Photopatterning of multilayer n-alkylsilane films

Erasable Photopatterning of Stilbene-Based Metal-Organic Framework Films

The development of photosensitive materials for erasable photopatterning is of significant interest in anti-counterfeiting and information storage applications. Herein two kinds of stilbene-based metal-organic framework (MOF) films with layer by layer method for studying photopatterning is reported. The resulting 2D Zn₂ (sdc)₂ MOF film (sdc = 4,4'-stilbenedicarboxylate) exhibits excellent photosensitive features with a very short photoconversion time (<35 s) while the 3D MOF Zn₄ O(sdc)₆ film does not have the property due to the fact that only parallel and short distance arrangement of olefin groups in the adjacent MOF layers can trigger [2+2] photocycloaddition. Furthermore, the Zn₂ (sdc)₂ film indicates obvious reversible fluorescent photoswitch behavior between yellow and blue fluorescence emission, which can achieve high-efficient, erasable photopatterning with various sizes (ca. 20 microns to decimeter). This study not only develops a new kind of photosensitive crystalline network film but also provides erasable photopatterning from macroscopic to microscopic in optical applications.

Effect of Chemical Microenvironment in Spirothiopyran Monolayer Direct-Write Photoresists

We study the effect of the microenvironment on writing chemical patterns into spirothiopyran monolayers over large areas in a single step with light. Surfaces functionalized with photoresponsive spirothiopyran are fabricated by chemically modifying amine-terminated monolayers. The merocyanine isomer selectively participates in a thiol-Michael addition reaction with maleimide-functionalized molecules, rendering these surfaces ideal for fast, mask-less direct writing. The local microenvironment of spirothiopyran is found to strongly influence the kinetics of photoswitching. The quantum yield of ring opening is found to be 17 times faster for spirothiopyran surrounded by a locally charged environment rich in guanidinium diluent molecules as compared to a closed-packed monolayer without diluents. Hydrophilic environments are also found to improve the kinetics of ring closing. Optimization of the diluent concentration leads to dramatic improvements in both contrast and yield of direct writing. This enables the monolayer to be used for maskless two-color photopatterning in which spatial control over patterning is obtained by varying the relative intensity of incident UV and green light. These experiments demonstrate the capacity of spirothiopyran monolayers to serve as a versatile toolbox for rapid, large-area surface functionalization.

Covalently Assembled Monolayers of Homo- and Heteroleptic FeII -Terpyridyl Complexes on SiOx and ITO-Coated Glass Substrates: An Experimental and Theoretical Study

Well-defined Fe^II -terpyridyl monolayers were fabricated on SiO_x and conductive ITO-coated glass substrates through covalent-bond formation between the metallo-organic complexes and a preassembled coupling layer. Three different homo- and heteroleptic complexes with terminal pyridyl, amine, and phenyl groups were tested. All the films were found to be densely packed and homogeneous, and consist of molecules standing upright. They exhibited high thermal (up to ≈220 °C) and temporal (up to 5 h at 100 °C) stability. The UV/Vis spectra of the monolayers showed pronounced metal-to-ligand charge-transfer bands with a significant redshift compared with the solution spectra of the metallo-ligands with a pendant pyridyl group quaternized with the coupling layer, whereas the shift was significantly smaller when the coupling layer was bonded to the primary amine (-NH₂ ) group of the complex. Cyclic voltammograms of the monolayers showed reversible, one-electron redox behavior and suggested strong electronic coupling between the confined molecules and the underlying substrate. Analysis of the electrochemistry data allowed us to estimate the charge-transfer rate constant between the metal center and the substrate. Additionally, detailed quantum-chemical calculations were performed to support and rationalize the experimentally observed photophysical properties of the Fe^II -terpyridyl complexes both in the solution state and when bound to a SiO_x -based substrate.

Low Damage Reductive Patterning of Oxidized Alkyl Self-Assembled Monolayers through Vacuum Ultraviolet Light Irradiation in an Evacuated Environment

Through 172 nm vacuum ultraviolet light irradiation in a high vacuum condition (HV-VUV), well-defined micropatterns with a varied periodic friction were fabricated at the surface of self-assembled monolayers (SAMs) terminated with oxygenated groups. No apparent height contrast between the HV-VUV-irradiated and -masked areas was observed, which indicated the stability of the C-C skeleton of the assembled molecules. The trimming of oxygenated groups occurred through dissociating the C-O bonds and promoting the occurrence of α- and β-cleavages in the C═O-containing components. Hence, the HV-VUV treatment trimmed the oxygenated groups without degrading the C-C skeleton. The HV-VUV treatment influenced the order of the assembled molecules, and the step-terrace structure was distorted. The decrease in friction at the HV-VUV-irradiated domains was attributed to the dissociation of oxygenated groups. (3-Aminopropyl)trimethoxysilane (APTMS) aggregated at the masked areas of the HV-VUV-patterned SAM, where the oxygenated groups worked as anchors. APTMS aggregations did not exist at the irradiated areas, indicating the trimming of the oxygenated groups at these areas. The direct assembling of APTMS on the Si substrate at the irradiated areas was prevented by the remaining C-C skeleton.

Hydrophilic/hydrophobic film patterning by photodegradation of self-assembled alkylsilane multilayers and its applications

While the photopatterning of self-assembled monolayers (SAMs) has been extensively investigated, much less attention has been given to highly ordered multilayer systems. By being both thicker (0.5-2 μm) and more stable (cross-linked) than SAMs, patterned hybrid multilayers lend themselves more easily to the development of technology-relevant materials and characterization. This paper describes a facile two-step UV approach to patterning an alkylsilane multilayer by combining photoinduced self-assembly for multilayer synthesis and photodegradation through a mask for creating patterns within the film. In this second stage, a spatially resolved removal of the alkyl tail via a photooxidation mechanism took place, yielding regular and uniform silica microdomains. The result was a regular array of features (alkylsiloxane/silica) differing in chemical composition (hybrid/inorganic), ordering (crystal-like/disordered), and wettability (hydrophobic/hydrophilic). Such a photopatterned film was of utility for a range of applications in which water droplets, inorganic crystals, or aqueous polymer dispersions were selectively deposited in the hydrophilic silica microwells.

Ordered hybrids from template-free organosilane self-assembly

Despite considerable achievements over the last two decades, nonporous organic-inorganic hybrid materials are mostly amorphous, especially in the absence of solvothermal processes. The organosilane self-assembly approach is one of the few opportunities for creating a regular assembly of organic and inorganic moieties. Additionally, well-established organosilicon chemistry enables the introduction of numerous organic functionalities. The synthesis of periodically ordered hybrids relies on mono-, bis-, or multisilylated organosilane building blocks self-assembling into hybrid mesostructures or superstructures, subsequently cross-linked by siloxane Si-O-Si condensation. The general synthesis procedure is template-free and one-step. However, three concurrent processes underlie the generation of self-organized hybrid networks: thermodynamics of amphiphilic aggregation, dynamic self-assembly, and kinetically controlled sol-gel chemistry. Hence, the set of experimental conditions and the precursor structure are of paramount importance in achieving long-range order. Since the first developments in the mid-1990s, the subject has seen considerable progress leading to many innovative advanced nanomaterials providing promising applications in membranes, pollutant remediation, catalysis, conductive coatings, and optoelectronics. This work reviews, comprehensively, the primary evolution of this expanding field of research.