Silicon surface functionalization targeting Si-N linkages

Modulating the Conduction Band Energies of Si Electrode Interfaces Functionalized with Monolayers of a Bay-Substituted Perylene Bisimide

The confinement of π-conjugated chromophores on silicon (Si) electrode surfaces is a powerful approach to engineer electroresponsive monolayers relevant to microelectronics, electrocatalysis, and information storage and processing. While common strategies to functionalize Si interfaces exploit molecularly dissolved building blocks, only a handful number of studies have leveraged the structure-function relationships of π-aggregates to tune the electronic structures of hybrid monolayers at Si interfaces. Herein, we show that the semiconducting properties of n-type monolayers constructed on Si electrodes are intimately correlated to the initial aggregation state of π-conjugated chromophore precursors derived from bay-substituted perylene bisimide (PBI) units. Specifically, our study unravels that for n-type monolayers engineered using PBI π-aggregates, the cathodic reduction potentials required to inject negative charge carriers into the conduction bands can be stabilized by 295 mV through reversible switching of the maximum anodic potential (MAP) that is applied during the oxidative cycles (+0.5 or +1.5 V vs Ag/AgCl). This redox-assisted stabilization effect is not observed with n-type monolayers derived from molecularly dissolved PBI cores and monolayers featuring a low surface density of the redox-active probes. These findings unequivocally point to the crucial role played by PBI π-aggregates in modulating the conduction band energies of n-type monolayers where a high MAP of +1.5 V enables the formation of electronic trap states that facilitate electron injection when sweeping back to cathodic potentials. Because the structure-function relationships of PBI π-aggregates are shown to modulate the semiconducting properties of hybrid n-type monolayers constructed at Si interfaces, our results hold promising opportunities to develop redox-switchable monolayers for engineering nonvolatile electronic memory devices.

Selective etching of silicon nitride over silicon oxide using ClF3/H2 remote plasma

Precise and selective removal of silicon nitride (SiN_x) over silicon oxide (SiO_y) in a oxide/nitride stack is crucial for a current three dimensional NOT-AND type flash memory fabrication process. In this study, fast and selective isotropic etching of SiN_x over SiO_y has been investigated using a ClF₃/H₂ remote plasma in an inductively coupled plasma system. The SiN_x etch rate over 80 nm/min with the etch selectivity (SiN_x over SiO_y) of ~ 130 was observed under a ClF₃ remote plasma at a room temperature. Furthermore, the addition of H₂ to the ClF₃ resulted in an increase of etching selectivity over 200 while lowering the etch rate of both oxide and nitride due to the reduction of F radicals in the plasma. The time dependent-etch characteristics of ClF₃, ClF₃ & H₂ remote plasma showed little loading effect during the etching of silicon nitride on oxide/nitride stack wafer with similar etch rate with that of blank nitride wafer.

Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si-N Bonds

The reactivity of liquid hydrazine (N₂H₄) with respect to H-, Cl-, and Br-terminated Si(100) surfaces was investigated to uncover the principles of nitrogen incorporation into the interface. This process has important implications in a wide variety of applications, including semiconductor surface passivation and functionalization, nitride growth, and many others. The use of hydrazine as a precursor allows for reactions that exclude carbon and oxygen, the primary sources of contamination in processing. In this work, the reactivity of N₂H₄ with H- and Cl-terminated surfaces prepared by traditional solvent-based methods and with a Br-terminated Si(100) prepared in ultrahigh vacuum was compared. The reactions were studied with X-ray photoelectron spectroscopy, atomic force microscopy, and scanning tunneling microscopy, and the observations were supported by computational investigations. The H-terminated surface led to the highest level of nitrogen incorporation; however, the process proceeds with increasing surface roughness, suggesting possible etching or replacement reactions. In the case of Cl-terminated (predominantly dichloride) and Br-terminated (monobromide) surfaces, the amount of nitrogen incorporation on both surfaces after the reaction with hydrazine was very similar despite the differences in preparation, initial structure, and chemical composition. Density functional theory was used to propose the possible surface structures and to analyze surface reactivity.

Anti-Adhesion Behavior from Ring-Strain Amine Cyclic Monolayers Grafted on Silicon (111) Surfaces

In this manuscript, a series of amine tagged short cyclic molecules (cyclopropylamine, cyclobutylamine, cyclopentylamine and cyclohexylamine) were thermally grafted onto p-type silicon (111) hydride surfaces via nucleophilic addition. The chemistries of these grafting were verified via XPS, AFM and sessile droplet measurements. Confocal microscopy and cell viability assay was performed on these surfaces incubated for 24 hours with triple negative breast cancer cells (MDA-MB 231), gastric adenocarcinoma cells (AGS) endometrial adenocarcinoma (Hec1A). All cell types had shown a significant reduction when incubated on these ring-strain cyclic monolayer surfaces than compared to standard controls. The expression level of focal adhesion proteins (vinculin, paxilin, talin and zyxin) were subsequently quantified for all three cell types via qPCR analysis. Cells incubate on these surface grafting were observed to have reduced levels of adhesion protein expression than compared to positive controls (collagen coating and APTES). A potential application of these anti-adhesive surfaces is the maintenance of the chondrocyte phenotype during in-vitro cell expansion. Articular chondrocytes cultured for 6 days on ring strained cyclopropane-modified surfaces was able to proliferate but had maintained a spheroid/aggregated phenotype with higher COL2A1 and ACAN gene expression. Herein, these findings had help promote grafting of cyclic monolayers as an viable alternative for producing antifouling surfaces.

Modification of a H-terminated silicon surface by organic sulfide molecules: the mechanism and origin of reactivity

For the reactions of disulfide molecules (RSSR), the steric effect rather than the electronic effect of the R group is the main origin of the different reactivity. In the reactions of sulfide molecules (RSXR′, X = S, P, Si, O, N, C), charges on the S atom and dissociation energies of the S–X bonds have a great impact on the reactivity of these reactions.

29,31- H Phthalocyanine Covalently Bonded Directly to a Si(111) Surface Retains Its Metalation Ability

The reaction of metal-free phthalocyanine molecules with a chlorine-terminated Si(111) surface is investigated to produce a phthalocyanine functionality directly attached to a semiconductor surface, without additional linkers or layers. The carefully prepared Cl-Si(111) surface provides an oxygen-free substrate that is reacted with 29,31- H phthalocyanine (H₂Pc) in a wet-chemistry process resulting in HCl elimination. The in situ metalation of this H₂Pc-modified silicon surface with cobalt is confirmed, suggesting that the produced functionality is chemically active. These processes are investigated by X-ray photoelectron spectroscopy, Fourier-transform infrared spectroscopy, and time-of-flight secondary ion mass spectrometry supplemented by density functional theory calculations. The morphology of the surface is monitored by atomic force microscopy. The combined spectroscopic, microscopic, and theoretical investigations demonstrate that additional linkers are not required for phthalocyanine attachment to occur, as the direct attachment can take place by forming Si-N bonds, and that the resulting surface species can participate in a metalation process.

Dissociative adsorption of a multifunctional compound on a semiconductor surface: a theoretical study of the adsorption of hydroxylamine on Ge(100)

The adsorption behavior of hydroxylamine on a Ge(100) surface was investigated using density functional theory (DFT) calculations. These calculations predicted that hydroxylamine, a multifunctional compound consisting of a hydroxyl group and an amine group, would initially become adsorbed through N-dative bonding, or alternatively through the hydroxyl group via O-H dissociative adsorption. An N-O dissociative reaction may also occur, mainly via N-dative molecular adsorption, and the N-O dissociative product was calculated to be the most stable of all the possible adsorption structures. The calculations furthermore indicated the formation of the N-O dissociative product from the N-dative structure to be nearly barrierless and the dissociated hydroxyl and amine groups to be bonded to two Ge atoms of adjacent Ge dimers. Simulated STM images suggested the change in electron density that would occur upon adsorption of hydroxylamine in various adsorption configurations, and specifically indicated the N-O dissociative product to have greater electron density around the amine groups, and the hydroxyl groups to mainly contribute electron density to the unoccupied electronic states.

A first-principles study on the adsorption of ethylenediamine on Ge(100)

We have performed density functional theory (DFT) calculations of the atomic and electronic structures of ethylenediamine on Ge(100). The two amine groups in ethylenediamine can interact with germanium surface atoms through a N-H dissociative nucleophilic reaction and/or N-dative bonding with an electron-deficient down Ge atom. Of the monodentate and row-bridged bidentate structures that formed, the dative-bonded configurations were found to be more stable than the NH dissociative adsorption structures. The formation of row-bridged bidentate, structures is more favorable than that of on-top or end-bridged structures. In simulated STM images, the three types of row-bridged adsorption structure have characteristic features, and the row-bridged dative-bonded configuration gives rise to features due to both adsorbed ethylenediamine molecules and the underlying Ge atoms.

pH driven addressing of silicon nanowires onto Si3N4/SiO2 micro-patterned surfaces

pH was used as the main driving parameter for specifically immobilizing silicon nanowires onto Si3N4 microsquares at the surface of a SiO2 substrate. Different pH values of the coating aqueous solution enabled to experimentally distribute nanowires between silicon nitride and silicon dioxide: at pH 3 nanowires were mainly anchored on Si3N4; they were evenly distributed between SiO2 and Si3N4 at pH 2.8; and they were mainly anchored on SiO2 at pH 2. A theoretical model based on DLVO theory and surface protonation/deprotonation equilibria was used to study how, in adequate pH conditions, Si nanowires could be anchored onto specific regions of a patterned Si3N4/SiO2 surface. Instead of using capillary forces, or hydrophilic/hydrophobic contrast between the two types of materials, the specificity of immobilization could rely on surface electric charge contrasts between Si3N4 and SiO2. This simple and generic method could be used for addressing a large diversity of nano-objects onto patterned substrates.

Dehydrohalogenation Condensation Reaction of Phenylhydrazine with Cl-Terminated Si(111) Surfaces

Formation of stable organic-inorganic contacts with silicon often requires oxygen- and carbon-free interfaces. Some of the general approaches to create such interfaces rely on the formation of a Si-N bond. A reaction of dehydrohalogenation condensation of Cl-terminated Si(111) surface with phenylhydrazine is investigated as a means to introduce a simple function to the surface using a -NH-NH₂ moiety as opposed to previously investigated approaches. The use of substituted hydrazine allows for the formation of a stable structure that is less strained compared to the previously investigated primary amines and leads to minimal surface oxidation. The process is confirmed by a combination of infrared studies, X-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry investigations. Density functional theory is utilized to yield a plausible surface reaction mechanism and provide a set of experimental observables to compare with these data.

Orientation and stability of a bi-functional aromatic organic molecular adsorbate on silicon

In this work we combine scanning tunneling microscopy, near-edge X-ray absorption fine structure spectroscopy, X-ray photoemission spectroscopy and density functional theory to resolve a long-standing confusion regarding the adsorption behaviour of benzonitrile on Si(001) at room temperature.

Steric spacing of molecular linkers on passivated Si(111) photoelectrodes

Surfaces with high photoelectrochemical and electronic quality can be prepared by tethering small molecules to single-crystalline Si(111) surfaces using a two-step halogenation/alkylation method (by Lewis and co-workers).1-7 We report here that the surface coverage of custom-synthesized, phenyl-based molecular linkers can be controlled by varying the steric size of R-groups (R=CH3, C6H11, 2-ethylhexyl) at the periphery of the linker. Additionally, the linkers possess a para triflate group (-O2SCF3) that serves as a convenient analytical marker and as a point of covalent attachment for a redox active label. Quantitative X-ray photoelectron spectroscopy (XPS) measurements revealed that the surface coverage systematically varies according to the steric size of the linker: CH3 (6.7±0.8%), CyHex (2.9±1.2%), EtHex (2.1±0.9%). The stability of the photoelectrochemical cyclic voltammetry (PEC-CV) behavior was dependent on an additional methylation step (with CH3MgCl) to passivate residual Si(111)-Cl bonds. Subsequently, the triflate functional group was utilized to perform Pd-catalyzed Heck coupling of vinylferrocene to the surface-attached linkers. Ferrocene surface coverages measured from cyclic voltammetry on the ferrocene-functionalized surfaces Si(111)-8a/CH3-Fc (R=CH3) and Si(111)-8c/CH3-Fc (R=2-EtHex) are consistent with the corresponding Fe 2p XPS coverages and suggest a ∼1:1 conversion of surface triflate groups to vinyl-Fc sites. The surface defect densities of the linker/CH3 modified surfaces are dependent on the coverage and composition of the organic layer. Surface recombination velocity (SRV) measurements indicated that n-Si(111)-8a/CH3 and the ferrocene coupled n-Si(111)-8a/CH3-Fc exhibited relatively high surface carrier lifetimes (4.51 and 3.88 μs, respectively) and correspondingly low S values (3880 and 4510 cm s(-1)). Thus, the multistep, linker/Fc functionalized surfaces exhibit analogously low trap state densities as compared to the fully passivated n-Si(111)-CH3 surface.

Density functional theory with van der waals corrections study of the adsorption of alkyl, alkylthiol, alkoxyl, and amino-alkyl chains on the H:Si(111) surface

Surface modification of silicon with organic monolayers tethered to the surface by different linkers is an important process in realizing future miniaturized electronic and sensor devices. Understanding the roles played by the nature of the linking group and the chain length on the adsorption structures and stabilities of these assemblies is vital to advance this technology. This paper presents a density functional theory (DFT) study of the hydrogen passivated Si(111) surface modified with alkyl chains of the general formula H:Si-(CH2)n-CH2 and H:Si-X-(CH2)n-CH3, where X = NH, O, S and n = (0, 1, 3, 5, 7, 9, 11), at half coverage. For (X)-hexane and (X)-dodecane functionalization, we also examined various coverages up to full monolayer grafting in order to validate the result of half covered surface and the linker effect on the coverage. We find that it is necessary to take into account the van der Waals interaction between the alkyl chains. The strongest binding is for the oxygen linker, followed by S, N, and C, irrespective of chain length. The result revealed that the sequence of the stability is independent of coverage; however, linkers other than carbon can shift the optimum coverage considerably and allow further packing density. For all linkers apart from sulfur, structural properties, in particular, surface-linker-chain angles, saturate to a single value once n > 3. For sulfur, we identify three regimes, namely, n = 0-3, n = 5-7, and n = 9-11, each with its own characteristic adsorption structures. Where possible, our computational results are shown to be consistent with the available experimental data and show how the fundamental structural properties of modified Si surfaces can be controlled by the choice of linking group and chain length.

Multifunctional silicon surfaces: reaction of dichlorocarbene generated from Seyferth reagent with hydrogen-terminated silicon (111) surfaces

Insertion of dichlorocarbene (:CCl2), generated by decomposition of the Seyferth reagent PhHgCCl2Br, into the Si-H bond of a tertiary silane to form a Si-CCl2H group is an efficient homogeneous, molecular transformation. A heterogeneous version of this reaction, between PhHgCCl2Br and a silicon (111) surface terminated by tertiary Si-H bonds, was studied using a combination of surface-sensitive infrared and X-ray photoelectron spectroscopies. The insertion of dichlorocarbene into surface Si-H bonds parallels the corresponding reaction of silanes in solution, to produce surface-bound dichloromethyl groups (Si-CCl2H) covering ∼25% of the silicon surface sites. A significant fraction of the remaining Si-H bonds on the surface was converted to Si-Cl/Br groups during the same reaction, with PhHgCCl2Br serving as a halogen atom source. The presence of two distinct environments for the chlorine atoms (Si-CCl2H and Si-Cl) and one type of bromine atom (Si-Br) was confirmed by Cl 2p, Br 3d, and C 1s X-ray photoelectron spectroscopy. The formation of reactive, halogen-terminated atop silicon sites was also verified by reaction with sodium azide or the Grignard reagent (CH3MgBr), to produce Si-N3 or Si-Me functionalities, respectively. Thus, reaction of a hydrogen-terminated silicon (111) surface with PhHgCCl2Br provides a facile route to multifunctional surfaces possessing both stable silicon-carbon and labile silicon-halogen sites, in a single pot synthesis. The reactive silicon-halogen groups can be utilized for subsequent transformations and, potentially, the construction of more complex organic-silicon hybrid systems.

Formation of stable nitrene surface species by the reaction of adsorbed phenyl isocyanate at the Ge(100)-2 × 1 surface

The reaction of phenyl isocyanate (PIC) following adsorption at the Ge(100)-2 × 1 surface has been investigated both experimentally and theoretically by Fourier transform infrared (FTIR) spectroscopy, X-ray photoelectron spectroscopy, temperature-programmed desorption, quantum chemical calculations, and molecular dynamics simulations. PIC initially adsorbs by [2 + 2] cycloaddition across the C═N bond of the isocyanate, as previously reported, but this initial product converts to a second product on the time scale of minutes at room temperature. The experimental and theoretical results show that the second product formed is phenylnitrene (C6H5N) covalently bonded to the germanium surface via a single Ge-N bond. This conclusion is further supported by FTIR spectroscopy experiments and density functional theory calculations using phenyl isocyanate-(15)N and phenyl-d5 isocyanate.

Recyclable functionalization of silica with alcohols via dehydrogenative addition on hydrogen silsesquioxane

Synthesis of class II hybrid silica materials requires the formation of covalent linkage between organic moieties and inorganic frameworks. The requirement that organosilylating agents be present to provide the organic part limits the synthesis of functional inorganic oxides, however, due to the water sensitivity and challenges concerning purification of the silylating agents. Synthesis of hybrid materials with stable molecules such as simple alcohols, rather than with these difficult silylating agents, may therefore provide a path to unprecedented functionality. Herein, we report the novel functionalization of silica with organic alcohols for the first time. Instead of using hydrolyzable organosilylating agents, we used stable organic alcohols with a Zn(II) catalyst to modify the surface of a recently discovered highly reactive macro-mesoporous hydrogen silsesquioxane (HSQ, HSiO1.5) monolith, which was then treated with water with the catalyst to form surface-functionalized silica. These materials were comprehensively characterized with FT-IR, Raman, solid-state NMR, fluorescence spectroscopy, thermal analysis, elemental analysis, scanning electron microscopy, and nitrogen adsorption-desorption measurements. The results obtained from these measurements reveal facile immobilization of organic moieties by dehydrogenative addition onto surface silane (Si-H) at room temperature with high loading and good tolerance of functional groups. The organic moieties can also be retrieved from the monoliths for recycling and reuse, which enables cost-effective and ecological use of the introduced catalytic/reactive surface functionality. Preservation of the reactivity of as-immobilized organic alcohols has been confirmed, moreover, by successfully performing copper-catalyzed azide-alkyne cycloaddition (CuAAC) "click" reactions on the immobilized silica surfaces.