the growth of other materials on liquid surfaces. The ability to systematically tune morphology can enable the production of particles for applications in photonics, electronics, and drug delivery and films for applications in sensing and separations.

Formation of heterogeneous polymer films via simultaneous or sequential depositions of soluble and insoluble monomers onto ionic liquids

In this paper, we studied the formation of heterogeneous polymer films on ionic liquid (IL) substrates via the simultaneous or sequential depositions of monomers that are either soluble or insoluble in the liquid. We found that the insoluble monomer 1H,1H,2H,2H-perfluorodecyl acrylate (PFDA) only polymerizes at the IL surface, while the soluble monomer ethylene glycol diacrylate (EGDA) can polymerize at both the IL surface and within the bulk liquid. The polymer chains that form within the bulk liquid entrap IL as they integrate into the polymer film formed at the IL surface, resulting in heterogeneous films that contain IL on the bottom side. Varying the order in which the soluble and insoluble monomers were introduced into the system led to different film structures. When the insoluble monomer was introduced first, a film formed at the surface and the soluble monomer then diffused through this film and polymerized within the bulk, leading to a sandwich structure. When the soluble monomer was introduced first, a layered film was formed whose structure followed the order in which the monomers were introduced. When the two monomers were introduced simultaneously, the soluble monomer polymerized in the bulk while a copolymer film formed at the surface. This study provides an understanding of how to control the composition of layered polymer films deposited onto IL substrates in order to develop new composite materials for separation and electrochemical applications.

Condensation and polymerization of supersaturated monomer vapor

Initiated chemical vapor deposition (iCVD) of poly(glycidyl methacrylate) from supersaturated monomer vapor is reported. Rapid film growth rates, up to 600 nm/min, were observed. Films grown from supersaturated monomer exhibited distinct surface undulations. The temporal evolution of surface features during film growth was studied and is explained by monomer condensation followed by droplet coalescence and film growth. High droplet densities were observed at the early times and are attributed to rapid polymerization of monomer within condensed liquid nuclei. Droplet nucleation resulting in surface undulations can be avoided by first depositing a thin, cross-linked film from ethylene glycol diacrylate monomer followed by deposition of supersaturated monomer vapors.

Encapsulation of ionic liquids within polymer shells via vapor phase deposition

We demonstrate the use of vapor phase deposition to completely encapsulate ionic liquid (IL) droplets within robust polymer shells. The IL droplets were first rolled into liquid marbles using poly(tetrafluoroethylene) (PTFE) particles because the marble structure facilitates polymerization onto the entire surface area of the IL. Polymer shells composed of 1H,1H,2H,2H-perfluorodecyl acrylate cross-linked with ethylene glycol diacrylate (P(PFDA-co-EGDA)) were found to be stronger than the respective homopolymers. Fourier transform infrared spectroscopy showed that the PTFE particles become incorporated into the polymer shells. The integration of the particles increased the rigidity of the polymer shells and enabled the pure IL to be recovered or replaced with other fluids. Our encapsulation technique can be used to form polymer shells onto dozens of droplets at once and can be extended to encapsulate any low vapor pressure liquid that is stable under vacuum conditions.

Biocompatibility assessment of insulating silicone polymer coatings using an in vitro glial scar assay

Vapor-deposited silicone coatings are attractive candidates for providing insulation in neuroprosthetic devices owing to their excellent resistivity, adhesion, chemical inertness and flexibility. A biocompatibility assessment of these coatings is an essential part of the materials design process, but current techniques are limited to rudimentary cell viability assays or animal muscle implantation tests. This article describes how a recently developed in vitro model of glial scar formation can be utilized to assess the biocompatibility of vapor-deposited silicone coatings on micron-scale wires. A multi-cellular monolayer comprising mixed glial cells was obtained by culturing primary rat midbrain cells on poly(D-lysine)-coated well plates. Stainless steel microwires were coated with two novel insulating thin film silicone polymers, namely poly(trivinyltrimethylcyclotrisiloxane) (polyV(3)D(3)) and poly(trivinyltrimethylcyclotrisiloxane-hexavinyldisiloxane) (polyV(3)D(3)-HVDS) by initiated chemical vapor deposition (iCVD). The monolayer of midbrain cells was disrupted by placing segments of coated microwires into the culture followed by immunocytochemical analysis after 7 d of implantation. Microglial proximity to the microwires was observed to correlate with the amount of fibronectin adsorbed on the coating surface; polyV(3)D(3)-HVDS adsorbed the least amount of fibronectin compared to both stainless steel and polyV(3)D(3). Consequently, the relative number of microglia within 100 µm of the microwires was least on polyV(3)D(3)-HVDS coatings compared to steel and polyV(3)D(3). In addition, the astrocyte reactivity on polyV(3)D(3)-HVDS coatings was lower compared to stainless steel and polyV(3)D(3). The polyV(3)D(3)-HVDS coating was therefore deemed to be most biocompatible, least reactive and most preferable insulating coating for neural prosthetic devices.

Chemical vapor deposition of conformal, functional, and responsive polymer films

Chemical vapor deposition (CVD) polymerization utilizes the delivery of vapor-phase monomers to form chemically well-defined polymeric films directly on the surface of a substrate. CVD polymers are desirable as conformal surface modification layers exhibiting strong retention of organic functional groups, and, in some cases, are responsive to external stimuli. Traditional wet-chemical chain- and step-growth mechanisms guide the development of new heterogeneous CVD polymerization techniques. Commonality with inorganic CVD methods facilitates the fabrication of hybrid devices. CVD polymers bridge microfabrication technology with chemical, biological, and nanoparticle systems and assembly. Robust interfaces can be achieved through covalent grafting enabling high-resolution (60 nm) patterning, even on flexible substrates. Utilizing only low-energy input to drive selective chemistry, modest vacuum, and room-temperature substrates, CVD polymerization is compatible with thermally sensitive substrates, such as paper, textiles, and plastics. CVD methods are particularly valuable for insoluble and infusible films, including fluoropolymers, electrically conductive polymers, and controllably crosslinked networks and for the potential to reduce environmental, health, and safety impacts associated with solvents. Quantitative models aid the development of large-area and roll-to-roll CVD polymer reactors. Relevant background, fundamental principles, and selected applications are reviewed.

Incorporation of Linear Spacer Molecules in Vapor Deposited Silicone Polymer Thin Films

Poly (trivinyl-trimethyl-cyclotrisiloxane) or polyV(3)D(3) is a promising insulating thin film known for its potential application in neural probe fabrication. However, its time-consuming synthesis rate renders it impractical for manufacturing standards. Previously, the growth mechanism of polyV(3)D(3) was shown to be affected by significant steric barriers. This article describes the synthesis of a copolymer of polyV(3)D(3) via initiated chemical vapor deposition (iCVD) using V(3)D(3) as the monomer, hexavinyl disiloxane (HVDS) as a spacer, and tert-butyl peroxide (TBP) as the initiator to obtain nearly a 4-fold increase in deposition rate. The film formation kinetics is limited by the adsorption of the reactive species on the surface of the substrate with an activation energy of -41.5 kJ/mol with respect to substrate temperature. The films deposited are insoluble in polar and non polar solvents due to their extremely crosslinked structure. They have excellent adhesion to silicon substrates and their adhesion properties are retained after soaking in a variety of solvents. Spectroscopic evidence shows that the films do not vary in structure after boiling in DI water for 1 hour, illustrating hydrolytic stability. PolyV(3)D(3)-HVDS has a bulk resistivity of 5.6 (±1) × 10(14) Ω-cm, which is comparable to that of parylene-C; the insulating thin film currently used in neuroprosthetic devices.