1
|
Luo S, Mancini A, Lian E, Xu W, Berté R, Li Y. Large Area Patterning of Highly Reproducible and Sensitive SERS Sensors Based on 10-nm Annular Gap Arrays. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:3842. [PMID: 36364618 PMCID: PMC9655199 DOI: 10.3390/nano12213842] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/27/2022] [Revised: 10/25/2022] [Accepted: 10/25/2022] [Indexed: 06/16/2023]
Abstract
Applicable surface-enhanced Raman scattering (SERS) active substrates typically require low-cost patterning methodology, high reproducibility, and a high enhancement factor (EF) over a large area. However, the lack of reproducible, reliable fabrication for large area SERS substrates in a low-cost manner remains a challenge. Here, a patterning method based on nanosphere lithography and adhesion lithography is reported that allows massively parallel fabrication of 10-nm annular gap arrays on large areas. The arrays exhibit excellent reproducibility and high SERS performance, with an EF of up to 107. An effective wearable SERS contact lens for glucose detection is further demonstrated. The technique described here extends the range of SERS-active substrates that can be fabricated over large areas, and holds exciting potential for SERS-based chemical and biomedical detection.
Collapse
Affiliation(s)
- Sihai Luo
- Department of Chemistry, Norwegian University of Science and Technology (NTNU), 7491 Trondheim, Norway
| | - Andrea Mancini
- Chair in Hybrid Nanosystems, Nanoinstitute Munich, Faculty of Physics, Ludwig-Maximilians-Universität München, Königinstrasse 10, 80539 München, Germany
| | - Enkui Lian
- Department of Chemistry, Norwegian University of Science and Technology (NTNU), 7491 Trondheim, Norway
| | - Wenqi Xu
- Department of Chemical Engineering, Norwegian University of Science and Technology (NTNU), 7491 Trondheim, Norway
| | - Rodrigo Berté
- Chair in Hybrid Nanosystems, Nanoinstitute Munich, Faculty of Physics, Ludwig-Maximilians-Universität München, Königinstrasse 10, 80539 München, Germany
| | - Yi Li
- Chair in Hybrid Nanosystems, Nanoinstitute Munich, Faculty of Physics, Ludwig-Maximilians-Universität München, Königinstrasse 10, 80539 München, Germany
- School of Microelectronics, MOE Engineering Research Center of Integrated Circuits for Next Generation Communications, Southern University of Science and Technology, Shenzhen 518055, China
| |
Collapse
|
2
|
Li N, Xiang F, Elizarov MS, Makarenko M, Lopez AB, Getman F, Bonifazi M, Mazzone V, Fratalocchi A. Large-Scale and Wide-Gamut Coloration at the Diffraction Limit in Flexible, Self-Assembled Hierarchical Nanomaterials. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2108013. [PMID: 34919763 DOI: 10.1002/adma.202108013] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/06/2021] [Revised: 12/12/2021] [Indexed: 06/14/2023]
Abstract
Unveiling physical phenomena that generate controllable structural coloration is at the center of significant research efforts due to the platform potential for the next generation of printing, sensing, displays, wearable optoelectronics components, and smart fabrics. Colors based on e-beam facilities possess high resolutions above 100k dots per inch (DPI), but limit manufacturing scales up to 4.37 cm2 , while requiring rigid substrates that are not flexible. State-of-art scalable techniques, on the contrary, provide either narrow gamuts or small resolutions. A common issue of current methods is also a heterogeneous resolution, which typically changes with the color printed. Here, a structural coloration platform with broad gamuts exceeding the red, green, and blue (RGB) spectrum in inexpensive, thermally resistant, flexible, and metallic-free structures at constant 101 600 DPI (at the diffraction limit), obtained via mass-production manufacturing is demonstrated. This platform exploits a previously unexplored physical mechanism, which leverages the interplay between strong scattering modes and optical resonances excited in fully 3D dielectric nanostructures with suitably engineered longitudinal profiles. The colors obtained with this technology are scalable to any area, demonstrated up to the single wafer (4 in.). These results open real-world applications of inexpensive, high-resolution, large-scale structural colors with broad chromatic spectra.
Collapse
Affiliation(s)
- Ning Li
- PRIMALIGHT, Faculty of Electrical Engineering, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Fei Xiang
- PRIMALIGHT, Faculty of Electrical Engineering, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
- School of Materials and Energy, University of Electronic Science and Technology of China (UESTC), Chengdu, Sichuan, China
| | - Maxim S Elizarov
- PRIMALIGHT, Faculty of Electrical Engineering, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Maxim Makarenko
- PRIMALIGHT, Faculty of Electrical Engineering, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Arturo B Lopez
- PRIMALIGHT, Faculty of Electrical Engineering, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Fedor Getman
- PRIMALIGHT, Faculty of Electrical Engineering, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Marcella Bonifazi
- PRIMALIGHT, Faculty of Electrical Engineering, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
- University of Zurich, Physik-Institut, Winterthurerstrasse 190, Zurich, CH-8057, Switzerland
| | - Valerio Mazzone
- PRIMALIGHT, Faculty of Electrical Engineering, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
- University of Zurich, Physik-Institut, Winterthurerstrasse 190, Zurich, CH-8057, Switzerland
| | - Andrea Fratalocchi
- PRIMALIGHT, Faculty of Electrical Engineering, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| |
Collapse
|
3
|
Luo S, Hoff BH, Maier SA, de Mello JC. Scalable Fabrication of Metallic Nanogaps at the Sub-10 nm Level. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2021; 8:e2102756. [PMID: 34719889 PMCID: PMC8693066 DOI: 10.1002/advs.202102756] [Citation(s) in RCA: 18] [Impact Index Per Article: 6.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/29/2021] [Revised: 08/09/2021] [Indexed: 06/01/2023]
Abstract
Metallic nanogaps with metal-metal separations of less than 10 nm have many applications in nanoscale photonics and electronics. However, their fabrication remains a considerable challenge, especially for applications that require patterning of nanoscale features over macroscopic length-scales. Here, some of the most promising techniques for nanogap fabrication are evaluated, covering established technologies such as photolithography, electron-beam lithography (EBL), and focused ion beam (FIB) milling, plus a number of newer methods that use novel electrochemical and mechanical means to effect the patterning. The physical principles behind each method are reviewed and their strengths and limitations for nanogap patterning in terms of resolution, fidelity, speed, ease of implementation, versatility, and scalability to large substrate sizes are discussed.
Collapse
Affiliation(s)
- Sihai Luo
- Department of ChemistryNorwegian University of Science and Technology (NTNU)TrondheimNO‐7491Norway
| | - Bård H. Hoff
- Department of ChemistryNorwegian University of Science and Technology (NTNU)TrondheimNO‐7491Norway
| | - Stefan A. Maier
- Nano‐Institute MunichFaculty of PhysicsLudwig‐Maximilians‐Universität MünchenMünchen80539Germany
- Blackett LaboratoryDepartment of PhysicsImperial College LondonLondonSW7 2AZUK
| | - John C. de Mello
- Department of ChemistryNorwegian University of Science and Technology (NTNU)TrondheimNO‐7491Norway
| |
Collapse
|
4
|
Yang K, Yao X, Liu B, Ren B. Metallic Plasmonic Array Structures: Principles, Fabrications, Properties, and Applications. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2021; 33:e2007988. [PMID: 34048123 DOI: 10.1002/adma.202007988] [Citation(s) in RCA: 10] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/25/2020] [Revised: 02/22/2021] [Indexed: 05/18/2023]
Abstract
The vast development of nanofabrication has spurred recent progress for the manipulation of light down to a region much smaller than the wavelength. Metallic plasmonic array structures are demonstrated to be the most powerful platform to realize controllable light-matter interactions and have found wide applications due to their rich and tunable optical performance through the morphology and parameter engineering. Here, various light-management mechanisms that may exist on metallic plasmonic array structures are described. Then, the typical techniques for fabrication of metallic plasmonic arrays are summarized. Next, some recent applications of plasmonic arrays are reviewed, including plasmonic sensing, surface-enhanced spectroscopies, plasmonic nanolasing, and perfect light absorption. Lastly, the existing challenges and perspectives for metallic plasmonic arrays are discussed. The aim is to provide guidance for future development of metallic plasmonic array structures.
Collapse
Affiliation(s)
- Kang Yang
- State Key Laboratory of Physical Chemistry of Solid Surfaces, The MOE Key Laboratory of Spectrochemical Analysis and Instrumentation, Collaborative Innovation Center of Chemistry for Energy Materials (iChEM), College of Chemistry and Chemical Engineering, Xiamen University, Xiamen, 361005, China
| | - Xu Yao
- State Key Laboratory of Physical Chemistry of Solid Surfaces, The MOE Key Laboratory of Spectrochemical Analysis and Instrumentation, Collaborative Innovation Center of Chemistry for Energy Materials (iChEM), College of Chemistry and Chemical Engineering, Xiamen University, Xiamen, 361005, China
| | - Bowen Liu
- State Key Laboratory of Physical Chemistry of Solid Surfaces, The MOE Key Laboratory of Spectrochemical Analysis and Instrumentation, Collaborative Innovation Center of Chemistry for Energy Materials (iChEM), College of Chemistry and Chemical Engineering, Xiamen University, Xiamen, 361005, China
- College of Chemistry and Chemical Engineering, Lanzhou University, Lanzhou, 730000, China
| | - Bin Ren
- State Key Laboratory of Physical Chemistry of Solid Surfaces, The MOE Key Laboratory of Spectrochemical Analysis and Instrumentation, Collaborative Innovation Center of Chemistry for Energy Materials (iChEM), College of Chemistry and Chemical Engineering, Xiamen University, Xiamen, 361005, China
- Innovation Laboratory for Sciences and Technologies of Energy Materials of Fujian Province (IKKEM), Xiamen, 361005, China
| |
Collapse
|
5
|
Fu Y, Wang Y, Chen D, Yu Z, Zheng J, Zhou H. Three-Dimensional Photonic Crystal Bulks with Outstanding Mechanical Performance Assembled by Thermoforming-Etching Cross-linked Polymer Microspheres. ACS APPLIED MATERIALS & INTERFACES 2020; 12:35311-35317. [PMID: 32635711 DOI: 10.1021/acsami.0c04723] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Traditional self-assembly methods for photonic crystals (PCs) limited by poor mechanical performance and microstructure defects make it hard to be directly applied to optical devices, whose performance strongly rely on mechanical performance and microstructure of PCs. Here, a thermoforming-etching strategy combining both traditional processing and nanofabrication is reported to develop cross-linked polystyrene microsphere-based PC bulks with outstanding mechanical performance. It illustrates scientific principles, where surface molecular chains of PS microspheres were activated and entangled with each other under thermoforming conditions (200 °C; 220 MPa), resulting in applicable mechanical strength (hardness and modulus reach 0.12 and 4.12 GPa, respectively). The optimum optical reflectivity of the PS microsphere-based (180 nm) PC bulk is 49.4% at 381 nm. Furthermore, these PC bulks have been successfully written in anti-counterfeiting and realized colorful pattern printing. The innovative method opens a new route for the rapid and simple fabrication of the nanoparticle structure which can be used as various functional devices and directly promotes the industrialization of bulk PC devices, such as optical and display devices, and so forth.
Collapse
Affiliation(s)
- Yue Fu
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Yunming Wang
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Dan Chen
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Zhaohan Yu
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Jiaqi Zheng
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Huamin Zhou
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
| |
Collapse
|
6
|
Sun S, Yang W, Zhang C, Jing J, Gao Y, Yu X, Song Q, Xiao S. Real-Time Tunable Colors from Microfluidic Reconfigurable All-Dielectric Metasurfaces. ACS NANO 2018; 12:2151-2159. [PMID: 29469563 DOI: 10.1021/acsnano.7b07121] [Citation(s) in RCA: 16] [Impact Index Per Article: 2.7] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/28/2023]
Abstract
Structural colors arising from all-dielectric nanostructures are very promising for high-resolution color nanoprinting and high-density optical storage. However, once the all-dielectric nanostructures are fabricated, their optical performances are usually static or change slowly, significantly limiting the practical applications in advanced displays. Herein, we experimentally demonstrate the real-time tunable colors with microfluidic reconfigurable all-dielectric metasurfaces. The metasurface is composed of an array of TiO2 nanoblocks, which are embedded in a polymeric microfluidic channel. By injecting solutions with a different refractive index into the channel, the narrow band reflection peak and the corresponding distinct colors of a TiO2 metasurface can be precisely controlled. The transition time is as small as 16 ms, which is orders of magnitude faster than the current techniques. By varying the lattice size of TiO2 metasurfaces, the real-time tunable colors are able to span the entire visible spectrum. Meanwhile, the injection and ejection of solvent have also shown the capability of the erasion and the restoration of information encoded in TiO2 metasurfaces. The combination of all-dielectric nanostructures with microfluidic channels shall boost their applications in functional color display, banknote security, anticounterfeiting, and point-of-care devices.
Collapse
Affiliation(s)
- Shang Sun
- State Key Laboratory on Tunable Laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School , Harbin Institute of Technology , Shenzhen , Guangdong 518055 , P.R. China
- Collaborative Innovation Center of Extreme Optics , Shanxi University , Taiyuan , Shanxi 030006 , P.R. China
| | - Wenhong Yang
- State Key Laboratory on Tunable Laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School , Harbin Institute of Technology , Shenzhen , Guangdong 518055 , P.R. China
- Collaborative Innovation Center of Extreme Optics , Shanxi University , Taiyuan , Shanxi 030006 , P.R. China
| | - Chen Zhang
- State Key Laboratory on Tunable Laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School , Harbin Institute of Technology , Shenzhen , Guangdong 518055 , P.R. China
- Collaborative Innovation Center of Extreme Optics , Shanxi University , Taiyuan , Shanxi 030006 , P.R. China
| | - Jixiang Jing
- State Key Laboratory on Tunable Laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School , Harbin Institute of Technology , Shenzhen , Guangdong 518055 , P.R. China
- Collaborative Innovation Center of Extreme Optics , Shanxi University , Taiyuan , Shanxi 030006 , P.R. China
| | - Yisheng Gao
- State Key Laboratory on Tunable Laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School , Harbin Institute of Technology , Shenzhen , Guangdong 518055 , P.R. China
- Collaborative Innovation Center of Extreme Optics , Shanxi University , Taiyuan , Shanxi 030006 , P.R. China
| | - Xiaoyi Yu
- State Key Laboratory on Tunable Laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School , Harbin Institute of Technology , Shenzhen , Guangdong 518055 , P.R. China
- Collaborative Innovation Center of Extreme Optics , Shanxi University , Taiyuan , Shanxi 030006 , P.R. China
| | - Qinghai Song
- State Key Laboratory on Tunable Laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School , Harbin Institute of Technology , Shenzhen , Guangdong 518055 , P.R. China
- Collaborative Innovation Center of Extreme Optics , Shanxi University , Taiyuan , Shanxi 030006 , P.R. China
| | - Shumin Xiao
- State Key Laboratory on Tunable Laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School , Harbin Institute of Technology , Shenzhen , Guangdong 518055 , P.R. China
- Collaborative Innovation Center of Extreme Optics , Shanxi University , Taiyuan , Shanxi 030006 , P.R. China
| |
Collapse
|
7
|
Sun S, Zhou Z, Zhang C, Gao Y, Duan Z, Xiao S, Song Q. All-Dielectric Full-Color Printing with TiO 2 Metasurfaces. ACS NANO 2017; 11:4445-4452. [PMID: 28317376 DOI: 10.1021/acsnano.7b00415] [Citation(s) in RCA: 144] [Impact Index Per Article: 20.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/19/2023]
Abstract
Recently, color generation in resonant nanostructures have been intensively studied. Despite of their exciting progresses, the structural colors are usually generated by the plasmonic resonances of metallic nanoparticles. Due to the inherent plasmon damping, such plasmonic nanostructures are usually hard to create very distinct color impressions. Here we utilize the concept of metasurfaces to produce all-dielectric, low-loss, and high-resolution structural colors. We have fabricated TiO2 metasurfaces with electron-beam lithography and a very simple lift-off process. The optical characterizations showed that the TiO2 metasurfaces with different unit sizes could generate high reflection peaks at designed wavelengths. The maximal reflectance was as high as 64% with full width at half-maximum (fwhm) around 30 nm. Consequently, distinct colors have been observed in bright field and the generated colors covered the entire visible spectral range. The detailed numerical analysis shows that the distinct colors were generated by the electric resonance and magnetic resonances in TiO2 metasurfaces. Based on the unique properties of magnetic resonances, distinct colors have been observed in bright field when the metasurfaces were reduced to a 4 × 4 array, giving a spatial resolution around 16000 dpi. Considering the cost, stability, and CMOS-compatibility, this research will be important for the structural colors to reach real-world industrial applications.
Collapse
Affiliation(s)
- Shang Sun
- State Key Laboratory on Tunable laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School, Harbin Institute of Technology , Shenzhen 518055, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University , Taiyuan 030006, China
| | - Zhenxing Zhou
- State Key Laboratory on Tunable laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School, Harbin Institute of Technology , Shenzhen 518055, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University , Taiyuan 030006, China
| | - Chen Zhang
- State Key Laboratory on Tunable laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School, Harbin Institute of Technology , Shenzhen 518055, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University , Taiyuan 030006, China
| | - Yisheng Gao
- State Key Laboratory on Tunable laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School, Harbin Institute of Technology , Shenzhen 518055, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University , Taiyuan 030006, China
| | - Zonghui Duan
- State Key Laboratory on Tunable laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School, Harbin Institute of Technology , Shenzhen 518055, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University , Taiyuan 030006, China
| | - Shumin Xiao
- State Key Laboratory on Tunable laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School, Harbin Institute of Technology , Shenzhen 518055, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University , Taiyuan 030006, China
| | - Qinghai Song
- State Key Laboratory on Tunable laser Technology, Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Shenzhen Graduate School, Harbin Institute of Technology , Shenzhen 518055, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University , Taiyuan 030006, China
| |
Collapse
|
8
|
Vala M, Homola J. Multiple beam interference lithography: A tool for rapid fabrication of plasmonic arrays of arbitrary shaped nanomotifs. OPTICS EXPRESS 2016; 24:15656-15665. [PMID: 27410838 DOI: 10.1364/oe.24.015656] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
A novel method enabling rapid fabrication of 2D periodic arrays of plasmonic nanoparticles across large areas is presented. This method is based on the interference of multiple coherent beams originating from diffraction of large-diameter collimated beam on a transmission phase mask. Mutual orientation of the interfering beams is determined by parameters of the used phase mask. Herein, parameters of the phase mask (periods and modulation depth) are selected to yield an interference pattern with high contrast and narrow well-separated maxima. Finally, multiple beam interference lithography (MBIL)-based fabrication of periodic plasmonic arrays with selected nanomotifs including discs, disc dimers, rods and bowtie antennas is demonstrated.
Collapse
|
9
|
Ding T, Herrmann LO, de Nijs B, Benz F, Baumberg JJ. Self-aligned colloidal lithography for controllable and tuneable plasmonic nanogaps. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2015; 11:2139-43. [PMID: 25505000 PMCID: PMC4515099 DOI: 10.1002/smll.201402639] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/02/2014] [Revised: 11/05/2014] [Indexed: 05/19/2023]
Abstract
Au nanoparticles (NPs) deposited on a substrate function as ring shaped colloidal shadow masks. Using e-beam evaporation of gold, nanometer sized gaps are formed as a result. The size of these gaps can be accurately tuned by controlling the thickness of the gold deposition, thereby tuning the plasmonic coupling of the NPs with the substrate. The clean cavity produced between the Au NPs and the Au film provides an excellent SERS platform for trace molecule detection.
Collapse
Affiliation(s)
- Tao Ding
- NanoPhotonics Centre, Cavendish Laboratory, JJ Thomson Avenue, Cambridge, CB3 0HE, UK; Department of Materials Science and Metallurgy, 27 Charles Babbage Road, University of Cambridge, CB3 0FS, UK
| | | | | | | | | |
Collapse
|
10
|
George D, Lutkenhaus J, Ding J, Zhang H, Cui J, Philipose U, Lin Y. Holographic fabrication of nanoantenna templates through a single reflective optical element. APPLIED OPTICS 2015; 54:2720-2724. [PMID: 25967182 DOI: 10.1364/ao.54.002720] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/04/2015] [Accepted: 03/02/2015] [Indexed: 06/04/2023]
Abstract
In this paper, we present a single reflective optical element-based approach for the control of laser phase, polarization, and beam intensity for the holographic fabrication of nanoantenna templates. The single optical element can be designed and printed precisely by a 3D printer. The holographic fabrication is demonstrated in both negative and positive photoresists. The pattern fabricated is in agreement with simulations. The control of the nanogap size of nanoantennas is discussed in terms of the capabilities of the single-optical-element approach.
Collapse
|
11
|
Vala M, Homola J. Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays. OPTICS EXPRESS 2014; 22:18778-89. [PMID: 25089495 DOI: 10.1364/oe.22.018778] [Citation(s) in RCA: 13] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/27/2023]
Abstract
A novel nanofabrication technique based on 4-beam interference lithography is presented that enables the preparation of large macroscopic areas (>50 mm2) of perfectly periodic and defect-free two-dimensional plasmonic arrays of nanoparticles as small as 100 nm. The technique is based on a special interferometer, composed of two mirrors and a sample with photoresist that together form a right-angled corner reflector. In such an interferometer, the incoming expanded laser beam is split into four interfering beams that yield an interference pattern with rectangular symmetry. The interferometer allows setting the periods of the array from about 220 nm to 1500 nm in both directions independently through the rotation of the corner-reflector assembly around horizontal and vertical axes perpendicular to the direction of the incident beam. Using a theoretical model, the implementation of the four-beam interference lithography is discussed in terms of the optimum contrast as well as attainable periods of the array. Several examples of plasmonic arrays (on either glass or polymer substrate layers) fabricated by this technique are presented.
Collapse
|
12
|
Hong JY, Huh S. Facile preparation of SERS-active nanostructured Au spheres by simple reduction of AuCl4- ions with EDOT. J Colloid Interface Sci 2014; 418:360-5. [DOI: 10.1016/j.jcis.2013.12.032] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/19/2013] [Revised: 12/10/2013] [Accepted: 12/12/2013] [Indexed: 10/25/2022]
|
13
|
Yan M, Xiang Y, Liu L, Chai L, Li X, Feng T. Silver nanocrystals with special shapes: controlled synthesis and their surface-enhanced Raman scattering properties. RSC Adv 2014. [DOI: 10.1039/c3ra44437f] [Citation(s) in RCA: 20] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/31/2023] Open
|
14
|
Walsh GF, Dal Negro L. Enhanced second harmonic generation from Au nanoparticle arrays by femtosecond laser irradiation. NANOSCALE 2013; 5:7795-7799. [PMID: 23893040 DOI: 10.1039/c3nr02145a] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/02/2023]
Abstract
Ultrafast laser irradiation of planar Au nanoparticle arrays is shown to double the particle plasmon quality factor and to enhance second harmonic generation 40-fold. It is found that the irradiation induces a morphological change of nano-cylinders into asymmetric droplet-like shapes with reduced surface roughness without altering their lithographically defined locations. These findings can be used to improve the performance of linear and nonlinear plasmonic devices.
Collapse
Affiliation(s)
- Gary F Walsh
- Department of Electrical and Computer Engineering and Photonics Center, Boston University, 8 Saint Marry's, Boston, Massachusetts 02215, USA
| | | |
Collapse
|
15
|
Lee SY, Jeon HC, Yang SM. Unconventional methods for fabricating nanostructures toward high-fidelity sensors. ACTA ACUST UNITED AC 2012. [DOI: 10.1039/c2jm16568f] [Citation(s) in RCA: 23] [Impact Index Per Article: 1.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
|
16
|
Abstract
Here we introduce a new paradigm of far-field optical lithography, optical force stamping lithography. The approach employs optical forces exerted by a spatially modulated light field on colloidal nanoparticles to rapidly stamp large arbitrary patterns comprised of single nanoparticles onto a substrate with a single-nanoparticle positioning accuracy well beyond the diffraction limit. Because the process is all-optical, the stamping pattern can be changed almost instantly and there is no constraint on the type of nanoparticle or substrates used.
Collapse
|