Single-Grain Lamellar Microdomain from a Diblock Copolymer

The Influence of Annealing Atmosphere, Blending Ratio, and Molecular Weight on the Phase Behavior of Blend Materials

In the study of block copolymers, many parameters need to be adjusted to obtain good phase separation results. Based on block copolymer polystyrene-b-polycarbonate and homopolymer polystyrene, the effects of the annealing atmosphere, blending ratio, and molecular weight on phase separation were studied. The results show that annealing in air can inhibit the occurrence of phase separation. In addition, snowflake patterns are formed during phase separation. The blending ratio affects the quality of the pattern. The molecular weight affects the size of the pattern, and the size increases as the molecular weight increases. In this article, the influence of process conditions and materials on phase separation was discussed, which has laid a solid foundation for the development of block copolymer self-assembly in the future.

Macroscopic Alignment of Block Copolymers on Silicon Substrates by Laser Annealing

Laser annealing is a competitive alternative to conventional oven annealing of block copolymer (BCP) thin films enabling rapid acceleration and precise spatial control of the self-assembly process. Localized heating by a moving laser beam (zone annealing), taking advantage of steep temperature gradients, can additionally yield aligned morphologies. In its original implementation it was limited to specialized germanium-coated glass substrates, which absorb visible light and exhibit low-enough thermal conductivity to facilitate heating at relatively low irradiation power density. Here, we demonstrate a recent advance in laser zone annealing, which utilizes a powerful fiber-coupled near-IR laser source allowing rapid BCP annealing over a large area on conventional silicon wafers. The annealing coupled with photothermal shearing yields macroscopically aligned BCP films, which are used as templates for patterning metallic nanowires. We also report a facile method of transferring laser-annealed BCP films onto arbitrary surfaces. The transfer process allows patterning substrates with a highly corrugated surface and single-step rapid fabrication of multilayered nanomaterials with complex morphologies.

Lithography-Free Route to Hierarchical Structuring of High-χ Block Copolymers on a Gradient Patterned Surface

A chemically defined patterned surface was created via a combined process of controlled evaporative self-assembly of concentric polymer stripes and the selective surface modification of polymer brush. The former process involved physical adsorption of poly (methyl methacrylate) (PMMA) segments into silicon oxide surface, thus forming ultrathin PMMA stripes, whereas the latter process was based on the brush treatment of silicon native oxide surface using a hydroxyl-terminated polystyrene (PS-OH). The resulting alternating PMMA- and PS-rich stripes provided energetically favorable regions for self-assembly of high χ polystyrene-block-polydimethylsiloxane (PS-b-PDMS) in a simple and facile manner, dispensing the need for conventional lithography techniques. Subsequently, deep reactive ion etching and oxygen plasma treatment enabled the transition of the PDMS blocks into oxidized groove-shaped nanostructures.

Preparation of Macroscopic Block-Copolymer-Based Gyroidal Mesoscale Single Crystals by Solvent Evaporation

Properties arising from ordered periodic mesostructures are often obscured by small, randomly oriented domains and grain boundaries. Bulk macroscopic single crystals with mesoscale periodicity are needed to establish fundamental structure-property correlations for materials ordered at this length scale (10-100 nm). A solvent-evaporation-induced crystallization method providing access to large (millimeter to centimeter) single-crystal mesostructures, specifically bicontinuous gyroids, in thick films (>100 µm) derived from block copolymers is reported. After in-depth crystallographic characterization of single-crystal block copolymer-preceramic nanocomposite films, the structures are converted into mesoporous ceramic monoliths, with retention of mesoscale crystallinity. When fractured, these monoliths display single-crystal-like cleavage along mesoscale facets. The method can prepare macroscopic bulk single crystals with other block copolymer systems, suggesting that the method is broadly applicable to block copolymer materials assembled by solvent evaporation. It is expected that such bulk single crystals will enable fundamental understanding and control of emergent mesostructure-based properties in block-copolymer-directed metal, semiconductor, and superconductor materials.

Solvent Effect on the Self-Assembly of a Thin Film Consisting of Y-Shaped Copolymer

The self-assembly of an amphiphilic Y-shaped copolymer consisting of two hydrophilic branches and one hydrophobic branch in a thin film is investigated under different conditions by virtue of mesoscopic computer modelling, accompanied by doping with a single solvent, doping with a binary solvent, and those solvent environments together with the introduction of confinement defined by various acting distances and influencing regions. A cylindrical micellar structure is maintained, as it is in the thin film with the doping of either 10% hydrophobic solvent or 10% hydrophilic solvent, whose structure consists of the hydrophobic core and hydrophilic shell. Attributed to the hydrophobicity/hydrophilia nature of the solvents, different solvents play an obvious role on the self-assembled structure, i.e., the hydrophobic solvent presents as a swelling effect, conversely, the hydrophilic solvent presents as a shrinking effect. Further, the synergistic effect of the binary solvents on the self-assembly produces the lowest values in both the average volumetric size and free energy density when the quantity of hydrophobic solvent and hydrophilic solvent is equivalent. Interestingly, the solvent effect becomes more pronounced under the existent of a confinement. When a lateral-oriented confinement is introduced, a periodically fluctuating change in the cylindrical size occurs in two near-wall regions, but the further addition of either hydrophobic or hydrophilic solvent can effectively eliminate such resulting hierarchical-sized cylinders and generate uniform small-sized cylinders. However, with the introduction of a horizontal-orientated confinement, the copolymers self-assemble into the spherical micellar structure. Moreover, the further addition of hydrophobic solvent leads to a decrease in the average size of micelles via coalescence mechanism, in contrast, the further addition of hydrophilic solvent causes an increase in the average size of micelles via splitting mechanism. These findings enrich our knowledge of the potential for the solvent effect on the self-assembly of amphiphilic copolymer system, and then provide theoretical supports on improving and regulating the mesoscopic structure of nanomaterials.

Thermal Approaches to Perpendicular Block Copolymer Microdomains in Thin Films: A Review and Appraisal

Block copolymer thin films are highly versatile and accessible materials capable of producing nanofeatures in the size regime of a few to hundreds of nanometers by a simple spin-coating-and-anneal process. Unfortunately, this simple protocol usually leads to parallel microdomains, which limits the applicability of such nanofeatures. A great deal of effort has been put into achieving perpendicular microdomains, but those that incorporate thermal annealing are arguably the most practical and reproducible in the lab and industry. This review discusses the recent ongoing efforts on various thermal approaches to achieving perpendicular microdomains in order to provide the readers with a toolbox to work with.

Surface functionalized nanostructures via position registered supramolecular polymer assembly

Versatile control of cylindrical nanostructures formed by supramolecular assembly of end-functionalized polymer blends is demonstrated not only in their orientation over large areas but also in their surface chemical functionalities. Two binary blends consisting of supramolecular analogues of diblock copolymers with complementary end-sulfonated and aminated groups are investigated, viz., mono-end-functionalized polymers of (i) one-end-sulfonated polystyrene (SPS) and one-end-aminated poly(butadiene) (APBD) and (ii) one end-aminated polystyrene (APS) and one end-sulfonated poly(butadiene) (SPBD). The orientation of the cylinders with respect to the substrate surface depends on the solvent annealing time; either hexagonally ordered vertical cylinders or in-plane ones are readily obtained by controlling the solvent annealing time. Selective chemical etching of one of the polymers provides four different chemically modified nanostructures, viz., hexagonally ordered cylindrical holes and cylindrical posts with either sulfonate or amine surface functional groups. Additional supramolecular assembly is successfully achieved by solution coating either polymers or organic dyes that complementarily interact with the functional groups on the nanostructures. Furthermore, the supramolecularly assembled nanostructures are controlled by confining them to topographically pre-patterned Si substrates with pattern geometries of various shapes and sizes to produce globally ordered vertical or in-plane cylinders with chemical functionalities on their surfaces.

Self-assembled morphologies of an amphiphilic Y-shaped weak polyelectrolyte in a thin film

Different from the self-assembly of neutral polymers, polyelectrolytes self-assemble into smaller aggregates with a more loosely assembled structure, which results from the repulsive forces acting between similar electrical compositions with the introduction of ions. The Y-shaped weak polyelectrolytes self-assemble into a core-shell type cylindrical structure with a hexagonal arrangement in a thin film, whose thickness is smaller than the gyration radius of the polymer chain. The corresponding formation mechanism consists of enrichment of the same components, adjustment of the shape of the aggregate, and the subsequent separation into individual aggregates. With the increase in the thickness of the thin film until it exceeds the gyration radius of the polymer chain, combined with the greater freedom of movement along the direction of thin film thickness, the self-assembled structure changes into a micellar structure. Under confinement, the repulsive force to the polymeric components is weakened by the repulsive forces among polyelectrolyte components with like charges, and this helps in generating aggregates with more uniform size and density distribution. In particular, when the repulsive force between the walls and the core forming components is greater than that between the walls and the shell forming components, such asymmetric confinement produces a crossed-cylindrical structure with nearly perpendicular arrangement of two cylinder arrays. Similarly, a novel three-crossed cylinder morphology is self-assembled upon removal of confinement.

One-dimensional Confinement Effect on the Self-assembly of Symmetric H-shaped Copolymers in a Thin Film

The self-assembly of a reformed symmetric H-shaped copolymer with four hydrophilic branches and one hydrophobic stem was systematically investigated. The existence of vacancies is vital to regulate the sizes of self-assembled cylinders to be able to form a hexagonal arrangement. With the introduction of horizontal-orientated confinement, a micellar structure is formed through a coalescence mechanism. The short acting distance and large influencing area of the confinement produces numerous small-sized micelles. Additionally, the cycled “contraction-expansion” change helps achieve hexagonal arrangement. In contrast, the introduction of lateral-oriented confinement with long acting distance and small influencing area cannot change the cylindrical structure. Under the fission mechanism, in which the larger cylinder splits into smaller ones, it is quite efficient to generate hierarchical-sized cylinders from larger-sized cylinders in the middle region and smaller-sized cylinders near both walls. The results indicate the possibility of regulating the characteristics of a nanomaterial by tuning the molecular structure of the copolymer and the parameters of the introduced confinement, which are closely related to the self-assembly structure.

Numerical Simulations of Directed Self-Assembly in Diblock Copolymer Films using Zone Annealing and Pattern Templating

Bulk fabrication of surface patterns with sub-20 nm feature sizes is immensely desirable for many existing and emerging technologies. Directed self-assembly (DSA) of block copolymers (BCPs) has been a recently demonstrated approach to achieve such feature resolution over large-scale areas with minimal defect populations. However, much work remains to understand and optimize DSA methods in order to move this field forward. This paper presents large-scale numerical simulations of zone annealing and chemo-epitaxy processing of BCP films to achieve long-range orientational order. The simulations utilize a Time-Dependent Ginzburg-Landau model and parallel processing to elucidate relationships between the magnitude and velocity of a moving thermal gradient and the resulting BCP domain orientations and defect densities. Additional simulations have been conducted to study to what degree orientational order can be further improved by combining zone annealing and chemo-epitaxy techniques. It is found that these two DSA methods do synergistically enhance long-range order with a particular relationship between thermal gradient velocity and chemical template spacing.

Rapid ordering of block copolymer thin films

Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be finely tuned via block architecture and processing conditions. However, the ultimate usage of these materials in real-world applications may be hampered by the extremely long thermal annealing times-hours or days-required to achieve good order. Here, we provide an overview of the fundamentals of block-copolymer self-assembly kinetics, and review the techniques that have been demonstrated to influence, and enhance, these ordering kinetics. We discuss the inherent tradeoffs between oven annealing, solvent annealing, microwave annealing, zone annealing, and other directed self-assembly methods; including an assessment of spatial and temporal characteristics. We also review both real-space and reciprocal-space analysis techniques for quantifying order in these systems.

Reordering transitions during annealing of block copolymer cylinder phases

While equilibrium block-copolymer morphologies are dictated by energy-minimization effects, the semi-ordered states observed experimentally often depend on the details of ordering pathways and kinetics. Here, we explore reordering transitions in thin films of block-copolymer cylinder-forming polystyrene-block-poly(methyl methacrylate). We observe several transient states as films order towards horizontally-aligned cylinders. In particular, there is an early-stage reorganization from randomly-packed cylinders into hexagonally-packed vertically-aligned cylinders; followed by a reorientation transition from vertical to horizontal cylinder states. These transitions are thermally activated. The growth of horizontal grains within an otherwise vertical morphology proceeds anisotropically, resulting in anisotropic grains in the final horizontal state. The size, shape, and anisotropy of grains are influenced by ordering history; for instance, faster heating rates reduce grain anisotropy. These results help elucidate aspects of pathway-dependent ordering in block-copolymer thin films.

Perpendicular Block Copolymer Microdomains in High Aspect Ratio Templates

Perpendicular orientation of lamellar microdomains in a high interaction parameter block copolymer was obtained within high aspect ratio gratings functionalized with a preferential sidewall brush. The experiments used polystyrene-block-polydimethylsiloxane (PS-b-PDMS) with molecular weight 43 kg/mol within trenches made using interference lithography. The perpendicular alignment was obtained for both thermal and solvent annealing, using three different solvent vapors, for a range of film thicknesses and trench widths. A platinum (Pt) layer at the base of the trenches avoided the formation of a wetting layer, giving perpendicular orientation at the substrate surface. The results are interpreted using self-consistent field theory simulation and a Ginzburg-Landau analytic model to map the energies of lamellae of different orientations as a function of the grating aspect ratio and the surface energies of the sidewalls and top and bottom surfaces. The model results agree with the experiment and provide a set of guidelines for obtaining perpendicular microdomains within topographic features.

Thermally-induced transition of lamellae orientation in block-copolymer films on 'neutral' nanoparticle-coated substrates

Block-copolymer orientation in thin films is controlled by the complex balance between interfacial free energies, including the inter-block segregation strength, the surface tensions of the blocks, and the relative substrate interactions. While block-copolymer lamellae orient horizontally when there is any preferential affinity of one block for the substrate, we recently described how nanoparticle-roughened substrates can be used to modify substrate interactions. We demonstrate how such 'neutral' substrates can be combined with control of annealing temperature to generate vertical lamellae orientations throughout a sample, at all thicknesses. We observe an orientational transition from vertical to horizontal lamellae upon heating, as confirmed using a combination of atomic force microscopy (AFM), neutron reflectometry (NR) and rotational small-angle neutron scattering (RSANS). Using molecular dynamics (MD) simulations, we identify substrate-localized distortions to the lamellar morphology as the physical basis of the novel behavior. In particular, under strong segregation conditions, bending of horizontal lamellae induce a large energetic cost. At higher temperatures, the energetic cost of conformal deformations of lamellae over the rough substrate is reduced, returning lamellae to the typical horizontal orientation. Thus, we find that both surface interactions and temperature play a crucial role in dictating block-copolymer lamellae orientation. Our combined experimental and simulation findings suggest that controlling substrate roughness should provide a useful and robust platform for controlling block-copolymer orientation in applications of these materials.

Directed self-assembly of cylinder-forming diblock copolymers on sparse chemical patterns

Using both theory and experiment, we investigate the possibility of creating perfectly ordered block copolymer nanostructures on sparsely patterned substrates. Our study focuses on scrutinizing the appropriate pattern conditions to avoid undesired morphologies or defects when depositing cylinder-forming AB diblock copolymer thin films on the substrates which are mostly neutral with periodic stripe regions preferring the minority domain. By systematically exploring the parameter space using self-consistent field theory (SCFT), the optimal conditions for target phases are determined, and the effects of the chemical pattern period and the block copolymer film thickness on the target phase stability are also studied. Furthermore, as a sample experimental system, almost perfectly aligned polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers are demonstrated. After the pattern transfer process, highly ordered Al nanodot arrays following the initial vertically aligned cylinder pattern are created. This systematic study demonstrates the ability to control the structure and the position of nanopatterns on sparse chemical patterns.

Millisecond Ordering of Block Copolymer Films via Photothermal Gradients

For the promise of self-assembly to be realized, processing techniques must be developed that simultaneously enable control of the nanoscale morphology, rapid assembly, and, ideally, the ability to pattern the nanostructure. Here, we demonstrate how photothermal gradients can be used to control the ordering of block copolymer thin films. Highly localized laser heating leads to intense thermal gradients, which induce a thermophoretic force on morphological defects. This increases the ordering kinetics by at least 3 orders of magnitude compared to conventional oven annealing. By simultaneously exploiting the thermal gradients to induce shear fields, we demonstrate uniaxial alignment of a block copolymer film in less than a second. Finally, we provide examples of how control of the incident light field can be used to generate prescribed configurations of block copolymer nanoscale patterns.

Directed self-assembly of silicon-containing block copolymer thin films

The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-PTMSS, L0=22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-epitaxy, using hydrogen silsesquioxane (HSQ) based prepatterns, achieved density multiplications up to 6× and trench space subdivisions up to 7×, respectively. These results establish the compatibility of DSA techniques with a high etch contrast, Si-containing BCP that requires a top coat neutral layer to enable orientation.

Microphase Separation of a PS-b-PFS Block CopolymerviaSolvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology

Block copolymer (BCP) lithography makes use of the microphase separation properties of BCPs to pattern ordered nanoscale features over large areas. This work presents the microphase separation of an asymmetric polystyrene-block-poly(ferrocenyl dimethylsilane) (PS-b-PFS) BCP that allows ordered arrays of nanostructures to be formed by spin casting PS-b-PFS on substrates and subsequent solvent annealing. The effects of the solvent annealing conditions on self-assembly and structural stability are discussed.

Enhanced vertical ordering of block copolymer films by tuning molecular mass

An orientation transition with increasing BCP molecular mass from a parallel to a perpendicular orientation.

Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter

Self-assembly of soft materials is broadly considered an attractive means of generating nanoscale structures and patterns over large areas. However, the spontaneous formation of equilibrium nanostructures in response to temperature and concentration changes, for example, must be guided to yield the long-range order and orientation required for utility in a given scenario. In this review we examine directed self-assembly (DSA) of block copolymers (BCPs) as canonical examples of nanostructured soft matter systems which are additionally compelling for creating functional materials and devices. We survey well established and newly emerging DSA methods from a tutorial perspective. Special emphasis is given to exploring underlying physical phenomena, identifying prototypical BCPs that are compatible with different DSA techniques, describing experimental methods and highlighting the attractive functional properties of block copolymers overall. Finally we offer a brief perspective on some unresolved issues and future opportunities in this field.

Facile control of long range orientation in mesoporous carbon films with thermal zone annealing velocity

Ordered mesoporous carbons exhibit appealing properties for many applications, but their function and performance can depend critically on their structure. The in-plane orientation of 2D cylinders from the cooperative assembly of Pluronic P123 and resol has been controlled by application of cold zone annealing (CZA). By varying the moving rate, the preferential in-plane orientation of the self-assembled cylinders can be tuned through the entire 180° range possible from ϕ = 50° to ϕ = -130° (relative to the moving direction). At a moving rate of 2 μm s(-1), this simple and easy CZA process leads to cylinders that are well aligned parallel to the moving direction with a high orientational factor of S = 0.98. Moreover, the in-plane oriented cylinders can be nearly perfectly aligned transverse to the moving direction (S = 0.95) by simply decreasing the moving velocity to 0.5 μm s(-1). We attribute the parallel alignment to the flow that develops from the motion of the thermal gradients, while the transverse alignment is related to flow cessation (inertial effect). The preferential orientation is retained through the carbonization process, but there is some degradation in orientation due to insufficient crosslinking of the resol during CZA; this effect is most prominent for the higher moving rates (less time for crosslinking), but can be overcome by post-CZA annealing at uniform elevated temperatures to further crosslink the resol. CZA is a simple and powerful method for fabricating well-aligned and self-assembled mesoporous carbon films over large areas.

Large-scale roll-to-roll fabrication of vertically oriented block copolymer thin films

Large-scale roll-to-roll (R2R) fabrication of vertically oriented nanostructures via directed self-assembly of cylindrical block copolymer (c-BCP) thin films is reported. Nearly 100% vertical orientation of cylinders in sub-100 nm c-BCP films under optimized processing via a dynamic sharp temperature gradient field termed Cold Zone Annealing-Sharp or 'CZA-S' is achieved, with successful scale-up on a prototype custom-built 70 ft × 1 ft R2R platform moving at 25 μm/s, with 9 consecutive CZA units. Static thermal annealing of identical films in a conventional vacuum oven fails to produce comparable results. As a potential for applications, we fabricate high-density silicon oxide nanodot arrays from the CZA-S annealed BCP thin film template.

Highly Aligned Block Copolymer Thin Films by Synergistic Coupling of Static Graphoepitaxy and Dynamic Thermal Annealing Fields

Directed self-assembly of cylinder forming block copolymer (c-BCP) thin films via a dynamic thermal field on multidimensional symmetric graphoepitaxy channels is reported. A synergy of dynamic thermal and static boundary fields induces highly aligned c-BCP cylinders inside the channels with a power law dependence of orientational order parameter f, on trench width, f ∼ d^-0.3, analogous to dual-field alignment of semiconducting metals and liquid crystals on graphoepitaxy surfaces, f' ∼ d^-1. Static thermal annealing of identical films in a vacuum oven for several days fails to produce comparable results. Furthermore, we demonstrate global c-BCP cylinder alignment over mesas and trenches by tuning the synergy between the dynamic thermal field and asymmetry of the graphoepitaxy static field.

Spatial and orientation control of cylindrical nanostructures in ABA triblock copolymer thin films by raster solvent vapor annealing

We present a spatially resolved approach for the solvent vapor annealing (SVA) of block copolymer thin films that permits the facile and relatively rapid manipulation of nanoscale ordering and nanostructure orientation. In our method, a localized (point) SVA zone is created through the use of a vapor delivery nozzle. This point annealing zone can be rastered across the thin film using a motorized stage to control the local nanoscale structure and orientation in a cylinder-forming ABA triblock copolymer thin film. At moderate rastering speeds (∼100 μm/s) (i.e., relatively modest annealing time at a given point), the film displayed ordered cylindrical nanostructures with the cylinders oriented parallel to the substrate surface. As the rastering speed was decreased (∼10 μm/s), the morphology transformed into a surface nanostructure indicative of cylinders oriented perpendicular to the substrate surface. These perpendicular cylinder orientations also were created by rastering multiple times over the same region, and this effect was found when rastering in either retrace (overlapping) or crossed-path (orthogonal) geometries. Similar trends in nanostructure orientation and ordering were obtained from various nozzle diameters by accounting for differences in solvent flux and annealing time, illustrating the universality of this approach. Finally, we note that our "stylus-based" raster solvent vapor annealing technique allows a given point to be solvent annealed approximately 2 orders of magnitude faster than conventional "bell jar" solvent vapor annealing.

Dynamic thermal field-induced gradient soft-shear for highly oriented block copolymer thin films

As demand for smaller, more powerful, and energy-efficient devices continues, conventional patterning technologies are pushing up against fundamental limits. Block copolymers (BCPs) are considered prime candidates for a potential solution via directed self-assembly of nanostructures. We introduce here a facile directed self-assembly method to rapidly fabricate unidirectionally aligned BCP nanopatterns at large scale, on rigid or flexible template-free substrates via a thermally induced dynamic gradient soft-shear field. A localized differential thermal expansion at the interface between a BCP film and a confining polydimethylsiloxane (PDMS) layer due to a dynamic thermal field imposes the gradient soft-shear field. PDMS undergoes directional expansion (along the annealing direction) in the heating zone and contracts back in the cooling zone, thus setting up a single cycle of oscillatory shear (maximum lateral shear stress ∼12 × 10(4) Pa) in the system. We successfully apply this process to create unidirectional alignment of BCP thin films over a wide range of thicknesses (nm to μm) and processing speeds (μm/s to mm/s) using both a flat and patterned PDMS layer. Grazing incidence small-angle X-ray scattering measurements show absolutely no sign of isotropic population and reveal ≥99% aligned orientational order with an angular spread Δθ(fwhm) ≤ 5° (full width at half-maximum). This method may pave the way to practical industrial use of hierarchically patterned BCP nanostructures.

Fabrication of silicon oxide nanodots with an areal density beyond 1 teradots inch(-2)

The combination of solvent annealing, surface reconstruction, and a tone-reversal etching procedure provides an attractive approach to utilize block copolymer (BCP) lithography to fabricate highly ordered and densely packed silicon oxide nano-dots on a surface. The obtained silicon oxide nano-dots feature an areal density of 1.3 teradots inch(-2) .

Fast assembly of ordered block copolymer nanostructures through microwave annealing

Block copolymer self-assembly is an innovative technology capable of patterning technologically relevant substrates with nanoscale precision for a range of applications from integrated circuit fabrication to tissue interfacing, for example. In this article, we demonstrate a microwave-based method of rapidly inducing order in block copolymer structures. The technique involves the usage of a commercial microwave reactor to anneal block copolymer films in the presence of appropriate solvents, and we explore the effect of various parameters over the polymer assembly speed and defect density. The approach is applied to the commonly used poly(styrene)-b-poly(methyl methacrylate) (PS-b-PMMA) and poly(styrene)-b-poly(2-vinylpyridine) (PS-b-P2VP) families of block copolymers, and it is found that the substrate resistivity, solvent environment, and anneal temperature all critically influence the self-assembly process. For selected systems, highly ordered patterns were achieved in less than 3 min. In addition, we establish the compatibility of the technique with directed assembly by graphoepitaxy.