Phase Behavior of Polystyrene-b-poly(methyl methacrylate) Diblock Copolymer

Spatially Amplified and Rigid Junction in Diblock Copolymers: Reduced Microphase Separation Size via Interface Expansion

We introduce an approach in diblock copolymer design, where modifying the junction point with rigid bulky monomer expands the cross-sectional area of the interface and leads to a decrease in the repeat period. Using living anionic polymerization, we synthesized a series of dialkynyl midfunctionalized poly(styrene-b-methyl methacrylate) (PSM-DA) and functionalized them using the thiol-alkyne click reaction with specifically selected rigid bulky monomers: PSS-(3-mercapto)propyl-heptaisobutyl substituted (PSS) and 1-adamantanethiol (ADA). This modification, though involving only a single monomer unit within the diblock copolymer structure, brought about a significant reduction in domain size, with PSS and ADA reducing it by 18% and 15%, respectively. The results indicate a method for reducing the domain sizes of block copolymers, which could lead to advancements in lithography and various nanotechnological applications.

Hiking down the Free Energy Landscape Using Sequential Solvent and Thermal Processing for Versatile Ordering of Block Copolymer Films

The kinetics and morphology of the ordering of block copolymer (BCP) films are highly dependent on the processing pathway, as the enthalpic and entropic forces driving the ordering processes can be quite different depending on process history. We may gain some understanding and control of this variability of BCP morphology with processing history through a consideration of the free energy landscape of the BCP material and a consideration of how the processing procedure moves the system through this energy landscape in a way that avoids having the system becoming trapped into well-defined metastable minima having a higher free energy than the target low free energy ordered structure. It is well known that standard thermal annealing (TA) of BCPs leads to structures corresponding to a well-defined stable free energy minimum; however, the BCP must be annealed for a very long time before the target low free energy structures can be achieved. Herein, we show that the same target low-energy structure can be achieved relatively quickly by subjecting as-cast films to an initial solvent annealing [direct immersion annealing (DIA) or solvent vapor annealing (SVA)] procedure, followed by a short period of TA. This process relies on lowering the activation energy barrier by reducing the glass-transition temperature through DIA (or SVA), followed by a multi-interface chain rearrangement through sequential TA. This energy landscape approach to ordering should be applicable to the process design for ordering many other complex materials.

Effect of Disparity in Self Dispersion Interactions on Phase Behaviors of Molten A-b-B Diblock Copolymers

Phase behaviors of molten A-b-B diblock copolymers with disparity in self dispersion interactions are revisited here. A free energy functional is obtained for the corresponding Gaussian copolymers under the influence of effective interactions originating in the localized excess equation of state. The Landau free energy expansion is then formulated as a series in powers of A and B density fluctuations up to 4th order. An alternative and equivalent Landau energy is also provided through the transformation of the order parameters to the fluctuations in block density difference and free volume fraction. The effective Flory χ is elicited from its quadratic term as the sum of the conventional enthalpic χH and the entropic χS that is related to energetic asymmetry mediated by copolymer bulk modulus. It is shown that the cubic term is balanced with Gaussian cubic vertex coefficients in corporation with energetics to yield a critical point at a composition rich in a component with stronger self interactions. The full phase diagrams with classical mesophases are given for the copolymers exhibiting ordering upon cooling and also for others revealing ordering reversely upon heating. These contrasting temperature responses, along with the skewness of phase boundaries, are discussed in relation to χH and χS. The pressure dependence of their ordering transitions is either barotropic or baroplastic; or anomalously exhibits anomalously both at different stages. These actions are all explained by the opposite responses of χH and χS to pressure.

Installing a functional group into the inactive ω-chain end of PMMA and PS-b-PMMA by terminal-selective transesterification

Various functional groups were incorporated into the inherently inactive ω-chain end of polymethacrylate-based polymers by terminal-selective transesterification.

Monitoring morphology evolution within block copolymer microparticles during dispersion polymerisation in supercritical carbon dioxide: a high pressure SAXS study

Monitoring morphology development and evolution within block copolymer microparticles dispersed in supercritical CO₂ using in situ SAXS.

Estimating the Segregation Strength of Microphase-Separated Diblock Copolymers from the Interfacial Width

The ever-growing catalog of monomers being incorporated into block polymers affords exceptional control over phase behavior and nanoscale structure. The segregation strength, χ N , is the fundamental link between the molecular-level detail and the thermodynamics. However, predicting phase behavior mandates at least one experimental measurement of χ N for each pair of blocks. This typically requires access to the disordered state. We describe a method for estimating χ N from small-angle X-ray scattering measurements of the interfacial width between lamellar microdomains, t x , in the microphase-separated melt. The segregation strength is determined by comparing t x to self-consistent field theory calculations of the intrinsic interfacial width, t i , as a function of the mean-field χ N . The method is validated using a series of independent experimental measurements of t x and χ N , measured via the order-disorder transition temperature, T ODT . The average absolute relative difference between χ N calculated from t x and the value calculated from T ODT is a modest 11%. Corrections for nonplanarity of the interfaces are investigated but do not improve the agreement between the experiments and theory. Published 2019. This article is a U.S. Government work and is in the public domain in the USA.

Giant Gyroid and Templates from High-Molecular-Weight Block Copolymer Self-assembly

We present a feasible approach to the direct development of three-dimensionally (3D) bicontinuous gyroid (GYR) nanostructure in high-molecular-weight, composition-controlled polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) films. The use of a neutral solvent vapor to elaborately control the swelling of block copolymer (BCP) films is essential to generate a direct pathway to GYR (or giant GYR) structure through a hexagonal (HEX) cylindrical morphology in the same material, because the thermal ordering of highly entangled BCP imposes the limit on the chain mobility. Along with the improved mechanical strength arising from the high molecular weight property of the polymers, the structural integrity and overall excellence of a large-scale GYR morphology were confirmed by the results of membrane performance, which showed greater permeability through the nanoporous GYR structure up to by a factor of three than that through the HEX structure. Moreover, a 3D nanoporous GYR template was applied to an affordable material to reproduce an inverse skeletal replica of the GYR structure with its structure being uniformly interconnected. This simple approach to the GYR template, owing to its structural tunability in a controlled composition of BCP, is anticipated to be applicable to a wide range of materialization for practical systems.

Micrometer-Scale Ordering of Silicon-Containing Block Copolymer Thin Films via High-Temperature Thermal Treatments

Block copolymer (BCP) self-assembly is expected to complement conventional optical lithography for the fabrication of next-generation microelectronic devices. In this regard, silicon-containing BCPs with a high Flory-Huggins interaction parameter (χ) are extremely appealing because they form high-resolution nanostructures with characteristic dimensions below 10 nm. However, due to their slow self-assembly kinetics and low thermal stability, these silicon-containing high-χ BCPs are usually processed by solvent vapor annealing or in solvent-rich ambient at a low annealing temperature, significantly increasing the complexity of the facilities and of the procedures. In this work, the self-assembly of cylinder-forming polystyrene-block-poly(dimethylsiloxane-random-vinylmethylsiloxane) (PS-b-P(DMS-r-VMS)) BCP on flat substrates is promoted by means of a simple thermal treatment at high temperatures. Homogeneous PS-b-P(DMS-r-VMS) thin films covering the entire sample surface are obtained without any evidence of dewetting phenomena. The BCP arranges in a single layer of cylindrical P(DMS-r-VMS) nanostructures parallel-oriented with respect to the substrate. By properly adjusting the surface functionalization, the heating rate, the annealing temperature, and the processing time, one can obtain correlation length values larger than 1 μm in a time scale fully compatible with the stringent requirements of the microelectronic industry.

Rapid thermal processing of self-assembling block copolymer thin films

Self-assembling block copolymers generate nanostructured patterns which are useful for a wide range of applications. In this paper we demonstrate the capability to control the morphology of the self-assembling process of PS-b-PMMA diblock copolymer thin films on unpatterned surfaces by means of fast thermal treatment performed in a rapid thermal processing machine. The methodology involves the use of radiation sources in order to rapidly drive the polymeric film above the glass transition temperature. Highly ordered patterns were obtained for perpendicular-oriented cylindrical and lamellar PS-b-PMMA block copolymers in less than 60 s. This approach offers the unprecedented opportunity to investigate in detail the kinetics of the block copolymer self-assembly during the early stages of the process, providing a much deeper understanding of the chemical and physical phenomena governing these processes.

Dielectric and molecular dynamics study of the secondary relaxations of poly(styrene-co-methylmethacrylate) copolymers: Influence of the molecular architecture

The effect of the structure of copolymers (random, alternate or diblock) on their dynamics has been studied by dielectric spectroscopy. Six copolymers of styrene and methyl methacrylate (three diblocks, one alternate and two random) have been studied. The results show that the sub- T (g) transitions of the diblock samples can be described by one asymmetric Havriliak-Negami (HN) function, while two are necessary for the rest of the copolymers (β and γ relaxations). The characteristic times of the sub- T (g) relaxations show an Arrhenius temperature dependence and there is a strong coupling of the α and β relaxations at high temperatures. The deconvolution of the merging relaxations has been made in the framework of the Williams Ansatz set out in terms of Havriliak-Negami distributions. Because the 2D (2)H-NMR results excluded any significant contribution from the rotation of the methoxy group of the methacrylate group around the C-OCH(3) bond, the γ relaxation may be assigned to the rotation of the methyl methacrylate group in a styrene-rich environment. The Molecular Dynamics simulations of a poly(methyl methacrylate) homopolymer and of the alternate copolymer are in qualitative agreement with the experimental results, although they predict smaller values for the activation energy of the sub- T (g) relaxations.