Holographic control of motive shape in plasmonic nanogap arrays

Large Area Patterning of Highly Reproducible and Sensitive SERS Sensors Based on 10-nm Annular Gap Arrays

Applicable surface-enhanced Raman scattering (SERS) active substrates typically require low-cost patterning methodology, high reproducibility, and a high enhancement factor (EF) over a large area. However, the lack of reproducible, reliable fabrication for large area SERS substrates in a low-cost manner remains a challenge. Here, a patterning method based on nanosphere lithography and adhesion lithography is reported that allows massively parallel fabrication of 10-nm annular gap arrays on large areas. The arrays exhibit excellent reproducibility and high SERS performance, with an EF of up to 10⁷. An effective wearable SERS contact lens for glucose detection is further demonstrated. The technique described here extends the range of SERS-active substrates that can be fabricated over large areas, and holds exciting potential for SERS-based chemical and biomedical detection.

Large-Scale and Wide-Gamut Coloration at the Diffraction Limit in Flexible, Self-Assembled Hierarchical Nanomaterials

Unveiling physical phenomena that generate controllable structural coloration is at the center of significant research efforts due to the platform potential for the next generation of printing, sensing, displays, wearable optoelectronics components, and smart fabrics. Colors based on e-beam facilities possess high resolutions above 100k dots per inch (DPI), but limit manufacturing scales up to 4.37 cm² , while requiring rigid substrates that are not flexible. State-of-art scalable techniques, on the contrary, provide either narrow gamuts or small resolutions. A common issue of current methods is also a heterogeneous resolution, which typically changes with the color printed. Here, a structural coloration platform with broad gamuts exceeding the red, green, and blue (RGB) spectrum in inexpensive, thermally resistant, flexible, and metallic-free structures at constant 101 600 DPI (at the diffraction limit), obtained via mass-production manufacturing is demonstrated. This platform exploits a previously unexplored physical mechanism, which leverages the interplay between strong scattering modes and optical resonances excited in fully 3D dielectric nanostructures with suitably engineered longitudinal profiles. The colors obtained with this technology are scalable to any area, demonstrated up to the single wafer (4 in.). These results open real-world applications of inexpensive, high-resolution, large-scale structural colors with broad chromatic spectra.

Scalable Fabrication of Metallic Nanogaps at the Sub-10 nm Level

Metallic nanogaps with metal-metal separations of less than 10 nm have many applications in nanoscale photonics and electronics. However, their fabrication remains a considerable challenge, especially for applications that require patterning of nanoscale features over macroscopic length-scales. Here, some of the most promising techniques for nanogap fabrication are evaluated, covering established technologies such as photolithography, electron-beam lithography (EBL), and focused ion beam (FIB) milling, plus a number of newer methods that use novel electrochemical and mechanical means to effect the patterning. The physical principles behind each method are reviewed and their strengths and limitations for nanogap patterning in terms of resolution, fidelity, speed, ease of implementation, versatility, and scalability to large substrate sizes are discussed.

Metallic Plasmonic Array Structures: Principles, Fabrications, Properties, and Applications

The vast development of nanofabrication has spurred recent progress for the manipulation of light down to a region much smaller than the wavelength. Metallic plasmonic array structures are demonstrated to be the most powerful platform to realize controllable light-matter interactions and have found wide applications due to their rich and tunable optical performance through the morphology and parameter engineering. Here, various light-management mechanisms that may exist on metallic plasmonic array structures are described. Then, the typical techniques for fabrication of metallic plasmonic arrays are summarized. Next, some recent applications of plasmonic arrays are reviewed, including plasmonic sensing, surface-enhanced spectroscopies, plasmonic nanolasing, and perfect light absorption. Lastly, the existing challenges and perspectives for metallic plasmonic arrays are discussed. The aim is to provide guidance for future development of metallic plasmonic array structures.

Three-Dimensional Photonic Crystal Bulks with Outstanding Mechanical Performance Assembled by Thermoforming-Etching Cross-linked Polymer Microspheres

Traditional self-assembly methods for photonic crystals (PCs) limited by poor mechanical performance and microstructure defects make it hard to be directly applied to optical devices, whose performance strongly rely on mechanical performance and microstructure of PCs. Here, a thermoforming-etching strategy combining both traditional processing and nanofabrication is reported to develop cross-linked polystyrene microsphere-based PC bulks with outstanding mechanical performance. It illustrates scientific principles, where surface molecular chains of PS microspheres were activated and entangled with each other under thermoforming conditions (200 °C; 220 MPa), resulting in applicable mechanical strength (hardness and modulus reach 0.12 and 4.12 GPa, respectively). The optimum optical reflectivity of the PS microsphere-based (180 nm) PC bulk is 49.4% at 381 nm. Furthermore, these PC bulks have been successfully written in anti-counterfeiting and realized colorful pattern printing. The innovative method opens a new route for the rapid and simple fabrication of the nanoparticle structure which can be used as various functional devices and directly promotes the industrialization of bulk PC devices, such as optical and display devices, and so forth.

Real-Time Tunable Colors from Microfluidic Reconfigurable All-Dielectric Metasurfaces

Structural colors arising from all-dielectric nanostructures are very promising for high-resolution color nanoprinting and high-density optical storage. However, once the all-dielectric nanostructures are fabricated, their optical performances are usually static or change slowly, significantly limiting the practical applications in advanced displays. Herein, we experimentally demonstrate the real-time tunable colors with microfluidic reconfigurable all-dielectric metasurfaces. The metasurface is composed of an array of TiO₂ nanoblocks, which are embedded in a polymeric microfluidic channel. By injecting solutions with a different refractive index into the channel, the narrow band reflection peak and the corresponding distinct colors of a TiO₂ metasurface can be precisely controlled. The transition time is as small as 16 ms, which is orders of magnitude faster than the current techniques. By varying the lattice size of TiO₂ metasurfaces, the real-time tunable colors are able to span the entire visible spectrum. Meanwhile, the injection and ejection of solvent have also shown the capability of the erasion and the restoration of information encoded in TiO₂ metasurfaces. The combination of all-dielectric nanostructures with microfluidic channels shall boost their applications in functional color display, banknote security, anticounterfeiting, and point-of-care devices.

All-Dielectric Full-Color Printing with TiO2 Metasurfaces

Recently, color generation in resonant nanostructures have been intensively studied. Despite of their exciting progresses, the structural colors are usually generated by the plasmonic resonances of metallic nanoparticles. Due to the inherent plasmon damping, such plasmonic nanostructures are usually hard to create very distinct color impressions. Here we utilize the concept of metasurfaces to produce all-dielectric, low-loss, and high-resolution structural colors. We have fabricated TiO₂ metasurfaces with electron-beam lithography and a very simple lift-off process. The optical characterizations showed that the TiO₂ metasurfaces with different unit sizes could generate high reflection peaks at designed wavelengths. The maximal reflectance was as high as 64% with full width at half-maximum (fwhm) around 30 nm. Consequently, distinct colors have been observed in bright field and the generated colors covered the entire visible spectral range. The detailed numerical analysis shows that the distinct colors were generated by the electric resonance and magnetic resonances in TiO₂ metasurfaces. Based on the unique properties of magnetic resonances, distinct colors have been observed in bright field when the metasurfaces were reduced to a 4 × 4 array, giving a spatial resolution around 16000 dpi. Considering the cost, stability, and CMOS-compatibility, this research will be important for the structural colors to reach real-world industrial applications.

Multiple beam interference lithography: A tool for rapid fabrication of plasmonic arrays of arbitrary shaped nanomotifs

A novel method enabling rapid fabrication of 2D periodic arrays of plasmonic nanoparticles across large areas is presented. This method is based on the interference of multiple coherent beams originating from diffraction of large-diameter collimated beam on a transmission phase mask. Mutual orientation of the interfering beams is determined by parameters of the used phase mask. Herein, parameters of the phase mask (periods and modulation depth) are selected to yield an interference pattern with high contrast and narrow well-separated maxima. Finally, multiple beam interference lithography (MBIL)-based fabrication of periodic plasmonic arrays with selected nanomotifs including discs, disc dimers, rods and bowtie antennas is demonstrated.

Self-aligned colloidal lithography for controllable and tuneable plasmonic nanogaps

Au nanoparticles (NPs) deposited on a substrate function as ring shaped colloidal shadow masks. Using e-beam evaporation of gold, nanometer sized gaps are formed as a result. The size of these gaps can be accurately tuned by controlling the thickness of the gold deposition, thereby tuning the plasmonic coupling of the NPs with the substrate. The clean cavity produced between the Au NPs and the Au film provides an excellent SERS platform for trace molecule detection.

Holographic fabrication of nanoantenna templates through a single reflective optical element

In this paper, we present a single reflective optical element-based approach for the control of laser phase, polarization, and beam intensity for the holographic fabrication of nanoantenna templates. The single optical element can be designed and printed precisely by a 3D printer. The holographic fabrication is demonstrated in both negative and positive photoresists. The pattern fabricated is in agreement with simulations. The control of the nanogap size of nanoantennas is discussed in terms of the capabilities of the single-optical-element approach.

Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays

A novel nanofabrication technique based on 4-beam interference lithography is presented that enables the preparation of large macroscopic areas (>50 mm2) of perfectly periodic and defect-free two-dimensional plasmonic arrays of nanoparticles as small as 100 nm. The technique is based on a special interferometer, composed of two mirrors and a sample with photoresist that together form a right-angled corner reflector. In such an interferometer, the incoming expanded laser beam is split into four interfering beams that yield an interference pattern with rectangular symmetry. The interferometer allows setting the periods of the array from about 220 nm to 1500 nm in both directions independently through the rotation of the corner-reflector assembly around horizontal and vertical axes perpendicular to the direction of the incident beam. Using a theoretical model, the implementation of the four-beam interference lithography is discussed in terms of the optimum contrast as well as attainable periods of the array. Several examples of plasmonic arrays (on either glass or polymer substrate layers) fabricated by this technique are presented.

Enhanced second harmonic generation from Au nanoparticle arrays by femtosecond laser irradiation

Ultrafast laser irradiation of planar Au nanoparticle arrays is shown to double the particle plasmon quality factor and to enhance second harmonic generation 40-fold. It is found that the irradiation induces a morphological change of nano-cylinders into asymmetric droplet-like shapes with reduced surface roughness without altering their lithographically defined locations. These findings can be used to improve the performance of linear and nonlinear plasmonic devices.

Optical force stamping lithography

Here we introduce a new paradigm of far-field optical lithography, optical force stamping lithography. The approach employs optical forces exerted by a spatially modulated light field on colloidal nanoparticles to rapidly stamp large arbitrary patterns comprised of single nanoparticles onto a substrate with a single-nanoparticle positioning accuracy well beyond the diffraction limit. Because the process is all-optical, the stamping pattern can be changed almost instantly and there is no constraint on the type of nanoparticle or substrates used.