A general design strategy for block copolymer directed self-assembly patterning of integrated circuits contact holes using an alphabet approach

Directed Self-Assembly of Cylinder-Forming Block Copolymers Using Pillar Topographic Patterns

We conducted a computational study on the self-assembly behavior of cylinder-forming block copolymers, directed by a guide pattern of hexagonally or tetragonally arrayed pillars, using mesoscale density functional theory simulations. By adjusting the spacing (Lp) and diameter (D) of the pillars in relation to the intrinsic cylinder-to-cylinder distance (L2) of the cylinder-forming block copolymer, we investigated the efficiency of multiple-replicating cylinders, generated by the block copolymer, through the pillar-directed self-assembly process. The simulations demonstrated that at specific values of normalized parameters L˜2=L2/Lp and D˜=D/Lp coupled with suitable surface fields, triple and quadruple replications are achievable with a hexagonally arrayed pillar pattern, while only double replication is attainable with a tetragonally arrayed pillar pattern. This work, offering an extensive structure map encompassing a wide range of possible parameter spaces, including L˜2 and D˜, serves as a valuable guide for designing the contact hole patterning essential in nanoelectronics applications.

Understanding nanodomain morphology formation in dip-coated PS-b-PEO thin films

Block copolymer (BCP) thin films prepared by dip-coating are increasingly investigated, owing to the many promising application areas, the facility, and the industrial scalability of this technique. Yet, the effect of different dip-coating parameters on BCP nanostructure formation is still underdeveloped and the results of previous literature are limited to a few block copolymers. Here, we study the effect of the withdrawal rate and solvent selectivity on the morphology evolution of dip-coated polystyrene-b-poly(ethylene oxide) thin films by applying a wide range of dip-coating speeds and altering the volume ratio of the tetrahydrofuran-water solvent system. The dip-coated films were characterized using atomic force microscopy and ellipsometry. The nanodomain morphology, its feature sizes, its spanning, and the degree of ordering were investigated with regard to different dip-coating parameters. Notably, we have obtained a hexagonally packed BCP pattern with long-range order without the need for post-annealing processes. Overall, a solid understanding of the parameters affecting the formed surface patterns and their interplay was attained and explained, extending the knowledge of this field to more materials.

Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning

This work reports a novel, simple, and resist-free chemo-epitaxy process permitting the directed self-assembly (DSA) of lamella polystyrene-block-polymethylmethacrylate (PS-b-PMMA) block copolymers (BCPs) on a 300 mm wafer. 193i lithography is used to manufacture topographical guiding silicon oxide line/space patterns. The critical dimension (CD) of the silicon oxide line obtained can be easily trimmed by means of wet or dry etching: it allows a good control of the CD that permits finely tuning the guideline and the background dimensions. The chemical pattern that permits the DSA of the BCP is formed by a polystyrene (PS) guide and brush layers obtained with the grafting of the neutral layer polystyrene-random-polymethylmethacrylate (PS-r-PMMA). Moreover, data regarding the line edge roughness (LER) and line width roughness (LWR) are discussed with reference to the literature and to the stringent requirements of semiconductor technology.

CNT modified layered α-MnO2 hybrid flame retardants: preparation and their performance in the flame retardancy of epoxy resins

In this paper, CNT modified layered α-MnO₂ hybrid flame retardants (α-MnO₂–CNTs) were synthesized through one-pot preparation. The structure and composition of the α-MnO₂–CNTs hybrid flame retardants were investigated by X-ray diffraction, TEM and SEM. Subsequently, the α-MnO₂–CNTs hybrids were then incorporated into epoxy resin (EP) to improve the fire safety properties. Compared with pure EP and the composites with CNTs or α-MnO₂, EP/α-MnO₂–CNTs composites exhibited improved flame retardancy and smoke suppression properties. With the incorporation of only 2.0 wt% of α-MnO₂–CNTs hybrid flame retardants, the peak heat release rate and total heat release of the composites showed 34% and 10.7% reduction respectively. In addition, the volatile gases such as CO and CO₂ were reduced and the smoke generation was also effectively inhibited. The improved fire safety of the composites is generally due to the network structures and the synergistic effect of α-MnO₂ and CNTs, the catalyzing charring effect, smoke suppression and the physical barrier effect of α-MnO₂ nanosheets.

In this paper, CNT modified layered α-MnO₂ hybrid flame retardants (α-MnO₂–CNTs) were synthesized through one-pot preparation.

Grain-Boundary-Induced Alignment of Block Copolymer Thin Films

We present and discuss the capability of grain boundaries to induce order in block copolymer thin films between horizontally and vertically assembled block copolymer grains. The system we use as a proof of principle is a thermally annealed 23.4 nm full-pitch lamellar Polystyrene-block-polymethylmetacrylate (PS-b-PMMA) di-block copolymer. In this paper, grain-boundary-induced alignment is achieved by the mechanical removal of the neutral brush layer via atomic force microscopy (AFM). The concept is also confirmed by a mask-less e-beam direct writing process. An elongated grain of vertically aligned lamellae is trapped between two grains of horizontally aligned lamellae. This configuration leads to the formation of 90° twist grain boundaries. The features maintain their orientation on a characteristic length scale, which is described by the material's correlation length ξ. As a result of an energy minimization process, the block copolymer domains in the vertically aligned grain orient perpendicularly to the grain boundary. The energy-minimizing feature is the grain boundary itself. The width of the manipulated area (e.g., the horizontally aligned grain) does not represent a critical process parameter.

Automated solvent vapor annealing with nanometer scale control of film swelling for block copolymer thin films

Molecular self-assembly of block copolymers has been pursued as a next generation high-resolution, low-cost lithography technique. Solvent vapor annealing is a promising way of achieving self-assembled patterns from polymers with high interaction parameters, χ, or high molecular weights. Compared to thermal annealing, the assembly in a solvated state can be much faster, but the film swelling process is typically challenging to control and reproduce. We report the design and implementation of an automated solvent annealing system that addresses these issues. In this system the film swelling is controlled via local heating or cooling, which enables exceptionally fast and precise modulation of the swelling. The swelling of the polymer films follows preprogrammed annealing profiles with the help of a feedback loop that compares and tunes the film thickness with respect to the set point. The system therefore enables complex annealing profiles such as rapid cyclic swelling and deswelling. We show that the orientation of the pattern morphology and the amount of lattice defects are influenced by the used annealing profile. We demonstrate that optimized profiles significantly shorten the annealing time (<15 min) of high-χ and high-molecular weight poly(styrene-b-2-vinylpyridine).

Influence of Homopolymer Addition in Templated Assembly of Cylindrical Block Copolymers

Templated assembly of cylindrical block copolymers provides a promising strategy for patterning holes at the nanoscale. However, remaining challenges include the ability to achieve defect-free patterns and to generate architectures useful for device patterning. The aim of this work is to gain insight into the influence of homopolymer addition on the assembly of a cylindrical block copolymer in confined space. To do so, a concerted examination that relies on experiments and simulations is carried out for different block copolymer/homopolymer blends. It is shown that by adding a majority block homopolymer with low molecular weight (compared to the blocks that make up the block copolymer), the pattern quality is significantly improved and a larger defect-free window is obtained in terms of template dimensions for two-hole features in elliptical confinements. The redistribution of the homopolymer chains effectively enables the assembly of two cylinders, despite the geometrical mismatch between the elliptical shape of the confinement and the natural hexagonal ordering of the unguided block copolymer. Monte Carlo simulations show that the homopolymer segregates to the spaces in the template that are entropically unfavorable for the block copolymer. This work serves to highlight the importance of optimizing block copolymer formulation.

Customizing topographical templates for aperiodic nanostructures of block copolymers via inverse design

The limited complexity of self-assembled nanostructures of block copolymers seriously impedes their potential utility in the semiconductor industry. Therefore, the customizability of complex nanostructures has been a long-standing goal for the utilization of directed self-assembly in nanolithography. Herein, we integrated an advanced inverse design algorithm with a well-developed theoretical model to deduce inverse solutions of topographical templates to direct the self-assembly of block copolymers into reproducible target structures. The deduced templates were optimized by finely tuning the input parameters of the inverse design algorithm and through symmetric operation as well as nanopost elimination. More importantly, our developed algorithm has the capability to search inverse solutions of topographical templates for aperiodic nanostructures over exceptionally large areas. These results reveal design rules for guiding templates for the device-oriented nanostructures of block copolymers with prospective applications in nanolithography.

Study of the perpendicular self-assembly of a novel high-χ block copolymer without any neutral layer on a silicon substrate

A novel type of high-χ block copolymer, polystyrene-block-polycarbonate (PS-b-PC), which contains an active –NH– group on the polymer backbone between the PS block and the PC block, has been successfully synthesized. Vertical micro-phase separation can be successfully achieved on Si substrates with neutral-layer-free materials with a pitch of 16.8 nm. Water contact angle experiments indicate that PS and PC have approximate surface energy values on Si substrates. A hydrogen bond mechanism has been proposed for the formation of a periodic and lamella-forming phase separation structure, with the domains oriented perpendicular to the substrate. A combination of both theory and experimental verification proves that the hydrogen bonding plays a dominant role as a real driving force to promote vertical micro-phase separation in the absence of a neutral layer. Subsequently, the study of a novel block copolymer on four different types of substrate without any neutral layer further confirms that the newly synthesized material enables greater flexibility and potential applications for the fabrication of various nanostructures and functional electronic devices in a simple, cost-effective and efficient way, which is of considerable importance to contemporary and emerging technology applications.

A novel type of high-χ block copolymer, polystyrene-block-polycarbonate (PS-b-PC), which contains an active –NH– group on the polymer backbone between the PS block and the PC block, has been successfully synthesized.

Directed self-assembly of a two-state block copolymer system

In this work, ladder-shaped block copolymer structures consisting of parallel bars, bends, and T-junctions are formed inside square confinement. We define binary states by the two degenerate alignment orientations, and study properties of the two-state system. We control the binary states by creating openings around the confinement, changing the confinement geometry, or placing lithographic guiding patterns inside the confinement. Self-consistent field theory simulations show templating effect from the wall openings and reproduce the experimental results. We demonstrate scaling of a single binary state into a larger binary state array with individual binary state control.

Multiplexed Biomolecular Arrays Generated via Parallel Dip-Pen Nanolithography

The capability of transferring target materials especially functionality-reliable biomolecules, into specific locations and with arbitrarily designed patterns are of critical importance for high-throughput disease diagnosis, multiplexing, and drug screening. Herein, we report the simultaneous patterning of two types of biomolecules using the parallel dip-pen nanolithography technology where an array of the atomic force microscope (AFM) tips can be selectively and alternately coated with target biomolecules via a specially designed inkwell array. Moreover, mixing target biomolecules at a proper volumetric ratio with polyethylene glycol dissolved in PBS buffer solution that works as an ink carrier can not only facilitate the smooth transfer of ink materials from the AFM tip to the substrate, it can also help to adjust the ink diffusion constant of different biomolecules to be highly similar so that the multiplexed biofunctional dot and/or line arrays at similar sizes can be reliably generated.

An embedded neutral layer for advanced surface affinity control in grapho-epitaxy directed self-assembly

Advanced surface affinity control for grapho-epitaxy directed self-assembly (DSA) patterning is essential for providing reliable DSA-based solutions for the development of semiconductor patterning. Independent control of surface affinity between the bottom and the sidewalls of a topographical guiding structure was achieved by embedding an ultrathin layer in the guiding template stack. The implementation of an embedded layer with tunable surface properties for DSA grapho-epitaxy was evaluated and optimized on 300 mm wafers by critical dimension SEM characterization. It was demonstrated that a thin protective layer, placed between the hard mask guiding template and the embedded layer, allows the preservation of the surface properties of the embedded layer during guiding template etching. The DSA performances of this novel grapho-epitaxy integration, using a topographical template patterned with 193 nm immersion lithography, were evaluated by monitoring the success rate and the critical dimension uniformity of the shrunk contacts. FIB-STEM analyses were further carried out to analyze the residual polymer thickness on the resulting contacts. This new integration leads to the control of the polymer residual thickness (a few nanometers) and uniformity (inferior to 1 nm) at the bottom of the guiding template which will facilitate the subsequent DSA pattern transfer.

Effect of Entrapped Solvent on the Evolution of Lateral Order in Self-Assembled P(S-r-MMA)/PS-b-PMMA Systems with Different Thicknesses

Block copolymers (BCPs) are emerging as a cost-effective nanofabrication tool to complement conventional optical lithography because they self-assemble in highly ordered polymeric templates with well-defined sub-20-nm periodic features. In this context, cylinder-forming polystyrene-block-poly(methyl methacrylate) BCPs are revealed as an interesting material of choice because the orientation of the nanostructures with respect to the underlying substrate can be effectively controlled by a poly(styrene-random-methyl methacrylate) random copolymer (RCP) brush layer grafted to the substrate prior to BCP deposition. In this work, we investigate the self-assembly process and lateral order evolution in RCP + BCP systems consisting of cylinder-forming PS-b-PMMA (67 kg mol^-1, PS fraction of ∼70%) films with thicknesses of 30, 70, 100, and 130 nm deposited on RCP brush layers having thicknesses ranging from 2 to 20 nm. The self-assembly process is promoted by a rapid thermal processing machine operating at 250 °C for 300 s. The level of lateral order is determined by measuring the correlation length (ξ) in the self-assembled BCP films. Moreover, the amount of solvent (Φ) retained in the RCP + BCP systems is measured as a function of the thicknesses of the RCP and BCP layers, respectively. In the 30-nm-thick BCP films, an increase in Φ as a function of the thickness of the RCP brush layer significantly affects the self-assembly kinetics and the final extent of the lateral order in the BCP films. Conversely, no significant variations of ξ are observed in the 70-, 100-, and 130-nm-thick BCP films with increasing Φ.

Rapid ordering of block copolymer thin films

Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be finely tuned via block architecture and processing conditions. However, the ultimate usage of these materials in real-world applications may be hampered by the extremely long thermal annealing times-hours or days-required to achieve good order. Here, we provide an overview of the fundamentals of block-copolymer self-assembly kinetics, and review the techniques that have been demonstrated to influence, and enhance, these ordering kinetics. We discuss the inherent tradeoffs between oven annealing, solvent annealing, microwave annealing, zone annealing, and other directed self-assembly methods; including an assessment of spatial and temporal characteristics. We also review both real-space and reciprocal-space analysis techniques for quantifying order in these systems.

Perpendicular Block Copolymer Microdomains in High Aspect Ratio Templates

Perpendicular orientation of lamellar microdomains in a high interaction parameter block copolymer was obtained within high aspect ratio gratings functionalized with a preferential sidewall brush. The experiments used polystyrene-block-polydimethylsiloxane (PS-b-PDMS) with molecular weight 43 kg/mol within trenches made using interference lithography. The perpendicular alignment was obtained for both thermal and solvent annealing, using three different solvent vapors, for a range of film thicknesses and trench widths. A platinum (Pt) layer at the base of the trenches avoided the formation of a wetting layer, giving perpendicular orientation at the substrate surface. The results are interpreted using self-consistent field theory simulation and a Ginzburg-Landau analytic model to map the energies of lamellae of different orientations as a function of the grating aspect ratio and the surface energies of the sidewalls and top and bottom surfaces. The model results agree with the experiment and provide a set of guidelines for obtaining perpendicular microdomains within topographic features.